• Title/Summary/Keyword: electron acceleration

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Precise Correction Method of the Copper Emission Spectra obtained from the Pulsed Plasma Jet

  • Kim, Jong-Uk;Son, Sung-Min;Ko, Dong-Seob;Seungmook Oh
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.104-105
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    • 2001
  • Recently, plasma injection has been suggested as a means to enhance and control combustion rates of propellant materials. It is also of interest for applications in fields such as rocket propulsion, electrothermal-chemical (ETC) launchers, and hypersonic mass acceleration technology. In order to characterize the plasma fundamental measurements such as the plasma excitation temperature and electron number density are essential. (omitted)

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X-ray properties of PWNe measured with the NuSTAR telescopes

  • An, Hongjun
    • The Bulletin of The Korean Astronomical Society
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    • v.43 no.2
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    • pp.43.1-43.1
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    • 2018
  • Young pulsar wind nebulae, powered by energetic central pulsars, are often observed as bright extended sources in the X-ray band. They are believed to accelerate electrons and positrons to very high energy and can possibly explain the positron excess observed by Fermi and AMS. The electron distribution in these PWNe can be best studied by X-ray satellites because emission in the X-ray band is produced by direct synchrotron radiation of the electrons and positrons. We present NuSTAR studies of PWNe and discuss the implication. Future studies to help further our understanding of particle acceleration will be briefly discussed.

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A Simulator for High Energy E-beam Lithography for Nano-Patterning (나노패터닝을 위한 고에너지 전자빔 리소그래피 시뮬레이터 개발 및 검증)

  • Kim Jinkwang;Kim Hak;Han Chanho;Chun Kukjin
    • Proceedings of the IEEK Conference
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    • 2004.06b
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    • pp.359-362
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    • 2004
  • Electron beam on high energy acceleration, which travels deeply and sharply through photoresist, became to be used in e-beam lithography apparatus for nano-patterning in due to its high resolution. An advanced electron beam lithography simulation tool is currently undergoing development for nano-patterning. This paper will demonstrate such simulation efforts with experiments at 200 keV e-beam lithography processes on PMMA, ZEP520 of which photoresist parameters and characteristics will be explained with simulation results. Neureuther parameters was extracted from the contrast curve of the resist

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A Development of SEM Applied Microjoining System (SEM을 이용한 미세 접합 시스템 개발)

  • 황일한;나석주
    • Journal of Welding and Joining
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    • v.21 no.4
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    • pp.63-68
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    • 2003
  • Scanning electron microscopy (SEM) has been used as a surface measurement instrument and a tool for lithography in semiconductor process due to its high density localized beam. For those purposes, however, the maximum current of SEM Is less than 100pA, which is not enough fo material processing. In this paper SEM was modified to increase the amount of current reaching a specimen from gun part where current is generated, the possibility of applying SEM to material processing, especially microjoining, was investigated. The maximum current of SEM after modifications was measured up to 10$\mu$A, which is about 10$^{5}$ times greater than before modifications. Through experiments such as eutectic solder wetting on thin 304 stainless steel foil and microjoining of 10$\mu$m thick 304 stainless steel, the intensity of electron beam of SEM proved to be great enough fur material processing as heat source. And a tight jig system was found necessary to hold materials close enough fur successful microloining.

Prediction of Insulation Reliability and Breakdown Life in Epoxy Composites (에폭시 복합체의 절연신뢰도 및 파괴수명 예측)

  • 신철기;박건호;왕종배;김성역;이준웅
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.260-264
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    • 1996
  • In this study, the dieiectric breakdown of epoxy composites used for transformers was experimented and then its data were simulated by Weibull distribution probability . As a result. first of all, speaking of dielectric breakdown properties, the more hardener increased the stronger breakdown strength at low temperature, and the breakdown strength of specimens because it is believed that the adding filler farms interface and charge is accumulated in it, therefore the molecular motility is raised, the electric field is concentrated, and the acceleration of electron and the growth of electron avalanche are early accomplished. In the case of filled specimens with treating silane, the breakdown strength become much higher since the suggests that silane coupling agent improves interfacial combination and relays electric field concentration. Finally, from the analysis 7f weibull distribution. it was confirmed that as the allowed breakdown probability was given by 0.11[%].

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Insulating Reliability according to additives in Epoxy Composites for PCB Material (인쇄 회로 기판용 에폭시 복합체의 첨가제에 따른 절연 신뢰도)

  • Yang, Jeong-Yun;Park, Young-Chull;Park, Geon-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05b
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    • pp.159-163
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    • 2003
  • In this study, the DC dielectric breakdown of epoxy composites used for PCB material was experimented and then its data were simulated by Weibull distribution equation. The more hardener increased the stronger breakdown strength at low temperature because of cross-linked density by the virtue of ester radical, and the breakdown strength of specimens with filler was lower than it of non-filler specimens because it is believed that the adding filler forms interface and charge is accumulated in it, therefore the molecular motility is raised, the electric field is concentrated, and the acceleration of electron and the growth of electron avalanche are early accomplished. From the analysis of Weibull distribution, it was confirmed that as the allowed breakdown probability was given by 0.1[%], the applied field value needed to be under 21.5[kV/mm].

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TEM sample preparation of microsized LiMn2O4 powder using an ion slicer

  • Jung Sik Park;Yoon‑Jung Kang;Sun Eui Choi;Yong Nam Jo
    • Applied Microscopy
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    • v.51
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    • pp.19.1-19.7
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    • 2021
  • The main purpose of this paper is the preparation of transmission electron microscopy (TEM) samples from the microsized powders of lithium-ion secondary batteries. To avoid artefacts during TEM sample preparation, the use of ion slicer milling for thinning and maintaining the intrinsic structure is described. Argon-ion milling techniques have been widely examined to make optimal specimens, thereby making TEM analysis more reliable. In the past few years, the correction of spherical aberration (Cs) in scanning transmission electron microscopy (STEM) has been developing rapidly, which results in direct observation at an atomic level resolution not only at a high acceleration voltage but also at a deaccelerated voltage. In particular, low-kV application has markedly increased, which requires a sufficiently transparent specimen without structural distortion during the sample preparation process. In this study, sample preparation for high-resolution STEM observation is accomplished, and investigations on the crystal integrity are carried out by Cs-corrected STEM.

Humic Substances Act as Electron Acceptor and Redox Mediator for Microbial Dissimilatory Azoreduction by Shewanella decolorationis S12

  • Hong, Yi-Guo;Guo, Jun;Xu, Zhi-Cheng;Xu, Mei-Ying;Sun, Guo-Ping
    • Journal of Microbiology and Biotechnology
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    • v.17 no.3
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    • pp.428-437
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    • 2007
  • The potential for humic substances to serve as terminal electron acceptors in microbial respiration and the effects of humic substances on microbial azoreduction were investigated. The dissimilatory azoreducing microorganism Shewanella decolorationis S12 was able to conserve energy to support growth from electron transport to humics coupled to the oxidation of various organic substances or $H_2$. Batch experiments suggested that when the concentration of anthraquinone-2-sulfonate (AQS), a humics analog, was lower than 3 mmol/l, azoreduction of strain S12 was accelerated under anaerobic condition. However, there was obvious inhibition to azoreduction when the concentration of the AQS was higher than 5 mmol/l. Another humics analog, anthraquinone-2-sulfonate (AQDS), could still prominently accelerate azoreduction, even when the concentration was up to 12 mmol/l, but the rate of acceleration gradually decreased with the increasing concentration of the AQDS. Toxic experiments revealed that AQS can inhibit growth of strain S12 if the concentration past a critical one, but AQDS had no effect on the metabolism and growth of strain S12 although the concentration was up to 20 mmol/l. These results demonstrated that a low concentration of humic substances not only could serve as the terminal electron acceptors for conserving energy for growth, but also act as redox mediator shuttling electrons for the anaerobic azoreduction by S. decolorationis S12. However, a high concentration of humic substances could inhibit the bacterial azoreduction, resulting on the one hand from the toxic effect on cell metabolism and growth, and on the other hand from competion with azo dyes for electrons as electron acceptor.

Preliminary Study on Improvement of Surface Characteristics of Stellite21 Deposited Layer by Powder Feeding Type of Direct Energy Deposition Process Using Plasma Electron Beam (플라즈마 전자빔을 이용한 분말공급형 직접식 에너지 적층 공정으로 제작된 Stellite21 적층층의 표면 특성 개선에 관한 기초 연구)

  • Kim, Dong-In;Lee, Ho-Jin;Ahn, Dong-Gyu;Kim, Jin-Seok;Kang, Eun Goo
    • Journal of the Korean Society for Precision Engineering
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    • v.33 no.11
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    • pp.951-959
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    • 2016
  • The aim of this paper is to investigate the improvement of surface characteristics of Stellite21 deposited layer by powder feeding type of direct energy deposition (DED) process using a plasma electron beam. Re-melting experiments of the deposited specimen is performed using a three-dimensional finishing system with a plasma electron beam. The acceleration voltage and the travel speed of the electron beam are chosen as process parameters. The effects of the process parameters on the surface roughness and the hardness of the re-melted region are examined. The formation of the re-melted region is observed using an optical microscope. Results of these experiments revealed that the re-melting process using a plasma electron beam can greatly improve the surface qualities of the Stellite21 deposited layer by the DED process.