• Title/Summary/Keyword: photosensitivity

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The Study on the Origin of Soybean Cultivation (대두재배(大豆栽培)의 기원(起源)에 관한 고찰(考察))

  • Lee, Sung-Woo
    • Journal of the Korean Society of Food Culture
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    • v.3 no.1
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    • pp.1-5
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    • 1988
  • According to the literature, soybean cultivation originated from Wang-Gong (B.C. 685-643) of China who brought it from northeast Asia, for the first time. FUKUDA, of Japan divided soybean into three species-the wild, the cultivated and the intermediate. From the result of that study, he concluded that the soybean originated in northeast Asia. But Wang Kum Rung of China insisted that soybean originated in Hwa-Nam, because the soybean is a shortday plant and the agricultural history of Hwa-Nam, south of China, is older than that of northeast Asia. However, agriculture in northeast Asia had been already begun about B.C. 4000-6000 and the origin of culture cannot be decided only by photosensitivity. It has been proved that soybeans found in Korea were same as the ones of B.C. 2000. The soybeans of northeast Asia meet the conditions of the probable place of origin of cultivated crops established by Vabilov. Accordingly it is concluded that soybean has been originated from northeast Asia.

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Micro Patterning Using Near-Field Coupled Nano Probe Laser Photo Patterning Of Chloromethylated Polyimide Thin Film (클로로메틸 폴리이미드(CMPI) 박막과 근접장 나노 프로브 레이저 패터닝을 이용한 미세 형상 가공 기술)

  • 최무진;장원석;김재구;조성학;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.369-372
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    • 2004
  • Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.

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A Study on the Photosensitivity of Poly(vinyl cinnamoyl acetate) Developable in Aqueous Base (수계현상성 Poly(vinyl cinnamoyl acetate)의 감광특성에 관한 연구)

  • 신동률
    • Journal of the Korean Graphic Arts Communication Society
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    • v.12 no.1
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    • pp.1.2-15
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    • 1994
  • This is the study which appear the relation between the situation of Anchor point and the qualities of lithographic prints using the uncoated paper. Anchor point were measured by microscopic photography and Kubelka-munk`s method. The situation of Anchor point increased with print density and print though, but it decreased with evenness and rub off. In case of commercial uncoated paper, the situation of Anchor point was optimized when it was 25~35% apporoximately. In preparation of samples for microscopic photography, the samples were used by the resin testing methods. This method used that the resin fixes the printed papers of sample very hard, in preparation of samples for microscopica potography a good result could be gained by this method.

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Preparation and Characterization of Acid Amplifiers containing electron withdrawing group (전자끄는기를 갖는 산 증식제의 합성 및 특성 연구)

  • Lee, Eun-Ju;Jeong, Yeon-Tae
    • Journal of the Korean Graphic Arts Communication Society
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    • v.21 no.1
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    • pp.21-34
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    • 2003
  • Acid amplifiers derived from a certain class of sulfonates suffer from autocatalytic decomposition in the presence of a strong acid to give corresponding sulfonic acid, which catalyze the composition of the parent sulfonates, leading to the liberation of more of the same sulfonic acids in an exponential manner. In this research we synthesized and evaluated 4-hydroxy-4'-(2-trifluoromethyl)benzenesulfonyloxy isopropylidene dicyclohexane (1), 4,4'-di-(2-trifluoromethyl)benzenesulfonyloxy isopropylidene dicyclohexane (2), 4-hydroxy-4'-(3-trifluoromethyl)benzenesulfonyloxy isopropylidene dicyclohexane (3) and 4,4-di-(3-trifluoromethyl)benzenesulfonyloxy isopropylidene dicyclohexane (4) as novel acid amplifiers with electron withdrawing group. These acid amplifiers (1-4) showed reasonable thermal stability for resist processing temeprature and exhibited higher photosensitivity compared to poly(tert-butyl methacrylate) film without acid amplifiers. Application of acid amplifiers to photofunctional materials, including photoresists, are described as a consequence of the combination of the acid amplifiers with photoacid generator.

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Effect of Polymer on the Photosensitive properties of organic Photoconductor (유기감광체의 감광특성에 미치는 고분자의 영향에 관한 연구)

  • 문명준;김명숙;이상남;민성기;김은경
    • Journal of the Korean Graphic Arts Communication Society
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    • v.16 no.3
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    • pp.43-60
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    • 1998
  • The photosensitive properties and spectroscopic characteristics in the organic photoconductor(OPC) with carrier generation layer(CGL) of poly(vinylbutyral)(PVB) and polycarbonate(PC) doped with titanyl phthalocyanine(TiOPc) were investigated. The change of crystal structure of TiOPc dispersed with PVB and PC was shown by UV-visible reflective spectrum and FT-IR spectrum and mainly caused by the difference of solubility of solvent and the interaction between TiOPc and binder. The particle size of TiOPc dispersed with PVB measured by SEM was smaller than in PC. The crystal structure of TiOPc dispersed with PVB was amorphous type and in PC was $\alpha$type. It was found that the photosensitive properties of OPC were dependent on the change of absorbance and ionization potential of TiOPc occurred from the difference of crystal structure. In this work, the photosensitivity of OPC of TiOPc dispersed with PVB was better than PC due to the crystal type and the smaller particle size.

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Characteristics of a-Si:H Films for Contact-type Linear Image Sensor (밀착형 선형 영상감지소자를 위한 a-Si:H막의 특성)

  • 오상광;박욱동;김기완
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.11
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    • pp.894-901
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    • 1991
  • Contact-type linear image sensors have been fabricated by means of RF glow discharge decomposition method of silane and hydrogen mixtures. The dependences of the electrical and optical properties of these sensor on thickness, RF power, substrate temperature and ambient gas pressure have been investigated. the ITO/i-a-Si:H/Al structure film shows photosensitivity of 0.85 and photocurrent to dark current ratio ($I_{ph}/I_{d}$) of 150 at 5V bias voltage under 200${\mu}W/cm^[2}$ red light intensity. Under 200${\mu}W/cm^[2}$ green light intensity, the ratio is 100. In order to investigate photocarrier transport mechanism and to obtain ${\mu}{\gamma}$ product we have measured the I-V characteristics of these sensors favricated with several different deposition parameters under various light sources. The linear inage sensor for document reading has been operated under reverse bias condition with green light source, resulting in ${\mu}{\gamma}$ product of about 1.5$[\times}10^{-9}cm^{2}$/V.

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Formation of Black Matrix and Ag Electrode Patterns by Photolithographic Process for High Resolution PDP

  • So, Jae-Yong;Kwon, Hyeok-Yong;Kim, Suk-Kyung;Park, Lee-Soon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.369-372
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    • 2008
  • Black matrix and Ag electrode with uniform line pitches were successfully fabricated through the photolithographic process by using the photosensitive black pastes and Ag pastes with optimized photosensitive properties for high resolution PDPs. The photosensitivity of the black and Ag pastes in the photolithographic process was investigated with the variation of photosensitive BM and Ag pastes and the photolithography process conditions. The important components and formulation of the photosensitive BM and Ag paste we discussed.

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Electro-optical Characteristics of the TN Cell Photo-aligned on the Blending Photopolymer Surfaces (복합 광폴리머 표면을 이용한 광배향 TN 셀의 전기 광학 특성)

  • 황정연;서대식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.7
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    • pp.600-605
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    • 2001
  • The electro-optical (EO) performances for the twisted-nematic (TN)-liquid crystal display (LCD) photo-aligned with polarized UV exposure on various blending photopolymer surfaces were investigated. Excellent LC alignment and voltage-transmittance (V-T) characteristics for TN-LCD photo-aligned with polarized UV exposure of normal incidence on the blending photopolymer (polyimide (PI) +PM4Ch(poly(4-methacryloyloxy chalcone))) surface containing chalcone group can be achieved. The EO performances for the TN-LCD photo-aligned on the blending photopolymer can be improved due to the photosensitivity by long side chain of the photopolymer.

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Synthesis and Characterization of Novel Acid Amplifiers with a Low Absorbance at 193 nm (193 nm에서 낮은 흡수도를 갖는 새로운 산 증식제의 합성 및 특성연구)

  • 소진호;정용석;최상준;정연태
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.8
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    • pp.806-811
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    • 2004
  • 1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.

The electrophotographic characteristics of the duble-layered orgaic photoreceptors for the laser printer (레이저 프린터용 이층형 유기감광막의 전자사진특성)

  • 박종관;박구범;이덕출
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.4
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    • pp.53-60
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    • 1998
  • The purpose of this paper is to meausre the electrophotographic characteristics of double-layered organic photoreceptor and to evaluate an application for the laser beam printer drum. The characte carrier generation layer(CGL) of double-layered photoreceptor was fabricated with .tau.-H$_{2}$Pc which has high photosensitivity in the near-infrareed region(thickness is about 0.3.mu.m), and Oxadiazole derivative was chosen as a charge carrier transport layer(CTL) because of its high hole mobility. To observe the electrophotographic characteristics of the photoreceptor, we measured the charge acceptance, dark-decay ratio, residual potential after light irradiation. From the result of this study, proper thickness of CTL was about 10.mu.m. Also it's realized that electrophotographic characteristics of the photoreceptor were depend on the thickness of the CTL and the initial surface potential.

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