• 제목/요약/키워드: nanofilms

검색결과 13건 처리시간 0.02초

Characterization of Thickness and Electrical Properties of Ni-Cr Thin Films via Terahertz Time-domain Spectroscopy

  • Sunghun Kim;Inhee Maeng;Hyeon Sang Bark;Jungsup Byun;Jae Hun, Na;Seho Kim;Myeong Suk Yim;Byung-Youl Cha;Youngbin Ji;Seung Jae Oh
    • Current Optics and Photonics
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    • 제7권5호
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    • pp.569-573
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    • 2023
  • We utilized terahertz time-domain spectroscopy (THz-TDS) to measure the thickness and electrical properties of nickel-chromium (Ni-Cr) films. This technique not only aligns well with traditional methods, such as haze-meter and transmission-densitometer measurements, but it also reveals the electrical properties and thickness of films down to a few tens of nanometers. The complex conductivity of the Ni-Cr thin films was extracted using the Tinkham formula. The experimental values closely aligned with the Drude model, indicating the reliability of our Ni-Cr film's electrical and optical constants. The thickness of Ni-Cr was estimated using the complex conductivity. These findings emphasize the potential of THz-TDS in quality control of metallic nanofilms, pointing toward an efficient and nondestructive test (NDT) for such analyses.

Hybrid PVD로 제조된 Ti-Me-N (Me=V, Si 및 Nb) 나노 박막의 미세구조와 마모특성 (Microstructure and Wear Resistance of Ti-Me-N (Me=V, Nb and Si) Nanofilms Prepared by Hybrid PVD)

  • 양영환;곽길호;이성민;김성원;김형태;김경자;임대순;오윤석
    • 한국표면공학회지
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    • 제44권3호
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    • pp.95-104
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    • 2011
  • Ti based nanocomposite films including V, Si and Nb (Ti-Me-N, Me=V, Si and Nb) were fabricated by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The pure Ti target was used for arc ion plating and other metal targets (V, Si and Nb) were used for sputtering process at a gas mixture of Ar/$N_2$ atmosphere. Mostly all of the films were grown with textured TiN (111) plane except the Si doped Ti-Si-N film which has strong (200) peak. The microhardness of each film was measured using the nanoindentation method. The minimum value of removal rate ($0.5{\times}10^{-15}\;m^2/N$) was found at Nb doped Ti-Nb-N film which was composed of Ti-N and Nb-N nanoparticles with small amount of amorphous phases.

다양한 투명 기판의 3-MPTMS 처리에 의한 은 나노 박막의 광 특성 변화 연구 (Fabrication and Optical Properties of (3-mercaptopropyl) Trimethoxysilane (MPTMS)-assisted Silver Nanofilm on Various Substrates)

  • 최현성;오승준;길도연;구태원;박영미
    • 한국광학회지
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    • 제34권6호
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    • pp.283-288
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    • 2023
  • 본 연구에서는 quartz, sapphire, slide glass와 같이 투명한 기판 위에 (3-mercaptopropyl) trimethoxysilane (MPTMS)를 처리하고 나노미터 두께로 은을 증착하여 형성된 은 나노 박막의 광학적, 전기적 특성을 탐구한다. 기판의 MPTMS 증착에 따라 각각 5, 7, 9, 13 nm 두께를 갖는 은 나노 박막의 표면 형태 변화를 전자현미경을 통해 확인하고, UV-visible 전자기파 영역의 투과 측정 실험을 통해 금속 나노 박막에서 나타나는 국소 표면 플라즈몬에 의한 흡수 효과가 줄어드는 것을 확인하였다. 이는 MPTMS에 의해 나노미터 두께의 금속 박막이 균일하게 형성된 것을 의미한다. 또한 MPTMS 증착 시간을 30분부터 77시간까지 조절함으로써 UV-visible 투과율과 전기전도도 변화를 측정하여 균일한 금속 나노 박막 형성을 위한 MPTMS의 증착 조건에 대해 탐구한다. 본 연구 결과는 투명 기판 위 균일한 금속 나노 박막 형성에 대한 연구 및 고성능 나노 박막 전극 개발 등과 같은 응용 분야에 도움이 될 것이다.