• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.375-375
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• 2010

CdTe as an absorber material is widely used in thin film solar cells with the heterostructure due to its almost ideal band gap energy of 1.45 eV, high photovoltaic conversion efficiency, low cost and stable performance. The deposition methods and preparation conditions for the fabrication of CdTe are very important for the achievement of high solar cell conversion efficiency. There are some rearranged reports about the deposition methods available for the preparation of CdTe thin films such as close spaced sublimation (CSS), physical vapor deposition (PVD), vacuum evaporation, vapor transport deposition (VTD), closed space vapor transport, electrodeposition, screen printing, spray pyrolysis, metalorganic chemical vapor deposition (MOCVD), and RF sputtering. The RF sputtering method for the preparation of CdTe thin films has important advantages in that the thin films can be prepared at low growth temperatures with large-area deposition suitable for mass-production. The authors reported that the optical and electrical properties of CdTe thin film were closely connected by the thickness-uniformity of the film in the previous study [1], which means that the better optical absorbance and the higher carrier concentration could be obtained in the better condition of thickness-uniformity for CdTe thin film. The thickness-uniformity could be controlled and improved by the some process parameters such as vacuum level and RF power in the sputtering process of CdTe thin films. However, there is a limitation to improve the thickness-uniformity only in the preparation process [1]. So it is necessary to introduce the external or additional method for improving the thickness-uniformity of CdTe thin film because the cell size of thin film solar cell will be enlarged. Therefore, the authors firstly applied the chemical mechanical polishing (CMP) process to improving the thickness-uniformity of CdTe thin films with a G&P POLI-450 CMP polisher [2]. CMP process is the most important process in semiconductor manufacturing processes in order to planarize the surface of the wafer even over 300 mm and to form the copper interconnects with damascene process. Some important CMP characteristics for CdTe were obtained including removal rate (RR), WIWNU%, RMS roughness, and peak-to-valley roughness [2]. With these important results, the CMP process for CdTe thin films was performed to improve the thickness-uniformity of the sputtering-deposited CdTe thin film which had the worst two thickness-uniformities of them. Some optical properties including optical transmittance and absorbance of the CdTe thin films were measured by using a UV-Visible spectrophotometer (Varian Techtron, Cary500scan) in the range of 400 - 800 nm. After CMP process, the thickness-uniformities became better than that of the best condition in the previous sputtering process of CdTe thin films. Consequently, the optical properties were directly affected by the thickness-uniformity of CdTe thin film. The absorbance of CdTe thin films was improved although the thickness of CdTe thin film was not changed.

• 한국광학회:학술대회논문집
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• 한국광학회 2000년도 하계학술발표회
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• pp.162-163
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• 2000

We have observed the short-channel effect, narrow-channel effect and small-geometry effect in terms of a variation of the threshold voltage. For a short-channel effect the threshold voltage was largely determined by the DIBL effect which stimulates more carrier injection in the channel by reducing the potential barrier between the source and channel. The effect becomes more significant for a shorter-channel device. However, the potential, field and current density distributions in the channel along the transverse direction showed a better uniformity for shorter-channel devices under the same voltage conditions. The uniformity of the current density distribution near the drain on the potential minimum point becomes worse with increasing the drain voltage due to the enhanced DIBL effect. This means that considerations for channel-width effect should be given due to the variation of the channel distributions for short-channel devices. For CCDs which are always operated at a pinch-off state the channel uniformity thus becomes significant since they often use a device structure with a channel length of > 4 ${\mu}{\textrm}{m}$ and a very high drain (or diffusion) voltage. (omitted)

• JSTS:Journal of Semiconductor Technology and Science
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• 제1권2호
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• pp.132-139
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• 2001

We considered the uniformity of fabricated micromirror arrays by characterizing the fabrication process and calculating the appropriate driving voltages of micromirrors used as virtual photomask in maskless photolithography. The uniformity of the micromirror array in terms of driving voltage and optical characteristics is adversely affected by factors, such as the air gap between the bottom electrode and the mirror plate, the spring shape and the deformation of the mirror plate or torsion spring. The thickness deviation of the photoresist sacrificial layer, the misalignment between mirror plate and bottom electrode, the aluminum deposition condition used to produce the spring and the mirror plate, and initial mirror deflection were identified as key factors. Their importance lies in the fact that they are related to air gap deviations under the mirror plate, asymmetric driving voltages in left and right mirror directions, and the deformation of the Al sring or mirror plate after removal of the sacrificial layer. The plasma ashing conditions used for removing the sacrificial layer also contributed to the deformation of the mirror plate and spring. Driving voltages were calculated for the pixel operation of the micromirror array, and the non-uniform characteristics of fabricated micromirrors were taken into consideration to improve driving performance reliability.

• 한국산학기술학회:학술대회논문집
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• 한국산학기술학회 2010년도 추계학술발표논문집 1부
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• pp.159-162
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• 2010

There are some limitations to advance technology glaring and luminous Intensity uniformity known as the weak point of existing LED lamp. To improve the two weak points, there have been no special alternative methods so far. Instead, one method which is being used such as the twisting secondary lens or arbitrary structure to remove glaring and improve luminous Intensity uniformity. Based on this academic background, it is necessary to be examined on Technology of Optical System to solve the two weak points by using not complicated but simple methods. This paper will examine the angle of reflection in order to improve luminous intensity uniformity. Also, this research will present the method using lighting analysis program to verify a hypothesis. Through the analysis program, we could understand the simulation analysis method and got some problems about the analysis result. After analysis of causes through reinterpretation of problems, we have reached a conclusion that was changed according to reflectivity and the shape of aspherics by main cause which effected luminous Intensity uniformity and glaring.

• 한국광학회:학술대회논문집
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• 한국광학회 2009년도 창립 20주년기념 특별학술발표회
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• pp.101-102
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• 2009

• 한국광학회:학술대회논문집
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• 한국광학회 2009년도 창립 20주년기념 특별학술발표회
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• pp.251-252
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• 2009

• 대한원격탐사학회지
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• 제26권6호
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• pp.645-652
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• 2010

The performance of the payload Electro-Optical System (EOS) in satellite system is affected by various factors, such as optics design, camera electronics design, and the characteristics of the CCD (Charge Coupled Device) used, etc. Of these factors, the camera electronics design is somewhat unique in that its operational parameters can be adjusted even after the satellite launch. In this paper, the effect of video gain on the non-uniformity correction performance is addressed. And a new optimal non-uniformity correction scheme is proposed and analyzed using the data from real camera electronics unit based on a TDI (Time Delayed Integration) type of CCD. The test results show that the performance of the conventional non-uniformity correction scheme is affected significantly when the video gain is added. On the other hand, in our proposed scheme, the performance is not dependent on the video gain. The insensitivity of the non-uniformity performance on the video-gain is mainly due to the fact that the correction is performed after the dark signal is subtracted from system response.

• 한국광학회지
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• 제21권2호
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• pp.61-68
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• 2010

최근 LED TV로 각광받고 있는 대형 LCD TV용 LED(Light Emitting Diode, 고체발광다이오드) 백라이트에 사용되는 도광판의 광구조를 최적화하여 LED에 의해 발생하는 휘점을 제거하고 조도균일도를 향상시키기 위한 시뮬레이션 연구를 진행하였다. 시뮬레이션 모델로 설정된 엣지형 백라이트는 LCD TV용으로 사용될 수 있는 두께 3 mm의 도광판, 측면에 배치된 세 개의 백색 LED와 램프 커버, 도광판의 하면에 배치된 반사 필름으로 구성되어 있다. 일반적인 엣지형 백라이트용 도광판과 같이 도광판의 입광면에 패턴이 형성되어 있지 않은 경우에는 도광판 상면의 조도균일도가 입광면과 LED 사이의 거리에 민감하게 의존하였다. 입광면과 LED 사이의 거리가 커질수록 조도균일도는 개선되다가 일정 거리 이상이 되면 개선이 둔화되는 경향성을 보였다. 반면에 도광판의 입광면에 렌티큘라(lenticular) 렌즈 배열이나 톱니모양(Serration)과 같은 미세 굴절 패턴을 형성하는 경우 LED가 입광면에 거의 붙어 있는 경우에도 패턴이 없는 경우에 비해 우수한 조도균일도를 보인다는 것을 알 수 있었고 조도균일도가 LED와 입광면 사이의 거리에 의존하는 정도가 줄어든다는 점도 확인하였다. 동일조건에서는 톱니모양 패턴이 렌티큘라 렌즈에 비해 우수한 조도균일도를 나타내었고 굴절률의 변화를 통해 추가적인 균일도 개선 효과를 얻을 수 있음도 확인하였다. 따라서 도광판의 입광면에 굴절 기능을 가지는 미세 패턴을 형성하고 그 광구조를 최적화하는 것은 LED에 의한 휘점 형성을 억제하고 LCD 측면의 비발광영역(베젤)을 줄이는데 있어서 매우 효과적인 방법이 될 수 있다는 것을 확인하였다.

• Current Optics and Photonics
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• 제3권5호
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• pp.401-407
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• 2019

Polymeric optical waveguide devices with Bragg gratings have been investigated, for implementing tunable lasers and wavelength filters used in wavelength-division-multiplexed optical communication systems. Owing to the excellent thermo-optic effect of these polymers, wavelength tuning is possible over a wide range, which is difficult to achieve using other optical materials. In this study the phase-mask technology, which has advantages over the conventional interferometeric method, was introduced to facilitate the fabrication of Bragg gratings in polymeric optical waveguide devices. An optical setup capable of fabricating multiple Bragg gratings simultaneously on a 4-inch silicon wafer was constructed, using a 442-nm laser and phase mask. During fabrication, some of the diffracted light in the phase mask was totally reflected inside the mask, which affected the quality of the Bragg grating adversely, so experiments were conducted to solve this issue. To verify grating uniformity, two types of wavelength-filtering devices were fabricated using the phase-mask lithography, and their reflection and transmission spectra were measured. From the results, we confirmed that the phase-mask method provides good uniformity, and may be applied for mass production of polymer Bragg-grating waveguide devices.

• Journal of the Optical Society of Korea
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• 제19권2호
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• pp.159-164
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• 2015

In the injection-molded light guide plate the replication quality, i.e. the reproduction accuracy, of micro-patterns should be high and uniform over the entire surface area. However technical difficulty in meeting the necessary replication quality arises as the plate size becomes large for TV applications. We propose a simulation technique to optimize the distribution of micro-patterns on a 55-inch injection molded light guide plate considering non-ideal replication quality of micro-patterns. The luminance uniformity could be improved by more than 16% by optimizing the pattern distribution in spite of the same replication quality.