• 제목/요약/키워드: electro deposition process

검색결과 87건 처리시간 0.026초

칼슘 전착처리 후, 시멘트 모르타르 속 철근의 부식속도에 대한 EIS 모니터링 (EIS monitoring on corroded reinforcing steel in cement mortar after calcium electro-deposition treatment)

  • 김제경;기성훈;이정재
    • 한국구조물진단유지관리공학회 논문집
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    • 제23권7호
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    • pp.1-8
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    • 2019
  • 본 연구는 시멘트 모르타르 속에 매입된 철근이 3wt.% NaCl 전해질 수용액에 8시간 침지 및 대기 중에서 16시간 건조가 반복되는 환경에 있을 때 교류 임피던스법을 이용하여, 10kHz에서 용액저항, 10mHz에서 전하이동저항을 측정하여, 그 값의 차이로부터 분극저항을 계산하여 부식속도를 측정하였다. 부식속도를 제어하기 위해 포화 Ca(OH)2 용액에서 일정시간 전착하여, 그 효과를 관찰하였다. 철근의 부식속도는 용존산소의 확산속도 증가에 의해, 침지보다는 건조 환경에서 가속되었으며, 이것은 모르타르 두께가 얇을수록 명확히 측정되었다. 침지 및 건조 반복횟수가 증가함에 따로, 철근의 부식속도는 부동태에서 Low-middle 상태로 가속되었으며, 그 기준은 다수의 연구자들이 사용한 기준을 사용하였다. 이 기준에 의해 철근의 부식속도가 Low-middle 상태가 되면, 포화 Ca(OH)2 용액에서 -10 uA/㎠ 전류밀도를 사용하여 철근에 전착을 진행하고, 5일간 건조시킨 후, 3wt.% NaCl 용액에서 침지-건조 반복실험을 다시 진행하면서, 부식속도를 측정하였다. 측정결과, 모르타르의 두께가 얇은 경우, 부식속도의 감소를 명확히 관찰하였다. 또한, 전착에 의한 철근의 부식속도 감소는 침지상태에서 보다 철근이 건조과정에 놓일 때, 더욱 크게 측정되었다. 전착처리에 따라 칼슘은 철근표면과 모르타르 계면에 존재하는 Porous rust layer의 void를 메우는 것으로 보인다. 시험체가 건조과정에 놓일 때, 철근표면에 형성된 다공질의 녹층속에 농축된 Ca2+가 침지과정보다 쉽게 CO32-와 결합되어, CaCO3가 형성됨으로서 철근의 부식속도를 더욱 감소시킨 것으로 생각된다.

초전도 케이블용 고온초전도 선재의 개발 및 특성평가 (Development and Characterization of High Temperature Superconducting Wire for Superconducting Cable System)

  • 민병진;이재훈;김영순;이헌주;문승현
    • KEPCO Journal on Electric Power and Energy
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    • 제1권1호
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    • pp.151-156
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    • 2015
  • In order to improve the properties of high-temperature superconducting wire for superconducting cable system, we optimized the electro-polishing (EP), ion-beam assisted deposition (IBAD), superconducting (SC) layer, and baking (heat) treatment. The buffer layer was deposited on electro-polished substrate with RMS roughness ($R_{RMS}$) less than 5 nm. The IBAD process was carried out at $V_{beam}$: 1100 V and $V_{accel}$: 850 V that resulted in highly crystalline film of $LaMnO_3$. Chemical composition of SC layer is key to higher critical current, and we found that composition can be determined by surface color of SC layer. We adopt a proprietary contorl system based on RGB analysis of the surface and achieved critical current of 150 A/4 mm-width. The proposed baking treatment resulted in decreasing of about 10% of fraction defects.

PVD방식을 이용한 NDLC 박막에서의 액정 배향 효과 (Liquid Crystal orientation on the NDLC Thin Film Deposited using physical deposition method)

  • 이원규;오병윤;임지훈;나현재;이강민;박홍규;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.301-301
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    • 2008
  • Ion beam (IB)-induced alignment of inorganic materials has been investigated intensively as it provides controllability in a nonstop process for producing high-resolution displays[1][2]. LC orientation via ion-beam (IB) irradiation on the nitrogen doped diamond like carbon (NDLC) thin film deposited by physical deposition method-sputtering was embodied. The NDLC thin film that was deposited by sputter showed uniform LC alignment at the 1200eV of the ion beam intensity. The pretilt angle of LC on NDLC thin films was measured with various IB exposure time and angle. The maximum pretilt angle were showed with IB irradiation angle of $45^{\circ}$ and exposure time of 62.5 sec, respectively. To show NDLC thin film stability in high temperature, thermal stability test was proceeded. The uppermost of the thermal stability of NDLC thin film was $200^{\circ}C$. In this investigation, the electro-optical (EO) characteristics of LC on NDLC thin film were measured.

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Filling of Cu-Al Alloy Into Nanoscale Trench with High Aspect Ratio by Cyclic Metal Organic Chemical Vapor Deposition

  • Moon, H.K.;Lee, S.J.;Lee, J.H.;Yoon, J.;Kim, H.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.370-370
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    • 2012
  • Feature size of Cu interconnects keep shrinking into several tens of nanometer level. For this reason, the Cu interconnects face challenging issues such as increase of electro-migration, line-width dependent electrical resistivity increase, and gap-filling difficulty in high aspect ratio structures. As the thickness of the Cu film decreases below 30 nm, the electrical resistivity is not any more constant, but rather exponential. Research on alloying with other elements have been started to inhibit such escalation in the electrical resistivity. A faint trace of Al added in Cu film by sputtering was reported to contribute to suppression of the increase of the electrical resistivity. From an industrial point of view, we introduced cyclic metal organic chemical vapor deposition (MOCVD) in order to control Al concentration in the Cu film more easily by controlling the delivery time ratio of Cu and Al precursors. The amount of alloying element could be lowered at level of below 1 at%. Process of the alloy formation was applied into gap-filling to evaluate the performance of the gap-filling. Voidless gap-filling even into high aspect ratio trenches was achieved. In-depth analysis will be discussed in detail.

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열처리방법에 따른 ${K_3}{Li_2}{Nb_5}{O_{15}}$(KLN)박막의 제작 (Preparation of ${K_3}{Li_2}{Nb_5}{O_{15}}$(KLN) Thin Films by Heat Treatment Methods)

  • 김광태;박명식;이동욱;조상희
    • 한국세라믹학회지
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    • 제37권8호
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    • pp.731-738
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    • 2000
  • KLN(K3Li2Nb5O15) has attracted a great deal of attention for their potential usefulness in piezoelectric, electro-optic, nonlinear optic, and pyroelectirc devices. Especially, the KLN single crystal has been studied in the field of optics and electronics. However it is hard to produce good quality single crystals due to the crack propagation during crystal growing. One of the solutions of this problem is prepartion of thin film. But the intensive study has not been conducted so far. In this study, after the KLN thin film were prepared by R.F. magnetron Sputtering method on SiO2/Si substrate, the post-annealing methods of RTA(rapid thermal annealin) and IPA(insitu post annealing) were employed. The deposition condition of KLN thin film was RF power(100 W), Working pressure(100 mtorr). The commonness of both RAT and IPA was that the higher were deposition and post annealing temperature, the higher was the intensity of XRD but the less surface roughness. The difference of post-annealing methods affected XRD phase and surface condition very much. And in IPA process, the influence of O2 had much effect on the formation of KLN phase.

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Analysis of Ni/Cu Metallization to Investigate an Adhesive Front Contact for Crystalline-Silicon Solar Cells

  • Lee, Sang Hee;Rehman, Atteq ur;Shin, Eun Gu;Lee, Doo Won;Lee, Soo Hong
    • Journal of the Optical Society of Korea
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    • 제19권3호
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    • pp.217-221
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    • 2015
  • Developing a metallization that has low cost and high efficiency is essential in solar-cell industries, to replace expensive silver-based metallization. Ni/Cu two-step metallization is one way to reduce the cost of solar cells, because the price of copper is about 100 times less than that of silver. Alkaline electroless plating was used for depositing nickel seed layers on the front electrode area. Prior to the nickel deposition process, 2% HF solution was used to remove native oxide, which disturbs uniform nickel plating. In the subsequent step, a nickel sintering process was carried out in $N_2$ gas atmosphere; however, copper was plated by light-induced plating (LIP). Plated nickel has different properties under different bath conditions because nickel electroless plating is a completely chemical process. In this paper, plating bath conditions such as pH and temperature were varied, and the metal layer's structure was analyzed to investigate the adhesion of Ni/Cu metallization. Average adhesion values in the range of 0.2-0.49 N/mm were achieved for samples with no nickel sintering process.

태양전지용 $MgF_2$ 반사방지막 특성연구 (A Study on Properties of $MgF_2$ antireflection film for solar cell)

  • 박계춘;양현훈;백수웅;나길주;소순열;이진;정해덕
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2009년도 추계학술대회 논문집
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    • pp.378-380
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    • 2009
  • $MgF_2$ is a current material for the optical applications in the UV and deep UV range. Process variables for manufacturing the $MgF_2$ thin film were established in order to clarify optimum conditions for growth of the thin film depending upon process conditions, and then by changing a number of vapor deposition conditions and substrate temperature, Annealing conditions variously, structural and Optical characteristics were measured. Thereby, optimum process variables were derived. Nevertheless, modern applications still require improvement of the optical and structural quality of the deposited layers. In the present work, the composition and microstructure of $MgF_2$ single layers grown on slide glass substrate by Electro beam Evaporator(KV-660) processes, were analyzed and compared. The surface Substrate temperature having an effect on the quality of the thin film was changed from $200[^{\circ}C]$ to $350[^{\circ}C]$ at intervals of $50[^{\circ}C]$. and annealing temperature an effect on the thin film was changed from $200[^{\circ}C]$ to $400[^{\circ}C]$ at intervals of $50[^{\circ}C]$. Physical properties of the thin film were investigated at various fabrication conditions substrate temperature, annealing and temperature, annealing time by XRD, FE-SEM.

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MEMS 부품을 위한 다결정 박막의 탄성 물성치 추출 시스템과 다결정 재료의 적용 (Elastic Property Extraction System of Polycrystalline Thin-Films for Micro-Electro-Mechanical System Device and Application to Polycrystalline Materials)

  • 정향남;최재환;정희택;이준기
    • 한국복합재료학회:학술대회논문집
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    • 한국복합재료학회 2004년도 추계학술발표대회 논문집
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    • pp.19-22
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    • 2004
  • A numerical system to extract effective elastic properties of polycrystalline thin-films for MEMS devices is already developed. In this system, the statistical model based on lattice system is used for modeling the microstructure evolution simulation and the key kinetics parameters of given micrograph, grain distributions and deposition process can be extracted by inverse method proposed in the system. In this work, the effective elastic properties of polysilicon, $BaTiO_3\;and\;ZrTiO_4$ are extracted using this system and by employing the fraction of the potential site($f_P$) as a kinetics parameter for the microstructure evolution, the statistical tendency of these materials is studied.

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NaCl 용액 조건 별 전착 프로세스에 의한 친환경 탄산칼슘 막의 형성 제어 (Formation Control of Eco-Friendly Calcium Carbonate Films by Electro-deposition Process at Different NaCl Solution Conditions)

  • 이승효;임경민;김혜민;이명훈
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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    • pp.91-92
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    • 2012
  • 본 연구에서는 $NaHCO_3$, $CaCl_2$ 용액 중 $Mg^{2+}$의 농도를 조절하며 전착프로세스에 의해 다양한 결정구조의 환경친화적인 탄산칼슘 막을 제작할 수 있었다. 특히, 여기서는 이들 막의 효율-실용적 설계 제작을 위해 상기한 용액 조건 중 NaCl의 첨가 농도를 달리하여 탄산칼슘 막의 석출량을 도출함으로써 최적 석출 속도를 제시할 수 있었다.

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