• Title/Summary/Keyword: pseudo spin valve

Search Result 9, Processing Time 0.02 seconds

The Giant Magnetoresistance Properties of CoFe/Cu/NiFe Pseudo Spin Valve (CoFe/Cu/NiFe Pseudo스핀밸브의 자기저항 특성)

  • Choi, W.J.;Hong, J.P.;Kim, T.S.;Kim, K.Y.
    • Journal of the Korean Magnetics Society
    • /
    • v.12 no.6
    • /
    • pp.212-217
    • /
    • 2002
  • The pseudo spin valve with a structure of Tl/CoFe(t $\AA$)/Cu(30 $\AA$)/NiFe(50 $\AA$)/Ta, showing giant magnetoresistance properties by utilizing coercivity difference between only two soft ferromagnetic layers were produced by d.c UHV magnetron sputtering system. In pseudo spin valve Ta/CoFe/Cu/NiFe/Ta, the magnetic and magnetoresistance properties with change of CoFe thickness were investigated. When the thickness of CoFe was 60 $\AA$, a typical MR curve of pseudo spin valve structure was obtained, showing MR ratio of 3.8 cio and the coercivity difference of 27.4 Oe with a sharp change of hard layer switching. When the CoFe thickness was varied from 20 to 100 $\AA$, coercivity difference between two layers was increased to 40 $\AA$. and decreased to 100 $\AA$ gradually. It is thought the change in coercivity of hard layer was due to the crystallinity and magnetostriction of thin CoFe layer. In order to improve the MR property in CoFe/Cu/NiFe trier layer structure, CoFe layer with change of 2-20 $\AA$ thick was inserted between Cu and NiFe. When the thickness of CoFe was 10 $\AA$, MR ratio was 6.7%, showing excellent MR property. This indicates 50 % higher than that of CoFe/Cu/NiFe pseudo spin valve.

Magnetoresistance Effect of Ta/NiFe/Cu/Co Pseudo Spin Valve Structure (Ta/NiFe/Cu/Co Pseudo 스핀밸브 구조의 자기저항 효과)

  • Joo, Ho-Wan;Choi, Jin-Hyup;Choi, Sang-Dae;Lee, Ky-Am
    • Journal of the Korean Magnetics Society
    • /
    • v.14 no.1
    • /
    • pp.25-28
    • /
    • 2004
  • The dependence of sensitivity, MR ratio, coercivity (Hc) and switching fields as a function of thickness of each magnetic layers(Co, NiFe and Cu) were investigated in pseudo spin valves with a structure of Ta/NiFe/Cu/Co. As measured results dependence of the thickness of each magnetic layer, we obtained MR ratio of 7.26% for Ta(4 nm)/NiFe(7.5 nm)/Cu(3 nm)/Co(5 nm) pseudo spin valves. Also, we could control properties of magnetoresistance for independent magnetization courses of each magnetic layer. Especially, we found that we could control coercivity as constant MR ratio dependence of Co thickness.

Hysteresis Loops of Magnetically Coupled Multilayers - Experiment and Calculations

  • Czapkiewicz, M.;Stobiecki, T.;Rak, R.;Wrona, J.;Kim, C.G.
    • Journal of Magnetics
    • /
    • v.9 no.2
    • /
    • pp.60-64
    • /
    • 2004
  • In this paper calculations of magnetisation and magnetoresistance characteristics of the Spin Valve (SV) and Pseudo Spin Valve (PSV) spintronics structures are reported and compared with the experimental data. The magnetisation reversal process was analysed with respect to the Stoner- Wohlfahrt model of total surface energy in terms of uniaxial anisotropy, exchange coupling between ferromagnetic layers, unidirectional exchange anisotropy of pinned layer (modelled by exchange coupling between magnetisation of pinned layer and net magnetisation of antiferromagnetic layer with high anisotropy). The numerical simulation of the model to the experimental magnetisation data yielded the above parameters for SV and PSV structures. These parameters were used to more sophistically micromagnetic modelling tool originating from the project called Object Oriented Micromagnetic Framework. Influence of the shape anisotropy of the Magnetic Tunnelling Junction cell used in MRAM was simulated by means of micromagnetic simulations. Results were compared to those obtained from the spot Kerr measurements.

The Fabrication and Magnetoresistance of Nanometer-sized Spin Device Driven by Current Perpendicular to the Plane (수직전류 인가형 나노 스핀소자의 제조 및 자기저항 특성)

  • Chun, M.G.;Lee, H.J.;Jeung, W.Y.;Kim, K.Y.;Kim, C.G.
    • Journal of the Korean Magnetics Society
    • /
    • v.15 no.2
    • /
    • pp.61-66
    • /
    • 2005
  • In order to make submicron cell for spin-injection device, lift-off method using Pt stencil and wet etching was chosen. This approach allows batch fabrication of stencil substrate with electron-beam lithography. It simplifies the process between magnetic film stack deposition and final device testing, thus enabling rapid turnaround in sample fabrication. Submicron junctions with size of $200nm{\times}300nm$ and $500nm{\times}500nm$ 500 nm and pseudo spin valve structure of $CoFe(30{\AA})/Cu(100{\AA})/CoFe(120{\AA}$) was deposited into the nanojunctions. MR ratio was 0.8 and $1.1{\%}$, respectively and spin transfer effect was confirmed with critical current of $7.65{\times}10^7A/cm^2$.