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A Study on the Transmittance, Heat-Resistance, and Mechanical Properties of SiO2, TiO2 Anti-Reflective Single Layers Deposited on Sapphire Substrate by MOCVD (금속유기화학증착법으로 사파이어 기판에 증착된 단층 SiO2, TiO2 저반사막의 광 투과율, 내열성, 기계적 특성에 관한 연구)

  • Shim, Gyu-In;Eom, Hyengwoo;Kang, Hyung;Choi, Se-Young
    • Journal of the Korea Institute of Military Science and Technology
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    • v.17 no.5
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    • pp.672-679
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    • 2014
  • To improve sensing capability of infrared, heat-resistance and mechanical properties, the $SiO_2$ and $TiO_2$ anti-reflective layers were coated on sapphire substrate by MOCVD. The standard wavelength was 4,600nm, and the thickness of anti-reflective layers were 379 and 758nm in case of ${\lambda}/4$ and ${\lambda}/2$ of incident angle($65^{\circ}$), respectively. The $SiO_2$ and $TiO_2$ anti-reflective layers were coated 12.6 and 9.7nm/min of deposition rates by increasing oxygen pressure to set the ideal refractive index of 1.283. In case of $SiO_2({\lambda}/2)$ coating, the transmittance increased from 55.0 to 62.7%. The transmittance of $TiO_2({\lambda}/2)$ anti-reflective layer also increased from 55.0 to 64.8%. The flexural strength of $SiO_2({\lambda}/2)$ and $TiO_2({\lambda}/2)$ layer coated sapphire increased from 337.8 to 362.9 and 371.8MPa, respectively. The flexural strength at $500^{\circ}C$ of these materials also increased respectively to 304.5, 358.2MPa from 265.9MPa. From these results, we confirmed these materials can be used as transmission window of infrared light.

Synthesis and Characterization of Large-Area and Highly Crystalline Tungsten Disulphide (WS2) Atomic Layer by Chemical Vapor Deposition

  • Kim, Ji Sun;Kim, Yooseok;Park, Seung-Ho;Ko, Yong Hun;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.361.2-361.2
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    • 2014
  • Transition metal dichalcogenides (MoS2, WS2, WSe2, MoSe2, NbS2, NbSe2, etc.) are layered materials that can exhibit semiconducting, metallic and even superconducting behavior. In the bulk form, the semiconducting phases (MoS2, WS2, WSe2, MoSe2) have an indirect band gap. Recently, these layered systems have attracted a great deal of attention mainly due to their complementary electronic properties when compared to other two-dimensional materials, such as graphene (a semimetal) and boron nitride (an insulator). However, these bulk properties could be significantly modified when the system becomes mono-layered; the indirect band gap becomes direct. Such changes in the band structure when reducing the thickness of a WS2 film have important implications for the development of novel applications, such as valleytronics. In this work, we report for the controlled synthesis of large-area (~cm2) single-, bi-, and few-layer WS2 using a two-step process. WOx thin films were deposited onto a Si/SiO2 substrate, and these films were then sulfurized under vacuum in a second step occurring at high temperatures ($750^{\circ}C$). Furthermore, we have developed an efficient route to transfer these WS2 films onto different substrates, using concentrated HF. WS2 films of different thicknesses have been analyzed by optical microscopy, Raman spectroscopy, and high-resolution transmission electron microscopy.

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Formation of Ohmic Contacts on acceptor ion implanted 4H-SiC (이온 이온주입한 p-type 4H-SiC에의 오믹 접촉 형성)

  • Bahng, W.;Song, G.H.;Kim, H.W.;Seo, K.S.;Kim, S.C.;Kim, N.K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.290-293
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    • 2003
  • Ohmic contact characteristics of Al ion implanted n-type SiC wafer were investigated. Al ions implanted with high dose to obtain the final concentration of $5{\times}10^{19}/cm^3$, then annealed at high temperature. Firstly, B ion ion implanted p-well region were formed which is needed for fabrication of SiC devices such as DIMOSFET and un diode. Secondly, Al implanted high dose region for ohmic contact were formed. After ion implantation, the samples were annealed at high temperature up to $1600^{\circ}C\;and\;1700^{\circ}C$ for 30 min in order to activate the implanted ions electrically. Both the inear TLM and circular TLM method were used for characterization. Ni/Ti metal layer was used for contact metal which is widely used in fabrication of ohmic contacts for n-type SiC. The metal layer was deposited by using RF sputtering and rapid thermal annealed at $950^{\circ}C$ for 90sec. Good ohmic contact characteristics could be obtained regardless of measuring methods. The measured specific contact resistivity for the samples annealed at $1600^{\circ}C\;and\;1700^{\circ}C$ were $1.8{\times}10^{-3}{\Omega}cm^2$, $5.6{\times}10^{-5}{\Omega}cm^2$, respectively. Using the same metal and same process of the ohmic contacts in n-type SiC, it is found possible to make a good ohmic contacts to p-type SiC. It is very helpful for fabricating a integrated SiC devices. In addition, we obtained that the ratio of the electrically activated ions to the implanted Al ions were 10% and 60% for the samples annealed at $1600^{\circ}C\;and\;1700^{\circ}C$, respectively.

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Improvement of Coating Properties of Metal/diamond Composite Through Ni Coated Diamond in the Kinetic Spraying Process (저온 분사 공정에서 니켈이 코팅된 다이아몬드 적용을 통한 금속/다이아몬드 복합재료의 코팅성 향상)

  • Na, Hyun-Taek;Bae, Gyu-Yeol;Kang, Ki-Cheol;Kim, Hyung-Jun;Lee, Chang-Hee
    • Journal of the Korean institute of surface engineering
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    • v.41 no.6
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    • pp.255-263
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    • 2008
  • Generally, deposition mechanism of diamond particle is mainly embedding effect in the kinetic spray process. Accordingly, in spite of high cost, helium gas was employed as process gas to get high diamond fraction in the composite coating. In this study, the deposition behavior of bronze/diamond by kinetic spray process was compared using different process gas (helium and nitrogen). Bare (mean size of $5{\mu}m$, $20{\mu}m$) and nickel coated diamond (mean size of $26{\mu}m$) were deposited on Al 6061-T6 substrate with fixed process temperature and pressure. For comparison with experimental results, plastic deformation behavior of nickel layer was simulated by finite element analysis (using ABAQUS/Explicit 6.7-2). The size, broken ratio, and fraction of diamond in the composite coating were analyzed through scanning electron microscopy and image analysis method. The uniform distribution and deposition efficiency of diamond particles in the coating layer could be achieved by tailoring the physical properties of the feedstock.

Superconformal gap-filling of nano trenches by metalorganic chemical vapor deposition (MOCVD) with hydrogen plasma treatment

  • Moon, H.K.;Lee, N.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.246-246
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    • 2010
  • As the trench width in the interconnect technology decreases down to nano-scale below 50 nm, superconformal gap-filling process of Cu becomes very critical for Cu interconnect. Obtaining superconfomral gap-filling of Cu in the nano-scale trench or via hole using MOCVD is essential to control nucleation and growth of Cu. Therefore, nucleation of Cu must be suppressed near the entrance surface of the trench while Cu layer nucleates and grows at the bottom of the trench. In this study, suppression of Cu nucleation was achieved by treating the Ru barrier metal surface with capacitively coupled hydrogen plasma. Effect of hydrogen plasma pretreatment on Cu nucleation was investigated during MOCVD on atomic-layer deposited (ALD)-Ru barrier surface. It was found that the nucleation and growth of Cu was affected by hydrogen plasma treatment condition. In particular, as the plasma pretreatment time and electrode power increased, Cu nucleation was inhibited. Experimental data suggests that hydrogen atoms from the plasma was implanted onto the Ru surface, which resulted in suppression of Cu nucleation owing to prevention of adsorption of Cu precursor molecules. Due to the hydrogen plasma treatment of the trench on Ru barrier surface, the suppression of Cu nucleation near the entrance of the trenches was achieved and then led to the superconformal gap filling of the nano-scale trenches. In the case for without hydrogen plasma treatments, however, over-grown Cu covered the whole entrance of nano-scale trenches. Detailed mechanism of nucleation suppression and resulting in nano-scale superconformal gap-filling of Cu will be discussed in detail.

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PAPER-TO-PAPER FRICTION CAUSED BY WOOD EXTRACTIVES ON THE PAPER SURFACE IS DETERMINE BY LENGTH AND ORDER OF THE HYDROCARBON CHAINS

  • Nilvebrant, Nils-Olof;Niklas Garoff;Christer Fellers
    • Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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    • 1999.11b
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    • pp.204-208
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    • 1999
  • Friction was measured on filter paper sheets impregnated with model compounds representing wood extractives using an apparatus based on the horizontal plane principle. The best lubrication of paper surfaces was achieved when they were completely separated by a densely packed film of saturated long-chain amphophilic molecules, such as fatty acids. The fatty acids adsorbed with their polar ends on the paper surface, causing their hydrocarbon chaine to be orientated perpendicularly to the paper surface. The saturated C18-acid, stearic acid, was an efficient lubricator for paper surfaces. The introduction of a double bond in stearic acid eliminated its lubricating ability. The spatial length of the lubricating fatty acid thereby decreases from 24${\AA}$ to 11${\AA}$. However the transisomer of oleic acid, elidic acid, had the ability to lower friction due to an increased spatial length of the fatty acid. Both the spatial length of the hydrocarbon chain and the number of lubricating chains may be of importance for the paper-to-paper friction caused by wood extractives. A hydrophilic head-graup in the wood extractive and an ordered molecular layer of lubricating molecules seems also to be prerequisites for efficient lubrication. A chemical weak boundary layer between the paper sheets was suggested to cause the low friction when long chain saturated fatty acids were deposited on paper.

A Study on the Distribution and Property of Carbonaceous Materials in the Subsurface Sediments near the Imjin River (임진강변 퇴적층 내 탄소물질들의 분포 및 특성 연구)

  • Jeong, Sang-Jo
    • Journal of Soil and Groundwater Environment
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    • v.15 no.3
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    • pp.34-43
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    • 2010
  • The fate of hydrophobic organic contaminants (HOCs) in ground water is highly affected by the distribution and property of the carbonaceous materials (CMs) in subsurface sediments. CMs in soils consist of organic matters (e.g., cellulose, fulvic acid, humic acid, humin, etc.) and black carbon such as char, soot, etc. The distribution and property of CMs are governed by source materials and geological evolution (e.g., diagenesis, catagenesis, etc.) of them. In this study, the distribution and property of CMs in subsurface sediments near the Imjin river in the Republic of Korea and HOC sorption property to the subsurface sediments were investigated. The organic carbon contents of sand and clay/silt layers were about 0.35% and 1.37%, respectively. The carbon contents of condensed form of CMs were about 0.13% and 0.45%, respectively. The existence of black carbon was observed using scanning electron microscopes with energy dispersive spectroscopy. The specific surface areas (SSA) of CMs in heavy fraction(HFrCM) measured with N2 were $35-46m^2/g$. However, SSAs of those HFrCM mineral fraction was only $1.6-4.3m^2/g$. The results of thermogravimetric analysis show that the mass loss of HFrCM was significant at $50-200^{\circ}C$ and $350-600^{\circ}C$ due to the degradation of soft form and condensed form of CMs, respectively. The trichloroethylene (TCE) sorption capacities of sand and clay/silt layers were similar to each other, and these values were also similar to oxidzed layer of glacially deposited subsurface sediments of the Chanute Air Force Base (AFB) in Rantoul, Illinois. However, these were 7-8 times lower than TCE sorption capacity of reduced layer of the Chanute AFB sediments. For accurate prediction of the fate of hydrophobic organic contaminants in subsurface sediments, continuous studies on the development of characterization methods for CMs are required.

High aspect ratio wrinkled patterns on polymers by glancing angle deposition

  • Ko, Tae-Jun;Ahmed, Sk. Faruque;Lee, Kwang-Ryeol;Oh, Kyu-Hwan;Moon, Myoung-Woon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.335-335
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    • 2011
  • Instability of a thin film attached to a compliant substrate often leads to emergence of exquisite wrinkle patterns with length scales that depend on the system geometry and applied stresses. However, the patterns that are created using the current techniques in polymer surface engineering, generally have low aspect ratio of undulation amplitude to wavelength, thus, limiting their application. Here, we present a novel and effective method that enables us to create wrinkles with a desired wavelength and high aspect ratio of amplitude over wavelength as large as to 2.5:1. First, we create buckle patterns with high aspect ratio of amplitude to wavelength by deposition of an amorphous carbon film on a surface of a soft polymer poly(dimethylsiloxane) (PDMS). Amorphous carbon films are used as a protective layer in structural systems and biomedical components, due to their low friction coefficient, strong wear resistance against, and high elastic modulus and hardness. The deposited carbon layer is generally under high residual compressive stresses (~1 GPa), making it susceptible to buckle delamination on a hard substrate (e.g. silicon or glass) and to wrinkle on a flexible or soft substrate. Then, we employ glancing angle deposition (GLAD) for deposition of a high aspect ratio patterns with amorphous carbon coating on a PDMS surface. Using this method, pattern amplitudes of several nm to submicron size can be achieved by varying the carbon deposition time, allowing us to harness patterned polymers substrates for variety of application. Specifically, we demonstrate a potential application of the high aspect wrinkles for changing the surface structures with low surface energy materials of amorphous carbon coatings, increasing the water wettability.

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Effect of Negative Oxygen Ions Accelerated by Self-bias on Amorphous InGaZnO Thin Film Transistors

  • Kim, Du-Hyeon;Yun, Su-Bok;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.466-468
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    • 2012
  • Amorphous InGaZnO (${\alpha}$-IGZO) thin-film transistors (TFTs) are are very promising due to their potential use in thin film electronics and display drivers [1]. However, the stability of AOS-TFTs under the various stresses has been issued for the practical AOSs applications [2]. Up to now, many researchers have studied to understand the sub-gap density of states (DOS) as the root cause of instability [3]. Nomura et al. reported that these deep defects are located in the surface layer of the ${\alpha}$-IGZO channel [4]. Also, Kim et al. reported that the interfacial traps can be affected by different RF-power during RF magnetron sputtering process [5]. It is well known that these trap states can influence on the performances and stabilities of ${\alpha}$-IGZO TFTs. Nevertheless, it has not been reported how these defect states are created during conventional RF magnetron sputtering. In general, during conventional RF magnetron sputtering process, negative oxygen ions (NOI) can be generated by electron attachment in oxygen atom near target surface and accelerated up to few hundreds eV by self-bias of RF magnetron sputter; the high energy bombardment of NOIs generates bulk defects in oxide thin films [6-10] and can change the defect states of ${\alpha}$-IGZO thin film. In this paper, we have confirmed that the NOIs accelerated by the self-bias were one of the dominant causes of instability in ${\alpha}$-IGZO TFTs when the channel layer was deposited by conventional RF magnetron sputtering system. Finally, we will introduce our novel technology named as Magnetic Field Shielded Sputtering (MFSS) process [9-10] to eliminate the NOI bombardment effects and present how much to be improved the instability of ${\alpha}$-IGZO TFTs by this new deposition method.

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Al-doping Effects on Structural and Optical Properties of Prism-like ZnO Nanorods

  • Kim, So-A-Ram;Kim, Min-Su;Cho, Min-Young;Nam, Gi-Woong;Lee, Dong-Yul;Kim, Jin-Soo;Kim, Jong-Su;Son, Jeong-Sik;Leem, Jae-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.420-420
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    • 2012
  • ZnO seed layer were deposited on quartz substrate by sol-gel method and prism-like Al-doped ZnO nanorods (AZO nanorods) were grown on ZnO seed layer by hydrothermal method with various Al concentration ranging from 0 to 2.0 at.%. Structural and optical properties of the AZO nanorods were investigated by field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), photoluminescence (PL). The diameter of the AZO nanorods was smaller than undoped ZnO nanorods and its diameter of the AZO nanorods decreased with increasing Al concentration. In XRD spectrum, it was observed that stress and full width at half maximum (FWHM) of the AZO nanorods decreased and the 'c' lattice constant increased as the Al concentration increased. From undoped ZnO nanorods, it was observed that the green-red emission peak of deep-level emission (DLE) in PL spectra. However, after Al doping, not only a broad green emission peak but also a blue emission peak of DLE were observed.

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