• Title/Summary/Keyword: discharge uniformity

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Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • v.23 no.4
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    • pp.161-168
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    • 2014
  • A real-time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a $125mm{\times}625mm$ size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge's behavior.

Characteristics of Line-type Internal Inductively Coupled Plasma Source for Flexible Display Processing

  • Lim, Jong-Hyeuk;Kim, Kyong-Nam;Gweon, Gwang-Ho;Hong, Seung-Pyo;Yeom, Geun-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1490-1493
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    • 2009
  • In this work we present a new type of line plasma source using an internal-type ICP operated at 2MHz with a ferrite module, describe the effect of ferrite module on the enhancement of the plasma properties and the uniformity, and compare to those obtained with 13.56MHz discharge. Also the electrical characteristics of the antenna line and the characteristics of the plasma uniformity were studied.

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FE Analysis of Plasma Discharge and Sheath Characterization in Dry Etching Reactor

  • Yu, Gwang Jun;Kim, Young Sun;Lee, Dong Yoon;Park, Jae Jun;Lee, Se Hee;Park, Il Han
    • Journal of Electrical Engineering and Technology
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    • v.9 no.1
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    • pp.307-312
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    • 2014
  • We present a full finite element analysis for plasma discharge in etching process of semiconductor circuit. The charge transport equations of hydrodynamic diffusion-drift model and the electric field equation were numerically solved in a fully coupled system by using a standard finite element procedure for transient analysis. The proposed method was applied to a real plasma reactor in order to characterize the plasma sheath that is closely related to the yield of the etching process. Throughout the plasma discharge analysis, the base electrode of reactor was tested and modified for improving the uniformity around the wafer edge. The experiment and numerical results were examined along with SEM data of etching quality. The feasibility and usefulness of the proposed method was shown by both numerical and experimental results.

Single Wall Carbon Nanotube Films Produced by Arc Discharge (아크 방전법으로 성장된 대면적 단일벽 탄소나노튜브 필름)

  • Kang, Young-Jin;Oh, Dong-Hoon;Song, Hye-Jin;Jung, Jin-Yeun;Jung, Hyuk;Cho, You-Suk;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.18 no.5
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    • pp.253-258
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    • 2008
  • A simple method to deposit carbon nanotube films uniformly on large area substrates using an arc discharge method is reported in this paper. The arc discharge method was modified to deposit carbon nanotube films in situ on the substrates. The substrates were scanned several times over the arcing point for a uniform film thickness. Deposition was carried out under variable dc bias conditions at 600 torr of $H_2$ gas. The thickness uniformity of the single-wall carbon nanotube films as characterized by a four-point probe was within 30% deviation. The morphology and crystal quality of the single-wall carbon nanotube film were also characterized by field emission scanning electron microscopy and Raman spectroscopy.

Carbon Nano-Powder Functionalization and Disperisibility with Plasma Discharge

  • Gang, Yu-Seok;Jeong, Man-Gi;Lee, Deok-Yeon;Song, Seok-Gyun;Kim, Seong-In
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.491-491
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    • 2013
  • A novel plasma system has been developed for 3-dimensional modification of the carbon nano-powders. Improvement of dispersion of these nano materials are studied by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and uniformity over the treated volume. The uniform dispersion is a critical factor for these material's nano composite applications. Using this plasma system, graphene, carbon black, and CNT was treated and functionalized. Several key discharge conditions such as Ar/H2/O2 or Ar/H2/NH3 gas ratio, treatment time, power, feeder's vibration frequency are investigated. Hydrophobic of graphene has turned some more into hydrophilic by reaction test with water, electrophoresis, surface contact angle test, and turbidity analysis. The oxygen content ratio in the plasma treated CNT has increased about 3.7 times than the untreatedone. In the case of graphene and carbon black, the oxygen- and nitrogen- content has been enhanced average 10%. O-H (N-H) peak, C-O (C-N) peak, and C=O (C=N) peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to O2 or NH3 content.

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The Characteristics of the Discharge Lamp Type Ozonizer using Pulse Power Source for Carnation Productivity Improvement (카네이션 생산성 향상을 위한 펄스 전원을 활용한 방전관형 오존발생기의 특성)

  • Song, Hyun-Jig
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.21 no.7
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    • pp.68-74
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    • 2007
  • For carnation productivity improvement, compact-low cost discharge lamp type ozonizer using pulse power source is designed and manufactured. This paper describes the discharge characteristics and the ozone generation characteristics with variation of the output voltage of pulse power source, the quantity of flowing air and the operating number of ozonizer. The important conclusions are as follows. The discharge voltage and current values are proportional to the output voltage of pulse power source. The ozone concentration and generation are proportional to the output voltage of pulse power source and the number of ozonizer. The maximum value of the ozone concentration and generation of the discharge lamp type ozonizer can be obtained 890[ppm] and 59.7[mg/h] respectively. In the carnation productivity house, when the discharge lamp type ozonizer is used the carnation is good quality in the uniformity of the carnation stalk thickness and increased the productivity through improvement of the air and the soil.

Study of a Ray-Tracing Method for Optimized Road Light Design

  • Oh, Seon;Choi, Dae-Seob
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.4
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    • pp.194-196
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    • 2010
  • A study is presented of improved road light design for drivers and pedestrians with the use of a ray- or reverse ray-tracing method. Many existing road lights are unsuitable for drivers and pedestrians because of serious problems such as glare effect or randomicity of illuminated areas. This situation has arisen because in customary design methods the emphasis has been on simple factors such as luminance or electrical power. However a high luminance or electrical power consumption, alone, do not guarantee bright and good road lighting. So we have applied a ray-tracing method to the design of a road light reflector with the goals of ensuring that illuminated objects on the road can be seen more clearly and that the illuminating light is more comfortable for the eyes of drivers and pedestrians. We have set design targets for factors such as the uniformity of lighting on the road area per road light, the shading angles and the continuous luminance uniformity on long lengths of road. For set heights of the eyes of drivers and pedestrians eyes we have calculated a design guideline for the achievement of the above design targets. Then we designed a road light reflector using the reverse ray-tracing approach. Also we have achieved the same luminance on the road with almost half the power consumption, through the reduction of lighty loss. In an ideal design optimum parameters are suggested to be a shading angle of 75 degrees and a luminance uniformity of 0.5 on the road area. This reflector performance is achievable with a 250 watt power consumption ceramic discharge metal light source.

Analysis and Control of Uniformity by the Feed Gate Adaptation of a Granular Spreader (입제비료 살포기의 출구조절에 의한 균일도의 분석과 제어)

  • Kweon, G.;Grift, Tony E.;Miclet, Denis;Virin, Teddy;Piron, Emmanuel
    • Journal of Biosystems Engineering
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    • v.34 no.2
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    • pp.95-105
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    • 2009
  • A method was proposed which employed control of the drop location of fertilizer particles on a spinner disc to optimize the spread pattern uniformity. The system contained an optical sensor as a feedback mechanism, which measured discharge velocity and location, as well as particle diameters to predict a spread pattern of a single disc. Simulations showed that the feed gate adaptation algorithm produced high quality patterns for any given application rate in the dual disc spreader. The performance of the feed gate control method was assessed using data collected from a Sulky spinner disc spreader. The results showed that it was always possible to find a spread pattern with an acceptable CV lower than 15%, even though the spread pattern was obtained from a rudimentary flat disc with straight radial vanes. A mathematical optimization method was used to find the initial parameter settings for a specially designed experimental spreading arrangement, which included the feed gate control system, for a given flow rate and swath width. Several experiments were carried out to investigate the relationship between the gate opening and flow rate, disc speed and particle velocity, as well as disc speed and predicted landing location of fertilizer particles. All relationships found were highly linear ($r^2$ > 0.96), which showed that the time-of-flight sensor was well suited as a feedback sensor in the rate and uniformity controlled spreading system.

Design Parameter Analysis for a Planar Type Reactive Ion Etcher (평판형 반응성 이온 식각기의 설계변수 분석)

  • 강봉구;박성호;전영진
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.11
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    • pp.1658-1665
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    • 1989
  • Reactor design considerations over several critical parameters for a planar type reactive ion etcher are given. The etch uniformity is taken as a principal design constraint. The characteristics of economicaly available vacuum pumping system are taken as practical design constraints. A set of theoretical conditions on the chamber geometry and on the gas delivery and vacuum system, that satisfy the design constraints, are derived from basic properties of RF glow discharge and gas dynamics. The theoretical results are applied to decide design parameters of a practical single-wafer-per-chamber planar type reactive ion etching machine.

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Improvement of Current Uniformity by Adjusting Ohmic Resitivity on the Surface in Light Emitting Diodes (발광 다이오드에서 분균일 전극의 Ohmic특성을 이용한 전류분포 균일도 향상)

  • Hwang, Seong-Min;Yun, Ju-Seon;Sim, Jong-In
    • Proceedings of the Optical Society of Korea Conference
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    • 2008.02a
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    • pp.93-94
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    • 2008
  • In order to suppress the current crowding in light emitting diodes (LEDs) grown on sapphire substrate, the effect of nonuniform contact resistivity between TME layer and p-GaN layer on the LED surface was theoretically investigated. The analysis results showed that current crowding occurring around p-electrode could be considerably improved, which in turn would be helpful to improve the electrostatic discharge (ESD) characteristic.

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