• Title/Summary/Keyword: maskless photolithography applications

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Uniformity Improvement of Micromirror Array for Reliable Working Performance as an Optical Modulator in the Maskless Photolithography System

  • Lee, Kook-Nyung;Kim, Yong-Kweon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.2
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    • pp.132-139
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    • 2001
  • We considered the uniformity of fabricated micromirror arrays by characterizing the fabrication process and calculating the appropriate driving voltages of micromirrors used as virtual photomask in maskless photolithography. The uniformity of the micromirror array in terms of driving voltage and optical characteristics is adversely affected by factors, such as the air gap between the bottom electrode and the mirror plate, the spring shape and the deformation of the mirror plate or torsion spring. The thickness deviation of the photoresist sacrificial layer, the misalignment between mirror plate and bottom electrode, the aluminum deposition condition used to produce the spring and the mirror plate, and initial mirror deflection were identified as key factors. Their importance lies in the fact that they are related to air gap deviations under the mirror plate, asymmetric driving voltages in left and right mirror directions, and the deformation of the Al sring or mirror plate after removal of the sacrificial layer. The plasma ashing conditions used for removing the sacrificial layer also contributed to the deformation of the mirror plate and spring. Driving voltages were calculated for the pixel operation of the micromirror array, and the non-uniform characteristics of fabricated micromirrors were taken into consideration to improve driving performance reliability.

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Anisotropic Superomniphobic Wettability on Hierarchical Structures of Micro Line Array Combined with Fluorinated Wax (C24F50)

  • Jeon, Deok-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.209.2-209.2
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    • 2014
  • In recent years, researches about hydrophobic and hydrophilic surfaces have been executed however their other effects have not been researched enough. In this paper, the fabrication method of hierarchical structures of micro line array combined with fluorinated wax for anisotropic superomniphobic wettability is presented. We have achieved anisotropic and superomniphobic surface via simple two step methods, which are maskless photolithography and wax deposition. In order to prove how to provide those characteristics, SEM, contact angle measurement tool and X-ray diffraction are used. Fluorinated wax is crystalized self-assembly and it is subordinated on micro line array so that it is able to display anisotropic wettability. Understanding on anisotropic superomniphobic surface and simple fabrication method has been attracted to apply for lots of applications which range from self-cleaning surface, microfluidic chip, to directionally fluid control device, even in oily fluid.

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