• Environmental Analysis Health and Toxicology
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• 제14권1_2호
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• pp.45-54
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• 1999

Quantitative strucrure-activity relationships between the toxicity (LD$\_$50/) and molecular properties of amine and nitro compounds were tested. The all 19 compounds showed low correlations below 0.500 to their LD$\_$50/ values. When amine or nitro compounds were taken separately, the correlation between the calculated chemphysico parameters and LD$\_$50/ were also poor (r$^2$=0.4911, 3967 repectively). The overall relationships among the QSAR parameters were investigated. Molecular weight shows a high correlation with total surface area (r$^2$=0.9287); 0.9090 for zero-order connectivity and second-order connectivity : 0.8784 for bioconcentration factor and second-order connectivity. When amine compounds were taken to perform the statistical treatment, the relationships between parameters were as follows: 0.8436 for volume-negentropy; 0.8925 for volume-bioconcentration factor; 0.9929 for zero-order connectivity-Kow; zero-order connectivity-bioconcentration factor; 0.9141 for zero-order connectivity-solubility; 0.9718 for solubility-bioconcentration factor; 0.9894 for solubility-bioconcentration factor and 0.9319 for Kow-bioconcentration factor. On the other hand, nitro compounds showed different relationships as follows: 0.8952 for volume-I/O character; 0.9520 for volume-total surface area: 0.9351 for volume-molecular weight; 0.9351 for volume-MW; 0.9961 for Kow-Koc; 0.8455 for Kow-bioconcentration factor; 0.8879 for Koc-bioconcentration factor; 0.9987 for MW-total surface area respectively.

• 분석과학
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• 제20권3호
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• pp.255-260
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• 2007

A new method for the simultaneous determination of low molecular weight amines and quaternary ammonium ions based on the separation by IC with a suppressor and the detection by MS with ESI has been developed. The method has been applied to the analysis of a mixture containing tetramethylammonium ion, tetraethylammonium ion, tetrapropylammonium ion, triethanolamine, trimethylamine and triethylamine. The constituents were separated by isocratic elution using an IonPac CS17 column, a cation-exchange column, and detected by conductivity and mass spectrometry. The newly developed method for the six components demonstrated that the repeatability in terms of relative standard deviation for three measurements was in the range of 0.1-0.5 %. The detection limits were between 0.2 and $0.9{\mu}g/mL$ by the IC/ESI-MS.

• 폴리머
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• 제31권6호
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• pp.555-561
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• 2007

다양한 분자량을 가진 저분자량 수용성 키토산을 얻기 위해 젖산염이 결합되어 있는 키토산 올리고당을 한외여과막 장치를 이용하여 분리하였고, 새로운 염 제거법으로 유리 아민기를 가진 LMWSC를 제조하였다. 젖산염이 제거된 LMWSC의 특성과 탈아세틸화도가 적외선 분광기(Infrared spectroscopy, IR) 및 핵자기공명장치($^1H-Nuclear$ Magnetic Resonance, $^1H-NMR$)에 의해 확인되었다. 분자량을 나타내는 다분산지수(PDI)는 $1.278{\sim}1.499$로 비교적 좁은 분자량분포를 나타내었다. 유전자 전달체로서의 가능성을 확인하기 위하여, 성공적으로 분자량에 따라 분리된 키토산 올리고당과 염이 제거된 LMWSC의 유전자 전이효율이 293T cell을 이용하여 확인하였다. 또한 유전자 전이효율을 향상시키기 위해 제조된 LMWSC 유도체가 Balb/C mice를 이용하여 평가되었다.

• 공업화학
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• 제9권1호
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• pp.71-75
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• 1998

LCD용의 재료로 사용하기 위하여 새로이 합성된 저분자 액정 중간체들을 이용하여 epoxy resin 구조를 근간으로 하는 측쇄형 선형액정 고분자 및 가교된 측쇄형 액정 고분자를 만들고 이 들의 액정특성에 대하여 조사하였다. Alkyl spacer의 길이가 다른 방향족 amine 말단의 방향족 저분자 액정(ALC(n))과 ethylene glycol diglycidylether로부터 합성된 선형 측쇄형 고분자액정은 DSC 및 편광현미경 관찰로부터 mesogen으로 쓰인 저분자 액정과 같이 네마틱 액정상을 보였으며 spacer $-(CH_2){_n}-$의 길이에 따라 액정상-등방상 전이온도($T_{NI}$)는 even-odd현상을 나타내었다. 선형 및 가교형 측쇄 액정고분자의 $T_{NI}$는 저분자 액정의 그것에 비해 더 낮은 온도에서 나타났으며 또한 가교형 측쇄 액정고분자의 경우에는 가교제인 1,10-diaminodecane 사용량에 따른 $T_g$및 $T_{NI}$의 변화폭이 그렇게 크지 않은 것이 관찰되었다.

• 폴리머
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• 제25권5호
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• pp.625-634
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• 2001

액상 이소프렌 고무에 무수 말레간(MAH)을 그라프팅시킨 후 2,2,6,6-tetramethyl-4-piperidinol (TMPO)를 반응시켜 hindered amine light stabilizer (HALS)가 함유된 새로운 고분자형 광안정제를 합성하고, SBR에 대한 광안정제로서의 특성을 관찰하였다. 새로운 고분자형 광안정제의 조성과 물리적 성질은 적정법, GPC 그리고 열중량 분석에 의하여 분석하였다. SBR의 광산화 반응에 대한 고분자형 광안정제의 효과를 254nm 자외선 조사에 따른 자외선 흡광도의 변화, 관능기 변화 그리고 잔막율로서 관찰한 결과, 새로운 고분자형 광안정제를 첨가함으로써 광산화 반응이 효과적으로 억제되었다. 또한, 고부자형 광안정제의 추출내성은 저분자량의 모델 화합물에 비하여 훨씬 우수하였으며, 고분자형 광안정제와 SBR의 상용성은 TMPO가 SBR 필름 표면에 균일하게 고루 분산되어 있어서 매우 우수하였다.

• Journal of Photoscience
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• 제3권3호
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• pp.167-169
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• 1996

Absorption of UV light induces photocleavage of polymer chains to produce free radicals which initiate photodegradation of the polymer molecules. Discoloration, cracking of surface, stiffening, and decreasing of mechanical properties of polymeric products occur as a result of photodegradation of the polymers. Photostabilizers are added to the polymer systems in order to minimize the unwanted effects of UV light. It is well known that Hindered Amine Light Stabilizers (HALS) are one of the most effective photostabilizer for polymers.' HALS have been used in a large number of commercial polymers and predominantly used in styrenic and engineering plastics. They are efficient and cost-effective in many applications despite their high prices. However, low molecular weight HALS vaporize easily, emitting harmful amines, and have poor extraction resistance, decreasing their photostabilization effect. They also decompose during processing and migrate within the polymers resulting in deposition on the polymer surfaces called 'blooming". These drawbacks of low molecular HALS can be overcome by use of the polymeric HALS. We have been studying photochemical reactions of the polymer systems. The present paper reports the preparation of a new polymeric photostabilizer containing HALS groups and their stabilization effects on photooxidation of polystyrene. The synthetic scheme for the preparation of polymeric photostabilizers containing HALS groups were shown at Scheme 1. N-[(Chloroformyl) phenyl]maleimide (CPMI) and N-[4-(chlorocarbonyl) phenyl]maleimide (CPMIC) were prepared by the known procedure. N[4-N'-(2,2,6,6-tetramethyl-4-piperidinyl)aminocarbonyl-phenyl] maleimide (TMPI) was prepared by the reaction of CPMI with 4-amino-2,2,6,6-tetramethylpiperidine (ATMP).

• 한국군사과학기술학회지
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• 제8권1호
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• pp.69-80
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• 2005

A synthesis of azide-terminated glycidyl azide polymer, GAP-A, was carried out by tosylation and azidation of polyepichlorohydrin(PECH) prepared by cationic ring-opening polymerization. Polyepichlorohydrin was prepared by cationic activated monomer polymerization using ethylene glycol and $BF_3{\cdot}OEt_2$ as an initiator and a catalyst at $\~10^{\circ}C$. Tosylation of polyepichlorohydrin was performed using traditional TsCl/pyridine method and was also carried out using TsCl/amine catalysts to reduce the reaction time significantly. Azidation of tosyl-terminated PECH(OTs-PECH) was performed using $NaN_3$ as an azidation reagent in DMF solvent at high temperature and was unexpectedly completed within 2 hours.

• 공업화학
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• 제7권2호
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• pp.341-349
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• 1996

폴리우레탄 수지의 염색성을 향상시키기 위하여 염착좌석을 갖는 저분자량의 디올류를 쇄연장제로 활용하였다. 쇄연장제와 폴리올의 종류를 변화시키고, 또한 하드세그멘트 (HS)/소프트세그멘트 (SS) 비율을 변화시키면서 폴리우레탄 수지를 합성하였다. HS/SS가 1.4이고, dimethylolpropionic acld(DMPA), N-butyldiethanolamine(BDEA)를 염착좌석용 쇄연장제(DCE)로 활용한 경우 반응의 불균일성으로 인하여 기계적 물성이 좋지 못하였으며, 특히 에스테르계 폴리올인 poly(butylene/ethylene adipate) glycol(PBEAG)로 합성한 경우 내가수분해성이 현저히 저하되었다. 그러나 DCE로 N-methyldiethanol amine(MDEA)를 사용하고 HS/SS를 1.3으로 조절한 경우 기계적 물성과 염색성이 향상되었으며, MDEA를 선형 쇄연장제(CE)인 1,4-butanediol(1,4-BD)과 에테르형 폴리올인 poly[oxyteramethylene] glycol(PTMG)과 반응시킨 경우 기계적 물성과 내가수분해성이 현저하게 향상되었다. 특히 분자설계적 측면에서 DCE를 HS와 SS내의 배분과 1,6-hexanediol(1,6-HD) 및 neopentylglycol(NPG)과의 공쇄연장으로 초기탄성률, 인장강도, 신장률을 제어 할 수 있음을 알 수 있다.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.44-45
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• 2006

Gene therapy holds great promise for treating various forms of diseases with a genetic origin including cystic fibrosis, different forms of cancer, and cardiovascular disorders. The clinical use of gene therapy treatments is however restricted, mainly because of the absence of safe and efficient gene delivery technologies. In our group, with an aim of developing efficient and nontoxic polymeric gene delivery systems, several novel types of polymeric gene carriers have been designed, synthesized, and evaluated. Herein, I will mainly present our recent work on low molecular weight linear PEI-PEG-PEI triblock copolymers, degradable hyperbranched poly(ester amine)s, and reduction-sensitive poly(amido amine)s.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.546-546
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• 2008

Copper (Cu) Chemical mechanical polishing (CMP) has been an essential process for Cu wifing of DRAM and NAND flash memory beyond 45nm. Copper has been employed as ideal material for interconnect and metal line due to the low resistivity and high resistant to electro-migration. Damascene process is currently used in conjunction with CMP in the fabrication of multi-level copper interconnects for advanced logic and memory devices. Cu CMP involves removal of material by the combination of chemical and mechanical action. Chemicals in slurry aid in material removal by modifying the surface film while abrasion between the particles, pad, and the modified film facilitates mechanical removal. In our research, we emphasized on the role of chemical effect of slurry on Cu CMP, especially on the effect of amine functional group on removal rate selectivity between Cu and Tantalum-nitride (TaN) film. We investigated the two different kinds of complexing agent both with amine functional group. On the one hand, Polyacrylamide as a polymer affected the stability of abrasive, viscosity of slurry and the corrosion current of copper film especially at high concentration. At higher concentration, the aggregation of abrasive particles was suppressed by the steric effect of PAM, thus showed higher fraction of small particle distribution. It also showed a fluctuation behavior of the viscosity of slurry at high shear rate due to transformation of polymer chain. Also, because of forming thick passivation layer on the surface of Cu film, the diffusion of oxidant to the Cu surface was inhibited; therefore, the corrosion current with 0.7wt% PAM was smaller than that without PAM. the polishing rate of Cu film slightly increased up to 0.3wt%, then decreased with increasing of PAM concentration. On the contrary, the polishing rate of TaN film was strongly suppressed and saturated with increasing of PAM concentration at 0.3wt%. We also studied the electrostatic interaction between abrasive particle and Cu/TaN film with different PAM concentration. On the other hand, amino-methyl-propanol (AMP) as a single molecule does not affect the stability, rheological and corrosion behavior of the slurry as the polymer PAM. The polishing behavior of TaN film and selectivity with AMP appeared the similar trend to the slurry with PAM. The polishing behavior of Cu film with AMP, however, was quite different with that of PAM. We assume this difference was originated from different compactness of surface passivation layer on the Cu film under the same concentration due to the different molecular weight of PAM and AMP.