• 한국광학회지
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• 제22권1호
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• pp.23-29
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• 2011

쌍안정 카이랄 스플레이 네마틱 액정표시소자는 스플레이 상태와 $-\pi$ 꼬인 상태를 쌍안정 상태로 사용하는 메모리 액정표시소자이다. 셀 갭/피치의 값이 0.25일 경우 완전한 쌍안정 상태를 갖지만, $-\pi$ 꼬인 상태에서 스플레이 상태로 전이시키기 위하여 fringe 전계를 인가할 경우 픽셀영역은 전계의 왜곡에 의해서 완전한 스플레이 상태가 아니라 $-\pi$ 꼬인 상태를 부분적으로 유지하게 된다. 본 논문에서는 화소영역에서 두 안정한 상태가 공존하지 않는 $-\pi$ 꼬인 상태를 어두운 상태로 사용하는 반사형 쌍안정 카이랄 스플레이 네마틱 액정표시소자를 제안한다. 제작된 반사형 액정표시소자는 30:1의 고명암비를 나타냈으며, 응답속도는 수직전압 8 V, fringe 전압 12 V의 구동 전압으로 각각 쓰기 응답시간이 950 ms, 리셋 응답시간이 450 ms였다. 또한 제안된 셀은 +C 광학 보상 필름을 사용하여 좌우 방향에서 $180^{\circ}$의 광시야각을 나타냈다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.293-294
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• 2009

We proposed a novel single gap transflective liquid crystal display (LCD) using liquid crystal with negative dielectric anisotropy. We designed cell structure driven by fringe electric field in the transmissive (T) part and vertical electric field in the reflective (R) part. In the device, high surface pretilt angle of the LC in the R-part is achieved through polymerization of an UV curable reactive mesogen (RM) monomer at surfaces. By optimizing the parameters, a newly developed transflective display has characteristics such as single gap and single gamma curve.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1529-1532
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• 2006

Depending on the optical design method, a novel dual-mode transflective LCD with proper LC material and optical films was developed. The design increased the optical transmittance and the reflectivity of dual-mode transflective LCDs with the proper parameters of cell gap, alignment layer and optical films. These parameters were evaluated by computer simulation. The simulation results also revealed that the transmissive and reflective states presented similar performance in the transflective LCDs.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.295-298
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• 2003

Reflective mode liquid crystal on silicon (LCoS) microdisplay is the major technology that can produce extremely high-resolution displays. A very large number of pixels can be packed onto the CMOS circuit with integrated drivers that can be projected to any size screen. Large size direct-view thin film transistor (TFT) LCDs becomes very difficult to make and to drive as the information content increases. However, the existing LC alignment technology for the LCoS cell fabrication is still the mechanical rubbing method, which is prone to have minor defects that are not visible normally but can be detrimental if projected to a large screen. In this paper, application of photo-alignment to LCoS fabrication is presented. The alignment is done by three-step exposure process. A MTN $90^{\circ}$ mode is chose as to evaluate the performance of this technique. The comparison with rubbing mode shows the performance of photo-alignment is comparable and even better in some aspect, such as sharper RVC curve and higher contrast ratio.