• 제목/요약/키워드: gas film

검색결과 2,504건 처리시간 0.036초

수직관내 리튬브로마이드 수용액막의 흡수과정에 대한 비흡수가스의 영향 (Effects of Non-Absorbable Gases on the Absorption Process of Aqueous LiBr Solution Film in a Vertical Tube (II))

  • 김병주;이찬우
    • 대한기계학회논문집B
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    • 제22권4호
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    • pp.499-509
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    • 1998
  • In the absorption process of water vapor in a liquid film, the composition of the gas phase, in which a non-absorbable gas is combined with the absorbate influences the transport characteristics remarkably. In the present study, the absorption processes of water vapor into aqueous solution of lithium bromide in the presence of non-absorbable gases were investigated analytically. The continuity, momentum, energy and diffusion equations for the solution film and gas phase were formulated in integral forms and solved numerically. It was found that the mass transfer resistance in gas phase increased with the concentration of non-absorbable gas. However the primary resistance to mass transfer was in the liquid phase. As the concentration of non-absorbable gas in the absorbate increased, the liquid-vapor interfacial temperature and concentration of absorbate in solution decreased, which resulted in the reduction of absorption rate. The reduction of mass transfer rate was found to be significant for the addition of a small amount of non-absorbable gas to the pure vapor, especially at the outlet of an absorber where non-absorbable gases accumulated. At higher non-absorbable gas concentration, the decrease of absorption flux was almost linear to the volumetric concentration of non-absorbable gas.

반도체 가스감지소자를 위한 공간전하 모델 (A Space Charge Model for Semiconductor Gas Sensors)

  • 이성필;이덕동;손병기
    • 대한전자공학회논문지
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    • 제26권11호
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    • pp.1631-1636
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    • 1989
  • A space charge model for semiconductor reduced gas sensors has been roposed and applied to gas sensing mechanism. SnO2-x and SnO2-x/Pt thin film were deposited by vacuum evaporating method. And Hall effect and gas sensitivity characteristics of these sensors were measured. From the space charge model and carrier concentration, the number of the adsorbed gas atom on the solid surface was calculated quantitatively. The gas sensing model was compared with CO gas sensitivities of the fabricated thin film gas sensors.

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Magnetron sputtering으로 증착한 ZnO 박막의 특성과 열처리에 따른 비저항과 미세구조 (A properties of ZnO thin film deposited by magnetron sputtering and its resistivity and microstructure due to annealing)

  • 이승환;성영권;김종관
    • E2M - 전기 전자와 첨단 소재
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    • 제10권2호
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    • pp.126-133
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    • 1997
  • In order to apply for the gas sensing layer and the piezoelectric thin film devices, we studied the effects of magnetron sputtering conditions and annealing temperature on the electrical and structual characteristics of the ZnO thin film. The optimal deposition conditions, in order to obtain a c axis of the ZnO (002) phase thin film which is perpendicular to SiO$_{2}$/Si substrate, were like these ; substrate temperature 150.deg. C, chamber pressure 2 mtorr, R.F. power 300 watts, gas flow ratio 0.4[O$_{2}$(Ar + $O_{2}$)]. When the ZnO thin film was annealed in 600.deg. C, $O_{2}$ gas ambient for 1 hr, the resistivity was 2.6 x 10$^{2}$.ohm.cm and the grain size of ZnO thin film was less than 1 .mu.m. So the ZnO thin film acquired from above conditions can apply for the gas sensing layer which require a c axis perpendicular to the substrate surface.

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RF 스퍼터링법에 의한 BN박막 증착시 기판 바이어스전압의 영향에 관한 연구 (The Effect of Substrate Bias Voltage during the Formation of BN film by R. F. Sputtering Method)

  • 이은국;김도훈
    • 한국표면공학회지
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    • 제29권2호
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    • pp.93-99
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    • 1996
  • In this work BN thin films were deposited on Si substrate by R. F. sputtering method at $200^{\circ}C$ and in Ar + $N_2$ mixed gas atmosphere. In order to investigate the effect of ion bombardment on substrate for c-BN bonding, substrate bias voltage was applied. The optimum substrate bias voltage for c-BN bonding was determined by FTIR analysis on specimens which were deposited with various bias voltages. Then BN thin film was deposited with this optimum condition and its phase, morphology, chemical composition, and refractive index were compared with those of BN film which was deposited without bias voltage. FTIR results showed that BN films deposited with substrate bias voltage were composed of mixed phases of c-BN and h-BN, while those deposited without bias voltage were h-BN only. When pure Ar gas was used for sputtering gas, BN films were delaminated easily from substrate in air, while when 10% $N_2$ gas was added to the sputtering gas, although c-BN specific infrared peak was reduced, delamination did not occur. GXRD and TEM results showed that BN films were amorphous phases regardless of substrate bias voltage, and AES results showed that the chemical compositions of B/N were about 1.7~1.8. The refractive index of BN film deposited with bias voltage was higher than that without bias voltage. The reason is believed to be the existence of c-BN bonding in BN film and the higher density of film that deposited with the substrate bias voltage.

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$SnO_2$ 박막증착을 위한 APCVD Reactor 내 유량 균일도 향상에 대한 수치 해석적 연구 (COMPUTATIONAL ANALYSIS FOR IMPROVING UNIFORMITY OF $SNO_2$ THIN FILM DEPOSITION IN AN APCVD SYSTEM)

  • 박준우;윤익로;정하승;신승원;박승호;김형준
    • 한국전산유체공학회:학술대회논문집
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    • 한국전산유체공학회 2010년 춘계학술대회논문집
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    • pp.567-570
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    • 2010
  • With continuously increasing flat panel display size, uniformity of thin film deposition has been drawing more attentions and associated fabrication methodologies are being actively investigated. Since the convective flow field of mixture gas plays a significant role for deposition characteristics of thin film in an APCVD system, it is greatly important to maintain uniform distribution and consistent concentration of mixture gas species. In this paper, computational study has been performed for the improvement of flow uniformity of mixture gas in an APCVD reactor during thin film deposition process. A diffuser slit has bee designed to spread the locally concentrated gas flow exiting from the flow distributor. A uniform flow distributor has been developed which has less dependency on operating conditions for global flow uniformity

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수직관내 리튬브로마이드 수용액막의 흡수과정에 대한 비흡수가스의 영향 (Effects of Non-Absorbable Gases on the Absorption Process of Aqueous LiBr Solution Film in a Vertical Tube (I))

  • 김병주;이찬우
    • 대한기계학회논문집B
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    • 제22권4호
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    • pp.489-498
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    • 1998
  • Among the heat/mass exchange units composing an absorption system, the absorber, where the refrigerant vapor is absorbed into the liquid solution is the one least understood. In the present study, the effects of non-absorbable gas on the absorption process of aqueous lithium bromide solution falling film inside a vertical tube were experimentally investigated. In the range of film Reynolds number of 30 ~ 195, heat and mass transfer characteristics were investigated as a function of non-absorbable gas volumetric concentration, 0.2 ~ 20%. An increase of non-absorbable gas volumetric concentration degraded the mass transfer rate dramatically in the absorption process. The reduction of mass transfer rate was significant for the addition of small amount of non-absorbable gas to the pure vapor. At film Reynolds number of 130, an increase of non-absorbable gas concentration from 0.2 to 6.0% resulted in the decrease of mass transfer rate by 36% and 20% of non-absorbable gas by 59%. However the decrease of film Nusselt number with the increase of volumetric concentration of non absorbable gas was relatively smaller than the decrease of Sherwood number. Critical film Reynolds number was identified to exist for the maximum heat and mass transfer regardless of the volumetric concentration of non-absorbable gases.

Non-absorbable Gas Effects on Heat and Mass Transfer in Falling Film Absorption

  • Kim, Byongjoo;Lee, Chunkyu
    • Journal of Mechanical Science and Technology
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    • 제17권4호
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    • pp.581-589
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    • 2003
  • Film absorption involves simultaneous heat and mass transfer in the gas-liquid system. While the non-absorbable gas does not participate directly In the absorption process. its pretence does affect the overall heat and mass transfer. An experimental study was performed to investigate the heat and mass transfer characteristics of LiBr-H$_2$O solution flow ing over 6-row horizontal tubes with the water vapor absorption in the pretence of non-absorbable gases. The volumetric concentration of non-absorbable gas, air, was varied from 0.17 to 10.0%. The combined effects of the solution flow rate and its concentration on the heat and mass transfer coefficients were also examined. The presence of 2% volumetric concentration of air resulted in a 25% reduction in the Nusselt number and 41% reduction in the Sherwood number Optimum film Reynolds number was found to exist at which the heat and mass transfer reach their maximum value independent of air contents. Reduced Nusselt and Sherwood numbers. defined as the ratio of Nusselt and Sherwood numbers at given non-absorbable gas content to that with pure water vapor, were correlated to account for the reduction in the heat and mass transfer due to non-absorbable gases in a falling film absorption process.

대향타겟식 스퍼터링법을 이용한 TOLED용 ITO 박막의 산소 가스 의존성 (Dependence on the Oxygen Gas of ITO Thin film for TOLED by Facing Targets Sputtering Method)

  • 금민종;김경환
    • 한국전기전자재료학회논문지
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    • 제19권1호
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    • pp.87-90
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    • 2006
  • In case of preparation of ITO thin film for using top electrode of Top-emitting Organic Light Emitting Diodes(TOLEDs), the ITO thin film should be prepared at room temperature and low oxygen gas flow condition in order to reduced the damage of organic layer due to the bombardment of highly energetic particles such as negative oxygen ions which accrued from the plasma. In this study, the ITO thin film with high optical transmittance and low resistivity prepared as a function of oxygen gas (0 ${\~}$ 0.8 sccm) and Ar gas was fixed at 20 sccm by the Facing Targets Sputtering (FTS) method. The electrical and optical properties of ITO thin films were measured by Hall effect measurement, UV/VIS spectrometer, respectively In the results, we obtained the ITO thin film with lowest resistivity($3{\times}10^{-4} {\Omega}{\cdot} cm$) at oxygen gas flow 0.2 sccm and optical transmittance over $80\%$ at oxygen gas flow over 0.2 sccm.

Effect of Ni Interlayer on the Methanol Gas Sensitivity of ITO Thin Films

  • Lee, Y.J.;Huh, S.B.;Lee, H.M.;Shin, C.H.;Jeong, C.W.;Chae, J.H.;Kim, Y.S.;Kim, Daeil
    • 열처리공학회지
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    • 제23권5호
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    • pp.245-248
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    • 2010
  • Sn doped $In_2O_3$ (ITO) and ITO/Ni/ITO (INI) multilayer films were deposited on the glass substrates with a reactive magnetron sputtering system without intentional substrate heating and then the influence of the Ni interlayer on the methanol gas sensitivity of ITO and INI film sensors were investigated. Although both ITO and INI film sensors have the same thickness of 100 nm, INI sensors have a sandwich structure of ITO 50 nm/Ni 5 nm/ITO 45 nm. The changes in the gas sensitivity of the film sensors caused by methanol gas ranging from 100 to 1000 ppm were measured. It is observed that the INI film sensors show the higher sensitivity than that of the ITO single layer sensors. Finally, it can be concluded that the INI film sensor have the potential to be used as improved methanol gas sensors.

위상변화를 이용한 표면탄성파 가스센서 (Surface acoustic wave gas sensors by utilizing the phase change)

  • 김진상;정용철;강종윤;김달영;남창우;윤석진
    • 센서학회지
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    • 제14권3호
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    • pp.186-190
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    • 2005
  • This paper describes the development of a surface acoustic wave gas sensor that is designed to detect volatile gas by monitering phase change of output signal as a function of time. The sensor consists of SAW oscillators with a center frequency of 100 MHz fabricated on $128^{\circ}$ Y-Z $LiNbO_{3}$ substrates. Experimental results, which show the phase change of output signal under the absorption of volatile gas onto sensors, are presented. The proposed sensor has the properties of high sensitivity compare to the conventional SAW gas sensor and chemical selectivity. Thus, it is thought these results are applicable for use in sensor array of an high performance electronic nose system.