• Title/Summary/Keyword: large plasma source

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Plasma Upflows and Microwave Emission in Hot Supra-arcade Structure associated with M1.6 Limb Flare

  • Kim, Sujin;Shibasaki, Kiyoto;Bain, Hazel M.;Cho, Kyung-Suk
    • The Bulletin of The Korean Astronomical Society
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    • v.39 no.1
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    • pp.74.1-74.1
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    • 2014
  • We have investigated a supra-arcade structure associated with an M1.6 flare, which occurred on the south-east limb in the 4th of November 2010. It is ob- served in extreme ultraviolet (EUV) with the Atmospheric Imaging Assembly (AIA) onboard the Solar Dynamics Observatory (SDO), microwaves at 17 and 34 GHz with the Nobeyama Radioheliograph (NoRH), and soft X-rays of 8-20 keV with the Reuven Ramaty High Energy Solar Spectroscopic Imager (RHESSI). Interestingly, we found exceptional properties of the supra-arcade thermal plasma from the AIA 131 A and the NoRH: 1) plasma upflows along large coronal loops and 2) enhancing microwave emission. RHESSI detected two soft X-ray sources, a broad one in the middle of supra-arcade structure and a bright one just above the flare-arcade. We estimated the number density and thermal energy for these two source regions during the decay phase of the flare. In the supra-arcade source, we found that there were increases of the thermal energy and the density at the early and the last stages, respectively. On the contrary, the density and thermal energy of the source on the top of the flare-arcade decreases throughout. The observed upflows imply that there is continuous energy supply into the supra- arcade structure from below during the decay phase of the flare. It is hard to be explained by the standard flare model in which the energy release site is located high in corona. Thus, we suggest that the potential candidate as the energy source for the hot supra-arcade structure is the flare-arcade which has exhibited a predominant emission throughout.

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A Study of the Properties of Optically Induced Layers in Semiconductors Aided by the Reflection of Optically Controlled Microwave Pulses

  • Wang, Xue;Choi, Yue-Soon;Park, Jong-Goo;Kim, Yong-K.
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.4
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    • pp.111-115
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    • 2009
  • We present a study on the reflection of optically controlled microwave pulses from non uniform plasma layers in semiconductors. The transient response of the microwave pulses in different plasma layers has been evaluated by means of the reflection function of dielectric microstrip lines. The lines were used with an open-ended termination containing an optically induced plasma region, which was illuminated by a light source. The reflection characteristics impedance resulting from the presence of plasma is evaluated by means of the equivalent transmission line model. We have analyzed the variation of the transient response in a 0.01 cm layer with a surface frequency in the region of 128 GHz. In the reflection the variation of the diffusion length $L_D$ is large compared with the absorption depth $1/{\alpha}_l$. The variation of the characteristic response of the plasma layer with differentially localized pulses has been evaluated analytically. The change of the reflection amplitude has been observed at depths of 0.1 cm, 0.01 cm and $0.1{\times}10^{-5}$ cm respectively.

Research of Nitriding Process on Austenite Stainless Steel with Plasma Immersion Ion Beam (플라스마 이온증착 기술을 이용한 스테인리스강의 질화처리에 관한 연구)

  • Kim, Jae-Dol;Park, Il-Soo;Ok, Chul-Ho
    • Journal of Advanced Marine Engineering and Technology
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    • v.32 no.2
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    • pp.262-267
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    • 2008
  • Plasma immersion ion beam (PIIB) nitriding process is an environmentally benign and cost-effective process, and offers the potential of producing high dose of nitrogen ions in a way of simple, fast and economic technique for the high plasma flux treatment of large surface area with nitrogen ion source gas. In this report PIIB nitriding technique was used for nitriding on austenite stainless steel of AISI304 with plasma treatment at $250{\sim}500^{\circ}C$ for 4 hours, and with the working gas pressure of $2.67{\times}10^{-1}$ Pa in vacuum condition. This PIIB process might prove the advantage of the low energy high flux of ion bombardment and enhance the tribological or mechanical properties of austenite stainless steel by nitriding, Furthermore, PIIB showed a useful surface modification technique for the nitriding an irregularly shaped three dimensional workpiece of austenite stainless steel and for the improvement of surface properties of AISI 304, such as hardness and strength

Effect of Duck Extract on Lipids in Rats (오리를 이용한 한방식품 추출액이 흰쥐의 지질함량에 미치는 영향)

  • 김정선;김우경
    • Journal of Nutrition and Health
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    • v.36 no.1
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    • pp.3-8
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    • 2003
  • The aim of the present study was to investigate the effect of duck extract on lipids. Rats in the experimental group were orally administered with duck extract for four weeks. The half of the supplementation was composed of duck meat and the other of the supplementation was composed of oriental herbs. Weight gain, diet intake, and food efficiency ratio were compared between control and experimental groups. Organ weight, lengths of small/large intestines, and the following plasma biochemical parameters were also measured: hemoglobin, hemoglobin, GOT, GPT, blood glucose concentration, lipids of plasma, liver, feces. Spleen index (weight/100 g body weight) of the rats in the experimental group was significantly higher than those in the control group due to increase in fat intake from the supplementation of duck meat. The large intestines of the rats in the experimental group was significantly larger due to the supplementation with dietary fiber derived from herbs in the extract. There were significant higher levels of plasma hematocrit, GOT, total cholesterol, and HDL-cholesterol in the rats of the experimental group. From the results, although duck meat is a source of animal food, the fat profile of duck extract, such as the ratio of polyunsaturated fatty acids to saturated fatty acids appears to be beneficial to human health. These findings suggest a possible anti-hyperlipidemic effect of duck extract. (Korean J Nutrition 36(1): 3∼8, 2003)

Large Area Diamond Nucleation and Si (001) Using Magnetoactive Microwave Plasma Chemical Vapor Deposition

  • Hyeongmin Jeon;Akimitsu Hatta;Hidetoshi Suzuki;Nam Jiang;Jaihyung Won;Toshimichi Ito;Takatomo Sasaki;Chongmu Lee;Akio Hiraki
    • The Korean Journal of Ceramics
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    • v.3 no.3
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    • pp.159-162
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    • 1997
  • Diamond was uniformly nucleated on large area Si(001) substrate (3cm$\times$4cm) using the low pressure magnetoactive microwave plasma chemical vapor deposition. $CH_4/He$ gas mixture was used as source gas in order to obtain high radical density in the nucleation enhancement step. $CH_3$radical density was measured by means of infrared laser absorption spectroscopy. The effect of substrate bias voltage on diamond nucleation was examined. The results showed that a suitable positive bias voltage appled to the substrate with respect to the chamber could enhance diamond nucleation while a negative bias voltages leaded to deposition of only non-diamond phase carbon.

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3D Etching Profile used Inductive Coupled Plasma (ICP) Source with Ambipolar Drift and Binary-Collision Effect. (쌍극성표동 효과와 이체충돌효과를 고려한 ICP(Inductive Coupled Plasma) 3차원 식각)

  • 이영직;이강환;이주율;강정원;문원하;손명식;황호정
    • Proceedings of the IEEK Conference
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    • 1999.11a
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    • pp.891-894
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    • 1999
  • ICP reactor produces high-density and high-uniformity plasma in large area, are has excellent characteristic of direction in the case of etching. Until now, many algorithms used one mesh method. These algorithms are not appropriate for sub 0.1 ${\mu}{\textrm}{m}$ device technologies which should deal with each ion. These algorithms could not present exactly straggle and interaction between projectile ions and could not consider reflection effects due to interactions among next projectile ions, reflected ions and sputtering ions, simultaneously. And difficult consider am-bipolar drift effect.

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VHF-PECVD OF Ti/TiN WITH SILANE REDUCTION PROCESS

  • Mizuno, Shigeru
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.350-356
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    • 1996
  • This paper presents VHF-Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD) of Ti/TiN with silne reduction process, using $TiCl_4$ source. VHF plasma, which is denser than a conventional RF plasma, produces a large number of radicals. Silane reduction process, which supplies silane radicals, more promotes dissociation of Ti-Cl bond than a conventional hydrogen reduction process. therefore, the VHF-PECVD with silane reduction process forms high quality Ti/TiN films, which have low level of Cl content(<0.2 at.%). In result, the resistivity for Ti or TiN is less than 200$\mu$$\Omega$cm. The surface morphology of Ti film is very smooth. The structure of TiN film is amorphous. Furthermore, excellent step coverage for the films is obtained.

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Research to Achieve Uniform Plasma in Multi-ground Capacitive Coupled Plasma

  • Park, Gi-Jeong;Lee, Yun-Seong;Yu, Dae-Ho;Lee, Jin-Won;Lee, Jeong-Beom;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.247.1-247.1
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    • 2014
  • The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

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Spectral Analyses of Plasma Induced by Laser Welding of Aluminum Alloys (알루미늄 합금의 레이저 용접시 유기하는 플라즈마의 스펙트럼 분석)

  • 김종도;최영국;김영식
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2001.10a
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    • pp.292-300
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    • 2001
  • The paper describes spectroscopic characteristics of plasma induces in the pulsed YAG laser welding of alloys containing a large amount of volatile elements. The authors have conducted the spectroscopic analyses of laser induced Al-Mg alloys plasma in the air and argon atmosphere. In the air environment, the identified spectra were atomic lines of Al, Mg, Cr, Mn, Cu, Fe and Zn, and singly ionized Mg lines, as well as the intense molecular spectra of A10 and Mg0 formed by chemical reactions of evaporated Al and Mg atoms from the pool surface with oxygen in the air. In argon atmosphere, Mg0 and AI0 spectra vanished, but AIH spectrum was detected. The hydrogen source was presumably hydrogen dissolved in the base metals, water absorbed on the surface oxide layer, or $H_2$ and $H_2O$ in the shielding gas. The resonant 1ines of Al and Mg were strongly self-absorbed, in particular, self-absorption of the Mg 1ine was predominant. These results show that the laser induced plasma was made of metal1ic vapor with relatively low temperature and high density.

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Discharge characteristics of FFL as the variation of cell structure (셀 구조 변화에 따른 FFL(Flat Fluorescent Lamp)의 방전특성)

  • 윤성현;박철현;조민정;임민수;권순석;임기조
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.600-603
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    • 2000
  • Recently, Display devices have become important in the information-oriented society and flat display devices are greatly demanded. Liquid crystal display(LCD) represents one of the most promising devices for large size desk-top monitors, notebook PC and car navigation system. However LCD cannot give forth light itself and must have backlight system. The most popular backlighting system is composed of a lighting-guide plate and CCFL as a lighting source. The number of CCFL must increase up if the area of display is increased. So a new backlighting source with high luminance is needed for large LCDs. In this paper, we proposed a surface discharge FFL with the new electrode structure like the needle shaped electrode as the variation of cell structure to high luminance and low power consumption. In comparison with different electrode structure it has low discharge voltage and current and good optical characteristics. So it has better discharge characteristics than different surface discharge FFL and can be fungible for a backlight as a lighting source in LCDs.

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