• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.235.2-235.2
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• 2014

Plasma hardly grows in low pressure because of lack of collision. Especially, in extremely low pressure like 1 mTorr, the experiment scale is far larger than mean free path therefore plasma is hardly generated in such low pressure. But low pressure plasma has useful properties like low damage or fine sputtering process because it has typically low electron density. In here, thermal electron is used to make breakdown in low pressure easily and cylindrical geometry is used to help discharge easily. And we changed magnetic field strength to control electron density or temperature. In low pressure, density and temperature behavior is very interesting so its characteristics are examined here.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.196.2-196.2
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• 2014

Nanostructuring the electrode surface is an emerging technology to improve the performance of supercapacitors since it can facilitate charge transfer, ion diffusion and electron propagation during electrochemical process. Fabrication of the electrode consisting of two or more materials together has also been focused on since it can provide synergetic effect such as broader working potential range and enhanced capacitance. In this work, we have used polyaniline (PANi) and manganese oxide (MnO2) as electrode materials. PANi is one of the promising electrode materials due to its high electrochemical activity, high doping level and stability. MnO2 is also widely studied material for supercapacitors since it is relatively cheap and environmentally friendly. Firstly, we synthesized polystyrene nanospheres on MnO2 nanoparticles. MnO2-incorporated PANi hollow nanospheres were then fabricated by polymerizing aniline monomers on these PS nanospheres and dissolving the inner PS spheres. The surface morphology, electronic absorption and electrical conductivity of the electrode were analyzed using field-emission scanning electron microscope (FE-SEM), UV-visible spectrometer, and sheet resistivity meter, respectively. The electrochemical properties such as capacitance of the supercapacitors were also estimated using cyclic voltammetry.

• Journal of The Korean Astronomical Society
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• v.37 no.5
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• pp.483-491
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• 2004

Clusters of galaxies are storage rooms of cosmic rays. They confine the hadronic component of cosmic rays over cosmological time scales due to diffusion, and the electron component due to energy losses. Hadronic cosmic rays can be accelerated during the process of structure formation, because of the supersonic motion of gas in the potential wells created by dark matter. At the shock waves that result from this motion, charged particles can be energized through the first order Fermi process. After discussing the most important evidences for non-thermal phenomena in large scale structures, we describe in some detail the main issues related to the acceleration of particles at these shock waves, emphasizing the possible role of the dynamical backreaction of the accelerated particles on the plasmas involved.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.43 no.3
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• pp.478-484
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• 1994

Facing target dc sputtering system developed by Hoshi et al. has simple configuration and high deposition rate under moderate substrate temperature in the range of pressure 5x10S0-4T - 1x10S0-2T torr. In this system, magnetic field should be applied perpendicular to the target surface in order to confine high energy secondary electrons between two targets. Because of this magnetic field, the glow discharge characteristics are very different from dc planar diode system showing some unstable discharge region. In this paper, the glow discharge characteristics of this system have been studied under the condition of Ti targets with Ar-NS12T(10%) as working gas. It is found that this system has stable discharge region under the discharge current density of 15-30(mA/cmS02T). The plasma density and electron temperature are in the range of 10S010Y - 10S011T(CMS0-3T) and 2.5-5(eV), respectively.