• 제목/요약/키워드: photonics

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도금 및 CMP에 의한 Micro-Tip 제작 공정 연구 (A Study on Micro-Tip Fabrication by Plating and CMP)

  • 한명수;박창모;신광수;고항주;김두근;한수욱;김선훈;기현철;김효진;김장현
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.152-152
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    • 2009

  • We investigate micro-tip properties as Ni-Co plating and CMP processes for MEMS probe card and units. The micro-tip are fabricated by using Ni-Co plating machine, lapping machine, and chemo-mechanical polisher. In order to get high conductive and reliable micro-tip, we control Co contents and thickness by CMP speed. We have found that about 20-25% of Co contents are required and have to lapping speed of 30 rpm. Also, we investigate photolithography and Ni-Co plating processes conditions for the one-step and the three-step micro-tips.

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