• 제목/요약/키워드: plasma system

검색결과 2,356건 처리시간 0.026초

Measurement of the ICRH antenna phasing using antenna strap probe based diagnostic system in EAST tokamak

  • Liu, L.N.;Liang, Q.C.;Yang, H.;Zhang, X.J.;Yuan, S.;Mao, Y.Z.;Zhang, W.;Zhu, G.H.;Wang, L.;Qin, C.M.;Zhao, Y.P.;Cheng, Y.;Zhang, K.
    • Nuclear Engineering and Technology
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    • 제54권10호
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    • pp.3614-3619
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    • 2022
  • To operate the ion cyclotron resonance heating (ICRH) antennas in a better heating state and produce relatively low impurities, it is necessary to control the antenna spectrum by changing the antenna phasing. As the electrical length of the antenna feeding transmission lines is changing as a matter of the standing wave pattern at the ceramic supports, 90° elbows, T-connectors and antenna loops, we chose to measure the current at the grounding points of the antenna loops by antenna strap probe. The voltage drops along a small, several millimeter-long paths at the end of the antenna loops give a signal that is proportional to the current in the antenna loop. Through the simulation of the antenna strap probe and the actual measurement of the antenna phasing under vacuum conditions, the reliability of the antenna strap probe based diagnostic system have been successfully proved. Moreover, this system was successfully applied to the ICRH daily experiments in the spring of 2021. In the near future, the active real-time feedback control of the antenna phasing system will be developed based on this diagnostic system in the EAST tokamak.

양액재배 시스템에서 유전체장벽방전 플라즈마를 이용한 시들음병균(Fusarium oxysporum f. sp. radicis lycopersici)의 불활성화 (Inactivation of Wilt Germs (Fusarium oxysporum f. sp. radicis lycopersici) using Dielectric Barrier Discharge Plasma in Hydroponic Cultivation System)

  • 박영식
    • 한국환경과학회지
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    • 제28권5호
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    • pp.495-502
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    • 2019
  • This study was conducted to investigated the possibility of inactivating wilt germs (Fusarium oxysporum f. sp. radicis lycopersici) using Dielectric Barrier Discharge (DBD) plasma in a hydroponic system. Recirculating hydroponic cultivation system for inactivation was consisted of planting port, LED lamp, water tank, and circulating pump for hydroponic and DBD plasma reactor. Two experiments were conducted: batch and intermittent continuous process. The effect of plasma treatment on Total Residual Oxidants (TRO) concentration change, Fusarium inactivation and growth of lettuce were investigated. In the batch experiment, most of the Fusarium was inactivated at a TRO concentration of 0.15 mg/L or more at four-day intervals. There was no change in lettuce growth after two times of plasma treatment for one week. The intermittent continuous experiment consisted of 30-minute, 60-minute, and 90-minute plasma treatment in 2 day intervals and 30-minute treatment a one-day; most of the Fusarium was inactivated only by treatment for 30-minute every two days. However, if inactivation under $10^1CFU/mL$ is required, it will be necessary to treat for 60 minutes in 2 day intervals. The plasma treatment caused no damage to the lettuce, except the 30 min plasma treatment ay the one-day interval. It was considered that the residual TRO concentration was higher than that of the other treatments.

비전도성 폐기물 용융처리를 위한 혼합형 플라즈마토치 시스템 특성 연구 (A Study on the Properties of the Dual-mode Plasma Torch System for Melting the Non-conductive Waste)

  • 문영표;최장영
    • 전기학회논문지
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    • 제65권1호
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    • pp.73-80
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    • 2016
  • The preliminary test for the dual mode plasma torch system was carried out to explore the operation properties in advance. The dual mode plasma torch system that is able to operate in transferred, non-transferred, or dual mode is very adequate for melting the mixed wastes including nonconductive materials such as concrete, asbestos, etc. since it exploits both the high efficiency of heat transfer to the melt in transferred mode and stable operation in non-transferred mode. Also, system operation including restarting is reliable and very easy. A stationary melter with a refractory structure was designed and manufactured considering the melting behavior of slags to minimize the refractory erosion. The power supply for the dual mode plasma torch system built with high power insulated gate bipolar transistor (IGBT) modules has functions for both current control and voltage control and is sufficient to suppress the harmonics during the operation of the plasma torch. The power supply provides two different voltages for transferred operation and non-transferred. It is confirmed that the operation voltage in transferred is always higher than non-transferred. The dual mode plasma torch system was successfully developed and is under operation for a melting experiment to optimize operation data.

Improvement of lower hybrid current drive systems for high-power and long-pulse operation on EAST

  • M. Wang;L. Liu;L.M. Zhao;M.H. Li ;W.D. Ma;H.C. Hu ;Z.G. Wu;J.Q. Feng ;Y. Yang ;L. Zhu ;M. Chen ;T.A. Zhou;H. Jia;J. Zhang ;L. Cao ;L. Zhang ;R.R. Liang;B.J. Ding ;X.J. Zhang ;J.F. Shan;F.K. Liu ;A. Ekedahl ;M. Goniche ;J. Hillairet;L. Delpech
    • Nuclear Engineering and Technology
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    • 제54권11호
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    • pp.4102-4110
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    • 2022
  • Aiming at high-power and long-pulse operation up to 1000 s, some improvements have been made for both 2.45 GHz and 4.6 GHz lower hybrid (LH) systems during the recent 5 years. At first, the guard limiters of the LH antennas with graphite tiles were upgraded to tungsten, the most promising material for plasma facing components in nuclear fusion devices. These new guard limiters can operate at a peak power density of 12.9 MW/m2. Strong hot spots were usually observed on the old graphite limiters when 4.6 GHz system operated with power >2.0 MW [B. N. Wan et al., Nucl. Fusion 57 (2017) 102019], leading to a reduction of the maximum power capability. With the new limiters, 4.6 GHz LH system, the main current drive (CD) and electron heating tool for EAST, can be operated with power >2.5 MW routinely. Long-pulse operation up to 100 s with 4.6 GHz LH power of 2.4 MW was achieved in 2021 and the maximal temperature on the guard limiters measured by an infrared (IR) camera was about 540 ℃, much below the permissible value of tungsten material (~1200 ℃). A discharge with a duration of 1056 s was achieved and the 4.6 GHz LH energy injected into the plasma was up to 1.05 GJ. Secondly, the fully-active-multijunction (FAM) launcher of 2.45 GHz system was upgraded to a passive-active-multijunction (PAM), for which the density of optimum coupling was relatively low (below the cut-off value). Good coupling with reflection coefficient ~3% has been achieved with plasma-antenna distance up to 11 cm for the new PAM. Finally, in order to eliminate the effect of ion cyclotron range of frequencies (ICRF) wave on 4.6 GHz LH wave coupling, the location of the ICRF launcher was changed to a port that is located 157.5° toroidally from the 4.6 GHz LH system and is not magnetically connected.

Microwave Plasma Sterilization System을 이용한 배추 절임수의 미생물 저감화 (Microbial Inactivation in Kimchi Saline Water Using Microwave Plasma Sterilization System)

  • 유동진;신윤지;김현진;송현정;이지혜;장성애;전소정;홍순택;김성재;송경빈
    • 한국식품영양과학회지
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    • 제40권1호
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    • pp.123-127
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    • 2011
  • 김치 제조 공정에서 사용되는 김치 절임수의 미생물학적 안전성 확보와 재활용을 위한 연구로써, 본 연구에서는 microwave plasma sterilization system을 이용한 김치 절임수의 미생물 수 저감화를 위하여, E. coli O157:H7, L. monocytogenes, S. Typhimurium에 대한 살균 효과를 측정하고, 또한 사용한 김치 절임수에 본 장치를 적용하였다. 김치 공장에서 반복 사용한 절임수에 있는 coliform, E. coli, Salmonella spp., total aerobic bacteria, yeasts and molds가 사용 횟수가 늘어남에 따라 미생물 수가 증가하였다. Microwave plasma를 이용한 살균처리에서는 E. coli O157:H7, L. monocytogenes, S. Typhimurium의 $D_{10}$-value가 0.48, 0.52, 0.45 cycle로 각각 측정되었고, 또한 1회 사용한 절임수에 microwave plasma sterilization system 적용 시, coliform, E. coli, Salmonella spp., total aerobic bacteria, yeasts and molds 숫자가 유의적으로 감소하였다. 따라서 본 연구 결과, 김치공장의 김치 절임수를 재사용하기 위해서 microwave plasma sterilization system을 이용한 살균방법이 적합하다고 판단된다.

자화된 평판형 유도 결합 $SF_6$ 플라즈마의 특성 (The Properties of Weakly Magnetized Planar Type Inductively Coupled $SF_6$ Plasma)

  • 윤차근;도현호;황기웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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    • pp.438-440
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    • 1995
  • The impedance characteristics and plasma parameters were experimentally studied in a weakly magnetized planar type, inductively coupled plasma (ICP) system. Compared with non-magnetized for system higher power transfer efficiency, stable impedance matching, enhancement of plasma density and higher electron temperature can be obtained. Such improvements are mainly due to the excitation of deeply penetrating electromagnetic wave and reduction of radial loss of electrons. In particulary, $SF_6$ (sulfur hexafluride) plasma shows unstable impedance matching in non-magnetized ICP because electronegativity of $SF_6$ effects on plasma characteristics. But, magnetized inductively coupled $SF_6$ plasma shows enough impedance matching stability to be applicable to the polysilicon etching in semiconductor process.

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Chamber Monitoring with Residual Gas Analysis with Self-Plasma Optical Emission Spectroscopy

  • 장해규;이학승;박정건;채희엽
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.262.2-262.2
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    • 2014
  • Plasma processing is an essential process for pattern etching and thin film deposition in nanoscale semiconductor device fabrication. It is necessary to maintain plasma chamber in steady-state in production. In this study, we determined plasma chamber state with residual gas analysis with self-plasma optical emission spectroscopy. Residual gas monitoring of fluorocarbon plasma etching chamber was performed with self-plasma optical emission spectroscopy (SPOES) and various chemical elements was identified with a SPOES system which is composed of small inductive coupled plasma chamber for glow discharge and optical emission spectroscopy monitoring system for measuring optical emission. This work demonstrates that chamber state can be monitored with SPOES and this technique can potentially help maintenance in production lines.

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Non-thermal plasma technology for abatement of pollutant emission from marine diesel engine

  • Panomsuwan, Gasidit;Rujiravanit, Ratana;Ueno, Tomonaga;Saito, Nagahiro
    • Journal of Advanced Marine Engineering and Technology
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    • 제40권10호
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    • pp.929-934
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    • 2016
  • Plasma technology has long been regarded as a key essential tool in many industrial and technological sectors. However, the advancement of plasma technology in marine applications has not been fully realized yet. Herein, we present a short overview on the recent trends in utilization of plasma technology for air-pollution treatment in marine diesel exhaust. Four non-thermal plasma system, including electron beam dry scrubber (EBDS), dielectric barrier discharge (DBD), electron beam-microwave (EB-MW) plasma hybrid system, and plasma-catalytic hybrid system, are described with emphasis on their efficiency in removals of $NO_x$ and $SO_x$ gases. Non-thermal plasma has the great potential to be an efficient and environmentally compatible technique in simultaneous removals of $NO_x$ and $SO_x$ gases from the exhaust of marine diesel engine in the future.

내플라즈마성 알루미나 세라믹스 제조 공정 (Processing of Plasma Resistant Alumina Ceramics)

  • 이현권;조경식;김미영
    • 한국세라믹학회지
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    • 제46권4호
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    • pp.385-391
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    • 2009
  • Need for plasma resistant ceramic materials has been continuously increased in semiconductor and display industry requiring plasma processing to realize ultra fine circuit process. Among promising candidates, alumina ceramics have still some advantages with respect to its economic aspect. In this study, fabrication of plasma resistant alumina ceramics was tried, and its processing optimization was also aimed. Careful processing control and thereby uniform microstructure of $Al_2O_3$ gave rise to enhanced plasma resistance, even comparable to market-governing commercial $Al_2O_3$. A further study is needed concerning ${\beta}-Al_2O_3$ materials system, presumably playing a decisive role in decreasing plasma resistance of $Al_2O_3$ ceramics.

컴퓨터수치제어(CNC) 플라즈마 아아크 절단장치 개발에 관한 연구 (A study on development of plasma-arc cutting system with computer-numerical control)

  • 노태정;나석주;나규환
    • Journal of Welding and Joining
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    • 제8권3호
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    • pp.60-69
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    • 1990
  • Plasma arc cutting is a fusion cutting process in which a gas-constricted arc is employed to produce a high-temperature, high-velocity plasma jet on the workpiece. This process provides some advantages such as increased cutting velocity, excellent working accuracy and the ability to cut special materials (widely used stainless steels and Al-alloys, for example), when compared with iconventional oxyfuel gas cutting. From the view point of price and reliability of the power source, plasma arc cutting has also some distinct advantages over laser beam cutting. High-speed machines with NC or CNC systems are needed for the plasma arc or laser beam cutting process, while for oxyfuel gas cutting, low-speed machines with copying templates or optical-shape tracking sensors can be applied. The low price and high flexibility of the microprocessor arc contributing more and more the application of CNC system in the plasma arc cutting process, as in other manufacturing fields. From these points of view, a microprocessor-based plasma arc cutting system was developed by using a reference-pulse system, and its performance was tested. The interpolating routines were programmed in the assembly language for saving the memory volume and improving the compouting speed, which has an intimate relationship with the available cutting velocity.

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