• 제목/요약/키워드: n-layer

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Magnetic field distribution in steel objects with different properties of hardened layer

  • Byzov, A.V.;Ksenofontov, D.G.;Kostin, V.N.;Vasilenko, O.N.
    • Advances in Computational Design
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    • 제7권1호
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    • pp.57-68
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    • 2022
  • A simulation study of the distribution of magnetic flux induced by a U-shaped electromagnet into a two-layer massive object with variations in the depth and properties of the surface layer has been carried out. It has been established that the hardened surface layer "pushes" the magnetic flux into the bulk of the magnetized object and the magnetic flux penetration depth monotonically increases with increasing thickness of the hardened layer. A change in the thickness and magnetic properties of the surface layer leads to a redistribution of magnetic fluxes passing between the poles of the electromagnet along with the layer and the bulk of the steel object. In this case, the change in the layer thickness significantly affects the magnitude of the tangential component of the field on the surface of the object in the interpolar space, and the change in the properties of the layer affects the magnitude of the magnetic flux in the magnetic "transducer-object" circuit. This difference in magnetic parameters can be used for selective testing of the surface hardening quality. It has been shown that the hardened layer pushes the magnetic flux into the depth of the magnetized object. The nominal depth of penetration of the flow monotonically increases with an increase in the thickness of the hardened layer.

고분자전해질 연료전지에서 TiN과 Ti/TiN이 코팅된 스텐레스 강 분리판의 부식 특성 (Analysis of Corrosion Characteristics for TiN- and Ti/TiN-coated Stainless Steel Bipolar Plate in PEMFC)

  • 한춘수;채길병;이창래;최대규;심중표
    • Korean Chemical Engineering Research
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    • 제50권1호
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    • pp.118-127
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    • 2012
  • 고분자전해질 연료전지용 분리판 소재로 스텐레스 강의 내식성과 전기전도성을 향상시키기 위해 표면을 TiN(titanium nitride) 또는 Ti/TiN(titanium/titanium nitride)으로 코팅하여 연료전지 운전환경에서 표면 코팅층의 물성 변화를 조사하였다. 200시간의 연료전지 운전에서 표면 코팅층의 부식, 균열(crack), 박리, 표면 화학조성 변화 등을 분석하여 코팅된 TiN 또는 Ti/TiN 박막의 역할을 규명하고자 하였다. 스텐레스 강 분리판의 전기전도도와 부식저항성은 소재 표면에 질화층 박막을 코팅함으로써 증가하였으나 연료전지 환경하에서 운전시 코팅된 박막의 부식과 박리현상이 SUS316L-Ti/TiN을 제외하고 현저히 발생하였다. TiN 코팅층과 하부 기재 사이에 Ti 중간층을 도입함으로써 TiN 박막의 밀착성이 향상되고 또한 코팅층의 두께 증가로 부식 위험성이 감소하는 것을 관찰하였다.

가스 질화침탄처리한 탄소강의 화합물층 성장 및 부식특성에 미치는 $CO_2$함량의 영향 (Effect of $CO_2$ Content on the Growth and Corrosion Characteristics of the Compound Layers in Gaseous Nitrocarburized Carbon Steels)

  • 김영희;김석동;윤희재
    • 열처리공학회지
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    • 제15권5호
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    • pp.219-227
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    • 2002
  • This study has been performed to investigate the effect of $CO_2$ content on the growth characteristics of the compound layer, porous layer and corrosion characteristics of carbon steels after gaseous nitrocarburizing in $70%-NH_3-CO_2-N_2$ at $580^{\circ}C$ for 2.5 hrs. The results obtained from the experiment were the thickness of the compound and porous layers increased with increasing $CO_2$ contents. At the same fixed gas composition the thickness of the compound and porous layer increased with increasing carbon content of the specimens. X-ray diffraction analysis showed that compound layer was mainly consisted of ${\varepsilon}-Fe_{2-3}(N,C)$ and ${\gamma}^{\prime}-Fe_4N$ as the increased with $CO_2$ contents in atmosphere, compound layer was chiefly consisted of ${\varepsilon}-Fe_{2-3}(N,C)$ phase. With increasing $CO_2$ content and total flow rate in gaseous nitrocarburizing, the amount of ${\varepsilon}-Fe_{2-3}(N,C)$ phase in the compound layer was increased. The current density of passivity decreased with increasing $CO_2$ content due to the development of porous layer at the out most surface of ${\varepsilon}-Fe_{2-3}(N,C)$.

Ag-Cu-Ti Brazing 금속을 이용한 Inconel/$Si_3N_4$ 접합의 계면구조 (Interfacial Structure of Inconel/$Si_3N_4$ Joint Using Ag-Cu-Ti Brazing Metal)

  • 정창주;장복기;문종하;강경인
    • 한국세라믹학회지
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    • 제33권12호
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    • pp.1421-1425
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    • 1996
  • Sintered Si3N4 and Inconel composed of Ni(58-63%) Cr(21-25%) Al(1-17%) Mn(<1%) fe(balance) were pressurelessly joined by using Ag-Cu-Ti brazing filler metal at 950℃ and 1200℃ under N2 gas atmosphere of 1atm and their interfacial structures were investigated. In case that the reaction temperature was low as 950℃ its interfacial structure was "Inconel metal/Ti-rich phase layer/brazing filler metal layer/Si3N4 " Ti used as reactive metal existed in between inconel steel and brazing metal and moved to the interface of between brazing filler metal nd Si3N4 according as reaction temperature increased up to 1200℃. The interfacial structure of inconel steel-Si3N4 reacted at 1200℃ was ' inconel metal/Ni-rich phase layer containing of Fe. Cr and Si/Cu-rich phase layer containing of Mn and Si/Si3N4 " Cr Mn, Ni and Fe diffused to the interface of between brazing filler metal and Si3N4 and reacted with Si3N4 The most reactive components of ingredients of inconel metal were Cr and Mn. On the other hand Ti added as reactive components to Ag-Cu eutectic segregated into Ni-rich phase layer,.

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AIP법으로 증착된 TiN/CrN 다층박막의 특성 분석 (Analysis of Properties Multi-Layered TiN/CrN Thin Films Deposited by AIP Method)

  • 백민숙;윤동주;허기복;김병일
    • 한국재료학회지
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    • 제28권7호
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    • pp.405-410
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    • 2018
  • TiN and CrN thin films are among the most used coatings in machine and tool steels. TiN and CrN are deposited by arc ion plating(AIP) method. The AIP method inhibits the reaction by depositing a hard, protective coating on the material surface. In this study, the characteristics of multi-layer(TiN/CrN/TiN(TCT), CrN/TiN/CrN(CTC)) are investigated. For comparison, TiN with the same thickness as the multilayer is formed as a single layer and analyzed. Thin films formed as multilayers are well stacked. The characteristics of micro hardness and corrosion resistance are better than those of single layer TiN. The TiN/CrN peak is confirmed because both TCT and CTC are formed of the same component(TiN, CrN), and the phase is first grown in the (111) direction, which is the growth direction. However, the adhesion and abrasion resistance of the multilayer films are somewhat lower.

PACVD 방법으로 TiN 코팅시 공정변수가 작은 동공 내부의 코팅층 형성에 미치는 영향 (Effects of Process Parameters on Formation of TiN Coating Layer in Small Holes by PACVD)

  • 김덕재;조영래;백종문;곽종구
    • 한국재료학회지
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    • 제11권6호
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    • pp.441-447
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    • 2001
  • PACVD 방법으로 다이캐스팅용 금형에 적용할 수 있는 TiN 코팅막을 형성시키는 연구를 하였다. 직류 펄스전원을 사용하여 지름이 4 mm인 작은 동공내부에 최고 20 mm 깊이까지 균일한 TiN 코팅층을 형성할 수 있었다. 코팅공정시 발광분광분석기를 사용해 Ti와 $N_{2}$$Ar^{+}$의 분광선을 측정함으로써 TiN 코팅막의 형성기구에 대하여 고찰하였다. 듀티비율이 50% 이상인 경우는 Ti, $N_{2}^{+}$$Ar^{+ }$ 의 분광선이 나타났으나, 듀터비율이 28.6%이하인 경우 분광선이 전혀 나타나지 않았으며 TiN 코팅층의 형성도 불안정하였다. 펄스전원으로 Bipolar로 사용한 경우 Unipolar를 사용한 경우보다 지름이 4 mm인 구멍에서 2배 깊게 코팅되었다.

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스테인리스강의 가스질화에 미치는 열처리 조건의 영향에 관한 연구 (Effect of Heat Treatment Characteristic on the Gas Nitriding of Stainless Steels)

  • 김한군;황길수;선철곤
    • 열처리공학회지
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    • 제16권2호
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    • pp.78-82
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    • 2003
  • Nitrided compound layer and diffusion layer structure were observed by SEM. The compound layer and the constituent of nitrided surface of STS 304, STS 316, STS 410 and SACM 645 steel were analysed using EMPA and XRD respectively. The depth of nitriding layer that is obtained from similar nitriding condition decrease in the order of SACM 645 > STS 410 > STS 316 > STS 304. Result of phase transformation of the nitrided at $550^{\circ}C$ by XRD analysis were as follows; The austenitic stainless steel was mainly consist of $Cr_2N$ accompanying with $Fe_4N$ and $Fe_{2-3}N$ phase and martensitic stainless steel was mainly consist of present $Fe_{2-3}N+Cr_2N$ phase, but SACM 645 steel was $Fe_{2-3}N$ phase present only.

래치업 억제를 위한 세그멘트 $N^{+}$ 버퍼층을 갖는 IGBT 구조 (An IGBT structure with segmented $N^{+}$ buffer layer for latch-up suppression)

  • Kim, Doo-Young;Lee, Byeong-Hoon;Park, Yearn-Ik
    • 대한전기학회논문지
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    • 제44권2호
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    • pp.222-227
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    • 1995
  • A new IGBT structure, which may suppress latch-up phenomena considerably, is proposed and verified by MEDICI simulation. The proposed structure employing the segmented $n^{+}$ buffer layer increases latch-up current capability due to suppression of the current flowing through the resistance of $p^{-}$ well, $R_{p}$, which is the main cause of latch-up phenomena without degradation of forward characteristics. The length of the $n^{+}$ buffer layer is investigated by considering the trade-off between the latch-up current capability and the forward voltage drop. The segmented $N^{+}$ buffer layer results in better latch-up immunity in comparison with the uniform buffer layer.

시뮬레이션을 통한 p-i-n 비정질 실리콘 박막 태양전지의 최적화 (Optimization of p-i-n amorphous silicon thin film solar cells using simulation)

  • 박승만;이영석;정성욱;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.436-436
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    • 2009
  • 현재 상용화되어 있는 결정질 태양전지의 경우 높은 실리콘 가격으로 인해 저가화에 어려움을 격고 있다. 따라서 태양전지 저가화의 한 방법으로 박막태양전지가 주목을 받고 있다. P-I-N 구조의 박막태양전지에서 각 층의 thickness, activation energy, energy bandgap은 고효율 달성을 위한 중요한 요소이다. 본 논문에서는 박막태양전지 P-I-N layer의 가변을 통하여 고효율을 달성하기 위한 simulation을 수행하였다. 가변 조건으로는 p-layer의 thickness, activation energy 그리고 energy bandgap을 단계별로 변화시켰고 i-layer는 thickness를 n-layer는 thickness와 activation energy를 가변하여 최적의 조건을 찾아 분석하였다. 최종 simulation 결과 p-layer의 thickness 5nm, activation energy 0.3eV 그리고 energy bandgap 1.8eV에서, i-layer thickness 400nm, n-layer thickness 30nm, activation energy 0.2eV에서 최고 효율 11.08%를 달성하였다.

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초 저속 순차증착으로 제작한 Bi계 초전도 박막의 생성막 평가 (Analysis of the Hi-system Superconducting Thin Films Fabricated by Layer-by-Layer Deposition Method at an Ultra low growth rate)

  • 양승호;김영표;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.503-504
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    • 2007
  • $Bi_2Sr_2Ca_{n-1}Cu_nO_x$(n=0, 1, 2)superconducting thin films have been fabricated by atomic layer-by-layer deposition at an ultra low growth rate using IBS(Ion Beam Sputtering) method. During the deposition, 90 mol% ozone gas of typical pressure of $1{\sim}9{\times}10^{-5}$ Torr are supplied with ultraviolet light irradiation for oxidation. XRD and RHEED investigations reveal out that a buffer layer with some different compositions is formed at the early deposition stage of less than 10 units cell and then Bi-2201 oriented along the c-axis is grown.

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