• 제목/요약/키워드: opto-electrical property

검색결과 15건 처리시간 0.041초

탄소나노튜브 기반 투명전도성 필름 및 이의 응용 (Carbon Nanotube (CNT) based Transparent Conductive Films for Display Applications)

  • 이건웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.77-77
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    • 2007
  • The development of next generation displays such as flexible display is a major challenge. Most materials and processes in current flat panel display industry cannot be transferred to flexible substrates. Typically, indium tin oxide (ITO) thin films are brittle and need to be deposited at high temperature to achieve an optimal opto-electrical property, therefore ITO films cannot be used as a flexible electrode. Up to date, many alternative materials to ITO have been proposed such as conductive polymers, nanometals, solution deposited transparent conductive oxide(TCO) and carbon nanotubes(CNTs). CNT based transparent conductive films are fabricated on glass and polymer substrates. CNT thin films exhibit a sheet resistance ($R_s$) of nearby $10^3\;{\Omega}/sq$ with a transmittance of around 80% on the visible light range, which is attributed by excellent dispersion and interaction among CNTs, solvents and polymeric binders. This talk will present the current studies, opto-electrical properties, design criteria and its applications for CNT-based transparent conductive films.

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전자빔 조사에 따른 ZnO/Cu/ZnO 박막의 전기광학적 특성 및 전기자동차용 투명 발열체 특성 (Effect of Electron Beam Irradiation on the Opto-Electrical and Transparent Heater Property of ZnO/Cu/ZnO Thin Films for the Electric Vehicle Application)

  • 이연학;박민성;김대일
    • 한국재료학회지
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    • 제33권11호
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    • pp.497-501
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    • 2023
  • ZnO/Cu/ZnO (ZCZ) thin films were deposited at room temperature on a glass substrate using direct current (DC) and radio frequency (RF, 13.56 MHz) magnetron sputtering and then the effect of post-deposition electron irradiation on the structural, optical, electrical and transparent heater properties of the films were considered. ZCZ films that were electron beam irradiated at 500 eV showed an increase in the grain sizes of their ZnO(102) and (201) planes to 15.17 nm and 11.51 nm, respectively, from grain sizes of 13.50 nm and 10.60 nm observed in the as deposited films. In addition, the film's optical and electrical properties also depended on the electron irradiation energies. The highest opto-electrical performance was observed in films electron irradiated at 500 eV. In a heat radiation test, when a bias voltage of 18 V was applied to the film that had been electron irradiated at 500 eV, its steady state temperature was about 90.5 ℃. In a repetition test, it reached the steady state temperature within 60 s at all bias voltages.

Theoretical Study for the ITO/Si based High Contrast Grating Structure with Focusing Capability and its Fabrication

  • Kim, J.Y.;Yeon, K.H.;Kyhm, J.;Cho, W.J.;Kim, T.J.;Kim, Y.D.;Song, J.D.
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.250-253
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    • 2015
  • High contrast grating (HCG) is the structure made up of the sub-wavelength grating of high-index and the surrounding layer of low-index, which reveals high contrast between two materials. Its advantages include high reflectivity over a broad bandwidth, polarization and wavelength selectivity, optical high-Q resonator, and phase modulation. In this work, the HCG structure comprising of indium tin oxide (ITO) and Silicon (Si), for the surrounding layer and the grating layer respectively, was studied. Its theoretical model was established, and transmittance, phase and optical behavior were calculated by rigorous coupled-wave analysis and finite element method. Furthermore, the established structure was fabricated to validate its feasibility. The fabricated structure shows the focusing capability whose length is about $10{\mu}m$, and the feasibility of the structure was demonstrated. It is also meaningful that ITO layer can contribute to the fabrication of the HCG structure, leading to enable the structure to be electrical-driven.

PMN 계 유전체 적용 EL 소자의 광전특성 연구 (The Study of Opto-electric Properties in EL Device with PMN Dielectric Layer)

  • 금정훈;한다솔;안성일;이성의
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.776-780
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    • 2009
  • In this study, the opto-electric properties of EL devices with PMN dielectric layer with variation of firing tempereature were investigated. For the PMN dielectric layer process, the paste was prepared by optimization of quantitative mixing of PMN powder, $BaTiO_3$, Glass Frit, $\alpha$-Terpineol and ethyl cellulose. The EL device stack consists of Alumina substrate ($Al_2O_3$), metallic electrode (Au), insulating layer (manufactured PMN paste), phosphor layer (ELPP- 030, ELK) and transparent electrode (ITO), which is well structure as a thick film EL device. The phase transformation properties of PMN dielectric with various firing temperatures of $150^{\circ}C$ to $850^{\circ}C$ was characterized by XRD. Also the opto-electric properties of EL devices with different firing temperature were investigated by LCR meter and spectrometer. We found the best opto-electric property was obtained at the condition of $550^{\circ}C$ firing which is 3432.96 $cd/m^2$ at 1948.3 pF Capacitance, 40 kHz Frequency, 40% Duty, Vth+330 V voltage.

MLA(Micro Lens Array) 제작을 위한 광학 시뮬레이션 (The beam property simulation for the fabrication of a MLA(Micro Lens Array))

  • 오해관;서현우;김근영;위창현;송요탁;이기근;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1497_1498
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    • 2009
  • This paper presents the simulation of micro-lens arrays based on dry and wet etching technique. Code V (Optical Research Associates Ltd) simulation was performed to extract optimal design parameters of a Micro-Lens Array(MLA). Thickness of UV adhesive, wavelength of laser source, curvature, and shape of lens surface were chosen for the design parameters. The simulation results showed that focal length of a MLA decreased with the increase of UV adhesive thickness. And the focal length depended on shape of lens surface and length of laser source.

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Electrical and Optical Properties of P-type Amorphous Oxide Semiconductor Mg:$ZnCo_2O_4$ Thin-Film

  • Lee, Chil-Hyoung;Choi, Won-Kook;Lee, Jeon-Kook;Choi, Doo-Jin;Oh, Young-Jei
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.87-87
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    • 2011
  • Oxide semiconductors are attractive materials for thin-film electronics and optoelectronics due to compatibility with synthesis on large-area, glass and flexible substrate. However, development of thin-film electronics has been hampered by the limited number of semiconducting oxides that are p-type. We report on the effect of the oxygen partial pressure ratio in the gas mixture on the electrical and optical properties of spinel Mg:$ZnCo_2O_4$ thin films deposited at room temperature using RF sputtering, that exhibit p-type conduction. The thin-films are deposited at room temperature in a background of oxygen using a polycrystalline Mg:$ZnCo_2O_4$ ablation target. The p-type conduction is confirmed by positive Seebeck coefficient and positive Hall coefficient. The electrical resistivity and carrier concentration in on dependent Mg:$ZnCo_2O_4$ thin films were found to be dependent on the oxygen partial pressure ratio. As a result, it is revealed that the Mg:$ZnCo_2O_4$ thin-films were greatly influenced on the electrical and optical properties by the oxygen partial pressure condition. The visible region of the spectrum of 36~85%, and hole mobility of 1.1~3.7 $cm^2$/Vs, were obtained.

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유/무기 복합 박막을 이용한 유기발광 소자의 보호층에 관한 연구 (Study on the Hybrid Passivation layer of OLEDs using the Organic/Inorganic Thin Film)

  • 배성진;이주원;이영훈;강남수;김동영;황성우;김재경;주병권
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 학술대회 및 기술세미나 논문집 디스플레이 광소자
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    • pp.78-80
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    • 2006
  • The hybrid thin-film (HTF) passivation layer composed of the Ultra Violet (UV) curable acrylate layer and MS-31 (MgO:$SiO_2$=3:1wt%) layer was adopted in organic light emitting device (OLEO) to protect organic light emitting materials from penetrations of oxygen and water vapors. The results showed that the HTF layer possessed a very low WVTR value of lower than $0.007gm/m^{2+}day$ at $37.8^{\circ}C$ and 100% RH. This value was within the limited range of the sensitivity of WVTR measurements. And the lifetime of the HTF passivated device became almost three times longer than that of the bare device. The HTF on the OLEO was found to be very effective in protect what from the penetrations of oxygen and moisture.

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용액코팅된 탄소나노튜브 전극의 광전기적 성질 (Opto-electrical properties of solution based carbon nanotube electrode)

  • 우종석;김선영;한중탁;이건웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.394-394
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    • 2007
  • Transparent conductive films can serve as a critical component in displays, solar cells, lasers, optical communication devices, and solid state lighting. Carbon nanotube (CNT) based transparent conductive films are fabricated on glass and polymer substrates. CNTs typically exist in form of quasi-crystalline bundles or highly entangled bundles containing tens of individual nanotubes. To achieve full potential, CNTs must be dispersed in a solvent or other organic media. CNTs are acid treated with nitric acid then the stable dispersion of CNTs in polar solvent such as alcohols, DMF, etc. is achieved by sonication. The solubility of CNTs correlates well with the area ratio of the D and G bands from Raman spectrum. Thin films are formed from well dispersed CNT solutions using spray coating method. CNT thin films exhibit a sheet resistance ($R_s$) of nearby $10^3\;{\Omega}/sq$ with a transmittance of around 80% on the visible light range, which is attributed by excellent dispersion and interaction among CNTs, solvents and polymeric binders.

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기판바이어스와 수소열처리에 의한 AZO 투명전도막의 전기적 특성 (Electrical properties of AZO transparent conductive oxide with substrate bias and $H_2$ annealing)

  • 정윤환;안정근;최대섭;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.331-331
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    • 2008
  • Transparent conductive oxide (TCO) are necessary as front electrode or anti-reflecting coating for increasing efficiency of LED and Photodiode. In this paper, aluminum-doped Zinc oxide films(AZO) were prepared by RF magnetron sputtering on Si substrate at room temperature with application of substrate bias from -60 to 60 V. Then annealed at temperature of 200, 300 and $400^{\circ}C$ for 1hr in $H_2$ ambient. Structural and electrical property of AZO thin films were investigated.

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Ni 층간박막에 따른 SnO2 박막의 전기적, 광학적 물성 변화 (Influence of Ni Interlayer on the Electrical and Optical Properties of SnO2 thin films)

  • 송영환;엄태영;김대일
    • 열처리공학회지
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    • 제29권5호
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    • pp.216-219
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    • 2016
  • $SnO_2$ single layer films (100 nm thick) and 2 nm thick Ni intermediated $SnO_2$ films were deposited on glass substrate by RF and DC magnetron sputtering without intentional substrate heating and then the influence of the Ni interlayer on the electrical and optical properties of the films were investigated. As deposited $SnO_2$ single layer films show the optical transmittance of 82.6% in the visible wavelength region and a resistivity of $6.6{ \times}10^{-3}{\Omega}cm$, while $SnO_2/Ni/SnO_2$ trilayer films show a lower resistivity of $2.7{ \times}10^{-3}{\Omega}cm$ and an optical transmittance of 76.3% in this study. Based on the figure of merit, it can be concluded that the intermediate Ni thin film effectively enhances the opto-electrical performance of $SnO_2$ films for use as transparent conducting oxides in flexible display applications.