• 제목/요약/키워드: electroplating mold

검색결과 39건 처리시간 0.025초

A study on the fabrication method of middle size LGP using continuous micro-lenses made by LIGA reflow

  • Kim, Jong-Sun;Ko, Young-Bae;Hwang, Chul-Jin;Kim, Jong-Deok;Yoon, Kyung-Hwan
    • Korea-Australia Rheology Journal
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    • 제19권3호
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    • pp.171-176
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    • 2007
  • LCD-BLU (Liquid Crystal Display-Back Light Unit) of medium size is usually manufactured by forming numerous dots with $50{\sim}300\;{\mu}m$ in diameter by etching process and V-grove shape with $50\;{\mu}m$ in height by mechanical cutting process. However, the surface of the etched dots is very rough due to the characteristics of the etching process and V-cutting needs rather high cost. Instead of existing optical pattern made by etching and mechanical cutting, 3-dimensional continuous micro-lens of $200\;{\mu}m$ in diameter was applied in the present study. The continuous micro-lens pattern fabricated by modified LIGA with thermal reflow process was tested to this new optical design of LGP. The manufacturing process using LIGA-reflow is made up of three stages as follows: (i) the stage of lithography, (ii) the stage of thermal reflow process and (iii) the stage of electroplating. The continuous micro-lens patterned LGP was fabricated with injection molding and its test results showed the possibility of commercial use in the future.

Nano Crystalline Change by Heat Treatment

  • Sun, Yong-Bin
    • 반도체디스플레이기술학회지
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    • 제12권4호
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    • pp.55-59
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    • 2013
  • Mold die sticking arises from silica filler abrasion to the cavity surface. Ni-P electroplating was examined to substitute conventional hard Cr plating. More than 4% of Phosphorus in the electroplated film produces nano crystal structure and annealing makes $Ni_3P$ precipitated to get hardness values equivalent to hard Cr.

나노 임프린팅 기술에 의한 나노패턴을 갖는 PMMA 도광판 제조 기술 (Technology to Fabricate PMMA Light Guiding Plate with nano pattern Using Nano Imprinting Technology)

  • 이병욱;이태성;이종하;이근우;홍진수;정재훈;김창교
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.414-415
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    • 2007
  • PMMA light guiding plate with nano pattern was fabricated by nano imprinting technology. Silicon mold was fabricated by conventional photolithography. A nickel stamper was fabricated by electroplating process using silicon mold. Nano imprinting was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM.

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UV 경사노광에 의한 미세광학패턴 LCD-도광판 (Development of Micro-Optical Patterned LCD-LGP using UV Inclined-Exposure Process)

  • 황철진;김종선;고영배;허영무
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 춘계학술대회 논문집
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    • pp.51-54
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    • 2005
  • Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

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광학 그레이팅의 사출성형제작을 위한 전자빔과 무반사 코팅층이 없는 크롬/퀄츠 마스크를 이용한 고종횡비 100nm 급 니켈 스탬퍼의 제작 (Fabrication of High Aspect Ratio 100nm-Scale Nickel Stamper Using E-Beam Writing based on Chrome/Quartz Mask Without Anti-Reflection Layer for Injection Molding of Optical Grating Patterns)

  • 서영호;최두선;이준형;제태진;황경현
    • 대한기계학회논문집A
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    • 제28권11호
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    • pp.1794-1798
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    • 2004
  • We present a fabrication method of high aspect ratio 100nm-scale nickel stamper using e-beam writing for the injection molding of optical grating patterns. Conventional nickel stamper is fabricated by nickel electroplating process which is followed by seed layer deposition. In this paper, we have used chrome coated blank mask without anti-reflection layer of CrON in order to simplified electroplating process. In experimental study, we have optimized electron-beam dosage for 100nm-scale optical grating patterns with 2.5-aspect ratio, and fabricated nickel stamper using above grating patterns as PR mold. Fabricated nickel stamper have showed height of 240$\pm$20nm and width of 116$\pm$6nm.

경사 LIGA 공정을 이용한 미세 바늘 어레이의 제작 (Fabrication of Microneedle Array Using Inclined LIGA Process)

  • 문상준;이승섭
    • 대한기계학회논문집A
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    • 제28권12호
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    • pp.1871-1876
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    • 2004
  • We demonstrate a novel fabrication technology for the microneedle array that can be used in the medical test field, which is transdermal drug delivery and blood analyte sampling. Previous researchers have used silicon-processed micromachining, a reactive ion etching, and molding techniques for the fabrication of microneedle array. However, these fabrication techniques have somewhat limitations apply to the microneedle array fabrication according to its application. Inclined LIGA process is suggested to overcome these problems. This process provides easier, sharper and longer out-of-plane microneedle array structure than conventional silicon-processed fabrication method did. Additionally, because of the advantage of the LIGA process based on mold fabrication for mass production, the polymer, PMMA(PolyMethylMethAcrylate), based microneedle array is useful as the mold base of nickel electroplating process; on the other hand, silicon-processed microneedle array is used in itself. In this research, we fabricate different types of out-of-plane microneedle array, which have different shape of tip, base and hole structure, using the inclined LIGA process. The fabricated microneedles have proper mechanical strength, height and sharpness to puncture human hand epidermis or dermis with less pain and without needle tip break during penetrating the skin.

Fabrication of 3D Feed Horn IR Antenna for IR Detector

  • Kim, Kun-Tae;Han, Yong-Hee;Shin, Hyun-Joon;Sung Moon;Park, Jung-Ho
    • KIEE International Transactions on Electrophysics and Applications
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    • 제4C권4호
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    • pp.170-175
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    • 2004
  • A three dimensional feed horn 10${\mu}{\textrm}{m}$ wavelength infrared antenna has been suggested, fabricated and characterized. It was applied to an infrared detector for efficient collecting of IR radiation and for reducing background noise. The horn antenna size was designed for maximum antenna directivity. The 3D feed horn antenna mold was fabricated using rotating and tilted illumination while the antenna plate was constructed by way of electroplating. Antenna characteristics were measured by coupling with a microbolometer. Measurement results indicated that the directivity of the antenna is 16.1㏈ and the background noise is reduced by approximately two times.

미세 엔진 운용성 검증 및 요소 기술 개발 (Fabrication and feasibility estimation of Micro Engine Component)

  • 이대훈;박대은;최권형;윤준보;권세진;윤의식
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2001년도 춘계학술대회논문집D
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    • pp.31-36
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    • 2001
  • As a part of micro engine development feasibility estimation was done through fabrication and test of down scaled combustor and MEMS fabricated spark electrode. In an experimental observation of the down scaled combustion phenomena where flame propagation was observed by optical method and pressure change in combustor which gives the information about the reaction generated thermal energy was recorded and analyzed. Optimal combustor scale was derived to be about 2mm considering increased heat loss effect and thermal energy generation capability. Through the fabrication and discharge test of MEMS electrode effects of electrode width and gap was investigated. Electrode was fabricated by thick PR mold and electroplating. From the result discharge voltage characteristic in sub millimeter scale electrode having thickness of $40{\mu}m$ was obtained. From the result base technology for design and fabrication of micro engine was obtained.

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화상처리용 마이크로 미러의 동특성 측정기술 (Dynamic Characteristics Measurement of Micro Mirror for Image Display)

  • 이은호;김규로
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1997년도 춘계학술대회 논문집
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    • pp.371-376
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    • 1997
  • A 100*100.mu.m$^{2}$ aluminum micro mirror is designed and fabricated using a thick photoresist as a sacrificial layer andas a mold for nickel electroplating. The micro mirror is composed of aluminum mirror plate, two nickel support posts, two aluminum hinges, two address eletrodes, and two landing electrodes. The aluminum mirror plate,which is supported by two nickel support posts, is overhung about 10.mu.m from the silicon substrate. THe aluminum mirror plate is actuated like a seesaw by electrostatic force generated by electic potential difference applied between the mirror plate and the address electrode. This paper presents some methods to measure the optical and the dynamic characteristics of the fabricated micro mirror.

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Alumina Templates on Silicon Wafers with Hexagonally or Tetragonally Ordered Nanopore Arrays via Soft Lithography

  • Park, Man-Shik;Yu, Gui-Duk;Shin, Kyu-Soon
    • Bulletin of the Korean Chemical Society
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    • 제33권1호
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    • pp.83-89
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    • 2012
  • Due to the potential importance and usefulness, usage of highly ordered nanoporous anodized aluminum oxide can be broadened in industry, when highly ordered anodized aluminum oxide can be placed on a substrate with controlled thickness. Here we report a facile route to highly ordered nanoporous alumina with the thickness of hundreds-of-nanometer on a silicon wafer substrate. Hexagonally or tetragonally ordered nanoporous alumina could be prepared by way of thermal imprinting, dry etching, and anodization. Adoption of reusable polymer soft molds enabled the control of the thickness of the highly ordered porous alumina. It also increased reproducibility of imprinting process and reduced the expense for mold production and pattern generation. As nanoporous alumina templates are mechanically and thermally stable, we expect that the simple and costeffective fabrication through our method would be highly applicable in electronics industry.