• Title/Summary/Keyword: plasma electronics

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Enhancing Lifetime of White OLED Device by Minimizing Operating Voltage Increase

  • Lee, Sung-Soo;Choi, Jun-Ho;Ha, Jae-Kook;Lee, Sang-Pil;Kim, Seong-Min;Choi, Ji-Hye;Lee, Soo-Yeon;Kim, Hyo-Seok;Chu, Chang-Woong;Shin, Sung-Tae;Kim, Chi-Woo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1658-1660
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    • 2007
  • We fabricate green device having unique life time characteristics of operating voltage reduction with time, ${\Delta}V_{op}$ <0. A green device needs lower voltage than initial voltage for sustaining constant current as life time goes on. It means there are two possible reasons; one is interface modification between anode and HIL due to oxygen plasma treatment and the other is bulk property modification due to combination of new green host and new green dopant. From these materials and oxygen plasma treatment, we can make white OLED device having the characteristics of low ${\Delta}V_{op}$ increasing.

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The generation of Uniform High Density Plasma of Inductively Coupled Plasma Etcher Enhanced by Alternating Axial Magnetic Field (축방향 자기장의 주기적 단속을 이용한 유도결합형 플라즈마 식각장비의 고품위 플라즈마 형성)

  • 정재성;김철식
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.589-592
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    • 1998
  • The performance of inductively coupled plasma (ICP) is enhanced by axial magnetic field driven by alternating current Helmholtz coils in this work. Langmuir pobe is used to characterize the plasma, and the etching performance is demonstrated with phororesist stripping process. It is shown that its density and uniformity depends on the frequency of driving current to the magnetic field.

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The characteristics of wall charge on the dependence of aging time in an AC Plasma Display Panel

  • Kim, Bhum-Joon;Cho, Hyung-Joon;Lee, Seung-Hun;Shin, Bhum-Jae;Choi, Kyung-Cheol
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.710-713
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    • 2003
  • The wall charge is major factor to determine the discharge characteristics. The minimum sustain voltage related to the wall charge decay were investigated as a function of aging time in AC plasma display panel. For the long time scale, the wall charge decay time is dependent on the aging time. The inverse time scale of the wall charge decay has the maximum value at around 3 hours aging time and then fell down.

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Electrical and Optical Characterization of the Vacuum In-Line Sealed PDP Panel

  • Kwon, Sang-Jik;Kim, Jee-Hoon;Kim, Tae-Ho;Shon, Byeong-Kyoo;Yang, Hwi-Chan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.832-835
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    • 2003
  • By using vacuum in-line driving and photoluminescence measuring method, we have observed the electrical and optical characteristics of the vacuum in-line sealing technology and analyzed the effect of the base vacuum level before filling the plasma gas. In the case of base vacuum level of $1{\times}10^{-3}$torr, the firing voltage of a 2-inch diagonal PDP panel was ranged from 310 to 345V depending on the plasma gas pressure of 200 to 300torr and luminous efficiency was ranged from 0.0227 to 0.0367 lm/W depending on the input voltage level of 330 to 225V. While, in the case of $1{\times}10^{-6}$, the characteristics were significantly improved. As a results, the firing voltage was ranged from 295 to 318V and luminous efficiency was from 0.0278 to 0.0451 lm/W.

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Structure dependence of carbon nanotube on the process parameters using microwave plasma chemical vapor deposition

  • Kim, Gwang-Bai;Lee, Soo-Myun;Uh, Hyung-Soo;Park, Sang-Sik;Cho, Euo-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.678-680
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    • 2002
  • Vertically aligned carbon nanotubes(CNTs) have been grown on Ni-coated TiN/Si substrate by microwave plasma chemical vapor deposition using $H_2/CH_4$ mixture gas. We have investigated the Effect of process parameters on the growth of CNT. During the growth, microwave power, pressure, and growth temperature were varied from 300 W to 700 W, 10 Torr to 30 Torr, and 300 $^{\circ}C$ to 700 $^{\circ}C$. respectively. Then we controlled the size of CNTs. The structure of CNT was sensitively dependent on the process parameters.

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3-D Simulation of T-Shaped Electrode and Comparison of Results with Experiments

  • Shin, Yeong-Kyo;Hwang, Tae-Su;Kang, Seok-Dong;Park, Hun-Gun;Ryu, Jae-Hwa;Kim, Hyun-Chul;Shin, Seong-Won;Lee, Jae-Koo
    • Journal of Information Display
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    • v.3 no.2
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    • pp.13-18
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    • 2002
  • Numerical simulation is one of the most useful tools to study gas discharge phenomena that occur in alternating current plasma display panel (AC-PDP) cell. Most PDP cell simulations have been performed for two-dimensional cell, is cross-section along the address electrode. We developed a three-dimensional PDP simulator and applied it to a T-shaped electrode cell in order to show the effects of sustain electrode shape that cannot be included in two-dimensional simulation. The dependence of power consumption on electrode shape and area in the simulation showed the same trend as experiment.

Manufacturing of Blue Polymer Light Emitting Diodes by Substrate Treatments (기판처리에 따른 청색 고분자 유기발광다이오드(PLED)의 제작)

  • Shin, Sang-Baie;Yoo, Jae-Heuk;Gong, Su-Cheol;Chang, Ji-Geun;Chang, Ho-Jung;Chang, Young-Cheol
    • Proceedings of the KAIS Fall Conference
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    • 2006.11a
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    • pp.133-134
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    • 2006
  • 본 논문에서는 ITO/Glass 기판에 스핀 코팅법(Spin Coating)과 열 증착법(Thermal Evaporation)을 이용하여 ITO/PEDOT:PSS/PVK/PFO-poss/Li/Al 구조를 갖는 청색 고분자 유기전계발광소자를 제작하였다. 청색 고분자 유기발광다이오드 제작시 ITO 전극을 $O_2$ gas를 이용한 Plasma Treatment와 Heat Treatment를 실시하여 기판처리가 제작된 소자의 전기, 광학적 특성에 미치는 영향에 대하여 조사하였다. Plasma와 Heat Treatment를 동시에 처리한 소자에서 가장 우수한 전기, 광학적 특성을 나타냈으며, 기판처리를 하지 않은 경우는 전기, 광학적 특성은 크게 감소하였다.

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Electrical Characteristics of Trench Capacitor with Various Structures (여러가지 구조를 갖는 Trench Capacitor의 전기적 특성)

  • Lee, Jin Hee;Nam, Kee Soo;Kim, Mal Moon;Park, Sin Chong
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.24 no.1
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    • pp.85-90
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    • 1987
  • Trench capacitors with four different structures were fabricated using plasma and reactive ion etching technique, and evaluated using their C-V and I-V characteristics. The results shows that the two step plasma etching technique is the best method to fabricate the trench capacitor because of its high breakdown field (~7.75 MV/Cm) and good step coverage. And the fixed oxide charges are comparable between the trench (3.6xE10/Cm\ulcorner~7.5xE10/Cm\ulcorner and the planar(4.5xE10/Cm\ulcorner~6.5E10/Cm\ulcorner capacitors.

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The development of RPS (Remote Plasma Source) (리모트 플라즈마용 전원 개발)

  • Kim Soo-Seok;Won Chung-Yuen;Choi Dae-Kyu;Choi Sang-Don
    • Proceedings of the KIPE Conference
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    • 2002.07a
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    • pp.245-248
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    • 2002
  • In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

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