• 한국대기환경학회지
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• 제20권1호
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• pp.99-110
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• 2004

In order to investigate the performance of carbon dioxide PSA over zeolite adsorbent, the present study showed results of isotherm measurement, cyclic operation of 3-bed apparatus, and the corresponding numerical simulation. The experiment data of bed temperature, purity, recovery were matched well with that of numerical simulation. Purity of both gas and adsorbent phase increased rapidly with rinse rate but the degree of increase was retarded for large rinse rate The total amount of adsorbed increased only 10% even if rinse rate was enlarged to 4 times. Optimal rinse rate was 7N㎥/hr in this study. The heating rinse led to augments in recovery and productivity, possibly thanks to ease of description resulting from increased volumetric rinse rate and temperature rise in the column.

• 환경위생공학
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• 제16권2호
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• pp.38-46
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• 2001

In this work, the heterogeneous ion exchange membrane was used in a electrodialysis apparatus to treat a Ni planting rinse water because the heterogeneous ion exchange membrane was excellent efficiency as compared with low manufacturing cost, was easy to make, and had a good mechanical properties. For a regeneration of membrane and to obtain the optimal condition for a scale-up of apparatus after treating Ni plating rinse water, we would find about the limiting current density and the concentration polarization. When the Ni plating rinse water 150mg/L was treated with the electrodialysis apparatus using the heterogeneous ion exchange membrane, the limiting current density was about $1.49{\;}mA/\textrm{cm}^2$. And the limiting current density increased with the flow rate and concentration of Ni plating rinse water. We recognized that the used membrane could be reused by periodic backwashing because efficiency was constant when the membrane was backwashed after treating wastewater.

• 한국패션뷰티학회지
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• 제4권3호
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• pp.13-17
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• 2006

Perm is one the of the most common thing in a beauty salon like hair-cut and hair perm needs processing solutions which is chemical substances. Those chemical substances damage the hair cuticle. Damaged hair cuticles with mistakes of perm will follow with the next performance and it will cause more damage to hair. As damage of hair cuticle become worse, it is harder to recover the hair cuticle like before. Therefore, this study shows that plain rinse is the way to reduce the damage of hair cuticle with perm as much as possible. With experiments, I suggest the right way to do plain rinse to satisfy customers' demand and reduce the damage. During the research, I figured that plain rinse with the knowledge, structure of hair cuticle, principle of perm and plain rinse, is very needed. The hair with plain rinse have more elastic curl and have less scales which came off from hair cuticle than the hair without plain rinse. This experiment concludes that hairdresser has to figure out about the time, temperature and type of water depends on the degree of damaged hair of customers. In order to perm, there is no way to not to use chemical substances to perm. Therefore, hairdresser has to choose suitable processing solutions and right steps, and as this is the age of 'well-being' boom, hairdresser must try to keep the healthy hair. Consequently, in order to meet the demands and conditions of customers, hairdresser needs to find the right method to do plain rinse and use the method in perm.

• Journal of Periodontal and Implant Science
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• 제24권3호
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• pp.503-512
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• 1994

The purpose of this study was to assess the clinical and microbiological effect of chlorhexidine rinse following scaling and root planing on periodontits. 10 patients with periodontal disease were selected for the study. They had not taken antibiotics for months and no history of dental treatment for 6 months before the study. They were good in general health. Patients received a scaling and root planing under local infiltration anesthesia, chlorhexidine rise group were subjected to twice a day 0.1% chlorhexidine rinse for a period 2 week. After initial clinical(plaque index, gingival index, probing pocket depth), microbiological and BANA tests were determined, each subject received a single session of scaling and root planing but no oral hygiene instructions. Clinical indices were measured, microbial parameters and BANA test were reassessed 1, 2 and 4 weeks after treatment. The results were as follows : 1. Plaque index, gingival index and pocket depth in chlorhexidine rinse group and control group were not significantly reduce during all weeks when compared chlorhexidine rinse group with control groups. Plaque index in chlorhexidine rinse group and control group were siginificantly reduced at 1, 2, 4weeks(P<0.05), gingival index and pocket depth wee ignificantly reduced at 2, 4weeks in both groups(P<0.05). 2. Perecntage of cocci and motile rods was significantly changed at 1, 2, 4weeks in chlorhexidine rinse group(P<0.05), control group was significantly changed at 4weeks in control group(P<0.05), intergroup difference was significantly at 2weeks in cocci and 4weeks in motile rods(P<0.05). 3. Percentage of non-motile rods in all group were not significantly changed when compared with those of baseline. 4. Percentage of spirochetes was significantly reduced at 4 week(P<0.05), control group was not significantly reduced during all weeks. 5. BANA test scores was significantly reduced during all weeks in chlorhexidine rinse group(P<0.05), control group was not significantly reduced during all weeks. The result showed that clinical and microbiological effect following scaling, root palning and chlorhexidine on periodontal disease.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제37회 하계학술대회 초록집
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• pp.400-400
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• 2009

• Restorative Dentistry and Endodontics
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• 제46권2호
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• pp.30.1-30.13
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• 2021

Objectives: This study was conducted to compare the microleakage and characteristics of the resin-tooth tissue interface between self-etch and etch-and-rinse adhesive systems after 48 hours and 3 months. Materials and Methods: 40 extracted premolar teeth were randomly divided into 2 groups: 1-step self-etch adhesive system - Optibond^TM All-In-One, and 2-step etch-and-rinse adhesive system - Adper^TM Single Bond 2. Both groups were subjected to 500 thermocycles (5℃-55℃) before scanning electron microscope (SEM) analysis or microleakage trial at 48-hour and 3-month time periods. Results: SEM images showed the hybrid layer thickness, diameter, and length of resin tags of the self-etch adhesive (0.42 ± 0.14 ㎛; 1.49 ± 0.45 ㎛; 16.35 ± 14.26 ㎛) were smaller than those of the etch-and-rinse adhesive (4.39 ± 1.52 ㎛; 3.49 ± 1 ㎛; 52.81 ± 35.81 ㎛). In dentin, the microleakage scores of the 2 adhesives were not different in both time periods (48 hours/3 months). However, the microleakage score of etch-and-rinse adhesive increased significantly after 3 months (0.8 ± 0.63 and 1.9 ± 0.88, p < 0.05). Conclusions: The self-etch adhesive exhibited better long-term sealing ability in dentin when compared to that of the etch-and-rinse adhesive. The greater hybrid layer thickness and dimensions of resin tags did not guarantee reliable, long-lasting sealing in the bonding area.

• Journal of Periodontal and Implant Science
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• 제24권2호
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• pp.340-356
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• 1994

The purpose of this study was to assess the clinical and microbiological effect of chlorhexidine rinse and supragingival plaque control following scaling and root planing on adult periodontal disease. 14 patients with adult periodontitis were selected for the study . They had not taken antibiotics for 6 months and history of dental treatment for 6 months before the study. Patients received a supragingival scaling and root planing under local anesthesia, plaque control group was subjected to professional plaque control 2 times for a period 2 week, chlorhexidine rinse group were subjected to twice daily 0.2% chlorhexidine rinse for a period 2 week. Clinical examination (plaque index, gingival index, probing pocket depth) and distribution of the bacteria morphology of subgingival plaque were monitored on baseline (0 week), 1 week, 2 week, 4 week and 6 week. The results were as follows : 1. Plaque index in chlorhexidine rinse group , plaque control group and control group was significantly reduced during all weeks (P<0.05). 2. Probing pocket depth was significantly reduced at 2, 4, 6 week (P<0.05) in chlorhexidine rinse group and control group, plaque control group was significantly reduced during all weeks (P<0.05). 3. Gingival index was significantly improved at 2, 4, 6 weeks(P<0.05) in chlorhexidine group and plaque control group, control group was significantly improved at 1, 2, 4 weeks (P<0.05). 4. Percentage of cocci was significantly increased at 1, 2, 4 and 6 weeks in chlorhexidine rinse group and control group, plaque control group was significantly increased at 2, 4 and 6 weeks(P<0.05). 5. Percentage of non-motile rods in all group were not significantly changed when compared with those of baseline (0 week) (P<0.05). 6. Percentage of motile rods was significantly reduced during all weeks (P<0.05) in chlorhexidine rinse group, plaque control group was significantly reduced at 2, 4, 6 weeks and 1, 2 and 4 weeks in control group. 7. Percentage of spirochetes was significantly reduced during all weeks (P<0.05), plaque control group was significantly reduced at 2, 4, 6 weeks and 1, 2, 4 weeks in control group. This results were suggested that clinical and microbiological effect of chlorhexidine rinse and supragingival plaque control following scaling and root planing on periodontal disease

• 농업과학연구
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• 제2권2호
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• pp.423-431
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• 1975

석회수(石灰水)(Limewater)가 낙농세척(酪農洗滌)-살균제(殺菌劑)로서 이용가치(利用價値)가 있는지를 구명(究明)하기 위(爲)하여 idophore와 비교(比較)하여 세척(洗滌)-살균시험(殺菌試驗)을 실시(實施)한 결과(結果)는 다음과 같다. 1. 착유백수(搾乳白數)에 따른 유석(乳石) 형성(形成)은 착유(搾乳) 6일(日) 착유(搾乳) 전세척제(前洗滌劑)로서 idophore를 처리(處理)(0.1119~0.876mg per sq. 10Cm)한 것이 가장 적었고 다음이 석회수처리(石灰水處理) (0.4639~1.5831mg)이며 무처리시(無處理時)(0.6230~4.3575mg)가 가장 많았다. 2. 착유전세척수(搾乳前洗滌水)의 온도(溫度)가 높을 수록 idophore처리(處理), 석회수처리(石灰水處理) 및 수도수(水道水) 처리(處理)는 모두 유석(乳石) 형성(形成)의 증가(增加)를 보였다. 3. 유지방(乳脂肪)의 제거(除去)는 석회수처리(石灰水處理)($10{\ell}$ 세척시(洗滌時) 78~88% 제거(除去))였으며 효과적(效果的)이였고 다음이 idophore 처리(處理)(66~86% 제거(除去))였으며 수도수처리(水道水處理)(56~68% 제거(除去))는 가장 효력(效力)이 떨어졌다. 4. 우유고형물(牛乳固形物) 제거효과(除去效果)는 idophor 처리(處理)($10{\ell}$ 세척시(洗滌時)73-78%제거(除去))와 석회수(石灰水) 처리(處理)(68~73%)가 비슷했으며 수도수처리(水道水處理)(44-52% 제거(除去))가 가장 떨어졌다. 5. 세척제(洗滌劑) 살균효과(殺菌效果)는 idophore 처리(處理)가 석회수처리(石灰水處理)보다 강(强)했으나 큰 차이(差異)는 보이지 않았다. 6. idophore 및 석회수처리(石灰水處理)는 모두 위생적(衛生的)인 우유생산(牛乳生産)을 기(期)할 수 있었다.

• 접착 및 계면
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• 제25권2호
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• pp.63-68
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• 2024

본 연구에서는 반도체 패키지용 와이어 본딩 공정에서 금(Au) wire의 표면처리에 적용되는 린스의 종류에 따른 Au wire의 오염 현상을 확인하고자 하였다. Au wire의 표면처리를 위해 실리콘(Si) 성분이 함유된 린스와 유기 계통으로만 이루어진 린스를 주로 사용하고 있으며, 실제 영향성을 확인하기 위해 두 종류의 1.0wt% 린스 용액으로 Au wire에 표면처리를 진행하였다. 이후, 반도체 공정에서 발생할 수 있는 Si 성분이 포함된 분진과의 반응성을 확인하기 위한 모사 실험을 진행하였다. 그 결과, optical microscopy(OM) 및 scanning electron microscopy(SEM) 분석을 통해 Si 성분이 함유된 린스로 표면처리한 Au wire의 경우 분진이 다량 흡착되었으며, 유기 계통으로만 이루어진 린스로 표면처리한 Au wire에는 소량의 분진이 흡착된 것을 확인하였다. 이는 Si 성분이 함유된 린스의 경우 상대적으로 극성을 띠기에, 주성분이 극성인 분진과 극성 상호작용을 일으키기 때문이다. 따라서 Si 성분이 존재하지 않는 린스를 사용하여 Au wire를 표면처리할 경우 분진에 의한 오염 현상이 감소하여 실제 와이어 본딩 공정에서 불량률을 낮추는 효과를 볼 수 있을 것으로 기대한다.

• 전자공학회논문지D
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• 제35D권2호
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• pp.60-69
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• 1998

Polysilicon surface mdoification tecnique is developed to reduce the sticking of microstructures fabricated by micromachining. Modified anti-sticking grain holes are simply formed by two-step dry eth without additional photolithography nor deposition of thin films. Both process-induced sticking and in-use sticking are successfully reduced more than two times by adopting grain holed polysilicon substrate. A sticking model for cantilever beam is derived. This model includes bending moment stems from stress gradient along the thickness directionof structural polysilicon. Because the surface tension of rinse liquid and the surface energy of the solids to be stuk tend to decrease in recently developed anti-sticking techniques, the effect of stress gradient will play an important role to analyze the sticking phenomena. Effect of the temperature during post-release rinse and dry is modelled and verified experimentally. Based on developed anti-sticking polysilicon structure and the sticking model, sticking of microstructure, fabricated by simple wet process including sacrificial layer etch and rinse with deionized water without special equimpment for post-release rinse and dry was alleviated more than 3.5 times.