• Smart Structures and Systems
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• 제29권4호
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• pp.577-588
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• 2022

Oil refineries' Fluid Catalytic Cracking Units (FCCU) when in full operation may exhibit strong fluid dynamics caused by turbulent flow in the piping system that may induce vibrations in other mechanical and structural components of the Unity. This paper reports on the experimental-theoretical-computational program performed to get the vibration properties and the dynamic response amplitudes to find out alternative solutions to attenuate the excessive vibrations that were causing fatigue fractures in components of the bottle like reactor-regenerator of an FCC unit in operation in an existing oil refinery in Brazil. Solutions to the vibration problem were sought with the aid of a 3D finite element model calibrated with the results obtained from experimental measurements. A short description of the found solutions is given and their effectiveness are shown by means of numerical results. The solutions were guided by the concepts of structural stiffening and dynamic control performed by a nonlinear pendulum controller whose mechanical design was based on parameters determined by means of a parametric study carried out with 2D and 3D mathematical models of the coupled pendulum-structure system. The effectiveness of the proposed solutions is evaluated in terms of the fatigue life of critical welded connections.

• Korean Chemical Engineering Research
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• 제45권1호
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• pp.73-80
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• 2007

본 연구는 생물학적 폐수 처리 공정인 연속 회분식 반응기(sequencing batch reactor, SBR)에서 질소 제거 최적화를 위해 활성 오니 공정모델(activated sludge model, ASM No.1, ASM1)과 반복 동적 프로그래밍(iterative dynamic programming, IDP)을 이용하여 SBR의 처리 기준을 만족하면서 최적 운전 조건을 탐색하고 하는 것을 목적으로 하였다. 연속 회분식 반응기의 최적화를 위해 에너지 최소화와 최소 회분 시간이 질소 처리의 농도 그래프의 면적과 비례하는 점을 이용하여 이를 고려한 새로운 performance index를 제안하였다. 회분 시간과 에너지에 대항하는 면적에 적절한 비중(weight)을 줌으로써 최소 회분 시간과 최소 에너지 문제를 동시에 고려하였다. SBR에서 IDP를 이용한 최적 운전서 최적 용존 산소 농도의 설정치가 전체 회분 시간과 전체 에너지 비용에 동시에 영향을 미침을 알 수 있었고 최적 운전시 기존의 운전 방법과 같은 유기물과 질소 제거가 가능하고 동시에 전체 비용을 20％까지 줄일 수 있었다. 더 나아가 공정이상으로 실제 공정이 모델과 다른 모델링 에러에 의해 잘못된 모사의 경우에도 IDP를 이용하여 다시 재최적화할 수 있음을 보였다.

• 조명전기설비학회논문지
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• 제19권4호
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• pp.1-8
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• 2005

본 연구에서는 2차원적 유체 모델을 통하여 보다 실질적인 플라즈마를 이해하고자 하였으며, 기하학적인 방전전극 구조를 반영하도록 전극단에서 챔버 외벽의 거리를 변화시키면서 플라즈마의 특성을 정량적으로 비교 분석하고자 하였다. 방전 챔버의 구조로서, 전극의 반경과 방전 챔버의 높이는 일정하게 유지하면서 방전 챔버의 넓이를 변화시킴에 따라 형성되는 플라즈마의 특성을 분석하였다. 그 결과, 전극단과 챔버 외벽의 거리가 짧을수록 그 영역에서 전계가 강하게 형성되어, 외벽을 향하는 각 입자들의 움직임도 매우 활발하다는 것을 알 수 있었다. 또한, 전각단과 외벽과의 거리가 짧을수록 전극 면상에서 형성되는 입자들의 수밀도와 유속의 변화가 일정하게 형성되는 것을 알 수 있었다. 이러한 결과는 웨이퍼의 대구경화에 따른 플라즈마의 균일성을 고려할 경우에 매우 효과적일 것으로 고려되어 진다.

• 에너지공학
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• 제22권2호
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• pp.148-155
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• 2013

한국표준형원전(OPR-1000)의 증기발생기 전열관은 관재료로 Alloy 600과 Alloy 690이 사용되고 있으며 전열관 확관방법은 폭발확관법이 적용되었다. 원전 운전경험에 따르면 전열관 확관법으로 폭발확관법이 사용된 증기발생기의 전열관들은 원주방향 균열이 잘 발생하였으며 그 위치는 전열관의 확관천이부위 외면이었고 슬러지에 의해 둘러싸인 지역이었다. 그러나 같은 조건의 전열관이라도 수압확관법이 적용된 경우는 원주방향 균열보다는 축방향 균열이 우세한 경향을 보여왔다. 따라서 본 연구에서는 상기와 같은 차이를 규명하기 위하여 전열관과 관판의 형상을 모델링하였으며 확관법에 따라 운전중 조건에서 전열관의 확관천이 부위에 작용하는 응력의 크기를 전산프로그램을 사용하여 계산하였고, 균열의 방향성과 우세성을 평가하였다.

• Korean Membrane Journal
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• 제8권1호
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• pp.1-12
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• 2006

In semiconductor industries, dissolved oxygen is one of the most undesirable contaminants of ultrapure water. A method for dissolved oxygen removal (DOR) consists in the use of polymeric hollow fibres, loaded with a catalyst and fed with a reducing agent such as hydrogen. In this work, PVDF hollow fibres loaded with Pd were characterized by means of perporometry, scanning electron microscopy (SEM), energy dispersive X-ray (EDX). The hollow fibre analyzed shows a five-layer structure with remarkable morphological differences. An estimation of pore diameters and their distribution was performed giving a mean pore diameter of 100 nm. The permeance and selectivity of the fibres were measured using $H_2,\;N_2,\;O_2$ as single gases, at different operating conditions. An $H_2$ permeance of $37 mmol/m^2s$ was measured and $H_2/O_2$ and $H_2/N_2$ selectivities of ca. 3 were obtained. $H_2$ permeance was 1/3 when a water stream flows in the shell side. Catalytic fibrebehaviour was simulated using a mathematical model for a loop membrane reactor, considering only $O_2$ and $H_2$ diffusive transport inside the membrane and their catalytic reaction. Dimensionless parameters such as the Thiele modulus are employed to describe the system behaviour. The model agrees well with the experimental reaction data.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.77-77
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• 2016

Thin films synthesized by plasma processes have been widely applied in a variety of industrial sectors. The structure control of thin film is one of prime factor in most of these applications. It is well known that the structure of this film is closely associated with plasma parameters and species of plasma which are electrons, ions, radical and neutrals in plasma processes. However the precise control of structure by plasma process is still limited due to inherent complexity, reproducibility and control problems in practical implementation of plasma processing. Therefore the study on the fundamental physical properties that govern the plasmas becomes more crucial for molecular scale control of film structure and corresponding properties for new generation nano scale film materials development and application. The thin films are formed through nucleation and growth stages during thin film depostion. Such stages involve adsorption, surface diffusion, chemical binding and other atomic processes at surfaces. This requires identification, determination and quantification of the surface activity of the species in the plasma. Specifically, the ions and neutrals have kinetic energies ranging from ~ thermal up to tens of eV, which are generated by electron impact of the polyatomic precursor, gas phase reaction, and interactions with the substrate and reactor walls. The present work highlights these aspects for the controlled and low-temperature plasma enhanced chemical vapour disposition (PECVD) of Si-based films like crystalline Si (c-Si), Si-quantum dot, and sputtered crystalline C by the design and control of radicals, plasmas and the deposition energy. Additionally, there is growing demand on the low-temperature deposition process with low hydrogen content by PECVD. The deposition temperature can be reduced significantly by utilizing alternative plasma concepts to lower the reaction activation energy. Evolution in this area continues and has recently produced solutions by increasing the plasma excitation frequency from radio frequency to ultra high frequency (UHF) and in the range of microwave. In this sense, the necessity of dedicated experimental studies, diagnostics and computer modelling of process plasmas to quantify the effect of the unique chemistry and structure of the growing film by radical and plasma control is realized. Different low-temperature PECVD processes using RF, UHF, and RF/UHF hybrid plasmas along with magnetron sputtering plasmas are investigated using numerous diagnostics and film analysis tools. The broad outlook of this work also outlines some of the 'Grand Scientific Challenges' to which significant contributions from plasma nanoscience-related research can be foreseen.