• Title/Summary/Keyword: r.f.-PACVD

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Influence of Parameters on Adhesion Strength on TiN Film by using R.F. Plasma Assisted Chemical Vapor Deposition (PACVD로 증착된 TiN 박막의 밀착성에 관하여)

  • Shin, Y.S.;Kim, M.I.
    • Journal of the Korean Society for Heat Treatment
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    • v.3 no.1
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    • pp.17-24
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    • 1990
  • In this study, TiN film was deposited onto steel by R.F.-PACVD in order to investigate the influence of parameters on the adhesion strength between film and substrate. Experimental results showed that adhesion strength by SAT is different from by optical microscopy. Adhesion strength is increased when the deposition temperature increases and is influenced by R.F. power and electrode distance. Especially heat treatment on the substrate has influenced over the adhesion strength, so it showed the 22 Newtons in adhesion strength by SAT and adhesion strength is decreased when deposition thickeness is thick and hardness is high. Also if the film is thick and high hardness simultaneous, the film was delaminated seriously.

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Effects of Substrate Hardness on the Hardness and Adhesion of TiN Deposited by R.F. PACVD (R.F. PACD에 의하여 증착된 TiN의 경도와 밀착력에 미치는 모재 경도의 영향)

  • Kim, S.K.;Kim, M.I.
    • Journal of the Korean Society for Heat Treatment
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    • v.4 no.1
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    • pp.19-29
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    • 1991
  • This study was to investigate the influence of the substrate hardness on the hardness and adhesion of TiN thin film deposited by R.F. PACVD. Although the substrate hardness changed, chemical composition, stoichiometry and structure of TiN thin film did not change. ISE index was 1.96-1.99 for the substrate and was 1.57-1.79 for TiN thin film. And ISE index of TiN thin film was inverse proportion to the substrate hardness. When the substrate hardness was low, TiN thin film had many cracks around the indentation. But as the substrate hardness increased, TiN thin film had a few cracks and the deformation was limited within indentation. In having measured the adhesion of TiN thin film by SAT, the critical load (Lc) generally increased as the substrate hardness decreased.

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r.f.PACVD를 이용한 Si이 첨가된 DLC 필름의 미세구조 및 기계적 특성 평가

  • 박세준;조성진;이광렬;고대홍
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.137-137
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    • 1999
  • DLC(diamond-like carbon) 필름은 경도가 높고 마찰계수가 낮다는 장점을 가지고 있기 때문에 내마모성 코팅이나 윤활성 코팅에 대한 많은 응용이 이루어지고 있다. 그러나 DLC 필름은 수 GPa 정도의 높은 필름 자체의 큰 잔류 응력을 가지며, 마찰 계수가 주변환경에 매우 큰 영향을 받는다는 단점이 있다. 이러한 단점은 DLC 필름의 응용에 대한 저해 요인이 되며, 이 점을 보완하기 위하여 DLC 필름에 Si를 첨가한 연구들이 진행되고 있다. 본 실험에서는 r.f-PACVD 법을 이용하여 Si이 첨가된 DLC 필름의 바이어스 전압에 따른 특성변화를 연구하였다. 사용한 반응 가스는 벤젠(C6H6)과 희석된 (SiH4:H2=10:90)이며, 희석된 실랜과 벤젠의 첨가비율은 6:4 고정시키고, 음전압은 -150V에서 -750V까지, -150V씩 증가하여 바이어스 전압의 변화에 따른 필름의 특성을 분석하였다. 바이어스 전압을 증가시킴에 따라 수소의 함량은 48.8 at.%에서 20.3 at.%로, Si의 함량은 1.5 at.%에서 2.4 at.%로 증가하였다. 그리고 잔류응력은 0.5GPa에서 2.1GPa로 증가하였고, 경도의 경우 5GPa에서 21.5GPa로 증가하는 경향을 보였다. 이러한 경향은 필름내부의 3차원 상호결합과 이온의 충돌에너지의 영향임을 알 수 있었다.

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Humidity Dependence of the Residual Stress of Diamond-like Carbon Film (습도에 따른 다이아몬드성 카본필름의 잔류응력 변화에 대한 연구)

  • Lee Young-Jin;Kim Tae-Young;Lee Kwang-Ryeol;Yang In-Sang
    • Journal of the Korean Vacuum Society
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    • v.13 no.4
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    • pp.157-163
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    • 2004
  • Dependence of residual compressive stress of diamond-like carbon (DLC) films on relative humidity was investigated. Polymeric, graphitic and diamond-like carbon films were prepared by r.f.-PACVD using methane or benzene with the negative self bias voltage of the substrate ranging from -100 to -800 V. In-situ measurements of the residual stress were carried out in an environment chamber where the relative humidity was varied from 10% to 90%. In dense DLC film of high residual compressive stress and hardness, we could not observe any change in the residual compressive stress with relative humidity. However, in the cases of graphitic and polymeric DLC films, abrupt change in the residual stress occurred by changing the relative humidity. The quantity of the stress change was inversely proportional to the film thickness, which means that the stress change with humidity is not due to the penetration of the water molecule into the film structure, but due to surface interaction between water molecules and film surface.

Effect of Si Addition on the Corrosion Resistance of Diamond-Like Carbon (DLC) Films

  • Kim, Woo-Jung;Kim, Jung-Gu;Park, Se-Jun;Lee, Kwang-Ryeol
    • Corrosion Science and Technology
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    • v.4 no.6
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    • pp.226-230
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    • 2005
  • Si incorporated diamond-like carbon (Si-DLC) films ranging from 0 to 2 at.% contents were deposited on STS 316L substrates for orthopedic implants by means of r.f. plasma-assisted chemical vapor deposition (r.f. PACVD) technique, using mixtures of benzene ($C_6H_6$) and silane ($SiH_4$) as the precursor gases. This study provides the reliable and quantitative data for assessment of the effect of Si incorporation on corrosion property in the simulated body fluid environment through the electrochemical test. It was found that corrosion to resistance of Si-DLC coatings with increasing Si content are improved owing to high $sp^3$ bonding.

Effects of Deposition Variables on Plasma-Assisted CVD of TiN Films (TiN박막의 증착특성에 미치는 플라즈마 화학증착변수들의 영향)

  • 이정래;김광호;신동원;박찬경
    • Journal of the Korean Ceramic Society
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    • v.31 no.10
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    • pp.1188-1196
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    • 1994
  • TiN films were deposited onto high speed steel(SKH9) and silicon wafer by plasma-assisted chemical vapor deposition(PACVD) using a TiCl4/N2/H2/Ar gas mixture. The effects of deposition temperature, R.F. power, and H2 concentration on the deposition of TiN were studied. The residual chlorine content and the microhardness of TiN films were also investigated. It was found that TiN films grew with a columnar structure of a strong (200) preferred orientation regardless of the substrate type and the deposition variables. The TiN films consisted of columnar-grains of about 50 to 100 nm in diameter. The columnar grains themselves contained much finer fibrous grains. As deposition temperature increased, the residual chlorine content decreased sharply. R. F. powder enhanced the deposition rate largely. Increasing of H2 concentration had little effect on the residual chlorine.

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Low Temperature Deposition of TiN on the Steel Substrate by Plasma-Assisted CVD (플라즈마 화학증착에 의한 강재위에 TiN의 저온증착)

  • 이정래;김광호;조성재
    • Journal of the Korean Ceramic Society
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    • v.30 no.2
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    • pp.148-156
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    • 1993
  • TiN films were deposited onto high speed steel (SKH9) by plasma assisted chemical vapor deposition (PACVD) using a TiCl4/N2/H2/Ar gas mixture at around 50$0^{\circ}C$. The effects of the deposition temperature, R.F. power and TiCl4 concentration on the deposition of TiN and the microhardness of TiN film were investigated. The crystallinity and the microhardness of TiN films were improved with increase of the deposition temperature. Optimum deposition temperature in this study was 50$0^{\circ}C$, because a softening or phase transformation of the substrate occurred over 50$0^{\circ}C$. A large increase of the film growth rate with a strong(200) preferred orientation was obtained by increasing R.F. power. Much chlorine content of about 10at.% was found in the deposited films and resulted in relatively low average microhardness of about 1, 500Kgf/$\textrm{mm}^2$ compared with the theoretical value(~2, 000Kgf/$\textrm{mm}^2$).

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A variation of elastic modulus of very thin diamond-like carbon films with deposition condition (증착조건에 따른 극미세 다이아몬드상 카본 박막의 탄성률 변화거동)

  • 정진원;이광렬;은광용;고대홍
    • Journal of the Korean Vacuum Society
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    • v.10 no.4
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    • pp.387-395
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    • 2001
  • The elastic modulus and the structural evolution were examined with the film thickness in polymeric, hard, graphitic diamond-like carbon (DLC) films. The DLC films used in the present study were prepared by radio frequency plasma assisted chemical vapor deposition (r.f.-PACVD) from $C_6H_6\;and\;CH_4$ gas. Elastic modulus of very thin DLC film was measured by free overhang method. This method has an advantage over the other methods. Because the substrate was removed by etching technique, the measured value is not affected by the mechanical property of the substrate. The structural evolution was investigated by the G-peak position of the Raman spectrum. The polymeric and graphitic films exhibited the decreased elastic modulus with decreasing film thickness. In polymeric films, the reason was that more polymeric film had been deposited in the initial stage of the film growth and in graphitic film more graphic films which had been deposited in the initial stage decreased the elastic modulus. The G-peak position of the Raman spectrum confirmed this result. On the other hand, the hard film showed the constant elastic modulus regardless to the film thickness. The structural change was not observed in this range of the film thickness.

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Friction and Wear of Nitrogen Incorporated Diamond-like Carbon Films Under a Vacuum

  • Yoon, Eui-Sung;Kong, Hosung;Lee, Kwang-Ryeol;Oh, Jae-Eung
    • Tribology and Lubricants
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    • v.11 no.5
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    • pp.59-65
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    • 1995
  • Tribological behaviors of nitrogen incorporated amorphous diamond-like carbon films were experimentally measured under a vacuum ($3 \times 10^{-5}$ Torr) using a ball (AISI 52100 steel)-on-disk wear-rig. Nitrogen incorporated DLC films were deposited by r.f. plasma assisted chemical vapor deposition method. Mixtures of benzene and ammonia or nitrogen gases were used as the reaction gases for the r.f. PACVD, and Si (100) wafer was used as the substrate. In the tribo-test, effects of DLC film thickness and normal load in friction were measured and discussed. Results showed that friction of nitrogen incorporated DLC films from a mixture gas of benzene and ammonia was lower than that of 100% benzene, specially in the measurement of minimum coefficient of friction. Differences in frictional characteristics of nitrogen incorporated DLC films were explained with the changes in chemical structures of the films. Result also showed that friction of DLC films increased with the sliding contact cycle, which remarkably accompanied with roll-shaped wear debris. Mechanisms and roles of the polymer-like wear debris were presented and discussed.