• 분석과학
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• 제21권5호
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• pp.397-402
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• 2008

이산화우라늄을 질산 및 미량의 불산으로 녹인 다음 우라늄 매트릭스로부터 규소를 분리하지 않고 분광광도계(spectrophotometer)로 측정할 수 있는 분석조건을 검토하였다. 분광광도계로 미량의 규소를 측정할 때 미량의 불산이 규소 분석에 미치는 영향을 조사하였으며, 불산의 간섭을 방지하기 위하여 붕산을 사용하였다. 우라늄 용액에서 미량의 불산이 존재할 경우 포화붕산 사용 유무에 따른 규소의 회수율은 각각 $103.3{\pm}0.8$ 및 $76.6{\pm}6.8%$이었다. 포화붕산의 양은 규소의 회수율에 크게 영향을 미치지 않았다. 따라서 본 방법으로 이산화우라늄 분말 중의 불순물로 존재하는 미량의 규소를 분리 과정없이 바로 UV-VIS 분광광도법으로 정량할 수 있었다.

• Corrosion Science and Technology
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• 제12권2호
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• pp.85-92
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• 2013

This work is concerned with an evaluation of dynamic boric acid corrosion (BAC) of low alloy steel for reactor pressure vessel of a pressurized water reactor (PWR). Mockup test method was newly established to investigate dynamic BAC of the low alloy steel under various conditions simulating a primary water leakage incident. The average corrosion rate was measured from the weight loss of the low alloy steel specimen, and the maximum corrosion rate was obtained by the surface profilometry after the mockup test. The corrosion rates increased with the rise of the leakage rate of the primary water containing boric acid, and the presence of oxygen dissolved in the primary water also accelerated the corrosion. From the specimen surface analysis, it was found that typical flow-accelerated corrosion and jet-impingement occurred under two-phase fluid of water droplet and steam environment. The maximum corrosion rate was determined as 5.97 mm/year at the leakage rate of 20 cc/min of the primary water with a saturated content of oxygen within the range of experimental condition of this work.

• 한국재료학회지
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• 제9권4호
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• pp.414-418
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• 1999

Typical metal oxide thin films having optical and electrical properties are widely used as inorganic functional materials. Liquid phase deposition(LPD) method, a new low temperature process, has been developed for the several advantages of no vacuum system, low cost, high throughput, and low processing temperature(<$50^{\circ}C$). Silica powder was added to 40wt% hydrofluoro-silicic acid($H_2$SiF\ulcorner) to obtain an immersing solution of silica-saturated hydrofluorosilicic acid solution. Boric acid solution was continuously added in the range from 0 to 0.05M to prepare supersaturated hydrofluorosilicic acid solution. LPD $SiL_2$film was formed with the variation of added amount of $H_2$O. The SiO$_2$thin film could be prepared from hydrofluorosilicic acid by LPD method. The thickness of LPD $_SiO2$film was influenced by the boric acid concentration and added amount of $H_2$O. Silicon in thin film existed as SiF\ulcorner by Raman spectrum.