• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.392-396
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• 1999

Superconducting YBa$_2Cu_3O_{7-{\delta}}$(YBCO) thin films were grown on Hastelloy(Ni-Cr-Mo alloys) with CeO$_2$ buffer layer in-situ by pulsed laser deposition in a multi-target processing chamber. To apply superconducting property on power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to grow the YBCO films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting overlayers and non-crystallization of YBCO on amorphous substrate. It is necessary to use a buffer layer to overcome the difficulties. We have chosen CeO$_2$ as a buffer layer which has cubic structure of 5.41 ${\AA}$ lattice parameter and only 0.2% of lattice mismatch with 3.82 ${\AA}$ of a-axis lattice parameter of YBCO on [110] direction of CeO$_2$ In order to enhance the crystallization of YBCO films on metallic substrates, we deposited CeO$_2$ buffer layers with varying temperature and 02 pressure. By XRD, it is observed that dominated film orientation is strongly depending on the deposition temperature of CeO$_2$ layer. The dominated orientation of CeO$_2$ buffer layer is changed from (200) to(111) by increasing the deposition temperature and this transition affects the crystallization of YBCO superconducting film on CeO$_2$ buffered Hastelloy.

• 한국진공학회지
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• 제8권1호
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• pp.43-50
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• 1999

이온빔보조증착법으로 h-BN을 증착하여 이온에너지 및 기판온도에 따른 hexagonal ring의 배열 및 결정성의 변화를 연구하였다. 보론은 전자빔으로 1.5 $\AA$/sec 의 속도로 증발시켰으며, 질소는 둥-hall 형 이온건으로 60, 80, 100eV의 에너지로 공급하였다. 기판의 온도는 상온(no heating), 200, 400, 500, $800^{\circ}C$로 변화시켰다. 질소이온에너지가 증가할수록 hexagonal ring의 c축은 기판에 평행하게 배열하여 100 eV의 질소이온에너지에서 가장 좋은 배열을 나타내었다. 이는 이온에너지가 높을수록 합성 막에 큰 압축응력이 발생하기 때문으로 생각된다. 기판온도에 따라서는 온도가 증가함에 따라 배열이 증가하다가 약 $400^{\circ}C$에서 최대가 되고 그 보다 높은 온도에서는 배열이 감소하였다. 그리고 결정도는 온도가 증가할수록 향상되었다. 이러한 경향들은 온도가 증가함에 따라 원자 이동도는 증가하고 응력발생은 어려워지는 경향으로부터 잘 설명된다. 또한 nano-indentor로 측정한 h-BN막의 경도는 c-축의 배열정도와 같은 경향을 보였다. 이온빔보조증착법은 hexagonal ring의 배열을 통해 h-BN막 성질의 최적화에 효과적인 방법으로 판단된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.383-383
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• 2010

Gas-phase hydrogen atoms create a variety of chemical and physical phenomena on Si surfaces: adsorption, abstraction of pre-adsorbed H, Si etching, Si amorphization, and penetration into the bulk lattice. Thermal desorption/evolution analyses exhibited three distinct peaks, including one from the crystalline bulk. It was previously found that thermal-energy gaseous H(g) atoms penetrate into the Si(100) crystalline bulk within a narrow substrate temperature window(centered at ~460K) and remain trapped in the bulk lattice before evolving out at a temperature as high as ~900K. Developing and sustaining atomic-scale surface roughness, by H-induced silicon etching, is a prerequisite for H absorption and determines the $T_s$ windows. Issues on the H(g) absorption to be further clarified are: (1) the role of the detailed atomic surface structure, together with other experimental conditions, (2) the particular physical lattice sites occupied by, and (3) the chemical nature of, absorbed H(g) atoms. This work has investigated and compared the thermal H(g) atom absorptivity of Si(100), Si(111) and Si(110) samples in detail by using the temperature programmed desorption mass spectrometry (TPD-MS). Due to the differences in the atomic structures of, and in the facility of creating atom-scale etch pits on, Si(100), (100) and (110) surfaces, the H-absorption efficiency was found to be larger in the order of Si(100) > Si(111) > Si(110) with a relative ratio of 1 : 0.22 : 0.045. This intriguing result was interpreted in terms of the atomic-scale surface roughening and kinetic competition among H(g) adsorption, H(a)-by-H(g) abstraction, $SiH_3(a)$-by-H(g) etching, and H(g) penetraion into the crystalline silicon bulk.

• 전기의세계
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• 제28권4호
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• pp.53-63
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• 1979

Interface recombination velocity in $Al_{x}$G $a_{1-x}$ As-GaAs and $Al_{0.85}$, G $a_{0.15}$ As-GaA $s_{1-y}$S $b_{y}$ heterojunction systems is studied as a function of lattice mismatch. The results are applied to the design of highly efficient III-V heterojunction solar cells. A horizontal liquid-phase epitaxial growth system was used to prepare p-p-p and p-p-n $Al_{x}$G $a_{1-x}$ As-GaA $s_{1-y}$S $b_{y}$-A $l_{x}$G $a_{1-x}$ As double heterojunction test samples with specified values of x and y. Samples were grown at each composition, with different GaAs and GaAs Sb layer thicknesses. A method was developed to obtain the lattice mismatch and lattice constants in mixed single crystals grown on (100) and (111)B oriented GaAs substrates. In the AlGaAs system, elastic lattice deformation with effective Poisson ratios .mu.$_{eff}$ (100=0.312 and .mu.$_{eff}$ (111B) =0.190 was observed. The lattice constant $a_{0}$ (A $l_{x}$G $a_{1-x}$ As)=5.6532+0.0084x.angs. was obtained at 300K which is in good Agreement with Vegard's law. In the GaAsSb system, although elastic lattice deformation was observed in (111) B-oriented crystals, misfit dislocations reduced the Poisson ratio to zero in (100)-oriented samples. When $a_{0}$ (GaSb)=6.0959 .angs. was assumed at 300K, both (100) and (111)B oriented GaAsSb layers deviated only slightly from Vegard's law. Both (100) and (111)B zero-mismatch $Al_{0.85}$ G $a_{0.15}$As-GaA $s_{1-y}$S $b_{y}$ layers were grown from melts with a weight ratio of $W_{sb}$ / $W_{Ga}$ =0.13 and a growth temperature of 840 to 820 .deg.C. The corresponding Sb compositions were y=0.015 and 0.024 on (100) and (111)B orientations, respectively. This occurs because of a fortuitous in the Sb distribution coefficient with orientation. Interface recombination velocity was estimated from the dependence of the effective minority carrier lifetime on double-heterojunction spacing, using either optical phase-shift or electroluminescence timedecay techniques. The recombination velocity at a (100) interface was reduced from (2 to 3)*10$^{4}$ for y=0 to (6 to 7)*10$^{3}$ cm/sec for lattice-matched $Al_{0.85}$G $a_{0.15}$As-GaA $s_{0.985}$S $b_{0.015}$ Although this reduction is slightly less than that expected from the exponential relationship between interface recombination velocity and lattice mismatch as found in the AlGaAs-GaAs system, solar cells constructed from such a combination of materials should have an excellent spectral response to photons with energies over the full range from 1.4 to 2.6 eV. Similar measurements on a (111) B oriented lattice-matched heterojunction produced some-what larger interface recombination velocities.ities.ities.s.

• Nuclear Engineering and Technology
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• 제52권6호
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• pp.1120-1130
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• 2020

The CREOLE experiment performed In the EOLE critical facility located In the Nuclear Center of CADARACHE - CEA have allowed us to get interesting and complete experimental information on the temperature effects in the light water reactor lattices. To analyze these experiments with accuracy an elaborate calculation scheme using the Monte Carlo method implemented in the MCNP6.1 code and the ENDF/B-VII.1 cross section library has been developed. We have used the ENDF/B-VII.1 data provided with the MCNP6.1.1 version in ACE format and the Makxsf utility to handle the data in the specific temperatures not available in the MCNP6.1.1 original library. The main purpose of this analysis is the qualification of the ENDF/B-VII.1 nuclear data for the prediction of the Reactivity Temperature Coefficient while ensuring the ability of the MCNP6.1 system to model such a complex experiment as CREOLE. We have analyzed the case of UO₂ lattice with 1166 ppm of boron in ordinary water moderator in specified temperatures. A detailed comparison of the calculated effective multiplication factors with the reference ones [1] in room temperature presented in this work shows a good agreement demonstrating the validation of our 3D calculation model. The discrepancies between calculations and the differential measurements of the Reactivity Temperature Coefficient for the analyzed configuration are relatively small: the maximum discrepancy doesn't exceed 1,1 pcm/℃. In addition to the analysis of direct differential measurements of the reactivity temperature coefficient performed in the poisoned UO₂ lattice configuration, we have also analyzed integral measurements in UO₂ clean lattice configuration using equivalency of the integral temperature reactivity worth with the driver core fuel reactivity worth and soluble boron reactivity worth. In this case both of the ENDF/B-VII.1 and JENDL.4 libraries were used in our analysis and the obtained results are very similar.

• 대한화학회지
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• 제58권6호
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• pp.528-534
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• 2014

어떤 이성분계용액에서는 상한임계용액온도와 하한임계용액온도가 동시에 나타나는 원형모양의 온도-조성 상도를 보인다. 이러한 현상은 분자간 특정상호작용이 존재하는 경우 나타나는 것으로 알려져 있다. 특정상호작용을 묘사하는 방법에는 여러 가지가 있다. 본 연구에서는 특정상호작용의 총수가 이항분포에 따라 분포한다고 가정하였다. 이 경우 특정상호작용을 Regular 용액이론, Quasichemical 이론 그리고 Flory-Huggins 격자이론에 적용하였을 때 원형모양의 온도-조성 상도를 보이는 경우에 대한 정확한 수학적인 조건을 유도하였다. 그리고 매개변수들이 온도-조성상도에 미치는 영향을 조사하였고, 물-니코틴에 대한 온도-조성상도를 계산하여 실험값과 비교하여 보았다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제16권6호
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• pp.854-859
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• 2016

Recently, GeSn is drawing great deal of interests as one of the candidates for group-IV-driven optical interconnect for integration with the Si complementary metal-oxide-semiconductor (CMOS) owing to its pseudo-direct band structure and high electron and hole mobilities. However, the large lattice mismatch between GeSn and Si as well as the Sn segregation have been considered to be issues in preparing GeSn on Si. In this work, we deposit the GeSn films on Si by DC magnetron sputtering at a low temperature of $250^{\circ}C$ and characterize the thin films. To reduce the stresses by GeSn onto Si, Ge buffer deposited under different processing conditions were inserted between Si and GeSn. As the result, polycrystalline GeSn domains with Sn atomic fraction of 6.51% on Si were successfully obtained and it has been demonstrated that the Ge buffer layer deposited at a higher sputtering power can relax the stress induced by the large lattice mismatch between Si substrate and GeSn thin films.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.47-50
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• 2000

This paper investigated structural and electrical properties of $Y_2$ $O_3$ as a buffer layer of single transistor FRAM (ferroelectric RAM). $Y_2$ $O_3$ buffer layers were deposited at a low substrate temperature below 40$0^{\circ}C$ and then RTA (rapid thermal anneal) treated. Investigated parameters are substrate temperature, $O_2$ partial pressure, post-annealing temperature, and suppression of interfacial $SiO_2$ layer generation. For a well-fabricated sample, we achieved that leakage current density ( $J_{leak}$) in the order of 10$^{-7}$ A/$\textrm{cm}^2$, breakdown electric field ( $E_{br}$ ) about 2 MV/cm for $Y_2$ $O_3$ film. Capacitance versus voltage analysis illustrated dielectric constants of 7.47. We successfully achieved an interface state density of $Y_2$ $O_3$/Si as low as 8.72x1010 c $m^{-2}$ e $V^{-1}$ . The low interface states were obtained from very low lattice mismatch less than 1.75%.

• Bulletin of the Korean Chemical Society
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• 제14권1호
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• pp.91-95
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• 1993

In this work we have studied the spin-lattice relaxation of $^{19}$F spins in benzotrifluoride in our quest for a reliable method of discriminating the contribution due to dipolar relaxation mechanism from that due to spin-rotational mechanism for nuclear spins located on methyl or substituted methyl group in organic molecules. Over the temperature range of 248-268 K the decay of normalized longitudinal magnetization was found to be well described by a two parameter equation of the form R(t) = exp(-st){$\frac{5}{6}$exp(-s$_1$)+$\frac{1}{6}$} which was derived under the assumption that interactions in the A3 spin system are modulated randomly and predominantly by internal rotational motions of -CF_3$ top, and it was shown that the separation of contribution due to dipolar interactions from that due to spin-rotation interaction could be successfully achieved by least-square fitting of observed data to this equation. The results indicate that the spin-rotational contribution is overwhelmingly larger than that of dipolar origin over the given temperature range and becomes more deminating at higher temperature.

• Bulletin of the Korean Chemical Society
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• 제15권9호
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• pp.713-718
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• 1994

Manganese-incorporated neodymium oxide systems with a variety of Mn mol% were prepared to investigate the effect of doping on the electrical properties of neodymium oxide. XRD, XPS, SEM, DSC, and TG techniques were used to analyze the specimens. The systems containing 2, 5, 8, and 10 mol% Mn were found to be solid solutions by X-ray diffraction analysis and the lattice parameters were obtained for the single-phase hexagonal structure by the Nelson-Riley method. The lattice parameters, a and c, decreased with increasing Mn mol%. Scanning electron photomicrographs of the specimens showed that the grain size decreased with increasing Mn mol%. The curves of log conductivity plotted as a function of 1/T in the temperature range from 500 to 1000$^{\circ}C$ at $PO_2$'s of $10^{-5}$ to $10^{-1}$ atm for the specimens were divided into high-and low-temperature regions with inflection points near 820-890$^{\circ}C$. The activation energies obtained from the slopes were 0.53-0.87 eV for low-temperature region and 1.40-1.91 eV for high-temperature region. The electrical conductivities increased with increasing Mn mol% and $PO_2$, indicating that all the specimens were p-type semiconductors. At $PO_2$'s below $10^{-3}$ atm, the electrical conductivity was affected by the chemisorption of oxygen molecule in the temperature range of 660 to 850$^{\circ}C$. It is suggested that electron holes generated by oxygen incorporation into the oxide are charge carriers for the electrical conduction in the high-temperature region and the system includes ionic conduction owing to the diffusion of oxygen atoms in the low-temperature region.