• Korean Journal of Optics and Photonics
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• v.20 no.6
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• pp.334-338
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• 2009

Recently, with increasing demand for flat-panel display product, methods for large area patterning are required. TIR (total internal reflection) holographic photo-lithography isstudied as one of the methods of large area lithography. In conventional TIR holography, light sources for hologram recording and image reconstruction are coherent beams such as laser beams. If the image is reconstructed with an incoherent light source such a UV lamp, the image noise from the coherence of light will be reduced and the UV lamp will be a better light source for large area exposure. We analyzed the effect of spectral bandwidth and angular bandwidth of the light source in image reconstruction and verified image blurring with experiments. For large area patterning which has micro-scale line width, it is expected that TIR holographic photo lithography by UV lamp will become a low-noise and low-priced technique.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.301.1-301.1
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• 2016

We report an ultraclean, cost-effective, and easily scalable method of transferring and patterning large-area graphene using pressure sensitive adhesive films (PSAFs) at room temperature. This simple transfer is enabled by the difference in wettability and adhesion energy of graphene with respect to PSAF and a target substrate. The PSAF transferred graphene is found to be free from residues, and shows excellent charge carrier mobility as high as ${\sim}17,700cm^2/V{\cdot}s$ with less doping compared to the graphene transferred by thermal release tape (TRT) or poly(methyl methacrylate) (PMMA) as well as good uniformity over large areas. In addition, the sheet resistance of graphene transferred by recycled PSAF does not change considerably up to 4 times, which would be advantageous for more cost-effective and environmentally friendly production of large-area graphene films for practical applications.

• Journal of the Korean Society for Precision Engineering
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• v.31 no.5
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• pp.367-373
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• 2014

Surface texturing is a machining process on the surface to give engineering functions. The representative process of the surface texturing is lotus effect to give hydrophobic property by the lithography and chemical etching, which is the bio mimic from the nature. Surface texturing can be manufactured by a lot of processes, in particular using mechanical method such as a precise diamond turning, grinding, rolling, embossing, vibrorolling, and abrasive jet machining (AJM). Among them, the grinding process is notable in terms of the wide range of texturing area and fast processing time. The patterning by grinding is done by the grooved grinding wheel on the work piece. In this case, the pattern shape is determined by the grinding conditions as well as the wheel dressing conditions. In this paper, experimental study on the pattern shapes were done and provide the feasibility in use for the large area patterning.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.381-384
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• 2003

Photosensitive electordes(Ag and Black) are widely used in the patterning of both address and bus electrodes on the rear and front panel of plasma display panel (PDP). As the need for high resolution(>XGA) and large area(>60 inches) PDP is increased, basic understanding of each component of formulation on the photolithographic process of patterning electrodes are required in order to increase the yield in the production of PDP. In this work, the materials and amount of necessary components of photosensitive electrode paste and their effect on the photolithographic process of patterning electrodes were studied.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.203-203
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• 2012

The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.4
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• pp.141-145
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• 2009

Recently, inkjet technology has emerged as one of the most powerful tools for patterning electronics devices, such as large area display applications, RFID, PCB patterning, etc. By using the Inkjet technology, the droplet speed as well as the size can be controlled precisely. In this paper, the relationship between waveform and droplet size will be investigated by means of experiment. Also the relationship between inkjet speed and droplet size will be discussed. It was shown from experimental results that ink droplet size from the nozzle diameter of $50{\mu}m$ can be varied from 37 to $58{\mu}m$ by modifying the inkjet waveform when the speed of the droplet is 1m/sec. Finally, experimental results indicate that small drops are more difficult to generate than large drops since the jetting conditions for making small drops are sensitively affected by the dwell time variation.

• 한국신재생에너지학회:학술대회논문집
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• 2007.11a
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• pp.281-284
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• 2007

Recently, we have developed p-i-n a-Si:H single junction thin film solar cells with RF (13.56MHz) plasma enhanced chemical vapor deposition (PECVD) system, and also successfully fabricated the mini modules ($>300cm^2$), using the laser patterning technique to form an integrated series connection. The efficiency of a mini module was 7.4% ($Area=305cm^2$, Isc=0.25A, Voc=14.74V, FF=62%). To fabricate large area modules, it is important to optimise the integrated series connection, without damaging the cell. We have newly installed the laser patterning equipment that consists of two different lasers, $SHG-YVO_4$ (${\lambda}=0.532{\mu}m$) and YAG (${\lambda}=1.064{\mu}m$). The mini-modules are formed through several scribed lines such as pattern-l (front TCO), pattern-2 (PV layers) and pattern-3 (BR/back contact). However, in the case of pattern-3, a high-energy part of laser shot damaged the textured surface of the front TCO, so that the resistance between the each cells decreases due to an incomplete isolation. In this study, the re-deposition of SnOx from the front TCO, Zn (BR layer) and Al (back contact) on the sidewalls of pattern-3 scribed lines was observed. Moreover, re-crystallization of a-Si:H layers due to thermal damage by laser patterning was evaluated. These cause an increase of a leakage current, result in a low efficiency of module. To optimize a-Si:H single junction thin film modules, a laser beam profile was changed, and its effect on isolation of scribed lines is discussed in this paper.

• Transactions of Materials Processing
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• v.16 no.4 s.94
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• pp.282-287
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• 2007

Hot embossing, one of Nanoimprint Lithography(NIL) techniques, has been getting attention as an alternative candidate of next generation patterning technologies by the advantages of simplicity and low cost compared to conventional photolithographies. A typical hot embossing usually, however, takes more than ten minutes for one cycle of the process because of a long thermal cycling. Over the last few years a number of studies have been made to reduce the cycle time for hot embossing or similar patterning processes. The target of this research is to develop an induction heating apparatus for heating a metallic micro patterning mold at very high speed with the large-area uniformity of temperature distribution. It was found that a 0.5 mm-thick nickel mold can be heated from $25^{\circ}C\;to\;150^{\circ}C$ within 1.5 seconds with the temperature variation of ${\pm}5^{\circ}C$ in 4-inch diameter area, using the induction heating apparatus.

• Journal of the Semiconductor & Display Technology
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• v.10 no.4
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• pp.53-59
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• 2011

Recently there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we focused on the deformation of the $2^{nd}$ generation TFT-LCD sized ($370{\times}470mm^2$) large-area soft mold in the UV imprinting process. A mold was fabricated with PDMS(Poly-dimethyl Siloxane) layered glass back plate(t0.5). Besides, the mold includes large surrounding wall type protrusions of 1.9 mm width and the via-hole(7 ${\mu}m$ diameter) patterend area. The large surrounding wall type protrusions cause the proximity effect which severely degrades the uniformity of residual layer in the via-hole patterend area. Therefore the deformation of the mold was calculated by finite element analysis to assess the effect of large surrounding wall type protrusions and the flexiblity of the mold. The deformation of soft mold was verified by the measurements qualitatively.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.265.2-265.2
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• 2013

We fabricate poly(3,4-ethylenedioxythiopene patterns using liquid-bridge-mediated nanotransfer (LB-nTM) printing via vapor phase polymerization (VPP). LB-nTM printing method can simultaneously enable the synthesis, alignment and patterning of the nanowires from molecular ink solutions. Two- or three-dimensional complex structures of VPP-PEDOT were directly fabricated over a large area using many types of molecular inks. VPP method is a versatile technique that can be used to obtain highly conducting coatings of conjugated polymer on both conducting and non-conducting substrates. The PEDOT patterns has analyzed crystallinity from X-ray diffraction pattern and select-area diffraction patterns. In addition, the PEDOT pattern has high conductivity compared other conducting polymers.