• Title/Summary/Keyword: ion beam modification

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Hydrophilic surface formation of polumer treated by ion assisted reaction and its applications (이온빔보조 반응법을 이용한 고분자 표면의 친수성처리와 그 응용)

  • Cho, J.;Choi, S. C.;Yun, K.H.;Koh, S. K.
    • Journal of the Korean Vacuum Society
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    • v.8 no.3B
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    • pp.262-268
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    • 1999
  • Polycarbonate (PC) and Polymethylmethacrylate (PMMA) surface was modified by ion assisted reaction (IAR) technique to obtain the hydrophilic functional groups and improve the wettability. In conditions of ion assisted reaction, ion beam energy was changed from 500 to 1500eV, and ion dose and oxygen gas blown rate were fixed $1\times10^{16}$ ions/$\textrm{cm}^2$ and 4ml/min, respectively. Wetting angle of water on PC and PMMA surface modified by $Ar^+$ ion without blowing oxygen at 4ml/mon showed $5^{\circ}$ and $10^{\circ}$. Changes of wetting angle with oxygen gas and $Ar^+$ ion irradiation were explained by considering formation of hydrophilic group due to a reaction between irradiated polymer chain by energetic ion irradiation and blown oxygen gas. X-ray photoelectron spectroscopy analysis shows that hydrophilic groups such as -C-O, -(C=O)- and -(C=O)-O- are formed on the surface of polymer by chemical interaction. The polymer surface modification using ion assisted reaction only changed the surface physical properties and sept the bulk properties. In comparison with other modification methods, the surface modification by IAR treatment was chemically stable and enhanced the adhesion between metal and polymer surface. The applications of various kinds of polymer surface modification methods, metal and polymer surface. The applications of various kinds of polymer surface modification could be appled to the new materials about hydrophilic surface properties by IAR treatment. The adhesion between metal film and polymer measured by Scotch tape test whether the hydrophilic surfaces could improve the adhesion strength or not.

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Ion Implantation Using Plasma Sheath (플라즈마 쉬스 (Sheath)를 이용한 이온 주입법)

  • 조무현
    • Journal of the Korean institute of surface engineering
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    • v.23 no.1
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    • pp.1-7
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    • 1990
  • Ion implantation is a well established superior superior surface modification technique for the improvement of wear resistance, hardenece, hardness, corrosion resistance, biocompaibity, surface friction, as well as for the modification of surface electric conductance. Conventional ion implantaion is a line-of-sight process witch ues the ion beam accelerator techniques. Plasma sheath ion implantation (PSII), as a new technique, is described in this paper. In PSII high voltage pulse is applied to a target material placed directly in a plasma, forming a think ion-matrix sheath around the target. Ions accelerate through the sheath drop and bombard the traget from all sides simultaneosuslyregardless of the target shape. This paper describes the principle of PSII, which has non-line-of sight characteristics, as well as the experimental appratus.

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Nano-Structures on Polymers Evolved by Ion Beam/Plasma

  • Moon, Myoung-Woon;Lee, Kwang-Ryeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.76-76
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    • 2012
  • Surface engineering of polymers has a broad array of scientific and technological applications that range from tissue engineering, regenerative medicine, microfluidics and novel lab on chip devices to building mechanical memories, stretchable electronics, and devising tunable surface adhesion for robotics. Recent advancements in the field of nanotechnology have provided robust techniques for controlled surface modification of polymers and creation of structural features on the polymeric surface at submicron scale. We have recently demonstrated techniques for controlled surfaces of soft and relatively hard polymers using ion beam irradiation and plasma treatment, which allows the fabrication of nanoscale surface features such as wrinkles, ripples, holes, and hairs with respect to its polymers. In this talk, we discuss the underlying mechanisms of formation of these structural features. This includes the change in the chemical composition of the surface layer of the polymers due to ion beam irradiation or plasma treatment and the instability and mechanics of the skin-substrate system. Using ion beam or plasma irradiation on polymers, we introduce a simple method for fabrication of one-dimensional, two-dimensional and nested hierarchical structural patterns on polymeric surfaces on various polymers such as polypropylene (PP), polyethylene (PE), poly (methyl methacrylate) PMMA, and polydimethylsiloxane (PDMS).

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Some Applications of Ion Beam Enhanved Deposition Techniques

  • Zhang, Fu-min
    • Journal of the Korean Vacuum Society
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    • v.6 no.S1
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    • pp.166-171
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    • 1997
  • IBED is a very promosing thin film deposition method because of its many advantages, such as excellent adhesion property of films to substrates, room temperature processing, ease of control over the composition and thickness of films, and so on, over the conventional techniques, It has been widely applied in the field of surface modification of materials in the last decade. In our laboratory, many kinds of thin films, such as wear-resistant hard coatings, corrosion and oxidation protective coatings, biomaterial films, buffer layer for high temperature superconductor films, and oxygen sensitive film, have been synthesized by IBED, and several industrial applications of the IBED films have been conducted.

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Charicteristics of HF 10-cm Type Grid Ion Source for Inert and Chemically Reactive Gases.

  • Chol, W.K;Koh, S.K;Jang, H.G;Jung, H.J;Kondranin, S.G.;Kralkina, E.A.;Bougrov, G.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1996.02a
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    • pp.102-102
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    • 1996
  • This paper represents a new type low power High Frequency technological ion source (HF TIS) for ion - beam processing: the surface modification of materials, cleaning of surface, sputtering, coating of thin films, and polishing. The operational principle of HF TIS is based on the excitation of electrostatic waves in plasma located in the external magnetic field. Low power HF TIS with diameter 92 rom gives the opportunity to obtain beams of inert and chemically reactive gases with currents range from 5 to 150 mA (current density $0.015\;~\;3.5\;mA/\textrm{m}^2$) and ion beam energy 100 ~ 2500 eV at a HF power level 10 ~ 150 W. Three grid concave type ion optical system (IOS) is used for extraction and formation ofion beam.n beam.

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Characteristics of Polymer irradiated by Low energy Ion Beam

  • sung Han;Yoon, Ki-Hyun;Jung, Hyung-Jin;Koh, Seok-Keun
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.109-109
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    • 1999
  • Recently, low energy ion beam irradiation has been adopted for surface modification. Low energy ion beam irradiation has many advantages in polymer engineering such as weak damage, good adhesion, noticeably-enhanced wettability(less than 15 degree), good reproducibility and so on. In this experiment, chemical reactions between free radicals and environment gas species have been investigated using angle-resolved XPS and TRIM code. In the case of low ion beam energy (around 1 keV), energy loss in polymer is mainly originated from atomic collisions instead of electronic interference. Atomic collisions could generated displaced atoms and free radicals. Cold cathode-ion source equipped with 5cm convex grid was used in an O2 environment. Base and working pressure were 5$\times$10-6 and 2.3$\times$10-4 Torr. Flow rates of argon and oxygen were fixed at 1.2 and 8 sccm. target materials are polyethylene polyvinyidenefluoride and polytetrafluoroethylene.

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Properties of Diamond-like Carbon(DLC) Thin Films deposited by Negative Ion Beam Sputter (I) (Negative ion beam sputter 법으로 증착한 DLC 박막의 특성 (I))

  • Kim, Dae-Yeon;Gang, Gye-Won;Choe, Byeong-Ho
    • Korean Journal of Materials Research
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    • v.10 no.7
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    • pp.459-463
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    • 2000
  • Direct use of negative ions for modification of materials has opened new research such as charging-free ion implantation and new materials syntheses by pure kinetic bonding reactions. For these purposes, a new solid-state ce-sium ion source has been developed in the laboratory scale. In this paper, diamond like carbon(DLC) films were prepared on silicon wafer by a negative cesium ion gun. This system does not need any gas in the chamber; deposition occurs under high vacuum. The ion source has good control of the C- beam energy(from 80 to 150eV). The result of Raman spectrophotometer shows that the degree of diamond-like character in the films, $sp^3$ fraction, increased as ion beam energy increases. The nanoindentation hardness of the films also increases from 7 to 14 GPa as a function of beam energy. DLC films showed ultra-smooth surface(Ra~1$\AA$)and an impurity-free quality.

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