• Title/Summary/Keyword: deposition area

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Development of Automatic Filet Welding Torch System with High Speed Rotating Arc Sensor

  • Lee, W.K.;Lee, G.Y.;Kim, J.H.;Kim, S.B.
    • 제어로봇시스템학회:학술대회논문집
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    • 2001.10a
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    • pp.94.1-94
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    • 2001
  • Arc sensor gives important groove information during welding. Automatic seam tracking control system with arc sensor has significant characteristics such that bead formation is given as decentralization of penetration and formation of concave bead profile and that a turning point of transverse weaving with constant arc length control is decided whether or not torch height reaches to a specified setting level. Furthermore, the rotating action of the arc prevents hanging of weld bead and forms flat bead surface under high speed welding condition. The variation of groove and deposition area can be detected from the trace of weaving. The area and width of weaving trace has close correlation with the area of groove and deposition. In this paper, main object of this system is to realize an adaptive microprocessor based controller ...

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Analysis of Debris Flow Disaster Area according to Location Change of Check Dam using Kanako-2D (Kanako-2D를 이용한 사방댐 위치 변화에 따른 토석류 피해지 분석)

  • Kim, Young Hwan;Jun, Kye-Won
    • Journal of the Korean Society of Safety
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    • v.33 no.1
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    • pp.128-134
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    • 2018
  • With the increase in frequency of typhoons and heavy rains following the climate change, the scale of damage from the calamities in the mountainous areas has been growing larger and larger, which is different from the past. For the case of Korea where 64% of land is consisted of the mountainous areas, establishment of the check dams has been drastically increased after 2000 in order to reduce the damages from the debris flow. However, due to the lack of data on scale, location and kind of check dams established for reducing the damages in debris flow, the measures to prevent damages based on experience and subjective basis have to be relied on. Under this study, the high-precision DEM data was structured by using the terrestrial LiDAR in the Jecheon area where the debris flow damage occurred in July 2009. And, from the numerical models of the debris flow, Kanako-2D that is available to reflect the erosion and deposition action was applied to install the erosion control facilities (water channel, check dam) and analyzed the effect of reducing the debris flow shown in the downstream.After installing the erosion control facilities, most of debris flow moves along the water channel to reduce the area to expand the debris flow, and after installing the check dam, the flow depth and flux of the debris flow were reduced along with the erosion. However, as a result of analyzing the diffusion area, flow depth, erosion and deposition volume of the debris flow generated from the deposition part after modifying the location of the check dams with the damages occurring on private residences and agricultural land located on the upstream area, the highest reduction effect was shown when the check dam is installed in the maximal discharge points.

Diversity of Epiphytic and Acid-tolerant Epiphytic Bacterial Communities on Plant Leaves

  • Joung Pil-Mun;Shin Kwang-Soo;Lim Jong-Soon;Park Seong Joo
    • Proceedings of the Microbiological Society of Korea Conference
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    • 2002.10a
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    • pp.100-105
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    • 2002
  • The diversity of epiphytic bacterial communities on deciduous oak tree (Quercus dentate Thunb.) leaves was examined both in the natural forest area with a clean air and in the industrial estate to assess effects of acidic deposition to the phyllosphere using 16S rDNA sequence data. In addition, acid-tolerant epiphytic bacterial communities were compared. A total of 78 epiphytic and 444 acid-tolerant clones were obtained from clone libraries, resulting in 20 and 17 phylotypes by analysis of restriction fragment length polymorphism (RFLP) for PCR-amplified 16S rDNA products. A low bacterial diversity in both areas was found. As tree leaves grow older, bacterial diversities were slightly increased in the level of subphylum. The community structure of epiphytic bacteria in both areas in April consisted of only two subphyla, $\beta-and\;\gamma-Proteobacteria$. In August two additional subphyla in both areas were found, but the composition was a little different, Acidobacteria and Cytophaga-Flexibacter-Bacteroids (CFB) group in the industrial estate and a -Proteobacteria and CFB group in the natural area, respectively. Acidobacteria could be an indicator of epiphytic bacteria for acidic deposition on plant leaves, whereas a -Proteobacteria be one of epiphytic bacteria that naturally survive on leaves that are not affected by acidic deposition. The acid-tolerant bacterial communities in April were composed of two subphyla, $\gamma-Proteobacteria$ and Low G+C gram-positive bacteria in both areas, and in August a-Proteobacteria was added to the community just in the natural forest area. The direct influence of acidic deposition on the acid-tolerant bacterial phylogenetic composition could not be detected in higher taxonomic levels such as subphylum, but at narrower or finer levels it could be observed by a detection of Xanthomonadales group of $\gamma-Proteobacteria$ just in the industrial estate.

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Tribology Coating Study of Thick DLC (ta-C) Film (DLC (ta-C) 후막코팅을 위한 트라이볼로지 코팅 연구)

  • Jang, Young-Jun;Kang, Yong-Jin;Kim, Gi Taek;Kim, Jongkuk
    • Tribology and Lubricants
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    • v.32 no.4
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    • pp.125-131
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    • 2016
  • In recent years, thick ta-C coating has attracted considerable interest owing to its existing and potential commercial importance in applications such as automobile accessories, drills, and gears. The thickness of the ta-C coating is an important parameter in these applications. However, the biggest problems are achieving efficient coating and uniformity over a large area with high-speed deposition. Feasibility is confirmed for the ta-C coating thickness of up to 9.0 µm (coating speed: 3.0 µm/h, fixed substrate) using a single FCVA cathode. The thickness was determined using multiple coating cycles that were controlled using substrate temperature and residual stresses. In the present research, we have designed a coating system using FCVA plasma and produced enhanced thick ta-C coating. The system uses a specialized magnetic field configuration with stabilized DC arc plasma discharge during deposition. To achieve quality that is acceptable for use in automobile accessories, the magnetic field, T-type filters, and 10 pieces of a multi-cathode are used to demonstrate the deposition of the thick ta-C coating. The results of coating performance indicate that uniformity is ±7.6 , deposited area is 400 mm, and the thickness of the ta-C coating is up to 5.0 µm (coating speed: 0.3 µm/h, revolution and rotation). The hardness of the coating ranges from 30 to 59 GPa, and the adhesion strength level (HF1) ranges from 20 to 60 N, depending on the ta-C coating.

RICE UPTAKE AND LEACHING OF 99TC IN DIFFERENT PADDY SOILS CONTAMINATED ACCORDING TO TWO CONTRASTING SCENARIOS

  • Choi, Yong-Ho;Lim, Kwang-Muk;Jun, In;Kim, Byung-Ho;Keum, Dong-Kwon
    • Journal of Radiation Protection and Research
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    • v.40 no.4
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    • pp.231-243
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    • 2015
  • Four different paddy soils collected around the Gyeongju nuclear site were treated with $^{99}TcO_4{^-}$ solution under the assumption of two contrasting contamination scenarios. Scenario I (SN-I) is for a pre-transplanting deposition of $^{99}Tc$ followed by plowing, whereas SN-II is for its deposition onto the water surface shortly after transplanting. Rice plants were grown in lysimeters in a greenhouse. Plant uptake of $^{99}Tc$ was quantified with the $TF_{area}$ ($m^2{\cdot}kg^{-1}-dry$). The SN-II $TF_{area}$ values for straws and brown rice, having been generally higher than the SN-I values, were within the ranges of $6.9{\times}10^{-3}{\sim}4.1{\times}10^{-2}$ and $5.2{\times}10^{-6}{\sim}7.3{\times}10^{-5}$, respectively. Sorption onto clay seems to have decreased $^{99}Tc$ uptake in SN-I, whereas it may have had an insignificant effect in SN-II. A phenomenon characteristic of submerged paddy soil, i.e., the development of a thin oxic surface layer may have greatly affected the rice uptake of SN-II $^{99}Tc$. The surface-water concentrations of $^{99}Tc$ were much higher in SN-II than in SN-I. For the percolating water, however, the opposite was generally true. At most 1.3% of the applied $^{99}Tc$ were leached through such percolation. The use of empirical deposition time-dependent $TF_{area}$ values was considered desirable in assessing the radiological impact of a growing-season deposition of $^{99}Tc$ onto paddy fields.

Diamond Crystal Growth Behavior by Hot Filament Chemical Vapor Deposition According to Pretreatment Conditions

  • Song, Chang Weon;You, Mi Young;Lee, Damin;Mun, Hyoung Seok;Kim, Seohan;Song, Pung Keun
    • Journal of the Korean institute of surface engineering
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    • v.53 no.5
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    • pp.241-248
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    • 2020
  • The change of the deposition behavior of diamond through a pretreatment process of the base metal prior to diamond deposition using HFCVD was investigated. To improve the specific surface area of the base material, sanding was performed using sandblasting first, and chemical etching treatment was performed to further improve the uniform specific surface area. Chemical etching was performed by immersing the base material in HCl solutions with various etching time. Thereafter, seeding was performed by immersing the sanded and etched base material in a diamond seeding solution. Diamond deposition according to all pretreatment conditions was performed under the same conditions. Methane was used as the carbon source and hydrogen was used as the reaction gas. The most optimal conditions were found by analyzing the improvement of the specific surface area and uniformity, and the optimal diamond seeding solution concentration and immersion time were also obtained for the diamond particle seeding method. As a result, the sandblasted base material was immersed in 20% HCl for 60 minutes at 100 ℃ and chemically etched, and then immersed in a diamond seeding solution of 5 g/L and seeded using ultrasonic waves for 30 minutes. It was possible to obtain optimized economical diamond film growth rates.

ANALYSIS OF THIN FILM POLYSILICON ON GLASS SYNTHESIZED BY MAGNETRON SPUTTERING

  • Min J. Jung;Yun M. Chung;Lee, Yong J.;Jeon G. Han
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2001.11a
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    • pp.68-68
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    • 2001
  • Thin films of polycrystalline silicon (poly-Si) is a promising material for use in large-area electronic devices. Especially, the poly-Si can be used in high resolution and integrated active-matrix liquid-crystal displays (AMLCDs) and active matrix organic light-emitting diodes (AMOLEDs) because of its high mobility compared to hydrogenated _amorphous silicon (a-Si:H). A number of techniques have been proposed during the past several years to achieve poly-Si on large-area glass substrate. However, the conventional method for fabrication of poly-Si could not apply for glass instead of wafer or quartz substrate. Because the conventional method, low pressure chemical vapor deposition (LPCVD) has a high deposition temperature ($600^{\circ}C-1000^{\circ}C$) and solid phase crystallization (SPC) has a high annealing temperature ($600^{\circ}C-700^{\circ}C$). And also these are required time-consuming processes, which are too long to prevent the thermal damage of corning glass such as bending and fracture. The deposition of silicon thin films on low-cost foreign substrates has recently become a major objective in the search for processes having energy consumption and reaching a better cost evaluation. Hence, combining inexpensive deposition techniques with the growth of crystalline silicon seems to be a straightforward way of ensuring reduced production costs of large-area electronic devices. We have deposited crystalline poly-Si thin films on soda -lime glass and SiOz glass substrate as deposited by PVD at low substrate temperature using high power, magnetron sputtering method. The epitaxial orientation, microstructual characteristics and surface properties of the films were analyzed by TEM, XRD, and AFM. For the electrical characterization of these films, its properties were obtained from the Hall effect measurement by the Van der Pauw measurement.

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Nickel Oxide Nano-Flake Films Synthesized by Chemical Bath Deposition for Electrochemical Capacitors (CBD(Chemical Bath Deposition) 법으로 제조된 전기화학식 캐패시터용 NiO 나노박편 필름)

  • Kim, Young-Ha;Park, Soo-Jin
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.163.2-163.2
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    • 2010
  • In this work, nano-flake shaped nickel oxide (NiO) films were synthesized by chemical bath deposition technique for electrochemical capacitors. The deposition was carried out for 1 and 2 h at room temperature using nickel foam as the substrate and the current collector. The structure and morphology of prepared NiO film were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). And, electrochemical properties were characterized by cyclic voltammetry, galvanostatic charge-discharge, and AC impedence measurement. It was found that the NiO film was constructed by many interconnected NiO nano-flakes which arranged vertically to the substrate, forming a net-like structure with large pores. The open macropores may facilitate the electrolyte penetration and ion migration, resulted in the utilization of nickel oxide due to the increased surface area for electrochemical reactions. Furthermore, it was found that the deposition onto nickel foam as substrate and curent collector led to decrease of the ion transfer resistance so that its specific capacitance of a NiO film had high value than NiO nano flake powder.

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Spreading and Deposition Characteristics of a Water Droplet Impacting on Hydrophobic Textured Surfaces (소수성 텍스쳐 표면에 충돌한 단일 액적의 퍼짐 및 고착 특성)

  • Lee, Jae-Bong;Moon, Joo-Hyun;Lee, Seong-Hyuk
    • Journal of ILASS-Korea
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    • v.17 no.1
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    • pp.14-19
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    • 2012
  • The present study conducts experimental investigation on spreading and deposition characteristics of a $4.3{\mu}l$ de-ionized (DI) water droplet impacting upon aluminum (Al 6061) flat and textured surfaces. The micro-textured surface consisted the micro-hole arrays (hole diameter: $125{\mu}m$, hole depth: $125{\mu}m$) fabricated by the conventional micro-computer numerical control (${\mu}$-CNC) milling machine process. We examined the surface effect of texture area fraction ${\varphi}_s$ ranging from 0 to 0.57 and impact velocity of droplet ranging from 0.40 m/s to 1.45 m/s on spreading and deposition characteristics from captured images. We used a high-speed camera to capture sequential images for investigate spreading characteristics and the image sensor to capture image of final equilibrium deposition droplet for analyze spreading diameter and contact angle. We found that the deposition droplet on textured surfaces have different wetting states. When the impact velocity is low, the non-wetting state partially exists, whereas over 0.64 m/s of impact velocity, totally wetting state is more prominent due to the increase kinetic energy of impinging droplet.

PECVD Silicon Nitride Film Deposition and Annealing Optimization for Solar Cell Application (태양전지 응용을 위한 PECVD 실리콘 질화막 증착 및 열처리 최적화)

  • Yoo, Jin-Su;Dhungel Suresh Kumar;Yi, Jun-Sin
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.12
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    • pp.565-569
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    • 2006
  • Plasma enhanced chemical vapor deposition(PECVD) is a well established technique for the deposition of hydrogenated film of silicon nitride (SiNx:H), which is commonly used as an antireflection coating as well as passivating layer in crystalline silicon solar cell. PECVD-SiNx:H films were investigated by varying the deposition and annealing conditions to optimize for the application in silicon solar cells. By varying the gas ratio (ammonia to silane), the silicon nitride films of refractive indices 1.85 - 2.45 were obtained. The film deposited at $450^{\circ}C$ showed the best carrier lifetime through the film deposition rate was not encouraging. The film deposited with the gas ratio of 0.57 showed the best carrier lifetime after annealing at a temperature of $800^{\circ}C$. The single crystalline silicon solar cells fabricated in conventional industrial production line applying the optimized film deposition and annealing conditions on large area substrate of size $125mm{\times}125mm$ (pseudo square) was found to have the conversion efficiencies as high as 17.05 %. Low cost and high efficiency silicon solar cells fabrication sequence has also been explained in this paper.