• 제목/요약/키워드: random material properties

검색결과 193건 처리시간 0.027초

결정질 실리콘 태양전지 표면 역 피라미드 구조의 특성 분석 (Influence of Inverted Pyramidal Surface on Crystalline Silicon Solar Cells)

  • 양지웅;배수현;박세진;현지연;강윤묵;이해석;김동환
    • Current Photovoltaic Research
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    • 제6권3호
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    • pp.86-90
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    • 2018
  • To generate more current in crystalline silicon solar cells, surface texturing is adopted by reducing the surface reflection. Conventionally, random pyramid texturing by the wet chemical process is used for surface texturing in crystalline silicon solar cell. To achieve higher efficiency of solar cells, well ordered inverted pyramid texturing was introduced. Although its complicated process, superior properties such as lower reflectance and recombination velocity can be achieved by optimizing the process. In this study, we investigated optical and passivation properties of inverted pyramid texture. Lifetime, implied-Voc and reflectance were measured with different width and size of the texture. Also, effects of chemical rounding at the valley of the pyramid were observed.

식각된 PZT 박막의 전기적 특성 개선에 관한 연구 (Electrical properties improvement of PZT thin films etched into $CF_4/(Cl_2+Ar)$ plasma)

  • 구성모;김동표;김경태;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
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    • pp.13-17
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    • 2004
  • The PZT thin films are well-known material that has been widely studied for ferroelectric random access memory (FRAM). We etched the PZT thin films by $CF_4/(Cl_2+Ar)$ plasma and investigated improvement in etching damage by $O_2$ annealing. PZT thin films were etched for 1 min in an ICP using a gas mixture of $Cl_2$(80%)/Ar (20%) with 30% $CF_4$ addition. The etching conditions were fixed at a substrate temperature of $30^{\circ}C$, an rf power of 700 W, a dc-bias voltage of -200 V and a chamber pressure of 2 Pa. To improve the ferroelectric properties of PZT thin films after etching, the samples were annealed for 10 min at various temperatures in $O_2$ atmosphere. After $O_2$ annealing, the remanent polarization, fatigue, and the leakage current were gradually recovered to the characteristics of the as-deposited film, according as the temperature increased.

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진동 및 충격조건에 대한 완충재별 완충성능 분석 (Cushioning Performance Analysis of Cushioning Materials for Vibration and Impact Condition)

  • 오재영
    • 한국포장학회지
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    • 제15권1호
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    • pp.1-6
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    • 2009
  • The impact absorption materials made of synthetic organic chemical product like Expanded Polystyrene(EPS), Expanded Polyethylene(EPE), Expanded Polyurethane(EPU), etc. have been used with general packaging material until the present. But nowadays, the use of these materials is intended to be decreased and to be recycled in connection with environmental pollution. In addition, it has been tried to substitute these materials with non-pollution materials(natural materials) like pulp mould, paper protectors, etc. At the same time, it is required to evaluate and analyze these cushioning materials for cushioning properties based on impact and vibration, in order to make an efficiency on the overall packaging system because they are generally being used by a random choice regardless of the properties of contents and cushioning materials. Therefore, this study provides analyzed data on cushioning properties of various cushioning materials against impact and vibration, and is intended to provide more efficient model for packaging system by minimizing their using amount through choosing an optimal cushioning material as well as intended to lead to the use of nonpollution materials in case these cushioning materials have same cushioning properties.

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Damascene 공정으로 제조한 $Bi_{3.25}La_{0.75}Ti_3O_{12}$ 박막 캐패시터 소자 특성 (Properties of $Bi_{3.25}La_{0.75}Ti_3O_{12}$ Thin Film Capacitors Fabricated by Damascene Process)

  • 신상헌;김남훈;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.368-369
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    • 2006
  • Ferroelectric thin films have attracted much attention for applications in nonvolatile ferroelectric random access memories(NVFeRAM) from the view points of high speed operation, low power consumption, and large scale Integration[1,2]. Among the FRAM, BLT is of particular interest. as it is not only crystallized at relatively low processing temperature, but also shows highly fatigue resistance and large remanent polarization Meanwhile, these submicron ferroelectric capacitors were fabricated by a damascene process using Chemical mechanical polishing (CMP). BLT capacitors were practicable by a damascene process using CMP. The P-E hysteresis were measured under an applied bias of ${\pm}5V$ by using an RT66A measurement system. The electric properties such as I-V were determined by using HP4155A analysers.

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Hot isostatic pressure을 이용한 CN nanofiber의 구조 및 전계방출 특성 (Structure and field emission properties of carbon-nitrogen (CN) nanofibers obtained by hot isostatic pressure)

  • 이양두;;;;남산;이윤희;주병권
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.84-87
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    • 2003
  • Carbon-nitrogen (CN) nanofibers have been produced using a water cooled hot isostatic pressure (HIP) apparatus. The CN nanofibers were grown in random with the diameter of about 100-150nm and length over $10{\mu}m$. Emission properties of CN nanofibers were investigated for spacing, between anode and cathode, variation. Then turn-on fields about $1.4V/{\mu}m$. The time reliability and light emission test were carried out for above 100 hours. We suggest that CN nanofibers can be possibly applied to high brightness flat lamp because of low turn-on field and time reliability.

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RTN에 의해 제작된 MOS소자의 전기적 특성 (Electrical Properties of MOS Devices by Rapid Thermal Nitridation(RTN))

  • 장의구;최원은;이철인
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1988년도 춘계학술대회 논문집
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    • pp.24-26
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    • 1988
  • The electrical properties of thin nitrided thermal oxides prepared by rapid thermal nitridation(RTN) have been studied. The flatband voltages were calculated using C-V measurement and found to vary as nitridation time and temperature. After nitridation an increase in the fixed oxide charge density was always observed, but the distribution of it as a function of annealing time was found to be random. The breakdown voltages were measured using curve tracer.

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수직보조전계 인가방식에 의한 전기영동 전착막의 제작 (Fabrication of EPD Films by Applying a.c Field Assisted Method)

  • 전용우;박성범;소대화
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.107-110
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    • 2002
  • The electrophoretic deposition (EPD) technique have been applied to fabricating superconducting films and wires in former researches of our Lab. However, the particles of EPD films were usually deposited random1y on the metal substrate, the vertically combined a.c and d.c fields were applied to the EPD electrodes for orienting and densifying the particles of high $T_{c}$ superconducting deposition film on the substrate metal. Therefore, the surface states of EPD films by this combined fields could be oriented and affect to the electric properties increasing of superconducting films. The proposed method modified by a.c. assisted field to the conventional electrophoresis system was suitable to obtain improved properties with particle oriented deposition and densification.

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Preparation of the SBT Film on the LZO/Si Structure for FRAM Application

  • Im, Jong-Hyun;Jeon, Ho-Seung;Kim, Joo-Nam;Park, Byung-Eun;Kim, Chul-Ju
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.140-141
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    • 2007
  • To fabricate the metal-ferroelectric-insulator-semiconductor (MFIS) structure for the ferroelectric random access memory (FRAM) application, we prepared the ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$ (SBT) and the insulator LaZrOx (LZO) thin films on the silicon substrate using a sol-gel method. In this study, we will investigate the feasibility of the SBT/LZO/Si structure as one of the promising gate configuration for the 1-transistor (1-T) type FRAM, by measurements of the electrical properties and the physical properties.

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PRAM용 GST계 박막의 조성에 따른 특성 (Properties of GST Thin Films for PRAM with Composition)

  • 정명훈;장낙원;김홍승;류상욱;이남열;윤성민;박영삼;이승윤;유병곤
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.203-204
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    • 2005
  • PRAM (Phase change Random Access Memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change material has been researched in the field of optical data storage media. Among the phase change materials $Ge_2Sb_2Te_5$(GST) is very well known for its high optical contrast in the state of amorphous and crystalline. However, the characteristics required in solid state memory are quite different from optical ones. In this study, the structural properties of GST thin films with composition were investigated for PRAM. The 100-nm thick GeTe and $Sb_2Te_3$ films were deposited on $SiO_2$/Si substrates by RF sputtering system. In order to characterize the crystal structure and morphology of these films, we performed x-ray diffraction (XRD) and atomic force microscopy (AFM).

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초고주파 응용을 위한 (100) 방향으로 성장된 PST / $LaNiO_3$박막의 구조적, 유전적 특성 (Dielectric and Structural properties of highly oriented $PST/LaNiO_3$ Thin Films for Microwave application)

  • 엄준철;이성갑;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.648-651
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    • 2004
  • Pb0.5Sr0.5TiO3(PST) thin films were deposited on the LaNiO3 (LNO(100))/Si and Pt/Ti/SiO2/Si substrates by the alkoxide-based sol-gel method. Structural and dielectric properties of PST thin films for the tunable microwave device applications were investigated. The PST films, which were directly grown on the Pt/Ti/SiO2/Si substrates showed the random orientation. For the LNO/Si substrates, the PST thin films exhibited highly (100) orientation. Compared with randomly oriented films, the highly (100)-oriented PST thin films showed better dielectric constant, tunability, and figure of merit (FOM). The dielectric constant, tunability, and FOM of the highly (100)-oriented PST thin film increased with increasing annealing temperature due to the decrease in lattice distortion. The differences in dielectric properties may be attributed to the change in the film stress and the in-plane oriented Polar axis depending on the substrate was used. The dielectric constants, dielectric loss and tunability of the PST thin films deposited on the LNO/Si substrates measured at 1 MHz were 483, 0.002, and 60.1%, respectively.

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