• 제목/요약/키워드: e-beam resist

검색결과 43건 처리시간 0.019초

사출성형을 이용한 미세 패턴 성형 (Fabrication of nano pattern using the injection molding)

  • 이관희;유영은;김선경;김태훈;제태진;최두선
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2007년도 춘계학술대회A
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    • pp.1532-1536
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    • 2007
  • A plastic substrate with tiny rectangular pillars less than 100nm is injection molded to study pattern replication in injection molding. The size of the substrate is 50mm ${\times}$ 50mm and 1mm thick. The substrate has 9 patterned areas of which size is 2mm ${\times}$ 2mm respectively. The lengths of the pillars are 50nm, 100nm, 150nm and 200nm and the width and height are 50nm and about 100nm respectively. A pattern master is fabricated by e-beam writing using positive PR(photo resist) and then a nickel stamper replicated from the PR master by nickel electro-plating. Cr is deposited on the PR pattern master before nickel electro-plating as a conducting layer. Using this nickel stamper, several injection molding experiments are done to investigate effects of the injection molding parameters such as mold temperature, injection rate, packing pressure or pattern location on the replication of the patterns under 100nm.

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Finite element simulations on the ultimate response of extended stiffened end-plate joints

  • Tartaglia, Roberto;D'Aniello, Mario;Zimbru, Mariana;Landolfo, Raffaele
    • Steel and Composite Structures
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    • 제27권6호
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    • pp.727-745
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    • 2018
  • The design criteria and the corresponding performance levels characterize the response of extended stiffened end-plate beam-to-column joints. In order to guarantee a ductile behavior, hierarchy criteria should be adopted to enforce the plastic deformations in the ductile components of the joint. However, the effectiveness of thesecriteria can be impaired if the actual resistance of the end-plate material largely differs from the design value due to the potential activation of brittle failure modes of the bolt rows (e.g., occurrence of failure mode 3 in the place of mode 1 per bolt row). Also the number and the position of bolt rows directly affect the joint response. The presence of a bolt row in the center of the connection does not improve the strength of the joint under both gravity, wind and seismic loading, but it can modify the damage pattern of ductile connections, reducing the gap opening between the end-plate and the column face. On the other hand, the presence of a central bolt row can influence the capacity of the joint to resist the catenary actions developing under a column loss scenario, thus improving the joint robustness. Aiming at investigating the influence of these features on both the cyclic behavior and the response under column loss, a wide range of finite element analyses (FEAs) were performed and the main results are described and discussed in this paper.

UV 차단 금속막을 이용한 잔류층이 없는 UV 나노 임프린트 패턴 형성 (UV-nanoimprint Patterning Without Residual Layers Using UV-blocking Metal Layer)

  • 문강훈;신수범;박인성;이헌;차한선;안진호
    • 마이크로전자및패키징학회지
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    • 제12권4호통권37호
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    • pp.275-280
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    • 2005
  • 나노 임프린트 (NIL)와 포토 리소그라피를 접목시킨 combined nanoimprint and photolithography (CNP) 기술을 이용하여 나노 미세 패턴을 형성하였다. 일반적인 UV-NIL 스탬프의 양각 패턴 위에 Cr 금속막을 입힌 hybrid mask mold (HMM)을 E-beam writing과 plasma etching으로 제작하였다. HMM 전면에는 친수성 물질인 $SiO_2$를 코팅하여 점착방지막 역할의 self-assembled monolayer(SAM) 형성을 용이하게 함으로써 HMM과 transfer layer의 분리를 용이하게 하여 패턴 손상을 억제하였다. 또한, transfer layer에는 일반적인 monomer resin 대신에 건식 에칭에 대한 저항력이 높은 negative PR을 사용하였다. Photo-mask 역할을 하는 HMM의 Cr 금속막이 UV를 차단하여 잔류하게 되는 PR의 비경화층(unexpected residual layer)은 간단한 현상 공정으로 제거하여 PR 잔류층이 없는 나노 미세 패턴을 transfer layer에 형성하였다.

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