• Title/Summary/Keyword: optical and electrical characteristics

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ZnO nanostructures for e-paper and field emission display applications

  • Sun, X.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.993-994
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    • 2008
  • Electrochromic (EC) devices are capable of reversibly changing their optical properties upon charge injection and extraction induced by the external voltage. The characteristics of the EC device, such as low power consumption, high coloration efficiency, and memory effects under open circuit status, make them suitable for use in a variety of applications including smart windows and electronic papers. Coloration due to reduction or oxidation of redox chromophores can be used for EC devices (e-paper), but the switching time is slow (second level). Recently, with increasing demand for the low cost, lightweight flat panel display with paper-like readability (electronic paper), an EC display technology based on dye-modified $TiO_2$ nanoparticle electrode was developed. A well known organic dye molecule, viologen, was adsorbed on the surface of a mesoporous $TiO_2$ nanoparticle film to form the EC electrode. On the other hand, ZnO is a wide bandgap II-VI semiconductor which has been applied in many fields such as UV lasers, field effect transistors and transparent conductors. The bandgap of the bulk ZnO is about 3.37 eV, which is close to that of the $TiO_2$ (3.4 eV). As a traditional transparent conductor, ZnO has excellent electron transport properties, even in ZnO nanoparticle films. In the past few years, one-dimension (1D) nanostructures of ZnO have attracted extensive research interest. In particular, 1D ZnO nanowires renders much better electron transportation capability by providing a direct conduction path for electron transport and greatly reducing the number of grain boundaries. These unique advantages make ZnO nanowires a promising matrix electrode for EC dye molecule loading. ZnO nanowires grow vertically from the substrate and form a dense array (Fig. 1). The ZnO nanowires show regular hexagonal cross section and the average diameter of the ZnO nanowires is about 100 nm. The cross-section image of the ZnO nanowires array (Fig. 1) indicates that the length of the ZnO nanowires is about $6\;{\mu}m$. From one on/off cycle of the ZnO EC cell (Fig. 2). We can see that, the switching time of a ZnO nanowire electrode EC cell with an active area of $1\;{\times}\;1\;cm^2$ is 170 ms and 142 ms for coloration and bleaching, respectively. The coloration and bleaching time is faster compared to the $TiO_2$ mesoporous EC devices with both coloration and bleaching time of about 250 ms for a device with an active area of $2.5\;cm^2$. With further optimization, it is possible that the response time can reach ten(s) of millisecond, i.e. capable of displaying video. Fig. 3 shows a prototype with two different transmittance states. It can be seen that good contrast was obtained. The retention was at least a few hours for these prototypes. Being an oxide, ZnO is oxidation resistant, i.e. it is more durable for field emission cathode. ZnO nanotetropods were also applied to realize the first prototype triode field emission device, making use of scattered surface-conduction electrons for field emission (Fig. 4). The device has a high efficiency (field emitted electron to total electron ratio) of about 60%. With this high efficiency, we were able to fabricate some prototype displays (Fig. 5 showing some alphanumerical symbols). ZnO tetrapods have four legs, which guarantees that there is one leg always pointing upward, even using screen printing method to fabricate the cathode.

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Influence of the Amount of Conductive Paste on the Electrical Characteristics of c-Si Photovoltaic Module (전도성 페이스트 도포량 변화에 따른 결정질 태양광 모듈의 전기적 특성에 대한 영향성 분석)

  • Kim, Yong Sung;Lim, Jong Rok;Shin, Woo Gyun;Ko, Suk-Whan;Ju, Young-Chul;Hwang, Hye Mi;Chang, Hyo Sik;Kang, Gi-Hwan
    • Korean Journal of Materials Research
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    • v.29 no.11
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    • pp.720-726
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    • 2019
  • Recently, research on cost reduction and efficiency improvement of crystalline silicon(c-Si) photovoltaic(PV) module has been conducted. In order to reduce costs, the thickness of solar cell wafers is becoming thinner. If the thickness of the wafer is reduced, cracking of wafer may occur in high temperature processes during the c-Si PV module manufacturing process. To solve this problem, a low temperature process has been proposed. Conductive paste(CP) is used for low temperature processing; it contains Sn57.6Bi0.4Ag component and can be electrically combined with solar cells and ribbons at a melting point of $150^{\circ}C$. Use of CP in the PV module manufacturing process can minimize cracks of solar cells. When CP is applied to solar cells, the output varies with the amount of CP, and so the optimum amount of CP must be found. In this paper, in order to find the optimal CP application amount, we manufactured several c-Si PV modules with different CP amounts. The amount control of CP is fixed at air pressure (500 kPa) and nozzle diameter 22G(outer diameter 0.72Ø, inner 0.42Ø) of dispenser; only speed is controlled. The c-Si PV module output is measured to analyze the difference according to the amount of CP and analyzed by optical microscope and Alpha-step. As the result, the optimum amount of CP is 0.452 ~ 0.544 g on solar cells.

Ridge Formation by Dry-Etching of Pd and AlGaN/GaN Superlattice for the Fabrication of GaN Blue Laser Diodes

  • Kim, Jae-Gwan;Lee, Dong-Min;Park, Min-Ju;Hwang, Seong-Ju;Lee, Seong-Nam;Gwak, Jun-Seop;Lee, Ji-Myeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.391-392
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    • 2012
  • In these days, the desire for the precise and tiny displays in mobile application has been increased strongly. Currently, laser displays ranging from large-size laser TV to mobile projectors, are commercially available or due to appear on the market [1]. In order to achieve a mobile projectors, the semiconductor laser diodes should be used as a laser source due to their size and weight. In this presentation, the continuous etch characteristics of Pd and AlGaN/GaN superlattice for the fabrication of blue laser diodes were investigated by using inductively coupled $CHF_3$ and $Cl_2$ -based plasma. The GaN laser diode samples were grown on the sapphire (0001) substrate using a metal organic chemical vapor deposition system. A Si-doped GaN layer was grown on the substrate, followed by growth of LD structures, including the active layers of InGaN/GaN quantum well and barriers layer, as shown in other literature [2], and the palladium was used as a p-type ohmic contact metal. The etch rate of AlGaN/GaN superlattice (2.5/2.5 nm for 100 periods) and n-GaN by using $Cl_2$ (90%)/Ar (10%) and $Cl_2$ (50%)/$CHF_3$ (50%) plasma chemistry, respectively. While when the $Cl_2$/Ar plasma were used, the etch rate of AlGaN/GaN superlattice shows a similar etch rate as that of n-GaN, the $Cl_2/CHF_3$ plasma shows decreased etch rate, compared with that of $Cl_2$/Ar plasma, especially for AlGaN/GaN superlattice. Furthermore, it was also found that the Pd which is deposited on top of the superlattice couldn't be etched with $Cl_2$/Ar plasma. It was indicating that the etching step should be separated into 2 steps for the Pd etching and the superlattice etching, respectively. The etched surface of stacked Pd/superlattice as a result of 2-step etching process including Pd etching ($Cl_2/CHF_3$) and SLs ($Cl_2$/Ar) etching, respectively. EDX results shows that the etched surface is a GaN waveguide free from the Al, indicating the SLs were fully removed by etching. Furthermore, the optical and electrical properties will be also investigated in this presentation. In summary, Pd/AlGaN/GaN SLs were successfully etched exploiting noble 2-step etching processes.

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Application of Pulse Current Electrolysis to the Large Scale of Copper and Aluminium Substrates for Solar Selective Coatings on Solar Collectors (실 규모 태양열 집열판 제작을 위한 구리 및 알루미늄 기판에의 태양광 선택흡수박막 전착;Pulse Current Electrolysis 적용)

  • 이태규;김동형;김형택;여운택
    • Journal of Energy Engineering
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    • v.5 no.2
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    • pp.108-114
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    • 1996
  • It is one of the most important factors to enhance the efficiency of the solar collectors by in-creasing collecting efficiency and decreasing heat loss. The pulse electrodeposition method has been involved in this study to improve characteristics of the solar selective coating on 230cm${\times}$60cm substrates and electrical efficiency of the process. The composition of the electrolyte was 280 g/$\ell$ chromic acid, 15 g/$\ell$ propionic acid, and 10 g/$\ell$ appropriate additive. 230cm${\times}$60cm copper and aluminium sheets were utilized as the substrates. It has been observed that the black chrome coatings exhibited reasonable optical properties for commercialization when the plating parameters were properly controlled; the absorptance was 0.98 and 0.97 and omittance was 0.17 and 0.23 for copper and aluminium substrate, respectively. This study implies that the pulse current electrolysis method could be applied to the large scale substrates, and the various products can be avilable after the consideration of the thermal conductivity, heat transfer efficiency and cost problems of the substrates.

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Effect of O2 Concentration and Annealing Temperature on the Characteristics of Indium Zinc Oxide Thin Films (Indium Zinc Oxide 박막 특성에 대한 O2 농도와 열처리 온도의 영향)

  • Cho, Han Na;Li, Yue Long;Min, Su Ryun;Chung, Chee Won
    • Applied Chemistry for Engineering
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    • v.17 no.6
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    • pp.644-647
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    • 2006
  • The indium zinc oxide (IZO) thin films were deposited using a radio frequency reactive magnetron sputtering method. Among the various processing variables, $O_{2}$ concentration and annealing temperature after deposition were selected and the optical, electrical, and structural properties of IZO thin films were investigated. As the $O_{2}$ concentration increased, the deposition rate of IZO thin films decreased, the resistivity increased and the transmittance slightly increased. According to atomic force microscopy analysis, the IZO films deposited at pure Ar showed rough surface and those deposited with $O_{2}$ addition exhibited relatively smooth surface. The IZO thin films deposited at pure Ar were annealed at 250, 350, and $450^{\circ}C$, respectively. The IZO thin film deposited at pure Ar showed the lowest transmittance and resistivity and resistivity greatly increased at the annealing temperature exceeding $250^{\circ}C$. The higher annealing temperature IZO films were annealed at, the smoother surface the films showed. The x-ray diffraction revealed that IZO films annealed at higher temperature had better crystalline structures.

Fabrication of a Schottky Type Ultraviolet Photodetector Using GaN Layer (GaN를 이용한 Schottky diode형 자외선 수광소자의 제작)

  • Seong, Ik-Joong;Lee, Suk-Hun;Lee, Chae-Hyang;Lee, Yong-Hyun;Lee, Jung-Hee;Hahm, Sung-Ho
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.6
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    • pp.28-34
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    • 1999
  • We fabricated a planar ultra-violet photodetector whose ohmic and schottky contacts were respectively formed with evaporated Al and Pt on the GaN layer. To examine the applicability of the device to the UV sensor, we investigated its electrical and optical characteristics. The GaN layer on the sapphire waver had $7.8{\times}10^{16}cm^{-3}$ of doping concentnation and the $138 cm^2/V{\cdot}s$ of electron mobility and it absorbed the spectrum of the light below 325 nm wavelength. It had the responsivity of 2.8 A/W of at 325 nm, and the signal to noise ratio(SNR) of $4{\times}10^4$, and the noise equivalent power(NEP) of $3.5{\times}10^9$W under 5 V reverse bias. These results confirmed that the GaN schottky diode had a solar blind properly when it was applied to the UV photodetector.

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Characteristics of transparent dielectric in PbO-B$_2$O$_3$-${SiO_2}-{Al_2}{O_3}$ system and investigation of reaction between dielectric and electrode(ITO) (투명 유전체 PbO-B$_2$O$_3$-${SiO_2}-{Al_2}{O_3}$의 물성 및 전극(ITO)과의 반응성 연구)

  • Lee, Jae-Yeol;Hong, Gyeong-Jun;Kim, Deok-Nam;Kim, Hyeong-Sun;Heo, Jeung-Su
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.305-311
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    • 2001
  • $PbO-B_2O_3-SiO_2-Al_2O_3$, system was investigated for optical, thermal and electrical properties of transparent dielectric. We also studied the reaction between transparent dielectric and transparent electrode(Indium Tin Oxide, ITO) during firing. For the evaluation of properties, dielectrics were prepared under the conditions fired at 520~58$0^{\circ}C$ with 12$\mu\textrm{m}$ thickness. In the reaction between dielectrics and electrode(ITO), In ions diffused into dielectric layer, while Sn ion diffusion was not observed. The coefficient of thermal expansion, the dielectric constant, the glass transition temperature and the transmittance of the dielectric were greatly dependent on PbO content. The increase of the coefficient of thermal expansion and the dielectric constant were monitored by increasing PbO, while the glass transition temperature and the transmittance were decreased. With the increased $Al_2O_3/B_2O_3$ ratio, the coefficient of thermal expansion and the transmittance were decreased, while the dielectric constant was increased. The glass transition temperature did not change significantly.

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Recent Progress of Ti3Ci2Tix MXene Electrode Based Self-Healing Application (Ti3Ci2Tix MXene 기반 전극 소재의 자가 치유 적용 기술 개발 동향)

  • Jun Sang Choi;Seung-Boo Jung;Jong-Woong Kim
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.3
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    • pp.20-34
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    • 2023
  • Single or multi-layered two-dimensional (2D) materials, with thicknesses in the order of a few nanometers, have garnered substantial attention across diverse research domains owing to their distinct properties, including electrical conductivity, flexibility, and optical transparency. These materials are frequently subjected to repetitive mechanical actions in applications like electronic skin (E-Skin) and smart textiles. Moreover, they are often exposed to external factors like temperature, humidity, and pressure, which can lead to a deterioration in component durability and lifespan. Consequently, significant research efforts are directed towards developing self-healing properties in these components. Notably, recent investigations have revealed promising outcomes in the field of self-healing composite materials, with Ti3Ci2Tix MXene being a prominent component among the myriad of available 2D materials. In this paper, we aim to introduce various synthesis methods and characteristics of Ti3Ci2Tix MXene, followed by an exploration of self-healing application technologies based on Ti3Ci2Tix MXene.

Characteristics of Sn-doped β-Ga2O3 single crystals grown by EFG method (EFG 법으로 성장한 β-Ga2O3 단결정의 Sn 도핑 특성 연구)

  • Tae-Wan Je;Su-Bin Park;Hui-Yeon Jang;Su-Min Choi;Mi-Seon Park;Yeon-Suk Jang;Won-Jae Lee;Yun-Gon Moon;Jin-Ki Kang;Yun-Ji Shin;Si-Yong Bae
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.33 no.2
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    • pp.83-90
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    • 2023
  • The β-Ga2O3 has the most thermodynamically stable phase, a wide band gap of 4.8~4.9 eV and a high dielectric breakdown voltage of 8MV/cm. Due to such excellent electrical characteristics, this material as a power device material has been attracted much attention. Furthermore, the β-Ga2O3 has easy liquid phase growth method unlike materials such as SiC and GaN. However, since the grown pure β-Ga2O3 single crystal requires the intentionally controlled doping due to a low conductivity to be applied to a power device, the research on doping in β-Ga2O3 single crystal is definitely important. In this study, various source powders of un-doped, Sn 0.05 mol%, Sn 0.1 mol%, Sn 1.5 mol%, Sn 2 mol%, Sn 3 mol%-doped Ga2O3 were prepared by adding different mole ratios of SnO2 powder to Ga2O3 powder, and β-Ga2O3 single crystals were grown by using an edge-defined Film-fed Growth (EFG) method. The crystal direction, crystal quality, optical, and electrical properties of the grown β-Ga2O3 single crystal were analyzed according to the Sn dopant content, and the property variation of β-Ga2O3 single crystal according to the Sn doping were extensively investigated.

Threshold Voltage Variation of ZnS:Mn/ZnS:Tb Thin- film Electroluminescent(TFEL) Devices (ZnS:Mn/ZnS:Tb 박막 전계발광소자의 문턱전압 변화)

  • 이순석;윤선진;임성규
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.6
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    • pp.21-27
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    • 1998
  • Electrical and optical characteristics of ZnS:Mn/ZnS:Tb multilayer TFEL devices were investigated for multi-color electroluminescent display applications. Emission spectra of M $n^{2+}$ and T $b^{3+}$ ions were observed from ZnS:Mn/ZnS:Tb multi-layer TFEL devices, and were very broad from 540 nm to 640 nm. Saturation luminance measured at 155 V was 1025 Cd/$m^2$. C-V, $Q_{t}$ - $V_{p}$ curves showed that the phosphor capacitance ( $C_{p}$ ) and the insulator capacitance ( $C_{i}$ ) were 13.5nF/$\textrm{cm}^2$ and 60 nF/$\textrm{cm}^2$, respectively. Threshold voltage( $V_{thl}$) was shown to decrease from 126 V to 93 V due to the increase of the applied voltage from 155 V to 185 V, which was attributed to the increase of the polarization charge. The equation for the calculation of the threshold voltage as a function of the applied voltage was proposed for the first time. The calculated threshold voltage agreed well with the data obtained from the measurement.t.t.t.

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