• Title/Summary/Keyword: large vacuum chamber

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A Study on the Formation of Air Bubble by the Droplet Volume and Dispensing Method in UV NIL (UV NIL공정에서 액적의 양과 도포방법에 따른 기포형성 연구)

  • Lee, Ki Yeon;Kim, Kug Weon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.14 no.9
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    • pp.4178-4184
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    • 2013
  • Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Recently, the major trends of NIL are high throughput and large area patterning. UV curable type NIL (UV NIL) can be performed at room temperature and low pressure. And one advantage of UV NIL is that it does not need vacuum, which greatly simplifies tool construction, so that vacuum oprated high-precision stages and a large vacuum chamber are no longer needed. However, one key issue in non-vacuum environment is air bubble formation problem. Namely, can the air bubbles be completely removed from the resist. In this paper, the air bubbles formation by the method of droplet application in UV NIL with non-vacuum environment are experimentally studied. The effects of the volume of droplet and the number of dispensing points on air bubble formation are investigated.

THERMAL SYSTEM DESIGN FOR A LARGE SPACE $SIMULATOR(\Phi8m\;\times\;L10m)$

  • Moon Guee-Won;Cho Chang-Lae;Cho Hyokjin;Lee Sang-Hoon;Seo Hee-Jun;Choi Seok-Weon
    • Bulletin of the Korean Space Science Society
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    • 2004.10b
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    • pp.281-284
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    • 2004
  • According to the National Space Program of Korea, KARI (Korea Aerospace Research Institute) has been developing a large space simulator (working dimension; $\Phi8m\;\times\;L10m$) to verify the performance of future large satellites under the space environment conditions. Especially, a very low temperature condition of space will be simulated by shrouds covering the inside surface of the vessel. The surface of shrouds will be cooled down to 17K by liquid nitrogen (LN2) from ambient temperature and hence, an optimal LN2 circulation system design is necessary to remove gaseous nitrogen (GN2) sufficiently and maintain the shrouds at the LN2 temperature.

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Fabrication of Pentacene Thin Film Transistors by using Organic Vapor Phase Deposition System (Organic Vapor Phase Deposition 방식을 이용한 펜타센 유기박막트랜지스터의 제작)

  • Jung Bo-Chul;Song Chung-Kun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.6
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    • pp.512-518
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    • 2006
  • In this paper, we investigated the deposition of pentacene thin film on a large area substrate by Organic Vapor Phase Deposition(OVPD) and applied it to fabrication of Organic Thin Film Transistor(OTFT). We extracted the optimum deposition conditions such as evaporation temperature of $260^{\circ}C$, carrier gas flow rate of 10 sccm and chamber vacuum pressure of 0.1 torr. We fabricated 72 OTFTs on the 4 inch size Si Wafer, Which produced the average mobility of $0.1{\pm}0.021cm^2/V{\cdot}s$, average subthreshold slope of 1.04 dec/V, average threshold voltage of -6.55 V, and off-state current is $0.973pA/{\mu}m$. The overall performance of pentacene TFTs over 4 ' wafer exhibited the uniformity with the variation less than 20 %. This proves that OVPD is a suitable methode for the deposition of organic thin film over a large area substrate.

Effect of Critical Cooling Rate for Minimization of Porosity in the Thick Aluminum Casting (후육 Al 주조재의 기포결함 최소화를 위한 임계냉각속도의 영향)

  • Kwak, Si-Young;Cho, In-Sung;Kim, Yong-Hyun;Lee, Hee-Kwon
    • Journal of Korea Foundry Society
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    • v.37 no.6
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    • pp.181-185
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    • 2017
  • In the present study, the effect of cooling rate on the formation of the porosity in the thick aluminum sand casting was investigated. Nowadays, due to considerations of weight and cost reduction, large scale thick aluminum casting has replaces steel frames for vacuum chambers for semiconductor production. Several thick aluminum castings were manufactured using chill with temperature measurements. The castings were inspected using 3D computed tomography in order to quantify the porosity defect density in the castings. Effects of the thickness of the chill on the porosity defect density were discussed.

THERMAL MODEL CORRELATION OF A GEOSTATIONARY SATELLITE (정지궤도 위성의 열해석 모델 보정)

  • Jun, H.Y.;Kim, J.H.
    • 한국전산유체공학회:학술대회논문집
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    • 2011.05a
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    • pp.230-235
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    • 2011
  • COMS (Communication, Ocean and Meteorological Satellite) is a geostationary satellite and was developed by KARI for communication, ocean and meteorological observations. COMS was tested under vacuum and very law temperature conditions in order to correlate thermal model and to verify thermal design. The test was performed by using KARI large thermal vacuum chamber. The COMS S/C thermal model was successfully correlated versus the 2 thermal balance test phases. After model correlation, temperatures deviation of all individual unit were less than $5^{\circ}C$ and global deviation and standard deviation also satisfied the requirements, less than $2^{\circ}C$ and $3^{\circ}C$. The final flight prediction was performed by using the correlated thermal model.

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THERMAL MODEL CORRELATION OF A GEOSTATIONARY SATELLITE (지구 정지궤도 위성의 열해석 모델 보정)

  • Jun, H.Y.;Kim, J.H.
    • Journal of computational fluids engineering
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    • v.16 no.3
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    • pp.59-65
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    • 2011
  • COMS (Communication, Ocean and Meteorological Satellite) is a geostationary satellite and was developed by KARI for communication, ocean and meteorological observations. COMS was tested under vacuum and very low temperature conditions in order to correlate thermal model and to verify thermal design. The test was performed by using KARI large thermal vacuum chamber. The COMS S/C thermal model was successfully correlated versus the 2 thermal balance test phases. After model correlation, temperatures deviation of all individual units were less than $5^{\circ}C$ and global deviation and standard deviation also satisfied the requirements, less than $2^{\circ}C$ and $3^{\circ}C$. The final flight prediction was performed by using the correlated thermal model.

Growth of zinc oxide thin films by oxygen plasma-assisted pulsed laser deposition

  • Pak, Sang-Woo;Suh, Joo-Young;Lee, Dong-Uk;Kim, Eun-Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.208-208
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    • 2010
  • Zinc oxide (ZnO) is a functional material with interesting optical and electrical properties, a wide band gap (more than 3.3 eV), a high transmittance in the visible light region, piezoelectric properties, and a high n-type conductivity. This material has been investigated for use in many applications, such as transparent electrodes, blue light-emitting diodes, and ultra-violet detector. ZnO films grown under low oxygen pressure by thin film deposition methods show low resistivity and large free electron concentration. Therefore, reducing the background carrier concentration in ZnO films is one of the major challenges ahead of realizing high-performance ZnO-based optoelectronic devices. In this study, we deposited ZnO thin films on sapphire substrates by pulsed laser deposition (PLD) with employing an oxygen plasma source to decrease the background free-electron concentration and enhance the crystalline quality. Then, the substrate temperature was varied between 200 'C to 900 'C The vacuum chamber was initially evacuated to a pressure of $10^{-6}$ Torr, and then a pure $O_2$ gas was introduced into the chamber and the pressure during deposition was maintained at $10^{-2}$ Torr. Crystallinity and orientation of ZnO films were investigated by X-ray diffraction (XRD). The film surface was analyzed with atomic force microscope (AFM). And electrical properties were measured at room temperature by Hall measurement.

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Research to Achieve Uniform Plasma in Multi-ground Capacitive Coupled Plasma

  • Park, Gi-Jeong;Lee, Yun-Seong;Yu, Dae-Ho;Lee, Jin-Won;Lee, Jeong-Beom;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.247.1-247.1
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    • 2014
  • The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

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An experimental study of hot filament chemical vapor deposition for diamond films (HFCVD에 의한 다이아몬드 박막 증착에 관한 실험적 연구)

  • Kim, Yeong-Jae;Han, Dong-Cheol;Choe, Man-Su
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.22 no.5
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    • pp.563-572
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    • 1998
  • An experimental study of hot filament chemical vapor deposition(HFCVD) has been carried out for the fabrication of diamond thin film. Of particular interest is the measurement of deposition uniformity on large substrates. Experimental apparatus including a vacuum chamber, heating elements, etc. has been designed and manufactured. Deposition profiles for different pretreatment powders and different flow rates have been measured in conjunction with the measurement of substrate temperature distribution on a large substrate surface. As the flow rate increases, deposition rate increases, however, the crystallinity becomes worse. Higher growth rate has been found on the region closer to the center location where substrate temperature is higher. The crystallinity has been improved as gas flow rate decreases. The growth rate and morphology of deposition were identified by SEM and the existence of diamond phase was proved by Raman spectroscopy.