• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.4
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• pp.367-372
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• 2002

The vertically well-aligned carbon nanotubes(CNTs) were successfully grown on Ni coated silicon wafer substrate by DC bias-assisted PECVD(Plasma Enhanced Chemical Vapor Deposition). As a catalyst, Ni thin film of thickness ranging from 15~30nm was prepared by electron beam evaporator method. In order to find the optimum growth condition, the type of gas mixture such as $C_2H_2-NH_3$ was systematically investigated by adjusting the gas mixing ratio at $570^{\circ}C$ under 0.4Torr. The diameter of the grown CNTs was 40~200nm and the diameter of the CNTs increased with increasing the Ni particles size. TEM images clearly showed carbon nanotubes to be multiwalled. The measured turn-on field was $3.9V/\mu\textrm{m}$ and an emission current of $1.4{\times}10^4A/\textrm{cm}^2$ was $7V/\mu\textrm{m}$. The CNTs grown by bias-assisted PECVD was able to demonstrate high quality in terms of vertical alignment, crystallization of graphite and the processing technique at low temperature of $570^{\circ}C$ and this can be applied for the emitter tip of FEDs.

• Proceedings of the Membrane Society of Korea Conference
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• 1998.10a
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• pp.63-65
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• 1998

1. Introduction : Atmospheric discharge of VOC-contaminated streams in chemical plants and air streams from chemical processes poses a serious environmental problem and entails large financial losses. Such emissions may be reduced by i) adsorption process, ii) absorption process and iii) incineration process. These processes only forbids the air pollutions. Throughout the recent decade, another technique-membrane process has emerged. The separation and recovery of organic vapors by membrane process may have great economic potential. Most of the published research works on the separation of organic vapors from air were performed using silicon rubber membranes. However, it is very difficult to fabricate very thin membranes with less than 1 $u m thickness. Plasma polymerization could be a good technique to generate a thin polymer film. The objective of this work is to find out the optimum condition of plasma polymerization for producing VOC separation membrane. For the objective, composite membranes are prepared through plasma polymerization of hexamethyldisiloxane onto porous substrates under different conditions. The membrane is then subjected to the permeation of permanent gases and VOCs to find the correlations between the physical properties of the penetrant and permeability and selectivity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.939-942
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• 2004

Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors were Prepared by using the capacitively coupled RF magnetron sputtering method. In this paper the effect of RF discharge power on the electrical, optical and structural properties were investigated experimentally. The results show that the structural and electrical properties of the film are highly affected by the variation of RF discharge power. The optimum growth conditions were obtained for films doped with 2 wt% of $Al_2O_3$ and 200 W in RF discharge power, which exhibit a resistivity of $10.4{\times}10^{-4}{\Omega}-cm$ associated with a transmittance of 89.66 % for 1000nm in films thickness in the wavelength range of the visible spectrum.

• Korean Journal of Optics and Photonics
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• v.12 no.5
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• pp.394-400
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• 2001

We studied thermal diffusion properties diffusion properties of multi-layered Ge-Sb-Te alloy thin films for optical recording media by solving the thermal equation. Based on the numerical analysis of optical energy distribution and absorption inside multi-layered films including temperature gradient and heat transfer simultaneously, we proposed the optimum parameters of the input laser power and the multi-layer structure as follow. i) Input laser power is 18 mW, ii) laser exposure time is 60 ns, iii) the thicknesses of the lower and the upper ZnS-SiO$_2$are 140 nm and 20~30 nm respectively, and iv) thickness of Ge-Sb-Te recording film is 20 nm.

• Journal of the Korean Society of Food Culture
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• v.7 no.4
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• pp.297-301
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• 1992

To investigate effects of the surface finishing methods (A : conventional press stone, B : enclosing in polyethylene (PE) bag, C : press-tone wrapped with PE film and D : covered with Chinese cabbage leaves 4cm in thickness on Kimchi) on Kimchi quality, pH-values, redness, film forming yeast growth, hardness and sensory quality of Kimchi during storage (for 60 days, at $10{\pm}5^{\circ}C$) in glass vessel $(11{\times}30cm)$ were investigated. pH of the top layer of A, C and D sample were higher than the optimum pH (4.2) of Kimchi, film forming yeast occurred on the surface of Kimchi, color of top layer Kimchi juice was darkened, and panel score of freshness and firmness was significantly worse (p<0.01) than that of sample B. However, in the case of Kimchi stored in PE bag (B), film forming yeast were can't detected visually in the surface of Kimchi, pH values were low as good quality Kimchi, freshness and firmness panel scores and hardness were significantly better (p<0.01) than A, C and D, and redness of juice of top layer of B was also preserved clearly for 60 days. Accordingly among the four surface finishing methods, the B-method was most effective in preserving of y of Kimchi.

• Korean Chemical Engineering Research
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• v.57 no.4
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• pp.525-530
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• 2019

The performance and stability of solid oxide fuel cells (SOFCs) depend on the microstructure of the electrode and electrolyte. In anode, porosity and pore distribution affect the active site and fuel gas transfer. In an electrolyte, density and thickness determine the ohmic resistance. To optimizing these conditions, using costly method cannot be a suitable research plan for aiming at commercialization. To solve these drawbacks, we made high performance unit cells with low cost and highly efficient ceramic processes. We selected the NiO-YSZ cermet that is a commercial anode material and used facile methods like die pressing and dip coating process. The porosity of anode was controlled by the amount of carbon black (CB) pore former from 10 wt% to 20 wt% and final sintering temperature from $1350^{\circ}C$ to $1450^{\circ}C$. To achieve a dense thin film electrolyte, the thickness and microstructure of electrolyte were controlled by changing the YSZ loading (vol%) of the slurry from 1 vol% to 5 vol. From results, we achieved the 40% porosity that is well known as an optimum value in Ni-YSZ anode, by adding 15wt% of CB and sintering at $1350^{\circ}C$. YSZ electrolyte thickness was controllable from $2{\mu}m$ to $28{\mu}m$ and dense microstructure is formed at 3vol% of YSZ loading via dip coating process. Finally, a unit cell composed of Ni-YSZ anode with 40% porosity, YSZ electrolyte with a $22{\mu}m$ thickness and LSM-YSZ cathode had a maximum power density of $1.426Wcm^{-2}$ at $800^{\circ}C$.

• Journal of Radiation Protection and Research
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• v.34 no.1
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• pp.25-30
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• 2009

Micro-columnar CsI(Tl) is the most popular scintillator material which is used for many indirect digital X-ray imaging detectors. The light scattering at the surface of micro-columnar CsI(Tl) scintillator was studied to find the correlation between the surface roughness and the resultant image resolution of indirect X-ray imaging detectors. Using a commercially available optical simulation program, Light Tools, MTF (Modulation Transfer Function) curves of the CsI(Tl) film thermally evaporated on glass substrate with different thickness were calculated and compared with the experimental estimation of MTF values by the edge X-ray image method and CCD camera. It was found that the standard deviation value of Gaussian scattering model which is determined by the surface roughness of micro-columns could certainly change the MTF value of image sensors. This model and calculation methodology will be beneficial to estimate the overall performance of indirect X-ray imaging system with CsI(Tl) scintillator film for optimum design depending on its application.

• Korean Journal of Materials Research
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• v.8 no.3
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• pp.195-199
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• 1998

Magnetic and Magneto-Optical properties of Co-based MnSbPt thin films prepared by R.F Sputtering were investigated. In this study, the optimum heat treatment condition was found to be $300^{\circ}C$-4hours under a $5\times10^{-6}$ Torr, but perpendicularly magnetized thin films could not be obtained. Coercive force showed maximum value of about 5000e at $250\AA$ Co thickness but the value is not enough for practical use of the thin film. Heat treated Co-based MnSbPt thin film shows 0.78 degree of Kerr rotation angle for 700nm of incident wavelength.

• Journal of the Korean Vacuum Society
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• v.16 no.5
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• pp.311-321
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• 2007

We have researched the chemical defects of NiO ultrathin films grown on Ag(001) by x-ray photoelectron spectroscopy. In particular, O 1s and Ni 2p spectra were analyzed consistently with control film thickness, $O_2\;and\;H_2O$ partial pressure and substrate temperature. As a result, we could identify each chemical defect. In addition, we suggest the optimum growth condition to minimize the defect density.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.389-389
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• 2012

Molybdenum is one of the most important materials used as a back ohmic contact for $Cu(In,Ga)(Se,S)_2$ (CIGS) solar cells because it has good electrical properties as an inert and mechanically durable substrate during the absorber film growth. Sputter deposition is the common deposition process for Mo thin films. Molybdenum thin films were deposited on soda lime glass (SLG) substrates using direct-current planar magnetron sputtering technique. The outdiffusion of Na from the SLG through the Mo film to the CIGS based solar cell, also plays an important role in enhancing the device electrical properties and its performance. The structure, surface morphology and electrical characteristics of Mo thin films are generally dependent on deposition parameters such as DC power, pressure, distance between target and substrate, and deposition temperature. The aim of the present study is to show the resistivity of Mo layers, their crystallinity and morphologies, which are influenced by the substrate temperature. The thickness of Mo films is measured by Tencor-P1 profiler. The crystal structures are analyzed using X-ray diffraction (XRD: X'Pert MPD PRO / Philips). The resistivity of Mo thin films was measured by Hall effect measurement system (HMS-3000/0.55T). The surface morphology and grain shape of the films were examined by field emission scanning electron microscopy (FESEM: Hitachi S-4300). The chemical composition of the films was obtained by the energy dispersive X-ray spectroscopy (EDX). Finally the optimum substrate temperature as well as deposition conditions for Mo thin films will be developed.