• Title/Summary/Keyword: magnetic thin film

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Effects of Alternating Magnetic Field Assisted Annealing of Pentacene Film for Organic Thin Film Transistor Applications

  • Park, Jae-Hoon;Choi, Jong-Sun
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.1
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    • pp.32-35
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    • 2007
  • In this article, a novel annealing technique using alternating magnetic field (AMF) is adopted to improve the electrical characteristics of pentacene film, thereby enhancing the performance of pentacene-based organic thin film transistors (OTFTs). According to the investigation results, the electrical conductivity in the pentacene film could be increased from 0.32 to 1.18 S/cm by annealing the pentacene film using AMF. And also, OTFTs with the pentacene film annealed by AMF exhibited an improved performance compared to the device without annealing. These results suggest that an annealing using AMF can be an effective method to improve the performance of devices based on organic semiconductors.

The Effect of Additional Elements X on Magnetic Properties of CoCrTa/Cr-X Thin Film (CoCrTa/Cr-X 자성박막의 자기적성질에 미치는 첨가원소 X의 영향)

  • 김준학;박정용;남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.3 no.4
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    • pp.314-319
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    • 1993
  • The Effects of additional element X (X = Si, Mo, Cu, Gd) on magnetic properties and microstructure of Co-1Zat%Cr-Zat%Ta/Cr-X magnetic thin film were investigated. The thickness changes of Cr-X underlayer and CoCrTa magnetic layer were in the range of $1000~2000\AA$ and $200~800\AA$. respectively. Substrate temperatures were controlled from $100^{\circ}C$ to $200^{\circ}C$. Increase of coercivity by about 100~200 Oe was observed in CoCrTa/Cr-X thin films compared to those without additional X element. Cu was the most effective additional element for increasing coercivity. CoCrTa/Cr-Cu thin film shows relatively high coercivity in $1500\AA$ underlayer thickness and $600\AA$ magnetic layer thickness.

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Crystallization of FePt/MgO(100) magnetic thin films (FePt/MgO(100) 자성박막의 결정화 연구)

  • Jeung, Ji-Wook;Cho, Tae-Sik;Yi, Min-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.278-279
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    • 2005
  • The crystallization of FePt/MgO(100) magnetic thin films of various thicknesses has been studied using synchrotron x-ray scattering, atomic force microscope, and vibrating sample magnetometer. In film with a 500-${\AA}$-thick, ordered (fct) FePt phase was dominantly crystallized into perpendicular (001) grains keeping the magnetically easy c-axis normal to the film plane during annealing. In film with a 812-${\AA}$-thick, however, longitudinal (110) grains keeping the c-axis parallel to the film plane were grown on top of the perpendicular (001) grains. The behavior of the magnetic properties was consistent with the thickness dependence of the crystallization. We attribute the thickness dependence of the crystallization to the substrate effect, which prefers the growth of the c-axis oriented perpendicular grains near the film/substrate interfacial area.

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Research Trend of Oxide Magnetic Films with Atomically Controlled Pulsed Laser Deposition (원자층 제어 PLD를 이용한 산화물 자성 박막 연구의 동향)

  • Kim, Bong-Ju;Kim, Bog-G.
    • Journal of the Korean Magnetics Society
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    • v.22 no.4
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    • pp.147-156
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    • 2012
  • Recently, there have been considerable interests in various thin film growth techniques with atomically controllable thickness. Among them, atomically controlled pulsed laser deposition (PLD) technique is quite popular. We have developed advanced thin film growth technique using PLD and Reflection high energy electron diffraction (RHEED). Using the technique, the growth of oxide thin films with the precisely controllable thickness has been demonstrated. In addition, our technique can be applied to high quality thin film growth with minimal defect and bulk chemical composition. In this paper, our recent progresses as well as the current research trend on oxide thin films will be summarized.

Enhanced effect of magnetic anisotropy on patterned Fe-Al-O thin films

  • N.D. Ha;Kim, Hyun-Bin;Park, Bum-Chan;Kim, C.G.;Kim, C.O.
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.239-239
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    • 2003
  • As a result of the recent miniaturization and enhancement in the performance of thin film inductors and thin film transformers, there are increased demands for the thin films with a high magnetic permeability in the high frequency range, a high saturation magnetization, a high electrical resistivity, and a low coercive force. In order to improve high frequency properties, we will investigate anisotropy field by shape and size of pattern. The Fe-Al-O thin films of 16mm diameter and 1$\mu\textrm{m}$ thickness were deposited on Si wafer, using RE magnetron reactive sputtering technique with the mixture of argon and oxygen gases. The fabricating conditions are obtained in the working partial pressure of 2m Torr, O$_2$ partial Pressure of 5%, Input power of 400w, and Al pellets on an Fe disk with purity of 99.9%. For continuous thin film is the 4Ms of 19.4kG, H$\sub$c/ of 0.6Oe, H$\sub$k/ of 6.0Oe and effective permeability of 2500 up to 100MHz. In this work, we expect to enhanced effect of magnetic anisotropy on patterned of Fe-Al-O thin films.

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Magnetic Field Dependent Characteristics of Al-doped ZnO by High Power Impulse Magnetron Sputtering (HIPIMS) (자장 구조 변화에 따른 High Power Impulse Magnetron Sputtering (HIPIMS)에서 Al-doped ZnO 박막 증착 특성)

  • Park, Dong-Hee;Yang, Jeong-Do;Choi, Ji-Won;Son, Young-Jin;Choi, Won-Kook
    • Korean Journal of Materials Research
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    • v.20 no.12
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    • pp.629-635
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    • 2010
  • Abstract In this study characteristics of Al-doped ZnO thin film by HIPIMS (High power impulse sputtering) are discussed. Deposition speed of HIPIMS with conventional balanced magnetic field is measured at about 3 nm/min, which is 30% of that of conventional RF sputtering process with the same working pressure. To generate additional magnetic flux and increase sputtering speed, electromagnetic coil is mounted at the back side of target. Under unbalanced magnetic flux from electromagnet with 1.5A coil current, deposition speed of AZO thin film is increased from 3 nm/min to 4.4 nm/min. This new value originates from the decline of particles near target surface due to the local magnetic flux going toward substrate from electromagnet. AZO film sputtered by HIPIMS process shows very smooth and dense film surface for which surface roughness is measured from 0.4 nm to 1 nm. There are no voids or defects in morphology of AZO films with varying of magnetic field. When coil current is increased from 0A to 1A, transmittance of AZO thin film decreases from 80% to 77%. Specific resistance is measured at about $2.9{\times}10-2\Omega{\cdot}cm$. AZO film shows C-axis oriented structure and its grain size is calculated at about 5.3 nm, which is lower than grain size in conventional sputtering.

Development of SMOKE system and study on magnetic properties of ultra-thin film

  • Min, H.G.;Byun, D.H.;Kim, S.H.;Park, C.Y.;Kim, J.H.;Kim, J.S.
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.2
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    • pp.134-138
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    • 1999
  • We have setup a compact and useful in-situ SMOKE system in order to study surface magnetism of ultra-thin films. Since the longitudinal or polar magnetic fields can be applied to the sample by just rotating the sample manipulator, It is very simple to take hysteresis curve for in-plane or polar surface magnetism. The SMOKE system was tested by investigating the surface magnetism of ultra-thin Co film deposited on Pt(111) surface.

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Preparation and Magnetic Properties of Co-system Amorphous Thin Film by the Sputter method (스파터법에 의한 Co-계 비정질박막의 제작과 자기특성)

  • 임재근;문현욱;서강수;신용진
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.190-191
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    • 1994
  • In this paper, We study on the fabrication of amorphous this film of zeromagnetostriction material and the magnetic properties. This films are fabricated by using sputtering method with input power of 400∼607[W], Ar gas pressure of 3∼ 9[mTorr] and target composition of Fe$\sub$4.7/ Co$\sub$74.3/Si$_2$B$\sub$19/. Sample this films with diameter of 14[mm ] and thickness of 27-30[$\mu\textrm{m}$] were obtained through experiments. When we analyzed the magnetic properties before and after annealing with sample thin films, we confirmed that magnetic domain wall amorphous thin films consisted for Neel magnetic domain wall with the width of about 1[$\mu\textrm{m}$].

Crystallograpic Characteristic of $Co_{77}Cr_{20}Ta_{3}$ Thin Films by Two-Step Sputtering (Two-Step 스퍼터링 법에 의한 $Co_{77}Cr_{20}Ta_{3}$ 박막의 결정학적 특성)

  • Park, Won-Hyo;Lee, Deok-Jin;Park, Yong-Seo;Choi, Hyung-Wook;Son, In-Hwan;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.103-106
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    • 2002
  • We prepared $Co_{77}Cr_{20}Ta_{3}$ thin film with Facing Targets Sputtering Apparatus. which can deposit a high quality thin film CoCrTa magnetic layer for Perpendicular magnetic recording media. In order to obtain Good Crystal orientation of CoCrTa thin films. We prepared Thin Films on slide glass substrate. The thickness of Buffer-layer were varied from 10 to 50 nm and Magnetic layer thickness fixed 100[nm]. input current was varied from 0.2[A] to 0.5[A]. Substrate temperature was varied from room temperature to ${250^{\circ}C}$ respectively. The crystal orientation of the CoCrTa film were examined with XRD. Introduce Buffer-layer thin films showed improvement of dispersion angle of c-axis orientation (${\Delta\theta}_{50}$).

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