• 제목/요약/키워드: electron density profile

검색결과 102건 처리시간 0.028초

Reconstruction of the Electron Density Profile in O-mode Ultrashort Pulse Reflectometry using a Two-dimensional Finite Difference Time Domain

  • Roh, Young-Su
    • 조명전기설비학회논문지
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    • 제27권7호
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    • pp.52-58
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    • 2013
  • The two-dimensional finite difference time domain algorithm is used to numerically reconstruct the electron density profile in O-mode ultrashort pulse reflectometry. A Gaussian pulse is employed as the source of a probing electromagnetic wave. The Gaussian pulse duration is chosen in such a manner as to have its frequency spectrum cover the whole range of the plasma frequency. By using a number of numerical band-pass filters, it is possible to compute the time delays of the frequency components of the reflected signal from the plasma. The electron density profile is reconstructed by substituting the time delays into the Abel integral equation. As a result of simulation, the reconstructed electron density profile agrees well with the assumed profile.

동축 원통형 코로나 방전 플라즈마의 해석적 모델 (An Analytical Model of Corona Discharge Plasmas in Coaxial Cylindrical Reactor)

  • 고욱희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권3호
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    • pp.157-161
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    • 2004
  • We present a simple analytical expression of plasma density by making use of the electron density equation to study the dynamic behavior of the corona discharge plasma. It assumes that a specified voltage profile is fed through the inner conductor of the reactor chamber consisting of two coaxial conducting cylinders. The analytical description is based on the electron continuity equation with ionization and attachment by electrons. It is found that the electron density profile calculated between two coaxial cylindrical electrodes depends very sensitively on the Profile of applied voltage. The analytical expression of plasma density and its generation will provide important scaling laws in the corona discharge plasma.

GPS를 이용한 전리층 토모그래피 모델 개발 (DEVELOPMENT OF IONOSPHERIC TOMOGRAPHY MODEL USING GPS)

  • 최병규;박종욱;이상정
    • Journal of Astronomy and Space Sciences
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    • 제23권3호
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    • pp.237-244
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    • 2006
  • 한국천문연구원에서 운영중인 9개의 GPS(Global Positioning System) 상시관측소 데이터를 이용하여 한반도 상공의 고도에 따른 전리층 내의 전자밀도 분포를 산출하였다. 전리층의 전자 밀도를 정밀하게 추정하기 위해 이중주파수(L1,L2) 데이터가 사용되었고, 2차원 총전자수(Total Electron Contents, TEC)값을 기반으로 정밀한 전자 밀도 분포를 얻을 수 있었다. 그리고 토모그래피 모델개발에 널리 사용되고 있는 Inversion 기법 중의 하나인 ART(Algebraic Reconstruction Technique) 알고리즘을 적용하였다. 본 연구에서는 지역적 GPS 관측망을 활용하여 시간에 따른 한반도 상공의 전자밀도 분포 유형을 제시하였고, GPS에 의한 전리층 재구성으로 얻어진 전자밀도 유형을 경험적 모델인 IRI-2001에 의해 계산된 값과 관측으로부터 얻어진 Ionosonde 관측값을 서로 비교하였다. 그 결과 GPS 재구성에 의한 전자밀도 분포 유형이 Ionosonde에 의한 관측값과 잘 일치하는 경향을 보였다.

Measurement of electron temperature and density using Stark broadening of the coaxial focused plasma for extreme ultraviolet (EUV) lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.475-475
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    • 2010
  • We have generated Ar plasma in dense plasma focus device with coaxial electrodes for extreme ultraviolet (EUV) lithography and investigated an emitted visible light for electro-optical plasma diagnostics. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas of pressure 8 mTorr. The inner surface of the cylindrical cathode has been attatched by an acetal insulator. Also, the anode made of tin metal. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature and density of the coaxial plasma focus could be obtained by Stark broadening of optical emission spectroscopy (OES). The Lorentzian profile for emission lines of Ar I of 426.629 nm and Ar II of 487.99 nm were measured with a visible monochromator. And the electron density has been estimated by FWHM (Full Width Half Maximum) of its profile. To find the exact value of FWHM, we observed the instrument line broadening of the monochromator with a Hg-Ar reference lamp. The electron temperature has been calculated using the two relative electron density ratios of the Stark profiles. In case of electron density, it has been observed by the Stark broadening method. This experiment result shows the temporal behavior of the electron temperature and density characteristics for the focused plasma. The EUV emission signal whose wavelength is about 6 ~ 16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD). The result compared the electron temperature and density with the temporal EUV signal. The electron density and temperature were observed to be $10^{16}\;cm^{-3}$ and 20 ~ 30 eV, respectively.

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전자 밀도 분포 측정을 위한 극단 펄스 레플렉토메터리 (Ultrashort Pulse Reflectometry for the Measurement of Electron Density Profiles)

  • 노영수
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권1호
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    • pp.8-14
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    • 2004
  • An O-mode Ultrashort Pulse Reflectometry (USPR) system has been designed and developed for the measurement of electron density profiles on the Sustained Spheromak Physics Experiment (SSPX) spheromak. In the original design of SSPX, peak densities were envisioned to be in the range of 0.5-3${\times}$10$^{14}$ cm$^{-3}$ . The total duration of formation and sustained discharges is typically ∼2 msec. Moreover, diagnostic access on SSPX is severely restricted. Such high density and short duration plasmas coupled with stringent diagnostic access are quite challenging for conventional reflectometer systems. In USPR, the SSPX diagnostic requirements have been successfully satisfied by employing up-converting mixers and monostatic horn/waveguide configuration. As a result, the USPR system has proven its applicability for the density measurement of a future fusion device. In the density profile measurements, the USPR system is capable of routinely generating density profiles with a temporal resolution of 57 $\mu$s. This paper presents details regarding the USPR fundamental principles, associated subsystems and laboratory tests as well as the experimental results obtained on SSPX

Microwave Electric Field and Magnetic Field Simulations of an ECR Plasma Source for Hyperthermal Neutral Beam Generation

  • 이희재;김성봉;유석재;조무현;남궁원
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.501-501
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    • 2012
  • A 2.45 GHz electron cyclotron resonance (ECR) plasma source with a belt magnet assembly configuration (BMC) was developed for hyperthermal neutral beam (HNB) generation. A plasma source for high flux HNB generation should be satisfied with the requirements: low pressure operation, high density, and thin plasma. The ECR plasma source with BMC achieved high density at low operation pressure due to electron confinement enhancement caused by high mirror ratio and drifts in toroidal direction. The 2.45 GHz microwave launcher had a circularly bended WR340 waveguide with slits. The microwave E-field profile induced by the microwave launcher was studied in this paper. The E-field profile was a cups field perpendicular to B-filed at ECR zone. The optimized E-field profile and B-field were found for effective ECR heating.

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Self-Consistent Subband Calculations of AlGaN/GaN Single Heterojunctions

  • Lee, Kyu-Seok;Yoon, Doo-Hyeb;Bae, Sung-Bum;Park, Mi-Ran;Kim, Gil-Ho
    • ETRI Journal
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    • 제24권4호
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    • pp.270-279
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    • 2002
  • We present a self-consistent numerical method for calculating the conduction-band profile and subband structure of AlGaN/GaN single heterojunctions. The subband calculations take into account the piezoelectric and spontaneous polarization effect and the Hartree and exchange-correlation interaction. We calculate the dependence of electron sheet concentration and subband energies on various structural parameters, such as the width and Al mole fraction of AlGaN, the density of donor impurities in AlGaN, and the density of acceptor impurities in GaN, as well as the electron temperature. The electron sheet concentration was sensitively dependent on the Al mole fraction and width of the AlGaN layer and the doping density of donor impurities in the AlGaN. The calculated results of electron sheet concentration as a function of the Al mole fraction are in excellent agreement with some experimental data available in the literature.

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전산화 단층촬영에 의한 니들펀칭 탄소/탄소 복합재료 노즐 목삽입재의 밀도 분포 평가 (Density Profile Evaluation of Needle-punched Carbon/Carbon Composites Nozzle Throat by the Computed Tomography)

  • 김동륜;윤남균;이진용
    • 한국추진공학회지
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    • 제10권1호
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    • pp.44-53
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    • 2006
  • 전산화 단층촬영법을 이용하여 탄소/탄소 목삽입재의 밀도 분포를 평가하였다. 전산화 단층촬영법의 Team hardening, 전기적 잡음 및 산란 X-ray의 영상을 보정하고 신호 대 잡음비를 높여 최적화할 때 측정된 탄소/탄소 복합재료의 밀도는 98.74%의 신뢰도 수준에서 ${\pm}0.01g/cm^3$ 분포를 갖는 것으로 평가되었다. 전산화 단층촬영 결과의 검증은 탄소/탄소 목삽입재를 절단하여 수침법에 의한 밀도 측정과 주사전자현미경 관찰을 통하여 수행되었으며 단층촬영 결과는 수침법에 의한 밀도 분포와 주사전자현미경의 영상과 일치하였다.

중형과학로켓, KSR-II를 이용한 이온층 전자 밀도 및 온도 분포 측정에 관한 연구 (A STUDY OF THE IONOSPHERIC ELECTRON MEASUREMENT ON THE MEDIUM-SIZED SCIENTIFIC ROCKET , KSR-II)

  • 이재진;김준;이수진;민경욱;표유선;조광래;이황재
    • Journal of Astronomy and Space Sciences
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    • 제15권2호
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    • pp.401-415
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    • 1998
  • 1998년 6월 11일 오전 10시(KST)에 태안 반도(37。N, 126。E)에서 발사된 국산 로켓 KSR-II는 73km에서 130km고도에 걸쳐 전자 밀도, 전자 온도, 부동 전위 등을 관측하는데 성공하였다. 이 지역은 이온 층의 E-region에 해당하는 지역으로 전자 온도가 낮고 특히 Probe의 오염 효과에 의해 오차가 생길 수 있기 때문에 전자 온도에 대한 정확한 데이터를 얻기가 쉽지 않다. 본 실험에서 사용된 장비는 Langmuir Probe (LP)와 Electron Temperature Probe (ETP)로 두 가지 서로 다른 probe를 통해 얻은 전자 온도를 비교하여 검증된 전자 온도를 구할 수 있었다. 실험 결과 전자 밀도는 약 90km지점에서 급격히 증가하여 약 102km지점에서 최대 전자 밀도를 갖고 이 이상의 고도에서는 점차 감소하는 것으로 나타났다. 이는 최대 전자밀도가 110km에서 나타나는 IRI(International Reference Ionosphere)95-model이나 PIM(Parameterized Ionospheric Model)과 비교해 보면 다소 낮은 고도에서 최대 전자 밀도가 존재하였음을 알 수 있으며 측정된 값은 모델 계산에 비해 약간 큰 값을 갖는 것으로 나타났다. 한편 ETP로 측정된 전자 온도는 200$^{\circ}$K에서 700$^{\circ}$K에서 LP에 의한 교란 효과로 추정되는 요동현상을 보였으며 이를 제외하면 전자 온도가 고도에 따라 다소 증가하는 경향을 볼 수 있었다. LP를 통해 구한 전자 온도는 125km이상의 고도에서 ETP를 통하여 구한 전자 온도와 어는 정도 일치한다는 점에서 신뢰할 만한 측정값을 얻었다고 판단된다.

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Numerical Modeling of an Inductively Coupled Plasma Sputter Sublimation Deposition System

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • 제23권4호
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    • pp.179-186
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    • 2014
  • Fluid model based numerical simulation was carried out for an inductively coupled plasma assisted sputter deposition system. Power absorption, electron temperature and density distribution was modeled with drift diffusion approximation. Effect of an electrically conducting substrate was analyzed and showed confined plasma below the substrate. Part of the plasma was leaked around the substrate edge. Comparison between the quasi-neutrality based compact model and Poisson equation resolved model showed more broadened profile in inductively coupled plasma power absorption than quasi-neutrality case, but very similar Ar ion number density profile. Electric potential was calculated to be in the range of 50 V between a Cr rod source and a conductive substrate. A new model including Cr sputtering by Ar+was developed and used in simulating Cr deposition process. Cr was modeled to be ionized by direct electron impact and showed narrower distribution than Ar ions.