• 제목/요약/키워드: perferred orientation

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기판 바이어스 전압변화에 따른 TiN박막의 배향성 및 미세구조 변화 (The effect of substrate bias on the perferred-orientation and microstructure of TiN films)

  • 서현;한만근;박원근;서평섭;전성용
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 춘계학술대회 논문집
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    • pp.159-159
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    • 2009
  • 본 연구는 기판 바이어스 전압변화에 따른 DC 스퍼터링 TiN 박막의 우선 결정배향성, 표면조도, 평균결정립 크기 및 단면 미세구조에 미치는 영향에 대해 조사하였다.

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아연-니켈합금전착층의 조직특성 (Microstructure of Zn-Ni Alloy Electrodeposir)

  • 예길촌;최성렬;신현준;안덕수
    • 한국표면공학회지
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    • 제21권1호
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    • pp.10-18
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    • 1988
  • The variation of Composition and the microstructure of Zn-Ni alloy electrodespposits were investigated to the electrolysis conditions chloride bath. The codeposition mechanism is of the equilibrium type in the electrolysis condition of the high temperature(6$0^{\circ}C$)and high flow rate (1.2-3.0m/sec). The(411, 330) perferred orienation was mainly developed in the Zn-Ni electrodeposir with ${\gamma}$-phase structure, while the(422.600) orientation was closely related to the commposition and the structure of the alloy electrodeposit.

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RF 마그네트론 반응성 스퍼터링 제작된 ZnO/Glass 박막 특성 (Characteristics of ZnO/Glass Thin Films Prepared by RF Magnetron Sputtering)

  • 박용욱;윤석진;최지원;김현재;정현진;박창엽
    • 한국전기전자재료학회논문지
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    • 제11권10호
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    • pp.833-841
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    • 1998
  • ZnO thin films on glass substrate were deposited by on RF mangetron reaction sputter with various grgon/oxygen gas ratios and sbustrate temperatures. Crystallinities, surface morphologies, chemical compositions, and electrical properties of the films were investigated by XRD, AFM, XPS, RBS, and electrometer(keithley 617). All films showed a strong perferred orientation along the x-axis on glass substrate, and the chemical stoichiometry of Zn/)=1/1.0 was obtained at Ar/$O_2$ =50/50. Surface roughness and resistivity depended on the argon/oxygen gas ratio. The minimum surface roughness of 20$\AA$ and maximum resistivity of $10^8$ $\Omega$ cm were achieved at Ar/$O_2$=10/90.

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시안화 황동도금욕을 사용한 黃銅電着層의 현미경조직 (Microstructure of brass electrodeposits in cyanide solution)

  • 예길촌;김종관
    • 한국표면공학회지
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    • 제17권4호
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    • pp.106-119
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    • 1984
  • Brass was electrodeposited over the range of the current densities from 2 to 8 A/$dm^2$ in cyanide bath at 20 and 40$^{\circ}C$. The cathode overpotential increased and the cathode efficiency was decreased respectively with decreasing temperature, increasing current density and addition of organic substance. The perferred orientation of the deposits were associated with the cathode overpotential and the nucleation energy of lattice planes. The (111) preferred orientation developed at the low current density and low cathode overpotential (440-520mV). On the other hand, the (111)+(100) preferred orientation developed at higher cathode overpotential (528-680mV). The (111)+(100) preferred orientation developed over the whole range of overpotential in the cyanide solution with organic additive. The copper content of deposit decreased with increasing current density and decreasing temperature. The morphology of the deposits with no additive was the polygonal body type of structure and the structure of the cross section was columnar structure. The morphology of the deposits with additive, on the other hand, was fine crystallite type of structure. And the structure of the cross section of them was the finer granular structure.

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Strip-cast 조건이 Nd-Fe-B 합금의 미세조직 형성에 미치는 영향 (Effect of Strip-cast Conditions on the Formation of Microstructures in Nd-Fe-B alloys)

  • 이대훈;장태석;김동환;김승호
    • 한국자기학회지
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    • 제12권1호
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    • pp.34-40
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    • 2002
  • 고에너지 Nd-Fe-B 소결자석 제조용 strip-cast 합금의 미세조직 개선을 위하여, Nd-Fe-B 합금을 다양한 조건하에서 strip casting법으로 제조한 후, 제조 조건이 상 형성, 상 분포 및 조직 형성에 미치는 영향을 조사하였다. 냉각속도 즉, wheel speed가 5 m/s 이하일 때 고특성 소결자석 제조에 적합한 미세조직을 갖는 Strip 합금들을 제조할 수 있었으며, 이때의 한계 조성은 Nd$_{14}$Fe$_{79}$B$_{7}$ 정도로 추정되었다. 또한 조성에 상관없이 5 m/s 이하에서는 strip 표면에 수직한 방향으로 <001> preferred orientation이 발생하였는데, 이것은 궁극적으로 합금의 분쇄.성형시 결정립 배향도 향상에 유리하게 작용할 것으로 보인다. 한편 냉각속도가 증가할수록 Nd$_2$Fe$_{14}$B 결정립의 미세화로 인하여 보자력이 증가하였으나, Nd 함량이 감소할 경우 $\alpha$-Fe 정출의 증가로 인하여 보자력이 감소하였다.

Ru/$RuO_2$ 하부전극에 성장한 PZT 박막의 전기적 특성 연구 (Electrodic properties of PZT thin films growed on Ru/$RuO_2$ bottom eletrode)

  • 최장현;강현일;김응권;박영;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.58-62
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    • 2002
  • Pb($Zr_{0.52}Ti_{0.48}$)$O_3$ (PZT) thin films deposited on the Pt/Ti and Ru/$RuO_2$ bottom electrode by rf magnetron sputtering methode. Ru/$RuO_2$ bottom electrode deposited on the p-type wafer as Ru thickness by in-situ process. Our results show that all PZT films indicated perovskite polycrystalline structure with perferred orientation (110) and no pyrochlore phase is observed. A well-fabricated $RuO_2$/PZT/Ru(100nm)/$RUO_2$ capacitor showed a leakage current density in the order of $2.13{\times}10^{-7}A/cm^2$ as 100 kV/cm, a remanent polarization of 7.20 ${\mu}C/cm^2$, and a coercive field of 58.37 kV/cm. The results show that the new Ru/$RuO_2$ bottom electrodes are expected to reduce the degradation ferroelectric fatigue and excellent ferroelectric properties.

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