• 대한기계학회논문집
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• 제8권3호
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• pp.217-223
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• 1984

본 논문에서는 이온질화 처리강의 미끄름 마멸현상에 대하여 이론 및 실험적 으로 규명하고 종래의 질화법과 비교하였다. 또한 미끄럼 마멸을 나타내는 일반식 V/L=C*(P/H)를 이용하여 이온질화, 염욕질화 및 가스질화에서의 C 값을 구하였으며 여기에서 V는 마멸체적, L은 마멸길이, P는 마멸하중, H는 경도이며 C는 마멸상수이다.

• Journal of Advanced Marine Engineering and Technology
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• 제22권5호
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• pp.712-720
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• 1998

The effect of H2:N2 gas ratio on the case thickness hardness and nitrides formation in the sur-face of SCM440 machine structural steel have been studied by micro-pulse plasma process. The thickness of compound layer increased with the increase of nitrogen content in the gas com-position. The maximum thickness of compound layer the maximum case depth and the maximum surface hardness were about 15.8${\mu}m$, 400${\mu}m$ and Hv765 respectively in the nitriding condition of 250Pa and 70% nitrogen content at $520^{\circ}C$ for 7hrs. Generally only nitride phases such as ${\'{\gamma}}$($Fe_4N$)$\varepsilon(Fe_2}{_3N}$ phases were detected in compound and diffusion layer by XRD analysis. The amount of $\varepsilon(Fe_2}{_3N}$ phase increased with the increase of nitrogen content. The relative amounts and kind of phases formed in the nitrided case changed with the change of nitrogen content in the gas composition.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.291-292
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• 2015

Duplex Stainless Steel의 Plasma Nitriding 처리 시 가스량과 처리온도가 표면 특성에 미치는 영향을 조사하였다. $N_2$함량 및 처리 온도가 각각 10%에서 25%로 $400^{\circ}C$에서 $430^{\circ}C$로 증가함에 따라서 질소가 과고용된 S-phase의 두께 및 표면 경도가 증가하였으나, 내부 식성은 $Cr_2N$ 및 $(Fe,Cr)_4N$이 석출하여 감소하였다. 질소를 10%로 고정하고 $CH_4$함량을 증가시키면 1%일 때 S-phase의 두께가 최대가 되며 그이후로 감소하였다. 처리온도 $400^{\circ}C$일 때 질소함량이 10%, $CH_4$ 함량이 5%일 경우 내식성이 모재보다 증가하였다.

• 열처리공학회지
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• 제11권4호
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• pp.315-323
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• 1998

This study has been conducted to develope the combined heat treating technique of gas carburising - gas nitriding and gas carburising to improve the hot working performance of type H3 hot work tool steel. Case depth and carbrides coarsening were increased with increasing carburising temperature and time, respectively. Surface hardness showed decreasing tendency with increasing 2nd tempering temperature after carburising treatment. After carburising, 2nd treatment at 500 to 600 was chosen according to a hardness demand of final product. High temperature tempering resistance showed more excellent quality during such carburising-nitriding or carburising than complex treatment as after conventional hardening.

• 한국표면공학회지
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• 제24권4호
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• pp.215-221
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• 1991

Microstructure evolution during low temperature vapor deposition exhibits wel-developed columnar structure mainly owing to geometrical shadowing effect of surface roughness. It is concluded that this structure is concided with many theoretical models suggested so far. In case of aluminum nitride film deposition consisted of etching and nitriding step employing ECR plasma, the rougher the surface before etching, the finer and more cone-and-whisker structure can be developed. In turn, this fine structure affects the formation and growth of columnar as well as offers many sites available for mechanical lock-up. Conclusively, the formation of well-defined columnar structures depends on the initial surface roughness.

• 한국표면공학회지
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• 제37권1호
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• pp.53-57
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• 2004

Austenitic stainless steel AISI 304 was nitrided in a low-pressure RF plasma using pure nitrogen. With a treatment of time of 4.0h at $400^{\circ}C$, the nitrogen-rich layer on the sample was $3\mu\textrm{m}$thick and had a hardness of approximately 4.4 times higher than that of untreated material. XRD data showed that as the process temperature rose from 350∼$450^{\circ}C$, the expanded austenite peaks became more prominent while the austenite peaks became weaker. Expanded austenite was transformed to ferrite and CrN at the treatment of$ 500^{\circ}C$. Langmuir probe measurements showed that electron density decreased above $450^{\circ}C$.

• 한국표면공학회지
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• 제43권2호
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• pp.91-96
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• 2010

SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 춘계학술발표회 초록집
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• pp.136-138
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• 2007

최근 기계가공기술의 발달에 따라 내마모용 TiN 박막의 수요가 증가하였고, TiN박막은 내마모용으로 높은 경도 및 밀착력을 필요로 한다. TiN박막을 증착시키는 방법은 PVD, CVD 등 여러 가지가 있으나 본 연구에서 공구강 SKD 61기판 표면과 Radical Nitriding(RN) 처리된 SKD 61 기판에 arc ion plating(AIP)를 이용하여 TiN 박막을 증착시켜 표면경도를 향상시키고, 이 코팅층의 미세구조가 기계적 특성에 미치는 영향을 연구하였다. 그 결과 RN처리된 SKD61에서 코팅 두께가 많이 나왔고, 스크래치테스트 결과 접착력이 향상되었음을 알 수 있었다.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2001년도 춘계학술강연 및 발표대회
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• pp.36-36
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• 2001

• 열처리공학회지
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• 제23권1호
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• pp.34-42
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• 2010