• 한국자기학회지
• /
• 제4권4호
• /
• pp.313-318
• /
• 1994

전자빔 증착 Co/Pt 다층박막에서 증발원자의 입사방향이 자기 및 자기광학적 성질에 미치는 영향을 조사하였다. 조성변조 Co/Pt 다층박막을 증발원자의 입사방향이 $0^{\circ},\;15^{\circ},\;30^{\circ},\;45^{\circ},\;60^{\circ}$이 되도록 하여 전자빔 증착법으로 제조한 후 x-ray 회절실험, 주사전자현미경으로 구조분석을 하였고, VSM, torque magnetometer, Kerr loop tracer를 사용하여 자기 및 자기광학적 성질을 조사하였다. x-ray 회절실험을 통해 모든 시료가 조성변조 다층박막 구조로 만들어졌음을 확인하였고, 입사각이 증가함에 따라 주상구조의 성장방향은 기판 수직선에서 벗어나지만 <111> 결정방향은 기판 수직선 가까이에 존재함이 관찰되었다. 포화자화값 $M_{s}$, Kerr회전각 ${\theta}k$는 입사각이 증가하면 줄어들었는데 이는 박막의 밀도 감소 때문이다. 자기이방성 또한 입사각의 증가에 따라 줄어들었다.

• 한국기계가공학회지
• /
• 제17권3호
• /
• pp.51-58
• /
• 2018

In this paper, the organic material Poly(methyl methacrylate) PMMA is used with inorganic $Al_2O_3$ to fabricate organic-inorganic multilayer barrier thin films. The organic thin films are developed using a roll-to-roll electrohydrodynamic atomization system, whereas the inorganic are grown using a roll-to-roll low-temperature atmospheric pressure atomic layer deposition system. For the first time, these two technologies are used together to develop organic-inorganic multilayer barrier thin films in atmospheric condition. The films are grown under optimized parameters and classified into three classes based on the layer structures, when the total thickness of the barrier is maintained at ~ 160 nm. All classes of barriers show good morphological, optical and chemical properties. The $Al_2O_3$ films with a low average arithmetic roughness of 1.58 nm conceal the non-uniformity and irregularities in PMMA thin films with a roughness of 5.20 nm. All classes of barriers show a notably good optical transmission of ~ 85 %. The hybrid organic-inorganic barriers show water vapor and oxygen permeation in the range of ${\sim}3.2{\times}10^{-2}g/m^2/day$ and $0.015cc/m^2/day$ at $23^{\circ}C$ and 100% relative humidity. It has been confirmed that it can be mass-produced and used as a low-cost barrier thin film in various printing electronic devices.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
• /
• pp.127-127
• /
• 2011

We investigate the transparent TFTs using a transparent ZnSnO3 (ZTO)/Ag/ZTO multilayer electrode as S/D electrodes with low resistivity of $3.24{\times}10^{-5}$ ohm-cm, and high transparency of 86.29% in ZTO based TFTs. The Transparent TFTs (TTFTs) are prepared on glass substrate coated 100 nm of ITO thin film. On atomic layer deposited $Al_2\;O_3$, 50 nm ZTO layer is deposited by RF magnetron sputtering through a shadow mask for channel layer using ZTO target with 1 : 1 molar ratio of ZnO : $SnO_2$. The power of 100W, the working pressure of 2mTorr, and the gas flow of Ar 20 sccm during the ZTO deposition. After channel layer deposition, a ZTO (35 nm)/Ag (12 nm)/ZTO(35 nm) multilayer is deposited by DC/RF magnetron sputtering to form transparent S/D electrodes which are patterned through the shadow mask. Devices are annealed in air at 300$^{\circ}C$ for 30 min following ZTO deposition. Using UV/Visible spectrometer, the optical transmittances of the TTFT using ZTO/Ag/ ZTO multilayer electrodes are compared with TFT using Mo electrode. The structural properties of ZTO based TTFT with ZTO/Ag/ZTO multilayer electrodes are analyzed by high resolution transmission electron microscopy (HREM) and X-ray photoelectron spectroscopy (XPS). The transfer and output characterization of ZTO TTFTs are examined by a customized probe station with HP4145B system in are.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2001년도 춘계학술발표회 초록집
• /
• pp.6-7
• /
• 2001

• 한국초전도학회:학술대회논문집
• /
• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
• /
• pp.34-37
• /
• 1999

We have fabricated YBCO/STO/YBCO multilayer by the pulsed laser deposition method varing the deposition condition of insulating STO layer. Superconducting properties of both YBCO layers are sensitively affected by the deposition condition of STO layer. We obtained the upper YBCO layer of T$_{c(zero)}\;{\sim}\;$90 K with a good reproducibility, however, T$_{c(zero)}$ of lower YBCO layer was decreased to about 80 K maybe due to the oxygen loss during the deposition of STO layer. Superconducting properties of both YBCO layers at every fabrication step were measured in order to study the reason for the deterioration of superconducting properties.

• 한국표면공학회지
• /
• 제45권3호
• /
• pp.106-110
• /
• 2012

Oblique angle deposition (OAD) is a physical vapor deposition where incident vapor flux arrives at non-normal angles. It has been known that tilting the substrate changes the properties of the film, which is thought to be a result of morphological change of the film. In this study, OAD has been applied to prepare single and multilayer TiN films by cathodic arc deposition. TiN films have been deposited on cold-rolled steel sheets and stainless steel sheet. The deposition angle as well as substrate temperature and substrate bias was changed to investigate their effects on the properties of TiN films. TiN films were analyzed by color difference meter, scanning electron microscopy, nanoindenter and x-ray diffraction. The color of TiN films was not much changed according to the deposition conditions. The slanted and zigzag structures were observed from the single and multilayer films. The relation between substrate tilting angle (${\alpha}$) and the growth column angle (${\beta}$) followed the equation of $tan{\alpha}=2tan{\beta}$. The indentation hardness of TiN films deposited by OAD was low compared with the ones prepared at normal angle. However, it has been found that $H^3/E^2$ ratio of 3-layer TiN films prepared at OAD condition was a little higher than the ones prepared at normal angle, which can confirm the robustness of prepared films.

• 한국염색가공학회지
• /
• 제20권5호
• /
• pp.23-27
• /
• 2008

In this work, poly(diallyldimethylammoniumchloride) (PDDAC) and meso-tetrakis(4-carboxyphenyl)porphyrin were considered to produce the self-assembly fabrication films. This method is based on the layer-by-layer (LbL) deposition produced by the electrostatic attraction between positively charged PDDAC and negatively charged porphyrin ions. The result of multilayer fabrication was discussed with the level of color strength (K/S). K/S spectra of the fabricated multilayer films showed gradual increase behaviors. In addition, the color photo images of the fabricated multilayer films showed that PDDAC and porphyrin were successfully attracted by electrostatic self-assembly forces.

• 한국광학회지
• /
• 제9권5호
• /
• pp.300-306
• /
• 1998

광학용 유전체 다층박막의 증착시 높은 열로 인해 형성되는 층간확산의 광학적 효과를 연구하였다. 연속적으로 변하는 굴절률 분포함수를 갖고 하나의 부분구조가 주기적으로 반복되는, 다층박막의 광특성 계산방법을 제시한다. 이 방법을 이용하여 Fabry-Perot형 여과막, 넓은 영역에 걸쳐 높은 반사율을 갖는 전반사경 및 반사 방지막에 대해 층간확산이 미치는 영향을 계산하여 투과 및 반사 스펙트럼을 얻었다. 층간확산으로 인하여 전반사경의스펙트럼 대역폭이 줄어들었으며 다층 반사방지막의 경우층의 수가 많을 때 특성이 악화되고 파장에 따른 반사율의 변화가 크게 되었다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
• /
• pp.385-386
• /
• 2007

We prepared the Al doped ZnO coating Ag multilayer thin films on glass without substrate heating using FTS system. The structure of multilayer thin films has Al doped ZnO/Ag/Al doped ZnO(AZO/Ag/AZO). The thickness of top and bottom AZO thin films were fixed to 50 nm, respectively and controlled the thickness of Ag thin films with deposition time. As-doped multilayer thin films were prepared at 1mTorr and input power (DC) of 100W at room temperature. To investigate the film properties, we employed four-point probe, UVNIS spectrometer, X-ray diffractometer (XRD), scanning electron microscopy (SEM), Hall Effect measurement system and Atomic Force Microscope (AFM).

• 마이크로전자및패키징학회지
• /
• 제14권2호
• /
• pp.49-57
• /
• 2007

본 연구에서는 Au 와 Sn을 rf-magnetron sputter를 이용하여 다층막(multilayer)과 동시증착(Co-sputter)방법으로 스퍼터링하여 기판위에 AuSn 솔더를 형성하였고, 솔더의 조성제어와 특성 분석을 통해 Sn rich AuSn 솔더의 형성 기술에 대하여 연구하였다. AuSn 솔더를 형성하기 앞서 Au와 Sn에 대하여 단일 금속 증착을 하였다. 이를 토대로 AuSn솔더를 증착하기 위한 실험 조건을 확보하였다. 증착변수로는 기판의 온도, rf 전력과 두께 비를 이용하였다. 다층막의 경우, 고온의 기판에서 솔더 합금의 표면거칠기와 조성이 보다 정확하게 제어되었다. 이에 비해 동시증착 솔더는 기판의 온도에 의한 조성의 변화가 거의 없었으나, rf전력에 의해서 조성이 보다 쉽게 제어할 수 있었다. 여기에 더해, 동시 증착 솔더 박막의 대부분은 증착동안에 금속간 화합물로 변화한 것을 알 수 있었다. 화합물의 종류는 XRD로 분석하였다. 형성된 솔더 박막을 플럭스를 이용하지 않고 리드프레임에 접합하여 접합강도를 측정하였다. 다층형의 경우 Au 10wt%의 조건에서 최대 $33(N/mm^2)$ 전단응력을 나타내었으며, 동시증착형은 Au 5wt%에서 $460(N/mm^2)$ 전단응력을 나타내었다.