• Korean Journal of Forensic Psychology
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• v.13 no.2
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• pp.147-167
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• 2022

This study was conducted to find out the difference in judgment of murder cases by participants' generation according to the type of murder. 196 adults in their 20s and older were randomly assigned to one of the scenarios of parricide, filicide, and murder, then responded to the judgment(ex. judgment of the perpetrator, degree of deviation from social norms, and judgment of victim responsibility). Finally, 128 responses were used in the analysis. As a result, it was found that the main effect of the murder type and the interaction effect of the generation and the murder type were not shown in all dependent variables. However, the difference between generations was statistically significant in the judgment of the perpetrator (e.g., perpetrator blame, perpetrator responsibility, intentional crime, etc.), indicating that millennials made unfavorable judgments to the perpetrator. Especially, in the case of parricide, it was found that millennials made unfavorable judgments to perpetrators than older generations. Also, it was found that the participants of the older generation tended to make unfavorable judgments toward the perpetrator of murder rather than the perpetrator of parricide. Finally, based on these results, this study proposed the need to reconsider the 'victim of survivors' factor, which is considered as a weighing of an offense for special sentencing factors.

• Journal of Powder Materials
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• v.1 no.1
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• pp.72-78
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• 1994

Two kinds of $U_3Si$ powders and $U_3Si$ dispersed nuclear fuel meats have been prepared by conventional comminution process and a newly developed rotating disk atomization process. In contrast to angular shape and broad size distribution of the conventionally processed powder, the atomized powder was spherical and showed narrow size distribution. For the atomized powder, the heat treatment time for the formation of $U_3Si$ by a peritectoid reaction was reduced to about one tenth, thanks to microstructure refinement by rapid cooling of about 5$\times$104 K/s. The extruding pressure of atomized $U_3Si$ powder and Al powder mixture was lower than that of comminuted $U_3Si$ and Al powder mixture. The elongation of the atomization processed fuel meats was much higher than that of the comminution processed fuel meats and remained over 10% up to 80wt.% of $U_3Si$ powder fraction in the fuel meats. It appears therefore that the loading density of $U_3Si$ in fuel meat can be increased by using atomized $U_3Si$ powder. The atomized spherical particles were randomly distributed, while the comminuted particles with angular and longish shape were considerably aligned along the extrusion direction. Along the transverse direction of the extraction the electrical conductivity of the atomization processed fuel meats was appreciably higher than that of comminution processed fuel meats. This tendency became pronounced as $U_3Si$ content increased. Because the thermal conduction which is believed to be proportioned to the electrical conduction in the nuclear fuel meats occurs in radial direction, the atomization processed fuel can be better used in research reactors where high thermal conductivity is required.

• Korean Journal of Materials Research
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• v.1 no.4
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• pp.191-197
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• 1991

The surface roughnesses of titanium silicide films and the diffusion behaviours of dopants in single crystal and polycrystalline silicon substrates durng titanium silicide formation by rapid thermal annealing(RTA) of sputter deposited Ti-filicide film from the composite $TiSi_{2.6}$ target were investigated by the secondary ion mass spectrometry(SIMS), a four-point probe, X-ray diffraction, and surface roughness measurements. The as-deposited films were amorphous but film prepared on single silicon substrate crystallized to the orthorhombic $TiSi_2$(C54 structure) upon rapid thermal annealing(RTA) at $800^{\circ}C$ for 20sec. There was no significant out-diffusion of dopants from both single crystal and polycrystalline silicon substrate into titanum silicide layers during annealing. Most of the implanted dopants piled up near the titanium silicide/silicon interface. The surface roughnesses of titanium silicide films were in the range between 16 and 22nm.