• Proceedings of the KIEE Conference
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• 1991.11a
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• pp.265-268
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• 1991

In the study, PPTMDSO(plasma-polymerized tetramethyldisiloxane) films were deposited on on glass substrate in a paralled plate reactor. As the function of RF power increased from 20 W to 110 W, and the substrate temperature increased from $25^{\circ}C$ to $100^{\circ}C$, the deposit ion rate, increased. When oxygen was intentionally added in monomer vapor, the concentration of Si-O-Si bonds increased while C-H, Si-H, -CH3, Si(CH3)x, -CH3, and Si-C bonds decreased in IR spectra. Thermal stability of PPTMSDO film were investigated and weight loss at $800^{\circ}C$ was 7.3 %.

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.1878-1880
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• 2005

In this research, We investigated the effect of $O_2/O_3$ Plasma treatment of indium-tin oxide (ITO) surface on the performance of organic light emitting devices (OLEDs). The OLED had a structure of ITO/N,N'-diphenyl-N,N' -(3-methylphenyl)-1, 1'-biphenyl-4-4'-diamine (TPD)/Tris (8-hydroxyquinolinato) Aluminum $(Alq_3)/Al$. The ITO surface was treated by $O_2/O_3$ plasma with different RF power chamber pressure and exposure time. As a result, the emission efficiency of the OLEDs could be improved obviously.

• Journal of Korea Society of Industrial Information Systems
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• v.18 no.3
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• pp.1-8
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• 2013

Plasma display panel (PDP) televisions are facing to have a new chance to receive attention along with a boom in 3-D software and contents because PDP can provide the comfortable and realistic 3-D images. The PDP has three driving circuit boards such as X, Y and addressing boards. Cost effective driving waveform has already been reported to decrease the number of driving circuit board. Half bridge based sustaining driver can remove a sustaining driver in the X board. However, the biasing circuit in the X driving boards cannot be reduced because there are some drawbacks such as unstable gas discharge condition and unreliability of an address driver IC. In this paper, the half bridge based sustaining driver is considered and a simple address driver is proposed to remove one driving board, X driving board. The stable gas discharge condition, reliability of the address driver IC and the low cost can be obtained by the proposed circuit.

• Asian-Australasian Journal of Animal Sciences
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• v.9 no.3
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• pp.309-313
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• 1996

This experiment was carried out to investigate the effect of rumen-protected lysine (RPLys) on growth rate, feed efficiency and plasma amino acid concentrations in sheep. RPLys was supplemented at the level of 0% ($T_1$), 0.2% ($T_2$) and 0.4% ($T_3$) of total DMI with 24 sheep in a 56 day feeding trial. The results are summarized as follows: 1. live weight gain of sheep in groups $T_1$, $T_2$ and $T_3$ was 219, 216 and 244 g/d, and was significantly (p < 0.05) higher for $T_3$ through the entire experiment. 2. Feed intake was not affected by RPLys supplementation. 3. The group fed $T_3$ had a significantly (p < 0.05) better feed efficiency than the groups fed $T_1$ and $T_3$. The response of $T_3$ was higher in growing period II of feeding low protein basal diet than in period I. 4. Plasma lysine concentrations tended to be higher with supplementing RPLys, but there were no differences between $T_2$ and $T_3$. 5. Supplementing RPLys in the diets increased plasma concentrations of arginine, asparagines, threonine, serine, valine and leucine compared with sheep receiving no RPLys. In contrast, plasma histidine was lower in sheep fed the supplementing RPLys than fed the diet $T_1$ with significant (p < 0.05) difference.

• Bulletin of the Korean Chemical Society
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• v.26 no.5
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• pp.729-734
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• 2005

A sensitive and selective method for quantitation of sofalcone and its active metabolite in human plasma has been established using liquid chromatography-electrospray ionization tandem mass spectrometry (LC-ESI/MS/MS). Plasma samples were transferred into 96-well plate using an automated sample handling system and spiked with 10 $\mu$L of 2 $\mu$g/mL $d_3$-sofalcone and $d_3$-sofalcone metabolite solutions (internal standard), respectively. After adding 0.5 mL of acetonitrile to the 96-well plate, the plasma samples were then vortexed for 30 sec. After centrifugation, the supernatant was transferred into another 96-well plate and completely evaporated at 40 ${^{\circ}C}$ under a stream of nitrogen. Dry residues were reconstituted with mobile phase and were injected into a $C_{18}$ reversed-phase column. The limit of quantitation of sofalcone and its metabolite was 2 ng/mL, using a sample volume of 0.2 mL for analysis. The reproducibility of the method was evaluated by analyzing 10 replicates over the concentration range of 2 ng/mL to 1000 ng/mL. The validation experiments of the method have shown that the assay has good precision and accuracy. Sofalcone and its metabolite produced a protonated precursor ion ([M+H]$^+$) of m/z 451 and 453, and a corresponding product ion of m/z 315 and 317, respectively. Internal standard ($d_3$-sofalcone and $d_3$-sofalcone metabolite) produced a protonated precursor ion ([M+H]$^+$) of m/z 454 and 456 and a corresponding product ion of m/z 315 and 317, respectively. The method has been successfully applied to a pharmacokinetic study of sofalcone and its active metabolite in human plasma.

• Journal of the Korean institute of surface engineering
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• v.41 no.5
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• pp.205-213
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• 2008

A 3D particle code is developed to analyze electron behavior in a planar magnetron sputtering cathode either in balanced or unbalanced configuration. Three types of collisions are included; electron - neutral elastic, excitation to a metastable state and ionization. Flight path is calculated by a 4-th order Runge-Kutta method with a time step of 10 ps. Effects of electron starting position, magnetic field intensity and configuration were analyzed. For a more efficient and accurate modeling, multithreading technique is considered for multicore CPU computers. Under an assumption of cold ion approach, target erosion profiles are predicted for a flat target surface.

• Journal of Nutrition and Health
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• v.21 no.4
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• pp.253-259
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• 1988

Riboflavin, Ascorbin Acid & Vitamin D status of 74 elderly Korean (35 men and 39 women)from urban households in Incheon were evaluated by blood analysis. Mean EGR-AC value of men was 1.05 while that of women was 1.03. Marginal deficiency of riboflavin(EGR-AC 1.15-1.35) was shown in 33.3% of men and 20% of women. Average plasma ascorbic acid contents of subjects were very low and men had significantly lower amount than women(0.23mg/㎗ vs 0.44mg/㎗). The percentages of subjects who had plasma ascorbic acid less than 0.4mg/㎗ were 88.9% of men and 45% of women. Mena serum Calcium, Inorganic phosphate contents and mean serum ALP activity of men were 9.97mg/㎗, 3.28mg/㎗ and 61.85 Unit/L respectively and those of women were 9.78mg/㎗, 3.49mg/㎗ and 67.80Unit/L respectively. From these results, Vitamin D status of subjects was considered to be normal.

• Journal of the Semiconductor & Display Technology
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• v.11 no.1
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• pp.67-71
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• 2012

The optical properties of PDP, such as the transmittance and reflectance, were analyzed with 3D optical code. Three different ITO-less structures in the front panel are examined. In the assembled panel study, the test 1 structure shows 16.6% and 10.2% higher reflectance than the structures of tests 2 and 3, respectively. In order to check the validation of the simulation result, three 7.5-inch test panels having the same geometry and property are fabricated as simulation models. The calculated reflective properties are compared to the measured data from real panels. The relative difference extracted from the simulation and measurement methods is less than 4.9% and are well matched.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.80-81
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• 2012

Recently, one of the critical issues in the etching processes of the nanoscale devices is to achieve ultra-high aspect ratio contact (UHARC) profile without anomalous behaviors such as sidewall bowing, and twisting profile. To achieve this goal, the fluorocarbon plasmas with major advantage of the sidewall passivation have been used commonly with numerous additives to obtain the ideal etch profiles. However, they still suffer from formidable challenges such as tight limits of sidewall bowing and controlling the randomly distorted features in nanoscale etching profile. Furthermore, the absence of the available plasma simulation tools has made it difficult to develop revolutionary technologies to overcome these process limitations, including novel plasma chemistries, and plasma sources. As an effort to address these issues, we performed a fluorocarbon surface kinetic modeling based on the experimental plasma diagnostic data for silicon dioxide etching process under inductively coupled C4F6/Ar/O2 plasmas. For this work, the SiO2 etch rates were investigated with bulk plasma diagnostics tools such as Langmuir probe, cutoff probe and Quadruple Mass Spectrometer (QMS). The surface chemistries of the etched samples were measured by X-ray Photoelectron Spectrometer. To measure plasma parameters, the self-cleaned RF Langmuir probe was used for polymer deposition environment on the probe tip and double-checked by the cutoff probe which was known to be a precise plasma diagnostic tool for the electron density measurement. In addition, neutral and ion fluxes from bulk plasma were monitored with appearance methods using QMS signal. Based on these experimental data, we proposed a phenomenological, and realistic two-layer surface reaction model of SiO2 etch process under the overlying polymer passivation layer, considering material balance of deposition and etching through steady-state fluorocarbon layer. The predicted surface reaction modeling results showed good agreement with the experimental data. With the above studies of plasma surface reaction, we have developed a 3D topography simulator using the multi-layer level set algorithm and new memory saving technique, which is suitable in 3D UHARC etch simulation. Ballistic transports of neutral and ion species inside feature profile was considered by deterministic and Monte Carlo methods, respectively. In case of ultra-high aspect ratio contact hole etching, it is already well-known that the huge computational burden is required for realistic consideration of these ballistic transports. To address this issue, the related computational codes were efficiently parallelized for GPU (Graphic Processing Unit) computing, so that the total computation time could be improved more than few hundred times compared to the serial version. Finally, the 3D topography simulator was integrated with ballistic transport module and etch reaction model. Realistic etch-profile simulations with consideration of the sidewall polymer passivation layer were demonstrated.

• Journal of Powder Materials
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• v.15 no.5
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• pp.371-377
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• 2008

This paper deals with the phase analysis of $MgB_2$ bulk using spark plasma sintering process after ball milling. Mg and amorphous B powders were used as raw materials, and milled by planetary-mill for 9 hours at argon atmosphere. In order to confirm formation of $MgB_2$ phase, DTA and XRD were used. The milled powders were fabricated to $MgB_2$ bulk at the various temperatures by Spark Plasma Sintering. The fabricated $MgB_2$ bulk was evaluated with XRD, EDS, FE-SEM and PPMS. In the DTA result, reaction on formation of $MgB_2$ phase started at $340^{\circ}C$. This means that ball milling process improves reactivity on formation of $MgB_2$ phase. The $MgB_2$ MgO and FeB phases were characterized from XRD result. MgO and FeB were undesirable phases which affect formation of $MgB_2$ phase, and it's distribution could be confirmed from EDS mapping result. Spark Plasma Sintered sample for 5 min at $700^{\circ}C$ was relatively densified and it's density and transition temperature showing super conducting property were $1.87\;g/cm^3$ and 21K.