• Title/Summary/Keyword: plasma $D_3$

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Numerical Modeling of Plasma Characteristics of ICP System with a Pulsed dc Bias (수치모델을 이용한 pulsed dc bias ICP장치의 플라즈마 특성 해석)

  • Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.43 no.3
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    • pp.154-158
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    • 2010
  • Numerical analysis is done to investigate the effects of pulse bias on the plasma processing characteristics like ion doping and ion nitriding by using fluid dynamic code with a 2D axi-symmetric model. For 10 mTorr of Ar plasma, -1 kV of pulse bias was simulated. Maximum sheath thickness was around 20 mm based on the electric potential profile. The peak electron temperature was about 20 eV, but did not affect the averaged plasma characteristics of the whole chamber. Maximum ion current density incident on the substrate was 200 $A/m^2$ at the center, but was decreased down to 1/10th at radius 100 mm, giving poor radial uniformity.

Hydrophilization of PP Fiber through Atmospheric Pressure Plasma Processing (대기압 플라즈마 처리를 통한 PP 섬유의 친수화)

  • Cho, Hang Sung
    • Textile Coloration and Finishing
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    • v.33 no.3
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    • pp.113-119
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    • 2021
  • Polypropylene fiber has the advantages of light weight, heat retention and antibacterial properties, but it is difficult to expand its market because it cannot be dyed or imparted functionality due to its hydrophobic properties. Atmospheric pressure plasma processing can modify the surface of the fiber and create polar functional groups on the surface of the fiber. In this study, an experiment was conducted on the hydrophilization of the ultra-hydrophobicity of polypropylene through plasma processing and surface changes before and after plasma processing. The ultra-hydrophobicity of polypropylene is the cause of impossible for dyeing and imparting functionality. Untreated polypropylene became hydrophilic, and it was confirmed that the ratio of oxygen and carbon(O/C) increased about 11 times from untreated polypropylene 0.017 to plasma-treated polypropylene 0.190.

Superhydrophobic nano-hair mimicking for water strider leg using CF4 plasma treatment on the 2-D and 3-D PTFE patterned surfaces

  • Shin, Bong-Su;Moon, Myoung-Woon;Kim, Ho-Young;Lee, Kwang-Ryeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.365-365
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    • 2010
  • Similar to the superhydrophobic surfaces of lotus leaf, water strider leg is attributed to hierarchical structure of micro pillar and nano-hair coated with low surface energy materials, by which water strider can run and even jump on the water surface. In order to mimick its leg, many effort, especially, on the fabrication of nanohairs has been made using several methods such as a capillarity-driven molding and lithography using poly(urethane acrylate)(PUA). However most of those effort was not so effective to create the similar structure due to its difficulty in the fabrication of nanoscale hairy structures with hydrophobic surface. In this study, we have selected a low surface energy polymeric material of polytetrafluoroethylene (PTFE, or Teflon) assisted with surface modification of CF4 plasma treatment followed by hydrophobic surface coating with pre-cursor of hexamethyldisiloxane (HMDSO) using a plasma enhanced chemical vapor deposition (PE-CVD). It was found that the plasma energy and duration of CF4 treatment on PTFE polymer could control the aspect ratio of nano-hairy structure, which varying with high aspect ratio of more than 20 to 1, or height of over 1000nm but width of 50nm in average. The water contact angle on pristine PTFE surface was measured as approximately $115^{\circ}$. With nanostructures by CF4 plasma treatment and hydrophobic coating of HMDSO film, we made a superhydrophobic nano-hair structure with the wetting angle of over $160^{\circ}C$. This novel fabrication method of nanohairy structures has been applied not only on 2-D flat substrate but also on 3-D substrates like wire and cylinder, which is similarly mimicked the water strider's leg.

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Zinc Nutritional Status in Korean Adults from Rural, Urban and Metropolitan Areas

  • Lee, Soo-Lim;Kwak, Eun-Hee;Yoon, Jin-Sook;Kwon, Chong-Suk;Beattie, John H.;Kwun, In-Sook
    • Preventive Nutrition and Food Science
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    • v.9 no.2
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    • pp.174-182
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    • 2004
  • The zinc intake and status of South Koreans from rural, urban and metropolitan areas were compared to evaluate the zinc nutritional status in different regional areas in South Korea. The dietary habits of 721 healthy adult subjects (271 from rural, 240 from urban, 210 from metropolitan city) with an age range 30 ∼ 64 (mean age 54$\pm$18) were assessed using a food frequency questionnaire. Mean daily Zn intake for rural, urban, and metropolitan areas was 6.5 mg, 7.3 mg, and 11.4 mg (p<0.05), respectively, which was 54%,61% and 95% of the Korean RDA for man (12 mg/d). Mean phytate: zinc molar ratios for rural, urban, and metropolitan city were 41, 34, and 30, respectively (p < 0.05), which were higher than the cutoff level of 20 for poor zinc status. The zinc intake and phytate: Zn molar ratio in the rural area were 0.5 and 1.3-fold compared to those of the metropolitan city, which can cause poor zinc nutriture in the rural area. Most of the zinc biomarkers were lower in the rural area than in the metropolitan city (p < 0.05) (mean rural and metropolitan values for plasma Zn: 80.8 $\mu\textrm{g}$/dL and 119.8 $\mu\textrm{g}$/dL, respectively; RBC Zn: 7.8 $\mu\textrm{g}$/dL and 8.8 $\mu\textrm{g}$/dL, respectively; plasma alkaline phosphatase (ALP) activity: 87 mU/mL and 100.4 mU/mL, respectively). It seems that a lower zinc intake in the rural area decreased zinc biomarker levels, such as plasma and RBC zinc, and plasma alkaline phosphatase activity, and caused the poor zinc nutritional status in this area. Most of the zinc biomarkers, such as RBC zinc and urinary and plasma zinc levels, in the subjects from the three localities, were within the normal range even when zinc intake of rural and urban subjects was low. The exception was plasma ALP activity in the rural area, which was lower than the reference level. Thus, marked zinc deficiency in these subjects were not observed, however, the potential for marginal zinc deficiency should be considered, especially for the rural area, because of the low zinc intake and the biomarker levels for marginal zinc deficiency.

Measurement of the excited Xe atoms density of matastable state$(1S_5)$ under various binary gas mixtures(Ne-Xe) by Laser Absorption Spectroscopy.

  • Lee, Jun-Ho;OH, P.Y.;Moon, M.W.;Ko, B.D.;Jeong, J.M.;Lee, H.J.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1218-1220
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    • 2005
  • We have developed laser absorption spectroscopy system for the measurement of excited Xe atoms in micro-discharged AC-PDP plasma. In this study, we have measured the absorption signals for the $1S_5$ xenon metastable state in the PDP cell with the various gas mixtures of Ne-Xe(1%), Ne-Xe(4%) and Ne-Xe(10%) under fixed gas pressure of 350 Torr and the eletrode gap distance of 50um. It is found that the maximum excited xenon densities are $1.2^{\ast}10^{12}\;cm^{-3}$, $1.8^{\ast}10^{12}\;cm^{-3}$ and $2.7^{\ast}10^{12}cm^{-3}$ for gas mixtures of Ne-Xe(1%), Ne-Xe(4%) and Ne-Xe(10%) respectively, in this experiment.

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Atmospheric Plasma Treatment on Copper for Organic Cleaning in Copper Electroplating Process: Towards Microelectronic Packaging Industry

  • Hong, Sei-Hwan;Choi, Woo-Young;Park, Jae-Hyun;Hong, Sang-Jeen
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.3
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    • pp.71-74
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    • 2009
  • Electroplated Cu is a cost efficient metallization method in microelectronic packaging applications. Typically in 3-D chip staking technology, utilizing through silicon via (TSV), electroplated Cu metallization is inevitable for the throughput as well as reducing the cost of ownership (COO).To achieve a comparable film quality to sputtering or CVD, a pre-cleaning process as well as plating process is crucial. In this research, atmospheric plasma is employed to reduce the usage of chemicals, such as trichloroethylene (TCE) and sodium hydroxide (NaHO), by substituting the chemical assisted organic cleaning process with plasma surface treatment for Cu electroplating. By employing atmospheric plasma treatment, marginally acceptable electroplating and cleaning results are achieved without the use of hazardous chemicals. The experimental results show that the substitution of the chemical process with plasma treatment is plausible from an environmentally friendly aspect. In addition, plasma treatment on immersion Sn/Cu was also performed to find out the solderability of plasma treated Sn/Cu for practical industrial applications.

The Effect of CYP2D6/3A5 Genotypes on Plasma Concentrations of Haloperidol after Adjunctive Treatment of Aripiprazole

  • Shim, Joo-Cheol;Ahn, Jung-Mi;Jung, Do-Un;Kong, Bo-Geum;Kang, Jae-Wook;Liu, Kwang-Hyeon;Shin, Jae-Gook
    • Korean Journal of Biological Psychiatry
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    • v.18 no.2
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    • pp.95-100
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    • 2011
  • Objectives To evaluate the drug interactions between aripiprazole and haloperidol, authors investigated plasma concentrations of those drugs by genotypes. Method Fifty six patients with a confirmed Diagnostic and Statistical Manual of Mental Disorders 4th edition diagnosis of schizophrenia were enrolled in this eight-week, double blind, placebo-controlled study. Twenty-eight patients received adjunctive aripiprazole treatment and twenty-eight patients received placebo while being maintained on haloperidol treatment. Aripiprazole was dosed at 15 mg/day for the first 4 weeks, and then 30 mg for the next 4 weeks. The haloperidol dose remained fixed throughout the study. Plasma concentrations of haloperidol and aripiprazole were measured by high-performance liquid chromatography-tandem mass spectrometry (LC-MS/MS) at baseline, week 1, 2, 4 and 8. $^*1$, $^*5$, and $^*10$ B alleles of CYP2D6 and $^*1$ and $^*3$ alleles of CYP3A5 were determined. The Student's T-test, Pearson's Chi-square test, Wilcoxon Rank Sum test and Logistic Regression analysis were used for data analysis. All tests were two-tailed and significance was defined as an alpha < 0.05. Results In the frequency of CYP2D6 genotype, $^*1/^*10$ B type was most frequent (36.5%) and $^*1/^*1$ (30.8%), $^*10B/^*10B$ (17.3%) types followed. In the frequency of CYP3A5 genotype, $^*3/^*3$ type was found in 63.5% of subjects, and $^*1/^*3$ type and $^*1/^*1$ were 30.8% and 5.8% respectively. The plasma levels of haloperidol and its metabolites did not demonstrate significant time effects and time-group interactions after adjunctive treatment of aripiprazole. The genotypes of CYP2D6 and 3A5 did not affect the plasma concentration of haloperidol in this trial. No serious adverse event was found after adding aripiprazole to haloperidol. Conclusion No significant drug interaction was found between haloperidol and aripiprazole. Genotypes of CYP2D6 and 3A5 did not affect the concentration of haloperidol after adding aripiprazole.

Pharmacokinetics of oxytetracycline in olive flounder (Paralichthys olivaceus) by intramuscular injection (Oxytetracycline을 근육 주사한 넙치 (Paralichthys olivaceus)의 약물동태학적 특성)

  • Jung, Sung-Hee;Choi, Dong-Lim;Kim, Jin-Woo;Jo, Mi-Ra;Seo, Jung-Soo;Ji, Bo-Young
    • Journal of fish pathology
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    • v.22 no.1
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    • pp.91-95
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    • 2009
  • The pharmacokinetic properties of oxytetracycline (OTC) were studied after intramuscular injection to cultured olive flounder, Paralichthys olivaceus. Plasma concentrations of OTC were determined after dosage of 12.5, 25 and 50 ㎎/㎏ body weight in olive flounder (average 600 g, $23{\pm}1{^{\circ}C}$). Plasma samples were taken at 3, 5, 10, 15, 24, 32, 48, 72, 120, 168, 240 and 360 h post-dose. With 25 and 50 ㎎/㎏, the peak plasma concentrations of OTC, which attained at 5 h post-dose, were 0.99 and 1.49 $\mu{g}/m\ell$, respectively. However, the peak plasma concentration of 12.5 ㎎/㎏ was 0.35 $\mu{g}/m\ell$ after 10 h post-dose. Plasma concentrations of OTC were not measurable at 360 h post-dose in all doses. The kinetic profile of absorption, distribution and elimination of OTC in plasma were analyzed fitting to a 1-compartment model by Win-Nonlin program. The following parameters were calculated for 12.5, 25 and 50 ㎎/㎏ body weight, respectively: AUC (the area under the concentration-time curve)?D���D24.98, 44.67 and 50.45 $\mu{g}$ $h/m\ell$ $T_{1/2}$ (half-life) ?D���D0.42, 0.59 and 0.41 h; $T_{max}$ (time for maximum concentration)?D���D8.46, 6.34 and 2.66 h; $C_{max}$ (maximum concentration)?D���D0.30, 0.63 and 1.13 $\mu{g}/m\ell$.

The Effect of Alloy Elements on the Damping Capacity and Plasma Ion Nitriding Characteristic of Fe-Cr-Mn-X Alloys. [II Plasma Ion Nitriding Characteristic] (Fe-Cr-Mn-X계 합금의 감쇠능 및 플라즈마 이온 질화특성에 미치는 합금원소의 영향 [II플라즈마 이온 질화특성])

  • Son, D.U.;Lee, H.H.;Seong, J.H.;Park, K.S.;Kim, C.K.;Kang, C.Y.
    • Journal of Power System Engineering
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    • v.9 no.1
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    • pp.76-81
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    • 2005
  • The effect of micro-pulse plasma nitriding temperature and time on the case thickness, hardness and nitride formation in the surface of Fe-12Cr-22Mn-X alloy with 3% Co and 1% Ti alloys elements investigated. External compound layer and internal diffusion layer was constituted in plasma nitride case of Fe-12Cr-22Mn-X alloys and formed nitride phase such as ${\gamma}'-Fe4N\;and\;{\varepsilon}-Fe2-3N$. Case depth increased with increasing the plasma nitriding temperature and time. Surface hardness of nitrided Fe-12Cr-22Mn-X alloys obtained the above value of Hv 1,600 and case depth obtained the above value of $45{\mu}m$ in Fe-12Cr-22Mn-3Co alloy and $60{\mu}m$ in Fe-12Cr-22Mn-1Ti alloy. Wear-resistance increased with increasing plasma nitriding time and showing the higher value in Fe-12Cr-22Mn-1Ti alloy than Fe-12Cr-22Mn-3Co alloy.

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Surface Modification of Glass Fiber for Polymer Insulator by Plasma Surface Treatment (플라즈마 표면처리에 따른 고분자절연재료용 유리섬유의 표면개질)

  • 임경범;이덕출
    • The Transactions of the Korean Institute of Electrical Engineers D
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    • v.52 no.5
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    • pp.206-206
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    • 2003
  • It is hard to expect excellent electrical, mechanical and chemical properties from most of the composite materials presently used as insulators due to insufficient wettability property caused by the difference of interfacial properties between the matrix material and the reinforcer. Therefore, various interfacial coupling agents have been developed to improve the interfacial properties of composite materials. But if the wettable coupling agents are used outdoor for a long time, change in quality takes place in the coupling agents themselves, bringing about deterioration of the properties of the composite materials. In this study, glass surface was treated by plasma to examine the effect of dry interface treatment without coupling agent. It was identified that the optimum parameters for the best wettability of the samples at the time of generation of plasma were oxygen atmosphere, 0.1 torr of system pressure, 100 W of discharge power, and 3 minutes of discharge time. Also, the surface resistance rate and dielectric property were improved.