• Title/Summary/Keyword: photodetector

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SnO2-Embedded Transparent UV Photodetector (SnO2 기반의 투명 UV 광 검출기)

  • Lee, Gyeong-Nam;Park, Wang-Hee;Kim, Joondong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.12
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    • pp.806-811
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    • 2017
  • An all-transparent ultraviolet (UV) photodetector was fabricated by structuring $p-NiO/n-SnO_2/ITO$ on a glass substrate. $SnO_2$ is an important semiconductor material because of its large bandgap, high electron mobility, high transmittance (as high as 80% in the visible range), and high stability under UV light. For these reasons, $SnO_2$ is suitable for a range of applications that involve UV light. In order to form a highly transparent p-n junction for UV detection, $SnO_2$ was deposited onto a device containing NiO as a high-transparent metal conductive oxide for UV detection. We demonstrated that all-transparent UV photodetectors based on $SnO_2$ could provide a definitive photocurrent density of $4nA\;cm^{-2}$ at 0 V under UV light (365 nm) and a low saturation current density of $2.02nA{\times}cm^{-2}$. The device under UV light displayed fast photoresponse with times of 31.69 ms (rise-time) and 35.12 ms (fall-time) and a remarkable photoresponse ratio of 69.37. We analyzed the optical and electrical properties of the $NiO/SnO_2$ device. We demonstrated that the excellent properties of $SnO_2$ are valuable in transparent photoelectric device applications, which can suggest various routes for improving the performance of such devices.

Fabrication of Wavelength Division Demultiplexing Photodetectors Using Quantum Well Intermixing (다중양자우물의 상호 섞임 현상을 이용한 다중파장검출기의 제작)

  • Yeo, Deok-Ho;Yoon, Kyung-Hun;Kim Sung-June
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.9
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    • pp.1-6
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    • 2000
  • Utilizing impurity free vacancy diffusion (IFVD) method, area selective intermixing of InGaAs/InGaAsP multi-quantum well (MQW) structure was done. After this, wavelength division demultiplexing waveguide type photodetectoers was integrated and measured. It showed large blue shift in bandgap due to intermixing of MQW. Photodetectors are based on typical p-i-n structure and devices having large and small bandgap areas line up linearly. Width of waveguide and length of each photodetector are 20 and 250 ${\mu}m$, respectively, TE/TM polarized light from tunable laser was butt-coupled to the photodetector and spectral response was measured. Photodetectors can demultiplexing 1480 and 1550 nm wavelength.

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MoO3/p-Si Heterojunction for Infrared Photodetector (MoO3 기반 실리콘 이종접합 IR 영역 광검출기 개발)

  • Park, Wang-Hee;Kim, Joondong;Choi, In-Hyuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.8
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    • pp.525-529
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    • 2017
  • Molybdenum oxide ($MoO_3$) offers pivotal advantages for high optical transparency and low light reflection. Considering device fabrication, n-type $MoO_3$ semiconductor can spontaneously establish a junction with p-type Si. Since the energy bandgap of Si is 1.12 eV, a maximum photon wavelength of around 1,100 nm is required to initiate effective photoelectric reaction. However, the utilization of infrared photons is very limited for Si photonics. Hence, to enhance the Si photoelectric devices, we applied the wide energy bandgap $MoO_3$ (3.7 eV) top-layer onto Si. Using a large-scale production method, a wafer-scale $MoO_3$ device was fabricated with a highly crystalline structure. The $MoO_3/p-Si$ heterojunction device provides distinct photoresponses for long wavelength photons at 900 nm and 1,100 nm with extremely fast response times: rise time of 65.69 ms and fall time of 71.82 ms. We demonstrate the high-performing $MoO_3/p-Si$ infrared photodetector and provide a design scheme for the extension of Si for the utilization of long-wavelength light.

Electrical Property in InAn/GaAs Quantum Dot Infrared Photodetector with Hydrogen Plasma Treatment (수소화 처리된 InAs/GaAs 양자점 적외선 수광소자의 전기적 특성)

  • Nam H.D.;Song J.D.;Choi W.J.;Cho W.J.;Lee J.I.;Choe J.W.;Yang H.S.
    • Journal of the Korean Vacuum Society
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    • v.15 no.2
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    • pp.216-222
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    • 2006
  • In this paper, we investigated the effect of hydrogen-plasma (H-plasma) treatment on the electrical and optical properties of a quantum dot infrared photodetector (QDIP) with a 5-stacked InAs dots in an InGaAs/GaAs well structure and $Al_{0.3}Ga_{0.7}As/GaAs$ SL (superlattice) current blocking layer. It has been observed that H-plasma treatment didn't affect the band structure of QDIP. It has been also observed that the H-plasma treatment on the QDIP not only enhance the electrical property of QDIP by curing the defect channels in $Al_{0.3}Ga_{0.7}As/GaAs$ SL but also introduce defects in QDIP structure. The H-plasma treatment for 10 min with 20 W of RF power provided the lowest dark current, which made it possible to measure the photo-current (PC) of QDIP whose PC was not detectable without the H-plasma treatment due to the high dark current.

Characterization of Electrical Crosstalk in 1.25 Gbps Optoelectrical Triplex Transceiver Module for Ethernet Passive Optical Networks (이더넷 광 네트워크 구현을 위한 1.25 Gbps 광전 트라이플렉스 트랜시버 모듈의 전기적 혼신의 분석)

  • Kim Sung-Il;Lee Hai-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.3 s.333
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    • pp.25-34
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    • 2005
  • In this paper, we analyzed and measured the electrical crosstalk characteristics of a triplex transceiver module for ethernet Passive optical networks(EPONS). And we improved the electrical crosstalk levels using Dummy ground lines with signal lines. The triplex transceiver module consists of a laser diode as a transmitter, a digital photodetector as a digital data receiver, and a analog photodetector as a community antenna television signal receiver. And there are integrated on silicon substrate. The digital receiver and analog receiver sensitivity have to meet -24 dBm at $BER=10^{-l2}$ and -7.7 dBm at 44 dB SNR. And the electrical crosstalk levels have to maintain less than -86 dB from DC to 3 GHz. From analysis and measurement results, the proposed silicon substrate structure that contains the Dummy ground line with $100\;{\mu}m$ space from signal lines and separates 4 mm among devices respectively, is satisfied the electrical crosstalk level compared to simple structure. This proposed structure can be easily implemented with design convenience and greatly reduced the silicon substrate size about $50\%$.

Fabrication of a Schottky Type Ultraviolet Photodetector Using GaN Layer (GaN를 이용한 Schottky diode형 자외선 수광소자의 제작)

  • Seong, Ik-Joong;Lee, Suk-Hun;Lee, Chae-Hyang;Lee, Yong-Hyun;Lee, Jung-Hee;Hahm, Sung-Ho
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.6
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    • pp.28-34
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    • 1999
  • We fabricated a planar ultra-violet photodetector whose ohmic and schottky contacts were respectively formed with evaporated Al and Pt on the GaN layer. To examine the applicability of the device to the UV sensor, we investigated its electrical and optical characteristics. The GaN layer on the sapphire waver had $7.8{\times}10^{16}cm^{-3}$ of doping concentnation and the $138 cm^2/V{\cdot}s$ of electron mobility and it absorbed the spectrum of the light below 325 nm wavelength. It had the responsivity of 2.8 A/W of at 325 nm, and the signal to noise ratio(SNR) of $4{\times}10^4$, and the noise equivalent power(NEP) of $3.5{\times}10^9$W under 5 V reverse bias. These results confirmed that the GaN schottky diode had a solar blind properly when it was applied to the UV photodetector.

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Pt/AlGaN Schottky-Type UV Photodetector with 310nm Cutoff Wavelength

  • Kim, Bo-Kyun;Kim, Jung-Kyu;Park, Sung-Jong;Lee, Heon-Bok;Cho, Hyun-Ick;Lee, Young-Hyun;Hahn, Yoon-Bong;Lee, Jung-Hee;Hahm, Sung-Ho
    • Journal of Sensor Science and Technology
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    • v.12 no.2
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    • pp.66-71
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    • 2003
  • Pt/AlGaN Schottky-type UV photodetectors were designed and fabricated. A low-temperature AlGaN interlayer buffer was grown between the AlGaN and GaN film in the diode structure epitaxy to obtain crack-free AlGaN active layers. A comparison was then made of the structural, electrical, and optical characteristics of two different diodes: one with an AlGaN($0.5\;{\mu}m$)/n+-GaN(2 nm) structure (type 1) and the other with an AlGaN($0.5\;{\mu}m$)/AlGaN interlayer($150\;{\AA}$)/n+-GaN($3\;{\mu}m$) structure(type 2). A crack-free AlGaN film was obtained by the insertion of a low-temperature AlGaN interlayer with an aluminum mole fraction of 26% into the $Al_xGa_{1-x}N$ layer. The fabricated Pt/$Al_{0.33}Ga_{0.67}N$ photodetector had a leakage current of 1 nA for the type 1 diode and $0.1\;{\mu}A$ for the type 2 diode at a reverse bias of -5 V. For the photoresponse measurement, the type 2 diode exhibited a cut-off wavelength of 300 nm, prominent responsivity of 0.15 A/W at 280 nm, and UV-visible extinction ratio of $1.5{\times}10^4$. Accordingly, the Pt/$Al_{0.33}Ga_{0.67}N$ Schottky-type ultraviolet photodetector with an AlGaN interlayer exhibited superior electrical and optical characteristics and improved UV detecting properties.

Large-area High-speed Single Photodetector Based on the Static Unitary Detector Technique for High-performance Wide-field-of-view 3D Scanning LiDAR (고성능 광각 3차원 스캐닝 라이다를 위한 스터드 기술 기반의 대면적 고속 단일 광 검출기)

  • Munhyun Han;Bongki Mheen
    • Korean Journal of Optics and Photonics
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    • v.34 no.4
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    • pp.139-150
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    • 2023
  • Despite various light detection and ranging (LiDAR) architectures, it is very difficult to achieve long-range detection and high resolution in both vertical and horizontal directions with a wide field of view (FOV). The scanning architecture is advantageous for high-performance LiDAR that can attain long-range detection and high resolution for vertical and horizontal directions. However, a large-area photodetector (PD), which is disadvantageous for detection speed, is essentially required to secure the wide FOV. Thus we propose a PD based on the static unitary detector (STUD) technique that can operate multiple small-area PDs as a single large-area PD at a high speed. The InP/InGaAs STUD PIN-PD proposed in this paper is fabricated in various types, ranging from 1,256 ㎛×949 ㎛ using 32 small-area PDs of 1,256 ㎛×19 ㎛. In addition, we measure and analyze the noise and signal characteristics of the LiDAR receiving board, as well as the performance and sensitivity of various types of STUD PDs. Finally, the LiDAR receiving board utilizing the STUD PD is applied to a 3D scanning LiDAR prototype that uses a 1.5-㎛ master oscillator power amplifier laser. This LiDAR precisely detects long-range objects over 50 m away, and acquires high-resolution 3D images of 320 pixels×240 pixels with a diagonal FOV of 32.6 degrees simultaneously.

Motion Blur Measurement with a High-Speed Camera

  • Laur, Juergen;Becker, Michael E.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1135-1138
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    • 2007
  • This paper presents motion picture artifacts measured with a high-speed camera. Measurement results of the high-speed camera on moving targets will be evaluated and compared with motion blur data derived from step responses measured on stationary test patterns with a spot-photodetector.

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