• 제목/요약/키워드: nano-thick films

검색결과 102건 처리시간 0.028초

Pt/LiCoO2/LiPON/Cu와 Pt/LiCoO2/LiPON/LiCoO2/Cu 구조를 갖는 Li-free 박막전지 (Li-free Thin-Film Batteries with Structural Configuration of Pt/LiCoO2/LiPON/Cu and Pt/LiCoO2/LiPON/LiCoO2/Cu)

  • 신민선;김태연;이성만
    • 한국표면공학회지
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    • 제51권4호
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    • pp.243-248
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    • 2018
  • All solid state thin film batteries with two types of cell structure, Pt / $LiCoO_2$ / LiPON / Cu and Pt / $LiCoO_2$ / LiPON / $LiCoO_2$ / Cu, are prepared and their electrochemical performances are investigated to evaluate the effect of $LiCoO_2$ interlayer at the interface of LiPON / Cu. The crystallinity of the deposited $LiCoO_2$ thin films is confirmed by XRD and Raman analysis. The crystalline $LiCoO_2$ cathode thin film is obtained and $LiCoO_2$ as the interlayer appears to be amorphous. The surface morphology of Cu current collector after cycling of the batteries is observed by AFM. The presence of a 10 nm-thick layer of $LiCoO_2$ at the interface of LiPON / Cu enhances the interfacial adhesion and reduces the interfacial resistance. As a result, Li plating / stripping at the interface of LiPON / Cu during charge/discharge reaction takes place more uniformly on Cu current collector, while without the interlayer of $LiCoO_2$ at the interface of LiPON / Cu, the Li plating / stripping is localized on current collector. The thin film batteries with the interlayer of $LiCoO_2$ at the interface of LiPON / Cu exhibits enhanced initial coulombic efficiency, reversible capacity and cycling stability. The thickness of the anode current collector Cu also appears to be crucial for electrochemical performances of all solid state thin film batteries.

Effect of Marangoni flow on Surface Roughness and Packing Density of Inkjet-printed Alumina Film by Modulating Ink Solvent Composition

  • Jang, Hun-Woo;Kim, Ji-Hoon;Kim, Hyo-Tae;Yoon, Young-Joon;Kim, Jong-Hee;Hwang, Hae-Jin
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.99-99
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    • 2009
  • Two different micro-flows during the evaporation of ink droplets were achieved by engineering both surface tension gradient and compositional gradient across the ink droplet: (1) Coffee-ring generating flow resulting from the outward flow inside the ink droplet & (2) Marangoni flow leading to the circulation flow inside the ink droplet. The surface tension gradient and the compositional gradient in the ink droplets were tailored by mixing two different solvents with difference surface tension and boiling point. In order to create the coffee-ring generating flow (outward flow), a single-solvent system using N,N-dimethylformamide with nano-sized spherical alumina particles was formulated, Marangoni flow (circulation flow) was created in the ink droplets by combining N,N-dimethylformamide and fotmamide with the spherical alumina powders as a co-solvent ink system. We have investigated the effect of these two different flows on the formation of ceramic films by inkjet printing method, The packing density of the ceramic films printed with two different ink systems (single- and co-solvent systems) and their surface roughness were characterized. The dielectric properties of these inkjet-printed ceramic films such as dielectric constant and dissipation factor were also studied in order to evaluate the feasibility of their application to the electronic ceramic package substrate.

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Ag-Co합금박막의 두께에 따르는 미세구조 변화 및 자기저항 거동 (Microstructure and Giant Magnetoresistance of AgCo Nano-granular Alloy Films)

  • 이성래;김세휘
    • 한국자기학회지
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    • 제8권3호
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    • pp.131-137
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    • 1998
  • 동시진공증착한 Ag-Co합금박막의 두께에 따르는 미세구조 및 거대자기저항의 거동의 변화를 연구하였다. 증착된 상태에서 40 at.%Co 합금의 200nm두께에서 최대 24%의 자기저항을 얻었다. 합금박막의 두께가 감소함에 따라, 특히 50NM 이하에서 비저항이 급격하게 증가되었고, 비저항 차 및 자기저항은 감소하였다. 비저항의 증가는 주로 표면저항의 증가가 주도하였다. 고분해능 T뜨을 사용하여 두께 감소에 따르는 합금박막의 미세구조 변화를 분석한 결과, 첫째 aG 및 cO 입자의 크기가 감소하며, 둘째 Co 및 Ag간의 상호 고용도가 증가되며, 섯째 Co입자의 형성비의 변화가 확인되었다. 이러한 미세구조적 변화는 자성체 입자의 자기모멘트, 자기이방성 등의 가지 상태의 변화를 가져오게 되어 자기저항에 영향을 끼치는 것으로 분석된다. 따라서 50nm 이하에서 거대자기저항의 감소는 표면에서의 스핀전도에 의한 형상 뿐만 아니라 미세구조의 면화도 크게 기여하는 것으로 보인다.

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임베디드 커패시터로의 응용을 위해 상온에서 RF 스퍼터링법에 의한 증착된 bismuth magnesium niobate 다층 박막의 특성평가 (The characteristics of bismuth magnesium niobate multi layers deposited by sputtering at room temperature for appling to embedded capacitor)

  • 안준구;조현진;유택희;박경우;웬지긍;허성기;성낙진;윤순길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.62-62
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    • 2008
  • As micro-system move toward higher speed and miniaturization, requirements for embedding the passive components into printed circuit boards (PCBs) grow consistently. They should be fabricated in smaller size with maintaining and even improving the overall performance. Miniaturization potential steps from the replacement of surface-mount components and the subsequent reduction of the required wiring-board real estate. Among the embedded passive components, capacitors are most widely studied because they are the major components in terms of size and number. Embedding of passive components such as capacitors into polymer-based PCB is becoming an important strategy for electronics miniaturization, device reliability, and manufacturing cost reduction Now days, the dielectric films deposited directly on the polymer substrate are also studied widely. The processing temperature below $200^{\circ}C$ is required for polymer substrates. For a low temperature deposition, bismuth-based pyrochlore materials are known as promising candidate for capacitor $B_2Mg_{2/3}Nb_{4/3}O_7$ ($B_2MN$) multi layers were deposited on Pt/$TiO_2/SiO_2$/Si substrates by radio frequency magnetron sputtering system at room temperature. The physical and structural properties of them are investigated by SEM, AFM, TEM, XPS. The dielectric properties of MIM structured capacitors were evaluated by impedance analyzer (Agilent HP4194A). The leakage current characteristics of MIM structured capacitor were measured by semiconductor parameter analysis (Agilent HP4145B). 200 nm-thick $B_2MN$ muti layer were deposited at room temperature had capacitance density about $1{\mu}F/cm^2$ at 100kHz, dissipation factor of < 1% and dielectric constant of > 100 at 100kHz.

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A Surface Etching for Synthetic Diamonds with Nano-Thick Ni Films and Low Temperature Annealing

  • Song, Jeongho;Noh, Yunyoung;Song, Ohsung
    • 한국세라믹학회지
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    • 제52권4호
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    • pp.279-283
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    • 2015
  • Ni (100 nm thick) was deposited onto synthesized diamonds to fabricate etched diamonds. Next, those diamonds were annealed at varying temperatures ($400{\sim}1200^{\circ}C$) for 30 minutes and then immersed in 30 wt% $HNO_3$ to remove the Ni layers. The etched properties of the diamonds were examined with FE-SEM, micro-Raman, and VSM. The FE-SEM results showed that the Ni agglomerated at a low annealing temperature (${\sim}400^{\circ}C$), and self-aligned hemisphere dots formed at an annealing temperature of $800^{\circ}C$. Those dots became smaller with a bimodal distribution as the annealing temperature increased. After stripping the Ni layers, etch pits and trigons formed with annealing temperatures above $400^{\circ}C$ on the surface of the diamonds. However, surface graphite layers existed above $1000^{\circ}C$. The B-H loop results showed that the coercivity of the samples increased to 320 Oe (from 37 Oe) when the annealing temperature increased to $600^{\circ}C$ and then, decreased to 150 Oe with elevated annealing temperatures. This result indicates that the coercivity was affected by magnetic domain pinning at temperatures below $600^{\circ}C$ and single domain behavior at elevated temperatures above $800^{\circ}C$ consistent with the microstructure results. Thus, the results of this study show that the surface of diamonds can be etched.

폴리이미드 기판에 극저온 Catalytic-CVD로 제조된 니켈실리사이드와 실리콘 나노박막 (Nano-thick Nickel Silicide and Polycrystalline Silicon on Polyimide Substrate with Extremely Low Temperature Catalytic CVD)

  • 송오성;최용윤;한정조;김건일
    • 대한금속재료학회지
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    • 제49권4호
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    • pp.321-328
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    • 2011
  • The 30 nm-thick Ni layers was deposited on a flexible polyimide substrate with an e-beam evaporation. Subsequently, we deposited a Si layer using a catalytic CVD (Cat-CVD) in a hydride amorphous silicon (${\alpha}$-Si:H) process of $T_{s}=180^{\circ}C$ with varying thicknesses of 55, 75, 145, and 220 nm. The sheet resistance, phase, degree of the crystallization, microstructure, composition, and surface roughness were measured by a four-point probe, HRXRD, micro-Raman spectroscopy, FE-SEM, TEM, AES, and SPM. We confirmed that our newly proposed Cat-CVD process simultaneously formed both NiSi and crystallized Si without additional annealing. The NiSi showed low sheet resistance of < $13{\Omega}$□, while carbon (C) diffused from the substrate led the resistance fluctuation with silicon deposition thickness. HRXRD and micro-Raman analysis also supported the existence of NiSi and crystallized (>66%) Si layers. TEM analysis showed uniform NiSi and silicon layers, and the thickness of the NiSi increased as Si deposition time increased. Based on the AES depth profiling, we confirmed that the carbon from the polyimide substrate diffused into the NiSi and Si layers during the Cat-CVD, which caused a pile-up of C at the interface. This carbon diffusion might lessen NiSi formation and increase the resistance of the NiSi.

마이크로 ESPI 기법에 의한 면내 변형 측정 민감도 향상 (Improvement of Sensitivity to In-plane Strain/Deformation Measurement by Micro-ESPI Technique)

  • 김동일;허용학;기창두
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.1442-1445
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    • 2005
  • Several test methods, including micro strain/deformation measurement techniques, have been studied to more reliably measure the micro properties in micro/nano materials. Therefore, in this study, the continuous measurement of in-plane tensile strain in micro-sized specimens of thin film materials was introduced using the micro-ESPI technique. TiN and Au thin films 1 and $0.47\;\mu{m}$ thick, respectively, were deposited on the silicon wafer and fabricated into the micro-sized tensile specimens using the electromachining process. The micro-tensile loading system and micro-ESPI system were developed to measure the tensile strain during micro-tensile test. The micro-tensile stress-strain for these materials was determined using the algorithm for continuous strain measurement. Furthermore, algorithm for enhancing the sensitivity to measurement of in-plane tensile strain was suggested. According to the algorithm for enhancement of sensitivity, micro-tensile strain data between interfringe were calculated. It is shown that the algorithm for enhancement of the sensitivity suggested in this study makes the sensitivity to the in-plane tensile strain increase.

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다중벽 카본 나노 튜브를 이용한 가스센서의 제작 (The Fabrication of Gas Sensors using MWCNTs)

  • 장경욱;김명호
    • 한국전기전자재료학회논문지
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    • 제22권12호
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    • pp.1089-1094
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    • 2009
  • Carbon nanotubes (CNTs) have excellent electrical, chemical stability, mechanical and thermal properties. In this paper, networks of Multi-walled carbon nanotube (MWCNT) materials were investigated as resistive gas sensors for ethanol ($C_2H_5OH$) detection. Sensor films were fabricated by air spray method for the multi-walled CNTs solution on glass substrates. Sensors were characterized by resistance measurements in the sensing system, in order to find the optimum detection properties for the ethanol gas molecular. The film that was sprayed with the MWCNT dispersion for 60 see, was 300 nm thick. And the electric resistivity is $2{\times}10^{-2}\;{\Omega\cdot}cm$. Also, the sensitivity and the linearity of MWVNT sensor for ethanol gas are 0.389 %/sec and 17.541 %/FS, respectively. The MWCNT film was excellent in the response for the ethanol gas molecules and its reaction speed was very fast, which could be using as ethanol gas sensor. The conductance of the fabricated sensors decreases when the sensors are exposed to ethanol gas.

50nm thick as-deposited poly silicon as an active layer of TFT for driving AM-OLEDs prepared at low temperature $(<200^{\circ}C)$ using Cat-CVD

  • Cho, Chul-Lae;Lee, Sung-Hyun;Lee, Chang-Hoon;Lee, Dea-Hyun;Lee, Sang-Yoon;Kwon, Jang-Yeon;Park, Kyung-Bae;Kim, Jong-Man;Jung, Ji-Sim;Hong, Wan-Shick
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.495-498
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    • 2006
  • The influence of various process parameters for the as-deposited poly silicon was investigated. The polycrystalline silicon films were successfully deposited on glass substrates at a low-temperature $(<200^{\circ}C)$ using the catalytic chemical vapor deposition (Cat-CVD). We achieved a low hydrogen content $({\sim}0.9%)$ and a high deposition rate $({\sim}35{\AA}/sec)$. The film is applicable to thin film transistors on plastic substrates.

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초음파원자현미경을 이용한 나노스케일 박막 코팅층에 대한 탄성특성 평가 (Evaluation of Elastic Properties for Nanoscale Coating Layers Using Ultrasonic Atomic Force Microscopy)

  • 곽동열;조승범;박익근
    • 한국생산제조학회지
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    • 제24권5호
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    • pp.475-480
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    • 2015
  • Ultrasonic atomic force microscopy (Ultrasonic-AFM) has been used to investigate the elastic property of the ultra-thin coating layer in a thin-film system. The modified Hertzian theory was applied to predict the contact resonance frequency through accurate theoretical analysis of the dynamic characteristics of the cantilever. We coat 200 nm thick Aluminum and Titanium thin films on the substrate using the DC Magnetron sputtering method. The amplitude and phase of the contact resonance frequency of a vibrating cantilever varies in response to the local stiffness constant. Ultrasonic-AFM images were obtained using the variations in the elastic property of the materials. The morphology of the surface was clearly observed in the Ultrasonic-AFM images, but was barely visible in the topography. This research demonstrates that Ultrasonic-AFM is a promising technique for visualizing the distribution of local stiffness in the nano-scale thin coatings.