• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.450-451
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• 2007

Dot-patterned carbon nanotube (CNT) emitters with excellent field emission properties were fabricated using photosensitive CNT paste. We carried out a parametric study on the compositions and the fabrication processes of the paste, in particular, by ball milling CNTs, which were optimized in terms of dot shapes and their field emission characteristics. The ball milling process improved the field emission current of the dot-patterned CNT emitters several times higher than that of the non-milled paste.

• Applied Chemistry for Engineering
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• v.7 no.2
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• pp.379-386
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• 1996

Photosensitive compound, 1-methyl-4-[2-(4-diethylacetylphenyl)ethenyl] pridinium methosulfate(SbQ-A salt), was synthesized from dimethyl sulfate, terephthalaldehyde mono-(diethylacetal) and 4-picoline. SbQ-A salts were reacted with poly(vinyl alcohol)s, (PVA) in aqueous solution with phosphoric acid as catalyst to give photosensitive PVA-SbQ with different SbQ content and molecular weight. Relative photosensitivity of PVA-SbQ was determined by gray scale(GS) method. The rotative sensitivity of PVA-SbQ increased with increasing amount of bound SbQ in the case of high molecular weight(MW=77,000-79,000g/mol) as substrate and decreased with decreasing molecular weight of PVA with about constant(1.3mol%) amount of bound SbQ. The most sensitive polymer was obtained when SbQ group content in PVA-SbQ reached about 2.63mol% in the case of high molecular weight(77,000-79,000g/mol) PVA. This sample showed 90 times greater sensitivity than dichromated PVA as reference photosensitive system. PVA-SbQ photosensitive polymer synthesized was applied to the photolithographic screening process of phosphor on the panel of cathode ray tube(CRT). Phosphor slurry was made with PVA-SbQ, phosphor, a small amount of surfactant and other additives using water as medium. The slurry was coated onto panel, dried by heater, exposed to UV light and then developed by distilled water. When a small amount of cationic surfactant such as cetyltrimethylammonium chloride was used in the slurry formulation, the sharpness of phosphor pattern was equal to or better than that of dichromated PVA photosensitive polymer system used currently.

• Journal of Photoscience
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• v.9 no.2
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• pp.1-4
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• 2002

Hula-twist is a volume-conserving photoisomerization reaction mechanism postulated in 1985 to account for the rapid photoisomerization of the retinyl chromophore in rhodopsin. The requisite stereochemical consequence of simultaneous isomerization of a double bond and an adjacent single bond has recently been demonstrated in isomerization of pre-vitamin D in an organic glass and by many other examples of organic systems already reported in the literature This paper reports the consequence in applying the mechanism to the primary photochemical process of several photosensitive biopigments: bilirubin, photoactive yellow protein, bacteriorhodopsin and rhodopsin. It is shown that the anchored nature of the chromophores must first be taken into consideration.

• Journal of the Korean Graphic Arts Communication Society
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• v.16 no.3
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• pp.147-156
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• 1998

A Photosensitive Crown Ether Styryl Dye derivative(CESD) was prepared for the application and the structure of it was discussed. Light excitation causes the trans-cis isomerization of CESD yielding a conformation suitable to form a coordination bond between an anion group and a metal cation located in crown ether. Intermolecular complex stabilized the cis isomer that absorbs at a shorter wavelength in the trend-cis isomerization. Application of CESD was suggested.

• Proceedings of the Materials Research Society of Korea Conference
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• 2007.11a
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• pp.31.1-31.1
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• 2007

• Proceedings of the KIEE Conference
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• 1999.11d
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• pp.1140-1141
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• 1999

유리 및 세라믹 미세구조물은 열적, 화학적, 기계적특성이 우수하며 이 제조방법으로 대표적인 것이 그라스의 노광, 열처리에 의한 노광부를 선택적으로 에칭시켜 구조물을 형성시키는 감광성그라스 공정이다. 그러나 공정조건을 변화시킴에 따라 기존과는 정반대로 비노광부를 선택적으로 에칭시키는 것이 가능하였으며 본 방식에 의해서 더욱 정밀한 미세구조물을 형성할 수 있음을 확인하였다.

• Bulletin of the Korean Chemical Society
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• v.29 no.9
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• pp.1689-1694
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• 2008

• Applied Chemistry for Engineering
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• v.9 no.7
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• pp.1053-1058
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• 1998

Poly(vinyl butyral)s (PVB) with different butyral content were synthesized from poly(vinyl alcohol)(PVA) and n-butylaldehyde with acid catalyst. Bound butyral unit in PVB was determined by elemental analysis. Synthesized PVBs were reacted with p-azidobenzaldehyde to give photosensitive polymer with azidobenzene group(PVB-AZ). Bound photosensitive azidobenzene group in PVB-AZ was determined by UV spectrophotometry. The photosensitivity of PVB-AZ was compared with that of PVB/2,6-bis(p-azidobenzylidene)cyclohexanone(BAC) photosensitizer mixture system by gray scale method. Photosensitivity of PVB-AZ was higher than that of PVB/BAC mixture system. The photosensitivity of PVB-AZ was dependent on the developer used due to the solubility of PVB-AZ in a developer solvent.

• Journal of the Korean Ceramic Society
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• v.40 no.2
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• pp.153-158
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• 2003

Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study,$La_{0.5}SR_{0.5}CoO_3$(LSCO) thin films as an electrode material for ferroelectric memories have been prepared by spin coating method using photosensitive sol solution. La-2methoxyethoxide, Sr-ethoxide, Co-2methoxyethoxide were used as starting materials. As UV exposure time to the LSCO gel thin film increased, the UV absorption peak intensity of metal${beta}$-diketonate decreased due to reduced solubility by M(metal)-O-M bond formation. Solubility difference by UV irradiation on LSCO gel thin film allows to obtain a fine patterning of thin film. The LSCO thin films annealed over$680{\circ}C$ in air showed perovskite phase and the lowest resistivity$(4{ imes}10^{-3}{Omega}cm)$ of the thin films were obtained by annealing at$740{\circ}C$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.421-421
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• 2008

Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.