• 대한기계학회논문집A
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• 제20권10호
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• pp.3113-3125
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• 1996

The objective of this study is to develop novel method named mechanical and chemical machining technique, which is capable of producing three dimensional patterns of few micrometers in dimension on a silicon wafer without the use of a mask. The strategy is to impart mechanical energy along the path of the pattern to be fabricated on a single crystal silicon by way on introdusing frictional interaction under controlled conditions. Then, the surface is preferentially etched to reveal the areas that have been mechanically energized. Upon completion of the etching process, the three dimensional pattern is produced on the silicon surface. Experiments have been conducted to identify the optimal tool material, geometery, as well as fabrication condition. The new technique introduced in this paper is significantly simpler than the conventional method which require sophisticated equipment and much time.

• 한국전기전자재료학회논문지
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• 제26권11호
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• pp.841-845
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• 2013

We give a textured front on silicon wafer for high-efficiency solar cells by using micro contact printing method which uses PDMS (polydimethylsiloxane) silicon rubber as a stamp and SAM (self assembled monolayer)s as an ink. A random pyramidal texturing have been widely used for a front-surface texturing in low cost manufacturing line although the cell with random pyramids on front surface shows relatively low efficiency than the cell with inverted pyramids patterned by normal optical lithography. In the past two decades, the micro contact printing has been intensively studied in nano technology field for high resolution patterns on silicon wafer. However, this promising printing technique has surprisingly never applied so far to silicon based solar cell industry despite their simplicity of process and attractive aspects in terms of cost competitiveness. We employ a MHA (16-mercaptohexadecanoic acid) as an ink for Au deposited $SiO_2/Si$ substrate. The $SiO_2$ pattern which is same as the pattern printed by SAM ink on Au surface and later acts as a hard resist for anisotropic silicon etching was made by HF solution, and then inverted pyramidal pattern is formed after anisotropic wet etching. We compare three textured surface with different morphology (random texture, random pyramids and inverted pyramids) and then different geometry of inverted pyramid arrays in terms of reflectivity.

• 한국정밀공학회지
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• 제32권1호
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• pp.49-55
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• 2015

Recently, many researchers and industry are looking for ways to decrease the use of lubricants because of economical and environmental reasons. One of the lubrication technologies is the MQL method. This study presents a research of MQL and Wet milling processes of Al 6061 material. For this experiment, the test specimen is suggested, and various machining conditions are applied. And, shape of micro-pattern which has been recently spotlighted is included in the test specimen. In order to compare MQL with Wet machining, several milling experiments were carried out, varying feed rate, cutting speed, depth of cut, etc. Finally, the surface roughness results of machining tests according to the process conditions were measured. It is expected that the results of machining experiments can be used to predict the surface roughness of various MQL milling processes.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2006년도 춘계학술대회 논문집
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• pp.239-242
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• 2006

LCD-BLU (Liquid Crystal Display - Back Light Unit) is one of kernel parts of LCD unit and it consists of several optical sheets(such as prism, diffuser and protector sheets), LGP (Light Guiding Plate), light source (CCFL or LED) and mold frame. The LGP of LCD-BLU is usually manufactured by forming numerous dots with $50{\sim}200$ um in diameter on it by etching process. But the surface of the etched dots of LGP is very rough due to the characteristics of the etching process during the mold fabrication, so that its light loss is high along with the dispersion of light into the surface. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current etched dot patterned LGP, optical pattern design with 50um micro-lens was applied in the present study. The micro-lens pattern fabricated by modified LiGA with thermal reflow process was applied to the optical design of LGP. The attention was paid to the effects of different aspect ratio (i.e. $0.2{\sim}0.5$) of optical pattern conditions to the brightness distribution of BLU with micro-lens patterned LGP. Finally, high aspect ratio micro-lens patterned LGP showed superior results to the one made by low aspect ratio in average luminance.

• 한국산업융합학회 논문집
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• 제22권5호
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• pp.467-473
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• 2019

In this study, approached to improve durability of the multi-functional nano-pattern fabricated on the curved lens surface using nanoimprint lithography (NIL) was proposed, and the effects of the proposed methods on functionality after wear test were examined. To improve the mechanical property of ultraviolet(UV)-curable resin, UV-NIL was conducted at the elevated temperature around $60^{\circ}C$. In addition, micro/nano hierarchical structures was fabricated on the lens surface with a durable film mold. Analysis on the worn surfaces of nano-hole pattern and hierarchical structures and measurements on the static water contact angle and critical water volume for roll-off indicated that the UV curing process with elevated temperature is effective to maintain wettability by increasing hardness of resin. Also, it was found that the micro-scale pattern is effective to protect nano-pattern from damage during wear test.

• 한국산학기술학회논문지
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• 제18권5호
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• pp.475-480
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• 2017

본 논문에서는 레이저 유도증착 공정을 사용하여 절연기판위에 미세패턴의 전도성 향상시켰다. 기존의 레이저 유도증착의 공정에서 발생하는 높은 레이저빔 에너지로 인하여, 미세패턴의 낮은 증착밀도, 산화와 같은 문제점이 있다. 이러한 문제점을 폴리머 코팅층을 사용하여 증착정밀도와 전도성 향상하였다. 실리콘 웨이퍼 위에 미세패턴 증착을 위해서 크롬, 구리를 사용하였다. 본 연구에서는 다중펄스 방식의 레이저 빔을 금속박막에 조사하여 절연기판(insulating substrate: $SiO_2$) 위에 시드 층을 형성하고, 형성된 시드 층위에 무전해 도금을 적용하여 미세패턴 및 구조물을 제작하는 복합공정기술을 개발하였다. 레이저빔의 다중 스캔방식으로 조사함으로서 레이저빔의 에너지가 증착 층의 증착밀도와 표면품위를 향상시키고, 미세전극 패턴으로 사용가능한 전기 전도성을 갖게 되었음 알 수 있었다. 레이저 직접묘화법과 무전해 도금을 적용한 복합공정을 이용하여 미세전극을 증착 한 후 비저항을 측정한 결과 도금 전 저항이 $6.4{\Omega}$, 도금 후의 저항이 $2.6{\Omega}$으로 미세전극 패턴의 표면조직이 균일하고 증착되었다. 표면조직이 균일하고 치밀하게 증착되었기 때문에 전기 전도도가 약 3배정도 향상되었다.

• 한국산학기술학회논문지
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• 제10권11호
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• pp.3280-3286
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• 2009

본 논문에서는 미세 무광부식 패턴을 갖는 HD Switch Panel 자동차 부품을 개발하는 것으로, 제품 디자인을 통해 금형을 설계, 제작하였다. 최적화된 금형 제작을 위하여 CAE(Computer Aided Engineering)해석을 통하여 사출성형 공정에서 나타날 수 있는 문제점과 부품의 수축 변형을 정량적으로 예측하였다. 그리고, 금형표면의 가열온도와 실제 금형온도를 비교함으로써 공정변수 조절을 통해 사출성형조건의 최적화도 달성할 수 있었다. 한편, 순간금형표면가열방식을 이용한 성형기술인 E-MOLD를 적용하여 자동차 내장부품용 HD Switch Panel 사출성형품을 제작하였고, 전자현미경과 원자현미경을 이용한 표면 평가 및 광택도 측정을 통하여 무광부식 패턴의 전사율 향상으로 인한 무광 특성이 향상됨(2.5이상$\to$1.5~1.7)을 확인하였다.

• Journal of the Optical Society of Korea
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• 제13권1호
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• pp.75-79
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• 2009

A four beam interference optical system for laser micro structuring using a pulse laser was demonstrated. The four beam interference optical system using a pulse laser(picosecond laser) can fabricate micro structure on mold material(NAK80) directly. Micro structure on the polymer can be reproduced economically by injection molding of the micro structure on the mold material. The four beam interference optical system was composed by the DOE(Diffractive Optical Element) and two lenses. The laser intensity distribution of four beam interference was explained by an interference optics point of view and by the image optics point of view. We revealed that both views showed the same result. The laser power distribution of a $1{\mu}m$ peak pattern was made by the four beam interference optical system and measured by the objective lens and CCD. A $1{\mu}m$ pitch dot pattern on the mold material was fabricated and measured by SEM(Scanning Electron Microscopy).

• 한국기계가공학회지
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• 제11권2호
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• pp.1-6
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• 2012

Recent ultra-precision machining systems have nano-scale resolution, and can machine various shapes of complex structures using five-axis driven modules. These systems are also multi-functional, which can perform various processes such as planing, milling, turning et al. in one system. Micro machining technology using these systems is being developed for machining fine patterns, hybrid patterns and high aspect-ratio patterns on large-area molds with high productivity. These technology is and will be applied continuously to the fields of optics, display, energy, bio, communications and et al. Domestic and foreign trends of micro machining technologies for flat molds were investigated in this study. Especially, we focused on the types and the characteristics of ultra-precision machining systems and application fields of micro patterns machined by the machining system.

• 대한기계학회논문집A
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• 제41권4호
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• pp.251-255
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• 2017

미세 패턴의 기계적 가공에서는 버의 발생이 불가피하고, 패턴과 버의 크기가 매우 작아 이를 구분하기 어렵다. 본 연구에서는 turning machine을 이용하여, 원통형 공작물의 옆면에 패턴의 피치와 높이가 각각 60, $1{\mu}m$인 마이크로 패턴을 제작하고, 패턴의 형상을 이용하여 버의 형상과 생성 메커니즘을 정의하였다. 또한, 자기연마 디버링을 이용하여 마이크로 패턴의 정밀도를 높이고자 하였다. 그 결과, 미세패턴의 제작 시, 공구의 이송방향에 따라 버의 생성방향이 결정됨을 확인할 수 있었다. 또한, 자기연마디버링 공정에서 자속밀도와 공구의 회전속도가 각각 40mT, 1600rpm일 때, 패턴의 높이는 $1.018{\mu}m$로 측정되었으며, 자기연마 디버링에 가장 적합한 조건임을 알 수 있었다.