• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.768-771
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• 2007

Carbon nanotubes (CNTs) were synthesized by inductively coupled plasma CVD at $450^{\circ}C$. CNTs were grown on the 1-nm-thick Fe-Ni-Co with $C_2H_2$ and $H_2$ at different pressures and plasma powers. CNTs were grown longer in height as the $H_{\alpha}/CH$ ratios became lower by decreasing plasma powers and increasing growth pressures.

• Journal of the Korean institute of surface engineering
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• v.29 no.5
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• pp.338-344
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• 1996

This study was an investigation of plasma-induced damages on silicon substrate in the semiconductor manufacturing technology. The plasma-induced damage level on silicon substrate was analyzed and compared in various plasma etching systems. The analysis methods were therma wave, life-time recovery, SCA (Surface Charge Analyzer) and TRXF (Total Reflection X-ray Fluorescence) measurements, and the measured values were compared for each systems. In the comparison of the values which were obtained by a system that had low life-time recovery, there was not any differences in DC parameters. However, the reflesh time distribution of device of that system had decreased about 10 to 20m sec compared to a system which had high life-time recovery.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1496-1497
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• 2007

This paper deals with the power system development of an arc plasma torch for current control and arc initiation. For stable output of a plasma torch, there are ways of supplying gas suitably, a plasma torch initiation and control system which can control desired output. The design of plasma torch is form of modified Huels type which has narrow downstream. This paper we product suitable feeder of power system and we can control stably in considering many work conditions.

• Applied Chemistry for Engineering
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• v.16 no.3
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• pp.413-421
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• 2005

This study focused on the decomposition of toluene in a plasma-photocatalytic hybrid system. Hexagonally packed meso-structured Mn-titanosilicates (Mn-Ti-MCM-41), as the photocatalysts, have been prepared by the hydrothermal method. The physical properties of the photocatalysts were characterized using XRD, XPS, TEM, BET/ICP, and $NH_3$/Toluene-TPD. Experiments were carried out at the applied voltage of 9.0 kV and at room temperature of $20^{\circ}C$. In the plasma only system, the activity of the toluene decomposition was higher than that in the photocatalytic system. However, the amount of by-products, such as phenol, $C_2{\sim}C_4$ alkene, was also increased in the plasma only system. However, the by-products decreased remarkably in a plasma-photocatalytic hybrid system. When Mn5mol%-Ti-MCM-41 was used as a photocatalyst in a plasma-photocatalytic hybrid system, the $CO_2$ selectivity in products was increased dramatically compared to other catalysts. It was confirmed that a plasma-photocatalytic hybrid system was better for toluene decomposition compared to photocatalytic and plasma only systems.

• Journal of the Korean institute of surface engineering
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• v.34 no.5
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• pp.395-402
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• 2001

An induction thermal plasma system have been newly designed for advanced operation with a pulse modulated mode to control the plasma power in time domain and to create non-equilibrium effects such as fast quenching of the plasma to produce new functional materials in high rate. The system consists of MOSFET power supply with a maximum power of 50 kW with a frequency of 460 kHz, an induction plasma torch with a 10-turns coil of 80 mm diameter and 150 mm length and a vacuum chamber. The pulse modulated plasma was successfully generated at a plasma power of 30 kW and a high pressure of 100 kPa, with taking the on and off time as 10 ms, respectively. Measurements were carried out on the time-dependent spectral lines emitted from Ar species. The dynamic behavior of plasma temperature in a pulse cycle was estimated by the Boltzmann plot and the excitation temperature of Ar atom was found to be changed periodically from around 0.5 to 1.7 eV during the cycle. Two application regions of the induction thermal plasma newly generated were introduced to material processing with high rate synthesis based on non equilibrium effects, and to the finding of new arc quenching gases coming necessary for power circuit breaker, which is friendly with earth circumstance alternative to SF6 gas.

• Journal of computational fluids engineering
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• v.19 no.4
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• pp.68-74
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• 2014

This computational study features the transient compressible and inviscid flow analysis on a metallic plasma discharge from the opposing composite electrodes which is subjected to pulsed electric power. The computations have been performed using the flux corrected transport algorithm on the axisymmetric two-dimensional domain of electrode gap and outer space along with the calculation of plasma compositions and thermophysical properties such as plasma electrical conductivity. The mass ablation from aluminum electrode surfaces are modeled with radiative flux from plasma column experiencing intense Joule heating. The computational results shows the highly ionized and highly under-expanded supersonic plasma discharge with strong shock structure of Mach disk and blast wave propagation, which is very similar to muzzle blast or axial plasma jet flows. Also, the geometrical effects of composite electrodes are investigated to compare the amount of mass ablation and penetration depth of plasma discharge.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.43-43
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• 2010

We have characterized the parametric and functional properties of live cell and cancer cell according to plasma treatment conditions using Atmospheric Pressure (AP) Plasma with uniquely designed low temperature arc-free unit. AP plasma system showed very highly efficient capabilities of reacting and interfacing directly with live and cancer cells. The parametric results with the types of gases, applied power, applied gap, and process times on cells will be presented in accordance with functional studies of the works. The growth of cancer cells is directly influenced by AP plasma exposure with evaluating plasma conditions in several human cancer cells and understanding how plasma exposure alters molecular signaling pathways. The cells exhibit a slower or faster growth rates compared with untreated cells, depending on the cell types. These results strongly support the conclusion that alterations in one or more of each gene are responsible, at least in part, for plasma-induced apoptosis in cancer cells. In addition, it also will be presented that AP plasma has an important role for the improvement of sensor performance due to excellent interface property between enzyme and metal electrode for bio sensor manufacturing process.

• Journal of the Korean Vacuum Society
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• v.19 no.3
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• pp.190-198
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• 2010

Asymmetric model for plasma uniformity by Ar and $CF_4$ was modeled by the antenna structure, the diameter of chamber, and the distance between source and substrate for the development of plasma equipment for 450 mm wafer. The aspect ratio of chamber was divided by diameter, distance from substrate, and pumping port area. And we found the condition with the optimized plasma uniformity by changing the antenna structure. The drift diffusion and quasi-neutrality for simplification were used, and the ion energy function was activated for the surface recombination and etching reaction. The uniformity of plasma density on substrate surface was improved by being far of the distance between substrate wall and chamber wall, and substrate and plasma source. And when the antenna of only 2 turns was used, the plasma uniformity can improve from 20~30% to 4.7%.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.523-523
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• 2012

As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

• Journal of Electrical Engineering and Technology
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• v.8 no.2
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• pp.326-330
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• 2013

The Korea Superconducting Tokamak Advanced Research (KSTAR) device is an advanced superconducting tokamak to establish scientific and technological bases for attractive fusion reactor. This device requires 3.5 Tesla of toroidal field (TF) for plasma confinement, and requires a strong poloidal flux swing to generate an inductive voltage to produce and sustain the tokamak plasma. KSTAR was originally designed to have 16 serially connected TF magnets for which the nominal current rating is 35.2 kA. KSTAR also has 7 pairs of poloidal field (PF) coils that are driven to 1 MA/sec for generation of the tokamak plasma according to the operation scenarios. The KSTAR Magnet Power Supply (MPS) was dedicated to the superconducting (SC) coil commissioning and $2^{nd}$ plasma experiment as a part of the system commissioning. This paper will describe key features of KSTAR MPS for the $2^{nd}$ plasma experiment, and will also report the engineering and commissioning results of the magnet power supplies.