• Title/Summary/Keyword: interface charge

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Electrical Properties of LDPE/PS/SEBS Blends (LDPE/PS/SEBS 블렌드의 전기적 성질)

  • Lee, Tae-Hee;Kim, Dong-Myung;Kim, Tae-Young;Kim, Won-Jung;Suh, Kwang-S.
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1661-1663
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    • 2004
  • The effect of the triblock copolymer poly[styrene-b-(ethylene-co-butylene)-b-styrene](SEBS) on the formation of space charge of immiscible low density polyethylene/polystyrene(LDPE/PS) blends was investigated. The amount of charge accumulated in the 70/30(wt%) LDPE/PS blends decreased when the SEBS content increased up to 10 wt%. For compatibilzed and uncompatibilized blend, morphological observation showed that the addition of SEBS results in the domain size reduction of the dispersed PS phase and a better interfacial adhesion between LDPE and PS phases. The location of SEBS at a domain interface enables charges to migrate from one phase to the other via domain interface and therefore, results in a significant decrease in the amount of space charge for the LDPE/PS blends with SEBS.

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Electrical Characteristics of Carbon Nanotube Embedded 4H-SiC MOS Capacitors (탄소나노튜브를 첨가한 4H-SiC MOS 캐패시터의 전기적 특성)

  • Lee, Taeseop;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.27 no.9
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    • pp.547-550
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    • 2014
  • In this study, the electrical characteristics of the nickel (Ni)/carbon nanotube (CNT)/$SiO_2$ structures were investigated in order to analyze the mechanism of CNT in MOS device structures. We fabricated 4H-SiC MOS capacitors with or without CNTs. CNT was dispersed by isopropyl alcohol. The capacitance-voltage (C-V) and current-voltage (I-V) are characterized. Both devices were measured by Keithley 4200 SCS. The experimental flatband voltage ($V_{FB}$) shift was positive. Near-interface trap charge density ($N_{it}$) and negative oxide trap charge density ($N_{ox}$) value of CNT embedded MOS capacitors was less than that values of reference samples. Also, the leakage current of CNT embedded MOS capacitors is higher than reference samples. It has been found that its oxide quality is related to charge carriers and/or defect states in the interface of MOS capacitors.

A Switched-Capacitor Interface Based on Dual-Slope Integration (이중-적분을 이용한 용량형 센서용 스위치드-캐패시터 인터페이스)

  • 정원섭;차형우;류승용
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.11
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    • pp.1666-1671
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    • 1989
  • A novel switched-capacitor circuit for interfacing capacitive microtransducers with a digital system is developed based on the dual-slope integration. It consists of a differential integrator and a comparator. Driven by the teo phase clock, the circuit first senses the capacitance difference between the transducer and the reference capacitor in the form of charge, and accumulates it into the feedback capabitor of the integrator for a fixed period of time. The resulant accumulated charge is next extracted by the known reference charge until the integrator output voltage refurns to zero. The length of time required for the integrator output to return to zero, as measured by the number of clock cycle gated into a counter is proportional to the capacitance difference, averaged over the integration period. The whole operation is insensitive to the reference voltage and the capacitor values involved in the circuit, Thus the proposed circuit permits an accurate differental capacitance measurement. An error analysis has showh that the resolution as high as 8 bits can be expected by realizing the circuit in a monolithic MOS IC form. Besides the accuracy, it features the small device count integrable onto a small chip area. The circuit is thus particularly suitadble for the on-chip interface.

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Improvement of Electrochemical Properties and Thermal Stability of a Ni-rich Cathode Material by Polypropylene Coating

  • Yoo, Gi-Won;Son, Jong-Tae
    • Journal of Electrochemical Science and Technology
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    • v.7 no.2
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    • pp.179-184
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    • 2016
  • The interface between the surface of a cathode material and the electrolyte gives rise to surface reactions such as solid electrolyte interface (SEI) and chemical side reactions. These reactions lead to increased surface resistance and charge transfer resistance. It is consequently necessary to improve the electrochemical characteristics by suppressing these reactions. In order to suppress unnecessary surface reactions, we coated cathode material using polypropylene (PP). The PP coating layer effectively reduced the SEI film that is generated after a 4.3 V initial charging process. By mitigating the formation of the SEI film, the PP-coated Li[(Ni0.6Co0.1Mn0.3)0.36(Ni0.80Co0.15Al0.05)0.64)]O2(NCS) electrode provided enhanced transport of Li+ ions due to reduced SEI resistance (RSEI) and charge transfer resistance (Rct). The initial charge and discharge efficiency of the PP-coated NCS electrode was 96.2 % at a current density of 17 mA/g in a voltage range of 3.0 ~ 4.3 V, whereas the efficiency of the NCS electrode was only 94.7 %. The presence of the protective PP layer on the cathode improved the thermal stability by reducing the generated heat, and this was confirmed via DSC analysis by an increased exothermic peak.

Novel OLED structure allowing for the in-situ ohmic contact and reduction of charge accumulation in the device

  • Song, Won-Jun;Kristal, Boris;Lee, Chong-Hoon;Sung, Yeun-Joo;Koh, Sung-Soo;Kim, Mu-Hyun;Lee, Seong-Taek;Kim, Hye-Dong;Lee, Chang-Hee;Chung, Ho-Kyoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.1014-1018
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    • 2007
  • We have demonstrated the enhancement of the power efficiency and device lifetime of organic light-emitting diodes (OLEDs) by introducing the ETL 1 / ETL2 (composite ETL) structure between EML and cathode and the HIL1 (composite HIL) / HIL2 between anode and HTL. Compared to reference devices retaining conventional architecture, novel OLED structure shows an outstanding EL efficiency that is 1.6 times higher (${\sim}4.5$ lm/w versus ${\sim}$ 2.71 lm/w for the reference device) and lower driving voltage $({\bigtriangleup}V>1V)$, but also a longer lifetime and smaller operating voltage drift over time. It is suggested in this work that the device performance can be improved by in-situ ohmic contact through novel electron controlled structure and reduction of charge accumulation in the interface through composite HIL

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Insertion of an Organic Hole Injection Layer for Inverted Organic Light-Emitting Devices

  • Park, Sun-Mi;Kim, Yun-Hak;Lee, Yeon-Jin;Kim, Jeong-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.379-379
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    • 2010
  • Recent technical advances in OLEDs (organic light emitting devices) requires more and more the improvement in low operation voltage, long lifetime, and high luminance efficiency. Inverted top emission OLEDs (ITOLED) appeared to overcome these problems. This evolved to operate better luminance efficiency from conventional OLEDs. First, it has large open area so to be brighter than conventional OLEDs. Also easy integration is possible with Si-based driving circuits for active matrix OLED. But, a proper buffer layer for carrier injection is needed in order to get a good performance. The buffer layer protects underlying organic materials against destructive particles during the electrode deposition and improves their charge transport efficiency by reducing the charge injection barrier. Hexaazatriphenylene-hexacarbonitrile (HAT-CN), a discoid organic molecule, has been used successfully in tandem OLEDs due to its high workfunction more than 6.1 eV. And it has the lowest unoccupied molecular orbital (LUMO) level near to Fermi level. So it plays like a strong electron acceptor. In this experiment, we measured energy level alignment and hole current density on inverted OLED structures for hole injection. The normal film structure of Al/NPB/ITO showed bad characteristics while the HAT-CN insertion between Al and NPB greatly improved hole current density. The behavior can be explained by charge generation at the HAT-CN/NPB interface and gap state formation at Al/HAT-CN interface, respectively. This result indicates that a proper organic buffer layer can be successfully utilized to enhance hole injection efficiency even with low work function Al anode.

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A Study on Space Charge of Organic Pentacene/metal Interface (유기물 Pentacene 박막과 금속 계면에서의 Space Charge 연구)

  • Yoon, Young-Woon;Babajayan, Arsen;Lee, Hoo-Neung;Kim, Song-Hui;Lee, Kie-Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.1
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    • pp.41-46
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    • 2007
  • Surface potential properties at the interface of pentacene thin films on gold (Au) and aluminum (Al) surfaces were investigated by using a near-field scanning microwave microprobe (NSMM). The surface potential formed across the pentacene film was observed by measuring the microwave reflection coefficient $S_{11}$ and compared with the result of a Kelvin-probe method. The obtained reflection coefficient ${\Delta}S_{11}$ of the pentacene thin films on Al was decreased as the pentacene film thickness increased due to the increased accumulation of negative space charges, while for Au ${\Delta}S_{11}$ was essentially constant.

Theoretical Model and Experimental Analysis of Electrical Conductivity in Hydrogenated Amorphous Silicon (비정질 실리콘의 전기 전도도에 대한 이론적 모델 및 실험적 분석)

  • Kim, Yong-Sang;Park, Jin-Seok;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1989.11a
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    • pp.127-130
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    • 1989
  • This paper reports the theoretical model and the experimental results regarding to the electrical conductivity of hydrogenated amorphous silicon (a-Si:H). The total effective conductance of a-Si:H with a planar structure has been considered as the sum of the conductance of an adsorbate-induced layer, a surface-interface layer, a bulk layer, and a substrate-interface layer. In order to investigate the effects of space charge layers in a-Si:H on the conductivity, the thickness dependence of the conductivity is characterized and the conductivities measured at the upper electrodes deposited on a-Si:H are compared with those measured at the lower electrodes deposited on the glass substrate. From our analysis, the bulk conductivity and the thickness of the space charge layer in a-Si:H are characterized quantitatively.

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Plasma Etching Damage of High-k Dielectric Layer of MIS Capacitor (High-k 유전박막 MIS 커패시터의 플라즈마 etching damage에 대한 연구)

  • 양승국;송호영;오범환;이승걸;이일항;박새근
    • Proceedings of the IEEK Conference
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    • 2003.07b
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    • pp.1045-1048
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    • 2003
  • In this paper, we studied plasma damage of MIS capacitor with $Al_2$O$_3$ dielectric film. Using capacitor pattern with the same area but different perimeters, we tried to separate etching damage mechanism and to optimize the dry etching process. After etching both metal and dielectric layer by the same condition, leakage current and C-V measurements were carried out for Pt/A1$_2$O$_3$/Si structures. The flatband voltage shift was appeared in the C-V plot, and it was caused by the variation of the fixed interface charge and the interface trapped charge. From I-V measurement, it was found the leakage current along the periphery could not be ignored. Finally, we established the process condition of RF power 300W, 100mTorr, Ar/Cl$_2$ gas 60sccm as an optimal etching condition.

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The Effects of Interfacial on the Electrical Properties in PET Films (PET 필름의 전기적 특성에 미치는 계면효과)

  • Gang, Mu-Seong;Lee, Chang-Hun;Park, Su-Gil;Park, Dae-Hui
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.5
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    • pp.281-284
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    • 1999
  • In this paper, the electrical conduction, breakdown strength and dielectric properties were investigated in the interfaces of PET films. The volume resistivity and breakdown strength were decreased; especially the specimens with semiconductive layer showed the lowest breakdown strength. This decrease of electrical properties was appeared by increasing charge density in inhomogeneous layer of PET. The dielectric properties of PET did not show significant difference with PET/PET but the films with semiconductive interface layer showed the increase in capacitance and $tan\delta$ was affected by the PET rather than semiconductive layer. It is assumed that the variation of $tan\delta$ was affected by the dielectric polarization and the leakage current(charge).

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