• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2008년 영문 학술대회
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• pp.589-596
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• 2008

Performance of a pulsed heat source high temperature inert gas plasma MHD electrical power generator, which can be one of the candidates of space-based laser-to-electrical power converter, is examined by a time dependent two dimensional numerical simulation. In the present MHD generator, the inert gas is assumed to be ideally heated to about $10^4K$ pulsed-likely within short time(${\sim}1{\mu}s$) in a stagnant energy input volume, and the energy of high temperature inert gas is converted to the electricity with the medium of pure inert gas plasma without seeding. The numerical simulation results show that an enthalpy extraction ratio(=electrical output energy/pulsed heat energy) of several tens of % can be achieved, which is the same level as the conventional seeded non-equilibrium plasma MHD generator. Although there still exist many phenomena to be clarified and many problems to be overcome in order to realize the system, the pulsed heat source high temperature inert gas MHD generator is surely worth examining in more detail.

• 반도체디스플레이기술학회지
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• 제15권2호
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• pp.6-10
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• 2016

In RF plasma processing, when the plasma is generated, there is the difference of impedance between RF generator and plasma source. Its difference is normally reduced by using the matcher and the RF power is transferred efficiently from the power generator to the plasma source. The generated plasma has source impedance that it can be changed during processing by pressure, frequency, density and so on. If the range of source impedance excesses the matching range of the matcher, it cannot match all value of the impedance. In this research, we studied the elevation mechanism of the RF power delivery efficiency between RF generator to the plasma source by using the transmission line and impedance tuning of the plasma source. We focus on two plasma sources (capacitive coupled plasma (CCP), inductive coupled plasma (ICP)) which is most widely used in industry recently.

• 한국전기전자재료학회논문지
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• 제33권1호
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• pp.70-77
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• 2020

In this study, the sterilization property of E. coli was established using a plasma generator with a flexible electrode structure. The bacterial suspension was prepared based on the McFarland standard 0.50 (1.5×10⁸ CFU/mL) concentration and a specific amount was inoculated on the plate medium. After the plasma was discharged 3 cm away from the plasma generator in the range of 30s to 5 min and the results compared to the control group, the observed colonies that were formed decreased significantly as the plasma discharge time increased.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.176.2-176.2
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• 2013

Property of optical diagnostics for pulse-discharged plasma in liquid and its biological applications to proteins are investigated by making use of high voltage Marx generator. The Marx generator has been consisted of 5 stages, where each charging capacitor is 0.5 ${\mu}F$, to generate a high voltage pulse with rising time of $1{\mu}s$. We have applied an input voltage of 6 kV to the each capacitor of 0.5 ${\mu}F$. High voltage pulsed plasma has been generated inside a polycarbonate tube by a single-shot operation, where the breakdown voltage is measured to be 7 kV, current of 1.2 kA, and pulse width of ~ 1 ${\mu}s$ between the two electrodes of anode-cathode whose material is made of tungsten pin, which are immersed into the liquids. We have investigated the emitted hydrogen lines for optical diagnostics of high voltage pulsed plasma. The emission line of 656.3 nm from $H-{\alpha}$ and 486.1 nm from $H-{\beta}$ have been measured by a monochromator. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium conditions, the electron temperature and density of the high voltage pulsed plasma in liquid could be obtained by the Stark broadening of optical emission spectroscopy. For the investigation of the influence of pulsed plasma on biological proteins, we have exposed it onto the proteins such as hemoglobin and myoglobin. The structural changes in these proteins and their analysis have also been obtained by circular dichroism (CD) and ultraviolet (UV) visible spectroscopy.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.175.1-175.1
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• 2016

In recent, tract infections such as atopic dermatitis, allergic rhinitis and a respiratory disease are increasing, giving rise to the atmospheric pollution, inflow of micro-size dust and side effect of humidifier disinfectant. In this context, the environment-friendly technology is required to eliminate airborne pathogens. We propose solution of the previous problems, making use of Radical Mist Generator (RMG). Existing technologies of air purification using a gas discharge produce harmful substances such as ozone, NOx, etc. However, the RMG uses a pure water as a plasma forming material. The RMG sprays the water mist, which contains reactive radicals to sterilize microorganisms. RMG is comprised of a power supply, plasma electrodes and a nozzle. In order to analyze the electrical characteristic and concentrations of reactive radicals, we employ an oscilloscope and a titration method. To test the sterilization effect of RMG, we used E.coli. We confirmed that E.coli was killed over 90%. Eventually, we expect that RMG can be promising tool for a purified system.

• Journal of Electrical Engineering and Technology
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• 제8권6호
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• pp.1365-1370
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• 2013

This paper examines the effects of magnetic induction attenuation on current distribution in the exit regions of the Faraday-type, non-equilibrium plasma Magnetohydrodynamic (MHD) generator by numerical calculation using cesium-seeded helium. Calculations show that reasonable magnetic induction attenuation creates a very uniform current distribution near the exit region of generator channel. Furthermore, it was determined that the current distribution in the middle part of generator is negligible, and the output electrodes can be used without large ballast resistors. In addition, the inside resistance of the exit region and the current concentration at the exit electrode edges, both decrease with the attenuation of magnetic flux density. The author illustrates that the exit electrodes of the diagonal Faraday-type, non-equilibrium plasma MHD generator should be arranged in the attenuation region of the magnetic induction, in order to improve the electrical parameters of the generator.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.490-490
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• 2013

In semiconductor industry, it is expected that plasma process which use 450 mm source will be used at next generation. However, main obstacle of the large area plasma source is plasma uniformity from it. When electrode is enlarged, field difference between center area and side area reduces the plasma uniformity [1-3]. Therefore we investigate multi-electrode which diminish this field difference.We designed two multi-electrode models. One has two segments and the other has five segments. Each multi-electrode model is connected with two power generator and two matchers. One generator and one matcher is connected with center electrode part. The other one generator and the other one matcher is connected with side electrode part. The ion density is measured at 29 points by using floating harmonic method [4-6]. After measuring the data of each multi-electrode model, we discuss the difference of profile between two models' data.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2002년도 전력전자학술대회 논문집
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• pp.245-248
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• 2002

In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

• 한국표면공학회지
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• 제29권5호
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• pp.371-378
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• 1996

An RF inductively coupled plasma (ICP) torch has been developed as a typical thermal plasma generator and reactor. It has been applied to various materials processings such as plasma flash evaporation, thermal plasma CVD, plasma spraying, and plasma waste disposal. The RF ICP reactor has been generally operated under one atmospheric pressure. Lately the characteristics of low pressure RF ICP is attracting a great deal of attention in the field of plasma application. In our researches of RF plasma applications, low pressure RF ICP is mainly used. In many cases, the plasma generated by the ICP torch under low pressure seems to be rather capacitive, but high density ICP can be easily generated by our RF plasma torch with 3 turns coil and a suitable maching circuiit, using 13.56 MHz RF generator. Plasma surface modification (surface hardening by plasma nitriding and plasma carbo-nitriding), plasma synthesis of AIN, and plasma CVD of BN, B-C-N compound and diamond were practiced by using low pressure RF plasma, and the effects of negative and positive bias voltage impression to the substrate on surface modification and CVD were investigated in details. Only a part of the interesting results obtained is reported in this paper.