• 제목/요약/키워드: plasma system

검색결과 2,356건 처리시간 0.029초

Enhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source

  • Choi, Min-Jun;Kwon, O Dae;Choi, Sang Dae;Baek, Ju-Yeoul;An, Kyoung-Joon;Chung, Kwun-Bum
    • Applied Science and Convergence Technology
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    • 제25권4호
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    • pp.73-76
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    • 2016
  • Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

방전플라즈마 소결공정으로 제조된 단일벽탄소나노튜브 강화 금속기지 복합재료 (Single Walled Carbon Nanotubes-Reinforced Metal Matrix Composite Materials Fabricated by Spark Plasma Sintering)

  • 권한상
    • 동력기계공학회지
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    • 제21권4호
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    • pp.94-99
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    • 2017
  • Single walled carbon nanotubes were mixed with various metal powders by mechanical ball milling and sintered by spark plasma sintering processes. Two compositional (0.1 and 1 vol%) of the single walled carbon nanotubes were dispersed onto the pure aluminum, 5052 aluminum alloy, pure titanium, Ti6Al4Vanadium alloy, pure copper, and stainless steel 316L. Each composite powders were spark plasma sintered at $600^{\circ}C$ and well synthesized regardless of the matrices. Vickers hardness of the composite materials was measured and they exhibited higher values regardless of the carbon nanotubes composition than those of the pure materials. Moreover, single walled carbon nanotubes reinforced copper matrix composites showed highest enhancement between the other metal matrices system. We believe that low energy mechanical ball milling and spark plasma sintering processes are useful tool for fabricating of the carbon nanotubes-reinforced various metal matrices composite materials. The single walled carbon nanotubes-reinforced various metal matrices composite materials could be used as an engineering parts in many kind of industrial fields such as aviation, transportation and electro technologies etc. However, detail strengthening mechanism should be carefully investigated.

고전압 용량성 결합 플라즈마 시스템의 개선된 전압 파형 출력을 위한 펄스 전류 발생장치 회로 (Current Source Type Pulse Generator with Improved Output Voltage Waveform for High Voltage Capacitively Coupled Plasma System)

  • 채범석;민주화;서용석;김현배
    • 전력전자학회논문지
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    • 제24권3호
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    • pp.153-160
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    • 2019
  • This study proposes a current source-type pulse generator to improve output voltage and current waveforms under a capacitively coupled plasma (CCP) system. The proposed circuit comprises two parallel-connected current source-type converters. These converters can satisfy the required output waveforms of plasma processing. The parallel-connected converters operate without reverse current fault by applying a time-delay control technique. Conventional voltage source converters based on pulse power supply exhibit drawbacks in short-circuit current, and problems occur when they are applied to a CCP system. The proposed pulse power supply based on a current source converter fundamentally solves the short-circuit current problem. Therefore, this topology can improve the voltage and current accuracy of a CCP system.

The Study of DNA Damage Induced by Atmospheric Pressure Plasma Jet and Their Mechanisms

  • Park, Yeunsoo;Song, Mi-Young;Yoon, Jung-Sik
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.155.1-155.1
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    • 2013
  • The goals of this study are to elucidate the plasma effects on DNA molecules to apply some plasma based applications and also to find out the mechanisms of plasma-induced DNA damage in biomolecule. Nonthermal atmospheric pressure plasma has much potential for medical, agricultural and food applications for the future. The atmospheric pressure plasma jet (APPJ) contains radicals, charged particles, low energy electrons, excited molecules and UV light. It has been started doing experiments using APPJ at the early 21th. And some recent results showed that APPJ has a possibility to apply to new fields like mentioned above. But it is kind of at the very early stages of plasma based application. It is definitely necessary much of theoretical and experimental studies to further understanding to use nonthermal atmospheric pressure plasma in biomedical, agriculture and food parts. Here we introduce a new experimental system to study plasma effects on biomolecules. And we will show some recent results of LEE-induced DNA damage using electron irradiation apparatus under ultra-high vacuum.

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나노펄스 플라즈마를 이용한 탈황 시스템의 H2O 및 NH3, 펄스 인가전압에 따른 입자변환 분석 (The effect of H2O, NH3 and applied voltage to the particle conversion in the desulfurization system using a nano-pulse plasma)

  • 김영훈;신동호;이건희;홍기정;김학준;김용진;한방우;황정호
    • 한국입자에어로졸학회지
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    • 제16권1호
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    • pp.1-8
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    • 2020
  • Nano-pulse plasma technology has great potential as the process simplicity, high efficiency and low energy consumption for SO2 removal. The research on the gas-to-particle conversion is required to achieve higher efficiency of SO2 gas removal. Thus, we studied the effect of the relative humidity, NH3 concentration and applied voltage of the nano-pulse plasma system in the gas to particle conversion of SO2. The particles from the conversions were increased from 10 to 100 nm in diameter as relative humidity, NH3 concentration, applied voltage increases. With these results, nano-pulse plasma system can be used to more efficient removal of SO2 gas by controlling above parameters.

Plasma for Semiconductor Processing

  • Efremov, Alexandre
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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    • pp.1-6
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    • 2002
  • Plasma processing of semiconductor materials plays a dominant role in microelectronic technology. During last century, plasma have gone a way from laboratory phenomena to industrial applications due to intensive progress in both scientific and industrial trends. Improvement and development of new experience together with development of plasma theory and plasma diagnostics methods. A most parameters (pressure, flow rate, power density) and various levels of plasma system (energy distribution, volume gas chemistry, transport, heterogeneous effects) to understand the whole process mechanism. It will allow us to choose a correct ways for processes optimization.

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THERMAL PLASMA SYNTHESIS OF NANO-SIZED POWDERS

  • Seo, Jun-Ho;Hong, Bong-Guen
    • Nuclear Engineering and Technology
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    • 제44권1호
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    • pp.9-20
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    • 2012
  • A brief review on the thermal plasma synthesis of nano-sized powders is presented according to the application materials, such as, metals, ceramics, glasses, carbonaceous materials and other functional composites, such as, supported metal catalyst and core-shell structured nano materials. As widely adopted plasma sources available for thermal plasma synthesis of nanosized powders, three kinds of plasma torches, such as transferred and non-transferred DC and RF plasma torches, are introduced with the main features of each torch system. In the basis of the described torch features and the properties of suggested materials, application results including synthesis mechanism are reviewed in this paper.

수소 Plasma 처리 후의 MgO 보호막에 대한 일함수 변화 측정 (Measurement of Changes in Work Function on MgO Protective Layer after H2-plasma Treatment)

  • 정재천;이석주;조재원
    • 한국전기전자재료학회논문지
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    • 제20권7호
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    • pp.611-614
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    • 2007
  • The changes in the work $function({\Phi}_w)$ in the MgO protective layers after $plasma(Ar,\;H_2)$ treatment have been studied using ${\Upsilon}-focused$ ion beam $({\Upsilon}-FIB)$ system. The ${\Phi}_w$ was determined as follows: Ar-plasma $treatment({\Phi}_w=4.52eV)$, $H_2-plasma$ $treatment({\Phi}_w=5.65eV)$, and non-plasma $treatment({\Phi}_w=4.64eV)$. The results indicated that the H-plasma could not make any effective physical etching due to the small masses of hydrogen atoms and molecules while the hydration of H-plasma could grow some contaminating materials on the surface of MgO.

실시간 플라즈마공정 모니터링을 위한 Self Plasma-Optical Emission Spectroscopy 성능 향상 (Improved Self Plasma-Optical Emission Spectroscopy for In-situ Plasma Process Monitoring)

  • 조경재;홍상진
    • 반도체디스플레이기술학회지
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    • 제16권2호
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    • pp.75-78
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    • 2017
  • We reports improved monitoring performance of Self plasma-optical emission spectroscopy (SP-OES) by augmenting a by-pass tube to a conventional straight (or single) tube type self plasma reactor. SP-OES has been used as a tool for the monitoring of plasma chemistry indirectly in plasma process system. The benefits of SP-OES are low cost and easy installation, but some semiconductor industries who adopted commercialized SP-OES product experiencing less sensitivity and slow sensor response. OH out-gas chemistry monitoring was performed to have a direct comparison of a conventional single type tube and a by-pass type tube, and fluid dynamic simulation on the improved hardware design was also followed. It is observed faster pumping out of OH from the chamber in the by-pass type SP-OES.

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열플라즈마를 이용한 재료의 표면개질 (Surface modification of materials by thermal plasma)

  • 강성표;이한준;김태희
    • 한국표면공학회지
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    • 제55권6호
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    • pp.308-318
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    • 2022
  • The surface modification and treatment using thermal plasma were reviewed in academic fields. In general, thermal plasma is generated by direct current (DC) and radiofrequency (RF) power sources. Thermal spray coating, a typical commercial process using thermal plasma, is performed by DC thermal plasma, whereas other promising surface modifications have been reported and developed using RF thermal plasma. Beyond the thermal spray coating, physical and chemical surface modifications were attempted widely. Superhydrophobic surface treatment has a very high industrial demand particularly. Besides, RF thermal plasma system for large-area film surface treatment is being developed. Thermal plasma is especially suitable for the surface modification of low-dimensional nanomaterial (e.g., nanotubes) by utilizing high temperature and rapid quenching. It is able to synthesize and modify nanomaterials simultaneously in a one-pot process.