• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.2
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• pp.169-174
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• 2024

In this study, the structural, electrical, and optical properties of AZO films of various thicknesses are compared. The AZO films were deposited on a glass substrate by FTS (Facing-Target-Sputtering) This research was conducted to find the optimal thickness for Transparent Conductive Oxide (TCO). AZO has suitable properties for TCO such as low resistivity, and high transmittance. Thin films of all thicknesses showed a transmittance of over 80% in the visible light region and electrical properties improved as thickness increased. It was confirmed that the film of 300 nm thick had the best performance due to its low resistivity, and uniform surface. This research is expected to help find optimal conditions in various fields where TCO is used, such as solar cells, displays, and sensors in the future.

• Journal of the Korean Graphic Arts Communication Society
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• v.18 no.1
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• pp.47-58
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• 2000

Transmittances of SiO2 and ZrO2 thin films, made by the electron beam evaporation method, were measured with a spectrophotometer to be used in determining their optical constants and thicknesses in the envelop method. New color glass lenses with high transmittance, which now can be manufactured in the industry, was successfully designed by using these constants. Also the vacuum evaporator could be mechanically corrected with these constants as correction factors.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.816-819
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• 2008

A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.194-197
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• 2006

One novel electrode-architecture has been adapted to fabricate transparent OTFTs. The device has more than 70% transmittance, yet reminds high performance. Furthermore, we also use transfer line method to prove that the device performance enhancement indeed contributes from the reduction of the contact resistances. It is anticipated that the transparent OTFTs would be very suitable to be the driving circuits for liquid crystal displays (LCDs).

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.990-993
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• 2006

We fabricated top emission organic light emitting diode (TEOLED) with transparent metal cathode Barium and Silver bilayer. Very thin Ba/Ag bilayer was deposited on the organic layer by thermal evaporation. This cathode shows high transmittance over 70% in visible range. And the device with a Ba-Ag has a low turn on voltage and good electrical properties.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.826-828
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• 2003

With a new PDP transparent dielectric layer formation technique, we were able to make dielectric layer with high transmittance by using dry film type dielectric material. We optimized dielectric pastes for dry film and they showed good process properties in lamination , drying and firing.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.308-309
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• 2015

선형 이온빔 적용 플라즈마 표면처리 기술 및 코팅 공정을 통해서 고경도 투명 박막 형성 연구를 수행하였다. 플라즈마 전처리를 통해서 박막과 기판 사이의 밀착력을 향상시키고, advanced linear PECVD와 advaced plasma source를 적용하여 SiOxNy계의 박막을 형성하였다. 그 결과 투과도 92 % 이상, 표면 경도 6.3~6.9 GPa 이상의 고경도 투명 박막을 개발하였다. 본 연구 공정을 바탕으로 고경도의 투명 보호 필름 및 투명 디스플레이에 응용이 가능할 것으로 기대된다.

• Proceedings of the Optical Society of Korea Conference
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• 2003.02a
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• pp.118-119
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• 2003

휴대용 통신기기의 발달로 인해 실내 및 실외 환경에서 높은 성능을 발휘하는 LCD 소자가 요구되고 있다. 후면광원을 사용하는 투과형 LCD는 실내 혹은 어두운 곳에서 높은 휘도와 명암대비비를 가지는 반면 실외나 밝은 곳에서는 높은 휘도 및 명암대비비를 보일 수 없다. 그에 반해 반사형 LCD는 주변광을 광원으로 사용하므로 실외 혹은 밝은 곳에서의 전기광학 특성이 양호한 장점이 있지만 실내 및 어두운 곳에서의 사용이 제한된다. (중략)

• Proceedings of the Optical Society of Korea Conference
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• 2004.02a
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• pp.100-101
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• 2004

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1453-1456
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• 2009

Transparent sol-gel hybrid dielectric material (hybrimer) coating films were fabricated by spin coating and photo or thermal curing of sol-gel derived oligosiloxane resins. Hybrimer coating films are suitable as the passivation layer of TFT in AMLCD due to low dielectric constant, small loss tangent, low leakage current density, high transmittance and thermal stability.